Integrated Circuit and Layout Method for Standard
- 1、下载文档前请自行甄别文档内容的完整性，平台不提供额外的编辑、内容补充、找答案等附加服务。
- 2、"仅部分预览"的文档,不可在线预览部分如存在完整性等问题,可反馈申请退款(可完整预览的文档不适用该条件!)。
- 3、如文档侵犯您的权益，请联系客服反馈,我们会尽快为您处理(人工客服工作时间：9:00-18:30)。
专利名称：Integrated Circuit and Layout Method for
Standard Cell Structures
发明人：Sheng-Hsiung CHEN,Chung-Te LIN,Fong-
Yuan CHANG,Ho Che YU,Li-Chun TIEN
申请号：US17454004
申请日：20211108
公开号：US20220058330A1
公开日：
20220224
专利内容由知识产权出版社提供
专利附图：
摘要：Placement methods described in this disclosure provide placement and routing rules where a system implementing the automatic placement and routing (APR) method
arranges standard cell structures in a vertical direction that is perpendicular to the fins but parallel to the cell height. Layout methods described in this disclosure also improve device density and further reduce cell height by incorporating vertical power supply lines into standard cell structures. Pin connections can be used to electrically connect the power supply lines to standard cell structures, thus improving device density and performance. The APR process is also configured to rotate standard cells to optimize device layout.
申请人：Taiwan Semiconductor Manufacturing Co., Lid.
地址：Hsinchu TW
国籍：TW
更多信息请下载全文后查看。