HARD X-RAY PHOTOELECTRON SPECTROMETER
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专利名称：HARD X-RAY PHOTOELECTRON
SPECTROMETER
发明人：KOBAYASHI KEISUKE,小林 啓介,KOBAYASHI
YOSHIKO,小林 美子
申请号：JP2015130414
申请日：20150629
公开号：JP2016212076A
公开日：
20161215
专利内容由知识产权出版社提供
专利附图：
摘要：PROBLEM TO BE SOLVED: To provide a hard X-ray photoelectron spectrometer in which the vacuum of an X-ray source is separated from the vacuum of an analysis
chamber.SOLUTION: A hard X-ray photoelectron spectrometer includes an X-ray source analyzer sample manipulator analysis chamber and a vacuum pumping system. A plate-like sample in a three-dimensional space is rotatably disposed around a Z-axis by a sample manipulator. The X-ray source diffracts and reflects the X-rays generated in a target to make it monochromatic and takes out only characteristic X-rays. It is disposed on the Rowland circle along with the target and the sample, and the Rowland circle is disposed to be perpendicular to the sample surface. The sample is configured such that the X-ray diffracted and reflected by a reflecting surface is placed in the focal position on the surface of the sample, and light is obliquely incident on the sample surface. As a result, the X-ray spot extends linearly into long pieces substantially in parallel to the Y-axis. An opening of the slit provided at the entrance of the analyzer is made parallel to the direction extending into the long pieces of the X-ray spot on the sample
surface.SELECTED DRAWING: Figure 6
申请人：KOBAYASHI KEISUKE,小林 啓介,KOBAYASHI YOSHIKO,小林 美子
地址：兵庫県相生市那波西本町１４－３０,兵庫県相生市那波西本町１４－３０
国籍：JP,JP
代理人：清原 義博
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