VACUUM VALUE

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专利内容由知识产权出版社提供
专利名称:VACUUM VALUE 发明人:OKUTOMI ISAO,YAMAMOTO ATSUSHI,SEKI
KEISEI 申请号:JP32755990 申请日:1128 公开号:J P H 04 206122A 公开日:19920728
摘要:PURPOSE:To obtain excellent large-current breaking performance and a low and stable surge property by reducing the quantity of a prescribed conductive component, in conductive components in a furst layer region of a contact material, compound with the quantity in a second layer region in a given range. CONSTITUTION:A vacuum valve contact is composed of a first layer region 15, forming a contact surface, and a second layer region 13 forming the inside of the first layer region 15. The regions 15 and 13 are continuously integrated with a highly conductive component composed of Ag and/or Cu. The quantity (b) of a highly conductive component in the region 13 is 2050wt.% to the whole quantity of a contact material, the quantity (a) of a mean highly conductive component in the region 15 is within a range of 20-80% of the quantity (b), with the remaining part composed of an arc resistance component. Carbide of one or more kind metal, selected from a group composed of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, is preferable as an arc resistant material. One or more kind component selected from Fe, Co, and Ni can be included as required as an auxiliary component.
申请人:TOSHIBA CORP
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