Exposure device and exposure method for exposing a

合集下载
  1. 1、下载文档前请自行甄别文档内容的完整性,平台不提供额外的编辑、内容补充、找答案等附加服务。
  2. 2、"仅部分预览"的文档,不可在线预览部分如存在完整性等问题,可反馈申请退款(可完整预览的文档不适用该条件!)。
  3. 3、如文档侵犯您的权益,请联系客服反馈,我们会尽快为您处理(人工客服工作时间:9:00-18:30)。

专利名称:Exposure device and exposure method for

exposing a photosensitive medium to light

on the basis of image data containing

multiple pixels

发明人:Takuji Ehara,Fumihiro Nakahara

申请号:US10863528

申请日:20040609

公开号:US07236184B2

公开日:

20070626

专利内容由知识产权出版社提供

专利附图:

摘要:In an exposure device according to the present invention, a plurality of exposure

bands each containing multiple dots is formed on photographic paper by repeating main scanning in a main scanning direction based on image data that contains multiple pixels and the transfer of the photographic paper in a sub scanning direction. Of the multiple dots contained in each of two continuous exposure bands, the mean value of the pixel levels of two pixels corresponding to two dots with the same positional relationship for the main scanning direction is calculated to derive interpolation data. Thus, the region between the two dots neighboring in the sub scanning direction on the photographic paper is exposed on the basis of the interpolation data.

申请人:Takuji Ehara,Fumihiro Nakahara

地址:Wakayama JP,Wakayama JP

国籍:JP,JP

代理机构:Smith Patent Office

更多信息请下载全文后查看

相关文档
最新文档