Precision Measurement of Optical Pulsation using a Cherenkov Telescope
赛默飞世尔 ARL iSpark 系列光学发射光谱仪 可靠的金属质量 创新的OES 铁和钢
T hermo Scientific ARL iSpark Series Optical Emission SpectrometersThe ARL iSpark Seriesis a high performance OES spectrometer platform based on the best PMT (photomultiplier tube) optics. It features the most sensitive CCD (charge-coupled device) optics, enhanced degree of functionality and other innovative technologies, including:•Unique PMT or dual CCD/PMT optics • Revolutionary digital spark generator • Innovative spark stand design• Advanced acquisition technologies and processing algorithms for PMT and CCD signals• Single Spark Acquisition with diffuse spark intensity removal algorithm to improve accuracy on PMTs • Most advanced analysis of micro-inclusions• Smart argon management with argon saving modesSpark optical emission spectrometry (OES)is the most widely used technique for elemental concentration analysis of solid metallic samples. With industry leading quality and performance, Thermo Scientific OES spectrometers excel in every aspect of this process with:•Very fast elemental analysis of most metals and alloys • Analysis of all necessary elements from trace to percentage level• Outstanding accuracy, precision and stability • Simple instrument operation and maintenance • Low capital investment and operating costsFor over 75 years, our company has set the standard of quality for spectrochemical analysis of metals. Throughout these years, performance, stability, reliability and longevity have been the key attributes of our optical emission spectrometers. The Thermo Scientific ™ ARL iSpark ™ metals analyzers combine these guiding principles with our experience and technical innovation to bring our customers the complete value based solution they have come to expect from our company.The ARL iSpark spectrometer can analyze all the elements necessary in your current and future applications. It is the answer to your analytical needs, whether for incoming material or metal quality control and production analysis. Working 24/7, the ARL iSpark metals analyzers deliver reliable performance year after year.Thermo Scientific ARL iSpark Series Optical Emission Spectrometers2ARL iSpark Series3Fullautomation Small samplesPrecious metalsNon metallic micro-inclusionsMetals and alloysARL iSpark 8880Experience and versatility• Dual CCD/PMT optics• Single and multi-matrix configurations • Ideal for metal recycling industries,laboratories or any companies that need high analytical versatility• Inclusion analysis available • Spectral investigation• Flexibility to accommodate future needsARL iSpark 8820Experience and innovation• Dual CCD/PMT optics• Single and multi-matrix configurations • Excellent performance on a widerange of elements• For foundries and metals processors and any companies wanting aneconomical solution allowing efficient quality control• Spectral investigationARL iSpark 8860Experience and performance• PMT optics• Single and multi-matrixconfigurations• Best performance for trace analysis • Instrument of choice for metal producers and refiners • Inclusion analysis availableThe ARL iSpark Series consists of three models meeting the needs of the various metals industries and processes.Made-to-measure spectrometers to answer a variety of needsUltimate optical designoffering the best solution to all your needsThe ARL iSpark Series is designed around the world’s most famous one-meter focal length PMT optics of the ARL 3460 and ARL 4460 OES spectrometers. With the addition of a high performance flat field CCD module on some models, the ARL iSpark Series addresses the requirements of all market and application segments. Its unique optical design concept offers an optimum solution for everyone.Dual CCD/PMT versus all PMT opticsThe CCD detector of the ARL iSpark allows outstanding analysis for a majority of the elements. PMTs are generally preferred for the determination of the critical elements and the analysis of traces, mainly in pure and ultra-pure metals. They are also required for the analysis of micro-inclusions.The dual optics offers the opportunity to select a PMT or CCD type of detector for each element according to the principle of “best of both technologies”. Applied with the ARL iSpark 8820 model, this principle ensures optimal analysis on all elements.The continuous spectral coverage of the CCD detector also provides unique capability for spectral investigations, making it a powerful tool for metals research.Thermo Scientific ARL iSpark Series Optical Emission Spectrometers4Photomutiplier tubesExcitation standPMT spectrometerCCD spectrometerDual CCD/PMT optical mountingGratingCCD spectrometerEntrance slitGratingCCD detectorVertical cross-section through the dual CCD/PMT opticsHorizontal cross-section through the PMT opticsSpectrometer bodyVacuum regionSecondary optics including slits and mirrorsPrimary slitArgon flushed light pathExcitation standGratingPMT opticsThe one-meter spectrometer in Paschen-Runge mounting with PMT detectors has the best resolving power on the market. Direct view ensures highest possible sensitivity. The spectrometer body is made of cast iron and operates under vacuum for ultimate stability. PMTs with the most advanced signal acquisition and processing technologies offer the best possible performance available on the market.The main modules of the spectrometer have been newly designed, leading to improved instrument performance, reliability, ease of use, as well as a reduction in maintenance and argon consumption.IntelliSourceThe Thermo Scientific intelliSource isa double current controlled source (CCS) and the most innovative spark source on the market. More flexible and precise than the other digital sources, it allows discharge shapes to be tailored for most efficient sample surface Smart Argon Management (SAM) interface allowingstarting or programming argon saving modesArgon managementThanks to an innovative computer controlled argon circuit design, the argon consumption has been significantly reduced.•The argon flows are optimized for each phase of the analytical sequence (flush, pre-burn, integration), allowing best performance while requiring the minimum argon consumptionTechnological breakthroughs to your benefitno tools are needed7The ARL iSpark was designed for increased safety, convenience and ease of use in daily operations:• The stand cover allows simple operation with maximal operator security. A hydraulic cylinder makes the opening easy and acts as a braking system that allows a smooth and unassisted closing• Samples to be analyzed, among other things, can be placed on the worktop located next to the stand• The setting-up samples and other accessories can be placed in the storage compartment• Front access to all modules of the instrument (e.g. vacuumWorktopStorage compartmentEasy opening/smooth closingFront access for easy maintenanceSpace savingHigh degree of functionality delivering many advantagesSpectra Viewer display showing a zoom on the analytical Cu line in the spectra of a pure iron sample (blue) and a CrNi steel sample (red).Innovative signal acquisition and processing for unequalled performancePMT signal acquisition and processingThe PMT signal is integrated during TGA (Time GatedAcquisition) windows, i.e. time windows synchronized with the single sparks. TGA is an ultra-high precision version of TRS (Time Resolved Spectroscopy) that allows improving sensitivity and accuracy by collecting the signal with minimal noise, background emission and spectral interference. In addition, PMT acquisition features include Single Spark Acquisition (SSA) and low noise integrator to suppress dark current and offset.The following features also contribute to the quality and the reliability of the analysis:The ARL iSpark spectrometer has several innovative signal acquisition and processing features that contribute to the superb performance and stability of the instrument, and make it a totally unique OES spectrometer.Thermo Scientific ARL iSpark Series Optical Emission Spectrometers8Our quality systemyour best guaranteeThe quality of our instruments is recognized by thousands ofcustomers around the world. This quality is ensured by ourmany comprehensive protocols and tools that compose ourmanufacturing process, some of which are outlined below.Calibration curve established with CARLApplicationsThe ARL iSpark spectrometers are delivered as turn-key systems with ready-to-use applications, pre-configured and calibrated in our factory. Analytical conditions, parameters and calibrations optimized by our specialists provide the best accuracy and performance at the highest speed with the lowest argon consumption. Element coverage and calibration CalibrationAccuracy, which depends on the calibration of the instrument, is the most important figure of merit required for a spectrometer. The ARL iSpark metal analyzers are individually calibrated in our factory. The calibrations are performed using certified reference materials (CRMs) and reference materials (RMs) validated in the factory. The calibration curves are established with CARL (Calibration ARL), a highly sophisticated multi-variable regression (MVR) software tool that corrects for matrixAnalysis of micro-inclusions a rapid analysis for a quick returnDetail of OXSAS display showing the result of simultaneous elemental concentration and inclusion analysis of a low alloy steel sample. The top results in % are fromelemental analysis. All other results are from Spark-DAT methods. They include Al sol, Al insol and total oxygen (TO), peaks and coincidental peaks, and inclusion size.• Quantitative determination of total oxygen content down to a few ppm in killed steels (Advanced Inclusion Analysis)See the dedicated application notes for more details.Optional methods using the Spark-DAT algorithms allow ultra-fast analysis of micro-inclusions, such as Al 2O 3, CaO, Al 2O 3-CaO, MnS and CaS in steel, or TiB 2, oxides, carbides, nitrides and chlorides in aluminum. Theinclusion information can be obtained simultaneously without any change in operation or maintenance compared to standard OES analysis. The Spark-DAT methods offer powerful tools for quality improvement, ideallycomplementing the OES analysis when metal cleanness is a concern. The Spark-DAT methods offer the quickest return on investment.Thermo Scientific ARL iSpark Series Optical Emission Spectrometers10Single Spark Analysis charts allowing visualization of the inclusion signals of the two elements Al and Ca in steelThermo Scientific OXSAS analytical software provides virtuallyunlimited analytical capacity and flexibility, and includes allthe features allowing data management, instrument control,calibration, instrument set-up and diagnostic.OXSAS gives the ability to work at various functional levelsfrom simple operations for routine analysis to a wider accessfor managers or users performing more critical operations (e.g.of their analytical methods. It also includes a comprehensive set of tools for quality and maintenance management. The Maintenance Management module assists the operator in the management of routine and preventive maintenance. This simple and efficient tool helps to guarantee the performance all through the life of the instrument.Thanks to regular free Internet software updates, OXSAS will OXSAS analytical software simple, flexible and powerfulTypical OXSAS display showing the result of a two-run analysis in concentration in termsof average, standard deviation, measurement uncertainty and the two individual runs Display of a calibration curve using OXSAS MVR toolMaintenance Management tool showing status of the maintenance tasksprogrammed in function of the instrument usage. The image on the rightillustrates the operation to be performed.Worldwide customer support Excelling in optical emission spectrometry since 1934, we provide you the support of a major international corporation:• A comprehensive worldwide after-sales service network assists with resolution of day to day queries and ensures that the ARL iSpark series spectrometer achieves the very high standards of reliability and durability it is designed for • Operational performance validation and possible online support with diagnostic helpThe ARL iSpark models are not limited to manual operation: if you wish to achievemore, meet tighter and tighter product specifications and time schedules withoutincreasing overhead costs, then our automation solutions will help you bringingyour quality control operations a step ahead with fully automated samplepreparation and analysis.Thermo Scientific series of SMS automation solutions meet the range of industryrequirements, from large aluminum smelters to modern steel works, includingfoundries and metals processors with varied capacities and needs.A choice of automation solutions for unmatched productivity。
Optical Metrology and Precision Measurements
Optical Metrology and PrecisionMeasurements光学计量与精密测量在现代科技的发展中,光学计量与精密测量技术在各个领域发挥着重要作用。
光学计量是利用光学原理和技术进行测量的一种方法,它可以实现对物体形状、表面质量、尺寸精度等参数的准确测量。
而精密测量则是指对物体特征进行高精度的测量和分析,以满足工程和科学研究的需求。
光学计量技术的发展源远流长。
早在古代,人们就开始利用光学原理进行测量。
例如,古代埃及人使用太阳光的投影来测量金字塔的高度。
然而,随着科技的进步,光学计量技术得到了极大的发展和改进。
现代光学计量技术已经可以实现微米甚至纳米级别的精度测量,为各个领域的研究和应用提供了重要支持。
光学计量技术在工业制造中起着至关重要的作用。
例如,在航空航天领域,精确测量飞机机翼的形状和表面质量对于确保飞行安全至关重要。
光学计量技术可以通过光学投影、激光干涉等方法对飞机机翼进行高精度的测量,从而保证其设计和制造的准确性。
在汽车制造中,光学计量技术可以用于检测汽车车身的尺寸、形状和表面质量,以确保汽车的安全性和外观质量。
此外,光学计量技术还广泛应用于电子、光电子、半导体等行业,为产品的研发和生产提供了可靠的测量手段。
除了工业制造,光学计量技术在科学研究中也发挥着重要作用。
例如,在物理学研究中,精密测量可以帮助科学家们研究微观世界的奥秘。
通过利用光学计量技术,科学家们可以测量微小物体的质量、形状和运动状态,从而深入了解物质的性质和行为规律。
在天文学研究中,光学计量技术可以用于测量天体的距离、亮度和光谱特性,为研究宇宙的起源和演化提供重要数据。
光学计量技术的发展离不开精密测量的支持。
精密测量是光学计量技术的基础,它要求测量设备具备高精度、高稳定性和高重复性。
为了满足这些要求,科学家们不断改进和创新测量设备。
例如,激光干涉仪是一种常用的精密测量设备,它利用激光的干涉原理进行测量。
了解光学指标
Understanding Optical SpecificationsOptical specifications are utilized throughout the design and manufacturing of a component or system to characterize how well it meets certain performance requirements. They are useful for two reasons: first, they specify the acceptable limits of key parameters that govern system performance; second, they specify the amount of resources (i.e. time and cost) that should be spent on manufacturing.An optical system can suffer from either under-specification or over-specification, both of which can result in unnecessary expenditure of resources. Under-specification occurs when not all of the necessary parameters are properly defined, resulting in inadequate performance. Over-specification occurs when a system is defined too tightly without any consideration for changes in optical or mechanical requirements, resulting in higher cost and increased manufacturing difficulty.In order to understand optical specifications, it is important to first review what they mean. To simplify the ever-growing number, consider the most common manufacturing, surface, and material specifications for lenses, mirrors, and windows. Filters, polarizers, prisms, beamsplitters, gratings, and fiber optics also share many of these optical specifications, so understanding the most common provides a great baseline for understanding those for nearly all optical products.MANUFACTURING SPECIFICATIONSDiameter ToleranceThe diameter tolerance of a circular optical component provides the acceptable range of values for the diameter. This manufacturing specification can vary based on the skill and capabilities of the particular optical shop that is fabricating the optic. Although diameter tolerance does not have any effect on the optical performance of the optic itself, it is a very important mechanical tolerance that must be considered if the optic is going to be mounted in any type of holder. For instance, if the diameter of an optical lens deviates from its nominal value it is possible that the mechanical axis can be displaced from the optical axis in a mounted assembly, thus causing decenter (Figure 1). Typical manufacturing tolerances for diameter are: +0.00/-0.10 mm for typical quality,+0.00/-0.050 mm for precision quality, and +0.000/-0.010 mm for high quality.Figure 1: Decentering of Collimated LightCenter Thickness ToleranceThe center thickness of an optical component, most notably a lens, is the material thickness of the component measured at the center. Center thickness is measured across the mechanical axis of the lens, defined as the axis exactly between its outer edges. Variation of the center thickness of a lens can affect the optical performance because center thickness, along with radius of curvature, determines the optical path length of rays passing through the lens. Typical manufacturing tolerances for center thickness are: +/-0.20 mm for typical quality, +/-0.050 mm for precision quality, and +/-0.010 mm for high quality.Radius of CurvatureThe radius of curvature is defined as the distance between an optical component's vertex and the center of curvature. It can be positive, zero, or negative depending on whether the surface is convex, plano, or concave, respectfully. Knowing the value of the radius of curvature allows one to determine the optical path length of rays passing through the lens or mirror, but it also plays a large role in determining the power of the surface. Manufacturing tolerances for radius of curvature are typically +/-0.5, but can be as low as +/-0.1% in precision applications or +/-0.01% for extremely high quality needs.CenteringCentering, also known by centration or decenter, of a lens is specified in terms of beam deviation δ (Equation 1). Once beam deviation is known, wedge angle W can be calculated by a simple relation (Equation 2). The amount of decenter in a lens is the physical displacement of the mechanical axis from the optical axis. The mechanical axis of a lens is simply the geometric axis of the lens and is defined by its outer cylinder. The opticalaxis of a lens is defined by the optical surfaces and is the line that connects the centers of curvature of the surfaces. To test for centration, a lens is placed into a cup upon which pressure is applied. The pressure applied to the lens automatically situates the center of curvature of the first surface in the center of the cup, which is also aligned with the axis of rotation (Figure 2). Collimated light directed along this axis of rotation is sent through the lens and comes to a focus at the rear focal plane. As the lens is rotated by rotating the cup, any decenter in the lens will cause the focusing beam to diverge and trace out a circle of radius Δ at the rear focal plane (Figure 1).Figure 2: Test for Centration(1)(2)where W is the wedge angle, often reported as arcminutes, and n is the index of refraction. ParallelismParallelism describes how parallel two surfaces are with respect to each other. It is useful in specifying components such as windows and polarizers where parallel surfaces are ideal for system performance because they minimize distortion that can otherwise degrade image or light quality. Typical tolerances range from 5 arcminutes down to a few arcseconds.Angle ToleranceIn components such as prisms and beamsplitters, the angles between surfaces are critical to the performance of the optic. This angle tolerance is typically measured using an autocollimator assembly, whose light source system emits collimated light. The autocollimator is rotated about the surface of the optic until the resultant Fresnel reflection back into it produces a spot on top of the surface under inspection. This verifies that the collimated beam is hitting the surface at exactly normal incidence. The entire autocollimator assembly is then rotated around the optic to the next optical surface and the same procedure is repeated. Figure 3 shows a typical autocollimator setup measuring angle tolerance. The difference in angle between the two measured positions is used to calculate the tolerance between the two optical surfaces. Angle tolerance can be held to tolerances of a few arcminutes all the way down to a few arcseconds.Figure 3: Autocollimator Setup Measuring Angle ToleranceBevelGlass corners can be very fragile, therefore, it is important to protect them when handling or mounting a component. The most common way of protecting these corners is to bevel the edges. Bevels serve as protective chamfers and prevent edge chips. They are defined by their face width and angle (Figure 4).Figure 4: Bevel on an Optical LensBevels are most commonly cut at 45° and t he face width is determined by the diameter of the optic. Optics with diameters less than 3.00mm, such as micro-lenses or micro-prisms, are typically not beveled due to the likelihood of creating edge chips in the process. It is important to note that for small radii of curvature, for example, lenses where the diameter is ≥ 0.85 x radius of curvature, no bevel is needed due to the large angle between the surface and edge of the lens. For all other diameters, the maximum face widths are provided in Table 1.Clear ApertureClear aperture is defined as the diameter or size of an optical component that must meet specifications. Outside of it, manufacturers do not guarantee the optic will adhere to the stated specifications. Due to manufacturing constraints, it is virtually impossible to produce a clear aperture exactly equal to the diameter, or the length by width, of an optic. Typical clear apertures for lenses are show in Table 2.Table 1: Bevel TolerancesDiameter Maximum Face Width of Bevel3.00mm – 5.00mm 0.1mm5.01mm – 25.4mm 0.25mm25.41mm – 50.00mm 0.3mm50.01mm – 75.00mm 0.4mmTable 2: Clear Aperture TolerancesDiameter Clear Aperture3.00mm – 10.00mm 90% of Diameter10.01mm - 50.00mm Diameter – 1mm≥ 50.01mm Diameter – 1.5mmSURFACE SPECIFICATIONSSurface QualityThe surface quality of an optical surface describes its cosmetic appearance and includes such defects as scratches and pits, or digs. In most cases, these surface defects are purely cosmetic and do not significantly affect system performance, though, they can cause a small loss in system throughput and a small increase in scattered light. Certain surfaces,however, are more sensitive to these effects such as: (1) surfaces at image planes because these defects are in focus and (2) surfaces that see high power levels because these defects can cause increased absorption of energy and damage the optic. The most common specification used for surface quality is the scratch-dig specification described by MIL-PRF-13830B. The scratch designation is determined by comparing the scratches on a surface to a set of standard scratches under controlled lighting conditions. Therefore the scratch designation does not describe the actual scratch itself, but rather compares it to a standardized scratch according to the MIL-Spec. The dig designation, however, does directly relate to the dig, or small pit in the surface. The dig designation is calculated at the diameter of the dig in microns divided by 10. Scratch-dig specifications of 80-50 are typically considered standard quality, 60-40 precision quality, and 20-10 high precision quality. Learn more about surface quality here.Surface FlatnessSurface flatness is a type of surface accuracy specification that measures the deviation of a flat surface such as that of a mirror, window, prism, or plano-lens. This deviation can be measured using an optical flat, which is a high quality, highly precise flat reference surface used to compare the flatness of a test piece. When the flat surface of the test optic is placed against the optical flat, fringes appear whose shape dictates the surface flatness of the optic under inspection. If the fringes are evenly spaced, straight, and parallel, then the optical surface under test is at least as flat as the reference optical flat. If the fringes are curved, the number of fringes between two imaginary lines, one tangent to the center of a fringe and one through the ends of that same fringe, indicate the flatness error. The deviations in flatness are often measured in values of waves (λ), which are multiples of the wavelength of the testing source. One fringe corresponds to ½ of a wave. 1λ flatness is considered typical grade, ¼λ flatness is considered to be precision grade, and 1/20λ is considered high precision grade.PowerPower, a type of surface accuracy specification, applies to curved optical surfaces, or surfaces with power. It is tested in a fashion similar to flatness, in that a curved surface is compared against a reference surface with a highly calibrated radius of curvature. Using the same principle of interference caused by the air gaps between the two surfaces, the interferences pattern of fringes is used to describe the deviation of the test surface from the reference surface. A deviation from the reference piece will create a series of rings, known as Newton's Rings. The more rings that are present, the larger the deviation. The number of dark or light rings, not the sum of both light and dark, corresponds to twice the number of waves of error.IrregularityIrregularity, a type of surface accuracy specification, describes how the shape of a surface deviates from the shape of a reference surface. It is obtained from the same measurement as power. Regularity refers to the sphericity of the circular fringes that are formed from the comparison of the test surface to the reference surface. When the power of a surface is more than 5 fringes, it is difficult to detect small irregularities of less than 1 fringe. Therefore it is common practice to specify surfaces with a ratio of power to irregularity of approximately 5:1. For more detailed information on optical flats and interpreting fringe patterns to test surface flatness, power and irregularity, view Optical Flats.Surface FinishSurface finish, also known as surface roughness, measures small scale irregularities on a surface. They are usually an unfortunate by-product of the polishing process. Rough surfaces tend to wear faster than smooth surfaces and may not be suitable for some applications, especially those with lasers or intense heat, due to possible nucleation sites that can appear in small cracks or imperfections. Manufacturing tolerances for surface finish range from 50Å RMS for typical quality, 20Å RMS for precision quality, and 5Å RMS for high quality.MATERIAL SPECIFICATIONSIndex of RefractionThe index of refraction of a medium is the ratio of the speed of light in vacuum to the speed of light in the medium. Typical indices of refraction for glass range from 1.4 - 4.0; visible glasses have lower ranges than those optimized for the infrared. For example, N-BK7 (a popular visible glass) has an index of 1.517, whereas, germanium (a popular IR glass) has an index of 4.003. For more information on infrared materials, view The Correct Material for Infrared (IR) Applications. The index of refraction of an optical glass is an important property because the power of an optical surface is derived from both the radius of curvature of the surface and the difference in the index of refraction of the media on either side of the surface. Inhomogeneity, specified by the glass manufacturer, describes the variation of index of refraction in a glass. It is specified according to different classes, where class and inhomogeneity are inversely related – as class increases, inhomogeneity decreases (Table 3).Table 3: Inhomogeneity SpecificationsInhomogeneity Class Maximum Permissible Variation of Index of Refraction0 +/- 50 x 10-61 +/- 20 x 10-62 +/- 5 x 10-63 +/- 2 x 10-64 +/- 1 x 10-65 +/- 0.5 x 10-6Abbe NumberAnother material property of glasses is the Abbe number, which quantifies the amount of dispersion that a glass exhibits. It is a function of the refractive index of a material at the f (486.1nm), d (587.6nm), and c (656.3nm) wavelengths (Equation 3),(3)Typical values of Abbe number range from 25 – 65. Glasses with an Abbe number greater than 55 (less dispersive) are considered crown glasses and those with an Abbe number less than 50 (more dispersive) are considered flint glasses. Due to dispersion, the index of refraction of a glass varies with wavelength. The most notable consequence of this is the fact that a system will have slightly different focal lengths for different wavelengths of light. For more detailed information on important material specifications such as index of refraction and Abbe number, please view Optical Glass.Laser Damage ThresholdLaser damage threshold indicates the maximum amount of laser power per area that a surface can withstand before it is damaged. Values are provided for pulsed lasers and continuous wave (CW) lasers. Laser damage threshold is a very important material specification for mirrors since they are used in conjunction with laser products more than any other optic; however, any laser-grade optic will provide a threshold. For example, consider a Ti:Sapphire Laser Mirror with damage threshold ratings of 0.5 J/cm2@ 150 femtosecond pulses and 100kW/cm2 CW. This means that the mirror can withstand energy densities of 0.5J per square centimeter from a high repetition femtosecond pulsed laser or 100kW per square centimeter from a high power CW laser. If the laser is concentrated on a smaller region, then the proper consideration must be taken to ensure the overall threshold does not exceed the specified values.Though a host of additional manufacturing, surface, and material specifications exist, understanding the most common optical specifications can greatly alleviate confusion. Lenses, mirrors, windows, filters, polarizers, prisms, beamsplitters, gratings, and fiber optics share a variety of attributes, therefore, knowledge of how they relate to each other and can affect overall system performance helps to choose the best components for integration into optics, imaging, or photonics applications.。
Optical Fiber Measurement
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Vaisala背景光度传感器LM21说明书
Background Luminance Sensor LM21Features•Intelligent, standalone sensor •Verified accuracy and photopic response•Extensive self-diagnostics •Window contaminationmeasurement and compensation •Optical path blockage detection •High power heaters to prevent snow accumulation •Calibration traceable to measurement standards •Field calibration device availableVaisala Background Luminance Sensor LM21 is an intelligent, standalone precision photometer.Vaisala Background Luminance Sensor LM21 is a state-of-the-art luminance sensor for runway visual range (RVR)assessment. The background luminance has an effect on the distance from which the pilot can see the runway lights.Resembles Human EyeLM21 is a precision photometer with a verified photopic spectral response. It measures the total amount of light coming in from an angle of 6 degrees,and converts the measured data to cd/m 2. The sensor sends themeasurement data to the interface unit of a Vaisala transmissometer or forward scatter visibility sensor. The interface unit combines both the visibility and background luminance data into the same message and sends it to the main RVR computer.LM21 can be connected to Vaisala Transmitter LT31 and Vaisala Forward Scatter Sensor FS11. LT31 and FS11 are connected using a RS-485 serial line.Comprehensive Self-DiagnosticsLM21 is an intelligent, standalone sensor.To ensure reliable and uninterrupted operation, it has extensive self-monitoring functions with high power heating features. The sensor measures and compensates for the attenuation effect of window contamination. It ensures that measurement accuracy is maintained between window cleanings,and also extends the cleaning interval.The optical path clearance monitoring circuitry verifies that measurement is not affected by obstructions.Easy to CalibrateThe calibration of LM21 is traceable to international measurement standards for luminous intensity. Vaisala Field Calibrator LMA21 is a unique field calibration device that is available for quick field calibration. It provides a stabilized and diffused white light beam for LM21 calibration.The calibration coefficients for light intensity have been defined during factory calibration and stored inthe LMA21 memory. Calibration starts automatically when LMA21 is connected to LM21. LM21 reads the calibrationcoefficients from the LMA21 memory and performs the calibration. The status and result of the calibration is displayed with5 LED indicators on the cover of LMA21.LM21 measures the ambient light level or background luminance in RVR applications. In the picture, LM21 is installed on Vaisala Transmissometer LT31.T echnical DataMeasurement PerformanceMeasurement range 2 … 40 000 cd/m²Accuracy±10 %Optical SpecificationsSpectral response400 … 700 nm, photopic according toCIE standardsPeak wavelength553 nm ± 5 nmField of view6° (94 % of measured luminance) Effective diameter of reception lens24 mm (0.94 in)Operating EnvironmentOperating temperature-55 … +65 °C (-67 … +149 °F) Operating humidity0 … 100 %RHInputs and OutputsConnection Power/signal cable providedPower supply10 … 38 VDC, or alternatively8 … 28 VAC, 6 WHeater power supply28 VAC, 50 WOutput signal RS-485 (RS-232), frequency output Overvoltage protection Power supply lines and output linesare protected by current limitingseries resistors and transientsuppressorsMechanical SpecificationsWeight1230 g (2.71 lb)Cable length 2.3 m (7 ft 7 in)Color WhiteHousing Aluminum, weatherproof Mounting With a mounting clamp onto LM21Support Arm of LT31 or OptionalSupport Arm of FS11ComplianceLM21 sensor is CE compliant. The compliance has been verified according tothe following EMC product family standards:Electrical equipment for measurement,control and laboratory use -EMC RequirementsIEC 61326-1: 2012-07 (Edition 2.0),Environment class: IndustrialElectrical equipment for measurement,control and laboratory use -EMC RequirementsEN 61326-1: 2013-01 (Edition 2.0),Environment class: IndustrialLM21 dimensions in mm (inches)1Length: 142 mm (5.59 in)2Width (with plug): 126 mm (4.96 in)3Width (without plug): 100 mm (3.94 in)4Height (without bracket): 137 mm (5.39 in)5Height (with bracket): 215 mm (8.46 in)Published by Vaisala | B210425EN-C © Vaisala 2017All rights reserved. Any logos and/or product names are trademarks of Vaisala or its individual partners. Any reproduction, transfer, distribution or storage of information contained in this document is strictly prohibited. All specifications — technical included — are subject to change without notice.。
SAE AS 4059E-2005 Aerospace Fluid Power - Cleanliness Classification for Hydraulic Fluids
AEROSPACESTANDARDSAE Technical Standards Board Rules provide that: “This report is published by SAE to advance the state of technical and engineering sciences. The use of this report is entirely voluntary, and its applicability and suitability for any particular use, including any patent infringement arising therefrom, is the sole responsibility of the user.”SAE reviews each technical report at least every five years at which time it may be reaffirmed, revised, or cancelled. SAE invites your written comments and suggestions. Copyright © 2005 SAE InternationalAll rights reserved. No part of this publication may be reproduced, stored in a retrieval system or transmitted, in any form or by any means, electronic, mechanical, photocopying, recording, or otherwise, without the prior written permission of SAE.TO PLACE A DOCUMENT ORDER: Tel: 877-606-7323 (inside USA and Canada)Tel: 724-776-4970 (outside USA)1. SCOPE:This SAE Aerospace Standard (AS) defines cleanliness classes for particulatecontamination of hydraulic fluids and includes methods of reporting related data (AppendixA). The contamination classes selected are based on the widely accepted NAS 1638cleanliness classes. Conversion from NAS 1638 cleanliness class specifications to AS4059 class specifications is defined. Comparison of the NAS 1638 classes to AS4059 classes is defined and the differences explained (Appendix B). This document provides versatility in identifying a maximum class in multiple size ranges, total number of particles larger than a specific size or designating a class for each size. NAS 1638 classes based on weight of particles are not applicable to either of these classes and are not included.2. APPLICABLE DOCUMENTS:The following publications form a part of this document to the extent specified herein. The latest issue of SAE publications shall apply. The applicable issue of other publications shall be the issue in effect on the date of the purchase order. In the event of conflict between the text of this document and references cited herein, the text of this document takesprecedence. Nothing in this document, however, supersedes applicable laws andregulations unless a specific exemption has been obtained.2.1 SAE Publications:Available from SAE, 400 Commonwealth Drive, Warrendale, PA 15096-0001. Web site: .ARP598 Aerospace Microscopic Sizing and Counting of ParticulateContamination for Fluid Power SystemsAIR877 Aerospace-Particle Count Data Conversion and ExtrapolationARP5376 Methods, Locations and Criteria for System Sampling andMeasuring the Solid Particle Contamination of Hydraulic Fluids2.2 AIA Publications:Available from Aerospace Industries Association of America, Inc., 1000 Wilson Boulevard, Suite 1700, Arlington, VA 22209-3901. Tel. 703-358-1000. Web site: http://www.aia-.NAS 1638 Cleanliness Requirements of Parts Used in Hydraulic Systems(Inactive for new design and not for use with automatic particlecounters)2.3 ISO Publications:Available from International Organization for Standardization, 1 rue de Varembe, 1211Geneva 20 Switzerland, American National Standards Institute, 11 West 42nd Street, New York, NY 10036-8002 Web address: or from the National Fluid Power Association (NFPA) Telephone (414)-778-3344 Web address: .ISO 4402 (1991) Hydraulic fluid power - Calibration of automatic-count instrumentsfor particles suspended in liquids - Method using classified AC finetest dust (Standard withdrawn in favor of ISO 11171) ISO 11171 Hydraulic fluid power - Calibration of liquid automatic particlecountersISO 11218 A erospace - Cleanliness classification for hydraulic fluidsISO 12103-1 Road vehicles - Test dust for filter evaluation - Part 1: Arizona testdust3. AS4059 CLEANLINESS CLASSES:When an AS4059 class is specified without suffix, the method specified in 3.2.2, Table 1, particles in each size range shall be used.CAUTION: This revision of AS4059 may result in different cleanliness classes from those obtained with previous versions whenever the class was specified without any letter size suffix and for some cases when the class was specified with a suffix. Cleanliness classes with no suffix from previous versions of AS4059 were based on particles greater than 5 µm or 6 µm(c), whereas classes from this revision are based on the number of particles in each of the size ranges except the smallest, 1 µm or 4 µm(c). See 3.2.2 for more specifics.3.1 Cleanliness Class Definitions:Tables 1 and 2 provide differential and cumulative particle counts respectively for AS4059 cleanliness levels for microscopic particle counts and for counts obtained by particlecounters calibrated to either the new or superseded ISO procedures. These tables list the cleanliness levels established to provide a set of criteria for specifying fluid cleanliness classes. The classes are based on contaminant size, count, and distribution. Note that the symbol µm(c) is used throughout this document to designate that the particle size was determined using a liquid automatic particle counter calibrated per ISO 11171.3.2 Specifying and Determining Cleanliness Class:3.2.1 Converting NAS 1638 Class Specifications to AS4059 Classes: NAS 1638 classes usedin current specifications can be converted directly to AS4059 classes. In the simplestform, where NAS 1638 Class 6 is currently specified, AS4059 Class 6 applies. Similarly, to designate fluid cleanliness levels equivalent to NAS 1638 Class 6 one would specify: Fluid cleanliness shall meet AS4059 Class 6.3.2.2 Determining AS4059 Class Using Differential Particle Counts: This method is applicableto those currently using NAS 1638 classes and desiring to maintain the methods, format, and results equivalent to those specified in NAS 1638.Table 1 applies to acceptance criteria based on differential particle counts, and providesa definition of particulate limits for Classes 00 through 12. A class shall be determinedfor each particle size range. The reported class of the sample is the highest class in any given particle range size.NOTE: The classes and particle count limits in Table 1 are identical to NAS 1638.Measurements of particle counts are allowed by use of an automatic particlecounter (properly calibrated per ISO 11171 or ISO 4402:1991), or an optical orelectron microscope. The size ranges measured and reported should bedetermined from Table 1 based on the measurement method.3.2.3 Determining AS4059 Class Using Cumulative Particle Counts: This method is applicableto those using the methods of previous revisions of AS4059 and/or cumulative particlecounts. The cleanliness levels for this method shall be specified by the appropriateclass from Table 2. To provide versatility, the applicable cleanliness class can beidentified in the following ways:a. Basing the class on the highest class of multiple size ranges (see 3.2.3.1).b. Total number of particles larger than a specific size (see 3.2.3.2).c. Designating a class for each size range (see 3.2.3.3).3.2.3.1 Cleanliness Class Based Upon Multiple Ranges: When this method is used thecleanliness class is determined for multiple size ranges and the highest class in anysize range is then used to identify the cleanliness class. Because the particle sizedepends upon the calibration and method of measurement, the sizes have beenassigned alpha characters, A, B, C, D, E, and F. The class designation shall be theclass number followed by the letter codes representing the particle sizes analyzed.Examples:a. AS4059 Class 6B-F requires that the particles be counted in all sizes B through Fand that the counts for each size shall be less than the maximum permitted per100 mL for Class 6. (NOTE: This example provides the same results as AS4059class 6, per 3.2.2.)b. AS4059 Class 7A-E requires that the particles be counted in all sizes A through Eand that the counts for each size shall be less than the maximum permitted per100 mL for Class 7.3.2.3.2 Classification Based on a Single Size: The AS4059 classes are based on a naturaldistribution of particle sizes previously used in NAS 1638. This natural distributiondoes not always apply for particles in a filtered fluid as used in a hydraulic system. In afiltered fluid, the highest class number will usually be determined by the counts for thesmallest particle size. Therefore, AS4059 Revision B and earlier based the class onthe 5 µm or 6 µm(c) size of interest since the smallest particle size usually has thehighest class number.Class 5B means no more than 9730 particles per 100 mL greater than size B (5 µm for optical microscopic counting and 6 µm(c) for ISO 11171 calibration). If these smallersize particles are not of interest, one might require Class 5C which limits the number of particles for size C and larger particles.Examples:a. AS4059 Class 5Bb. AS4059 Class 6C3.2.3.3 Designating a Class for Each Size Range: Automatic particle counters can count thenumber of particles in several size ranges. Today, a different class of cleanliness isoften desired for each of several size ranges. Requirements can be stated andcleanliness can easily be reported for a number of size ranges. A class may bedesignated for each size from A through F. An example is provided below:7B/6C/5D is a numeric-alpha representation in which the number designates thecleanliness class and the alphabetical letter designates the particle size range to which the class applies. It also indicates that the number of particles for each size range donot exceed the following maximum number of particles:Size B: 38,900 per 100 mLSize C: 3460 per 100 mLSize D: 306 per 100 mL4. SAMPLING AND ANALYSIS:4.1 Procedures:Sampling and analysis of fluid shall be in accordance with ARP5376.4.2 Particle Count Measurement:Particle counts shall be made in accordance with one of the following methods:4.2.1 Method A - Automatic Particle Counters: Automatic Particle Counters (APCs) shall becalibrated per ISO 11171.NOTE: ISO 4402:1991 may be used for automatic particle counter calibration when the original particle size ranges in NAS 1638 are reported; i.e., 5, 15, 25, 50, and100 µm.4.2.2 Method B - Optical Microscope: Optical microscopic particle counting shall beconducted in accordance with ARP598.4.2.3 Method C - Combination Method: This method permits the use of automatic particlecounters without the need for latex calibration to count 70 µm(c) (100 µm) and largerparticles (Size Code F on Table 2). An optical microscope is used to count particles>100 µm in length. Optical counting of these size large particles or fibers is relativelyfast. This method replicates the original NAS 1638 requirements for large size particles (see Appendix B).4.2.4 Method D - Electron Microscope: This is an acceptable method to determine particlecount per this specification, although the high equipment cost limits the use of thismethod to well equipped laboratories.5. DETERMINATION AND REPORTING OF CLEANLINESS CLASS:5.1 AS4059 Cleanliness Data Sheet:Because sampling, automatic particle counter calibration procedures, and other factors are so important in determining fluid cleanliness, the AS4059 Fluid Cleanliness DataSheet (either DS-1 for Table 1, section 3.2.2 or DS-2 for Table 2, section 3.2.3) orequivalent shall be used for each sample (see Appendix A).NOTE: Users have permission to reproduce the data sheet without copyrightinfringement.5.2 Reporting of Cleanliness Class:The fluid cleanliness classification is determined from either Table 1 or 2 by the number of particles in each range or greater than the applied sizes depending on specificationmethod.6. NOTES:This section contains information of a general or explanatory nature that may be helpful but is not mandatory.6.1 Data Analysis:AIR877 provides guidance on particle count data conversion and extrapolation foranalysis.6.2 Sampling Errors:Extracting a fluid sample from a fluid system may generate large particles above 50 µm[38 µm(c)] that can enter the sample and distort the contamination count. When a samplehas an unusually high count in one of the larger size ranges, the sampling device ortechnique should be considered as a possible cause, and additional sampling isrecommended. If confidence is obtained that the large particles are in error, consideration can be made to set the cleanliness requirements based on the smaller particle sizes,which may minimize errors caused by poor sampling techniques.6.3 Dilution:High levels of contamination may saturate automatic particle counters; therefore, counts greater than 75% of the saturation level of the counter may be suspect. When it isnecessary to count particles at a level approaching saturation or greater, it will benecessary to dilute the sample. Care must be exercised when the fluid sample is diluted in order to reduce particle counts below the saturation level of the counter. The dilution fluid must be very clean, Class 0 or better, and must be compatible with the hydraulic fluid and the optical qualities of the fluid used in APC calibration. Dilution presents two majorproblems. First, any error in dilution will be reflected in total counts. Second, the dilution fluid will contain some particles of various sizes resulting in an erroneous increase inparticle counts. With these problems in mind, it is obvious that extremely clean dilution fluid and accurate measurement of the dilution ratio are necessary.6.4 Revisions:The change bar ( l ) located in the left margin is for the convenience of the user in locating areas where technical revisions, not editorial changes, have been made to the previous issue of this document. An (R) symbol to the left of the document title indicates acomplete revision of the document.6.5 Key Words:Particle count, particle size, cleanliness class, contaminant level, contaminationPREPARED UNDER THE JURISDICTION OFSAE SUBCOMMITTEE A-6C1, CONTAMINATION AND FILTRATION PANEL OFCOMMITTEE A-6, AEROSPACE FLUID POWER, ACTUATION, AND CONTROLTECHNOLOGIESAPPENDIX AFIGURE A1 - AS4059 Fluid Cleanliness Data Sheet (DS-1)(For Differential Particle Counts)FIGURE A2 - AS4059 Fluid Cleanliness Data Sheet (DS-2)(For Cumulative Particle Counts)APPENDIX BDIFFERENCES BETWEEN AS4059 AND NAS 1638B.1 SCOPE:This Appendix is to provide information on the variations between NAS 1638 andAS4059.B.2 BACKGROUND:When NAS 1638 was developed, the principle means of counting particles was theoptical microscope with particles sized by the longest dimension per ARP598. WhenAPCs came into use this provided a method of analyzing a sample much faster that the ARP598 method. A method of calibrating APCs was developed, although theymeasured area and not length, such that comparable results to that of ARP598 could be obtained from the same sample. Now, automatic particle counters are the primarymethod used to count particles and the projected area of a particle determines size.Because of the way particles are sized with the two methods, automatic particle counters and optical microscopes do not always provide the same results. NAS 1638 has nowbeen made inactive for new design and has been revised to indicate it does not apply to use of automatic particle counters. This standard incorporates the features of NAS1638, including the use of ARP598, and is intended to provide a uniform classification system independent of the particle size analysis method.Prior to ISO 11171, the previous APC calibration method most widely utilized was ISO4402, which used Air Cleaner Fine Test Dust (ACFTD) as the reference calibrationmaterial. ACFTD is no longer manufactured and the ISO 4402 method using this dusthas been made obsolete. The industry developed the method ISO 11171, whichsupercedes ISO 4402, with a calibration standard based on NIST-certified samples ofISO 12103-1 A3 medium test dust suspended in hydraulic oil. There is a differencebetween the particle measurements by ISO 4402 and ISO 11171. To retain the samecleanliness measure, calibrations using ISO 11171 are conducted to a corrected particle count scale. For example, particles reported as 5 µm with the ISO 4402 method arereported as 6 µm(c) by the ISO 11171 method. In fact 5 µm corresponds to 6.4 µm(c),and some round off was conducted for simplification.B.2.1 Differences between NAS 1638 and AS4059:AS4059 was developed to have classes equivalent to NAS 1638. However, there aredifferences.B.2.1.1 Cumulative Counts versus Differential Counts in a Size Range: NAS 1638 wasdesigned for use with an optical microscope and therefore particle counts werespecified in particle size ranges. Section 3.2.2 of this standard utilizes this sameapproach, so as to minimize differences in resulting fluid classifications from theoriginal NAS 1638 standard. AS4059 was originally designed for use primarily withautomatic particle counters, which can easily count particles larger than a selectedsize. Therefore, 3.2.3 provides a method for reporting cumulative particle counts todetermining the AS4059 class, which can be useful for evaluating filter performance,for example. Cumulative particle counts need to be calculated If particle counts aremade using an optical microscope in the size intervals specified by ARP598. Thecumulative particle counts at each size can easily be calculated by adding all thecounts for larger sizes. For example, to determine the number of particles greaterthan 15 µm, simply add the particles obtained in the 15-25, 25-50, 50-100, and >100size ranges.B.2.1.2 Counting of Smaller Particles: AS4059 allows the analysis and reporting of smallerparticle sizes than NAS 1638.B.2.1.3 Counting Large Particles and Fibers: In some samples, it has been observed thatmany of the particles larger than 100 micrometers are fibers. However, automaticparticle counters size particles based on projected area rather than longestdimension and do not differentiate between fibers and particles. Therefore, fiberswill be reported as particles with dimensions considerably less than the length of thefibers. A problem with fibers is that they may not be present in fluid in the system butrather have been introduced as the result of poor sampling techniques or poorhandling during analysis.B.2.1.4 Combination Method of Particle Counting: Section 4.2.3 refers to particle countingby the combination method, which utilizes both APCs and optical microscopiccounting. This method was included because some APCs are not routinelycalibrated using the latex method of ISO 11171 for particle sizes above 50 µm(c).Using an APC for counting in the 4-38 µm(c) range and a microscope for 70 µm(c)(100 µm) allows such APCs to be used. Of course, this would preclude the particlecount from being measured on-line.。
工业类英语词汇_50
optical fiber sensor,光纤式传感器optical(measurement)method,光测法optical micrometer,光学测微器optical plummet,optical pumping,magnetometer,optical(quantity)transducer(sensor),optical reading range,光学读数范围optical spectrometer,光学光谱仪optical system,光学系统optical theodolite,光学经纬仪optical vibrometer,光学测振仪optical wedge micrometer,光楔测微器optima estimation,最优估计optimal control,最优控制optimal control law,最优控制律optimal control system,最优控制系统optimal control theory,最优控制理论optimal decision problem,最优决策问题optimal solution,最优解optimal strategy,最做出策略optimality principle,最优性原理optimization,optimization layer,优化层optimization technique,最优化技术optimum frequency,最佳频率order,有序order parameter,序参数ordinary temperature thermistor,常温热敏电阻器organic semiconductor gas transducer [sensor],有机半导体气体传感器organic semiconductor humidity transduce [sensor],有机半导体湿度传感器organic semiconductor thermistor,有机半导体热敏电阻器orientation,定向orientation control,定向控制orifice,节流孔orifice plate,孔板orifice-and-plug flowmeter,锥塞式流量计original system,原系统originator,源发站orthogonal distrortion,正交畸变ortho-projector,正射投影仪oscillating period,振荡周期oscillator,振荡器oscillograph,oscillographic polarograph,示波极谱仪oscilloscope,示波器outboard rotor,外重心转子outdoor location,户外场所outer package,外包装outlier,剔除值output device,output equation,输出方程output error,输出误差output feedback,输出反馈output fluctuation,输出波动output force or torque stability,输出激振力或力矩的稳定性output impedance,输出阻抗output impedance of microphone,传声器输出阻抗output information,输出信息output matrix,输出矩阵output noise,输出噪声output prediction method,输出预估法output shaft rotation clearance,输出轴间隙角output shaft rotation range,输出轴转角范围output shaft torque,输出轴转矩output signal,输出信号output signal "one" level,输出信号“1”电平output signal "zero" level,输出信号“0”电平output state,输出状态output stem travel clearance,输出杆间隙位移output system,输出系统output unit,输出设备output variable,输出变量output vector,oval gear flowmeter,椭圆齿轮流量计oval wheel flowmeter,椭圆齿轮流量计oven temperature,箱温over-current protection,过电流保护over-voltage protection,过电压保护overall design,总体设计overdampin,overflow,溢出overflow indication,溢出指示overlapping averages,滑动平均overlapping event,交迭事件overload,overload flow-rate,过载流量over-load meter,过载仪overpressure characteristic,超压特性overpressure failure,超压破裂overrange,过范围overrange limit,过范围限overshoot,overview panel,总貌画面overvoltage protection varistor,过电压保护电压敏电阻器oxide thermistor,氧化物热敏电阻器oxygen bomb,氧弹oxygen bomb calorimeter,氧弹式热量计oxygen (pressure)gauge,氧压力表oxygen regulator,氧气减压器ozone analyzer,臭氧分析仪ozone sonde,臭氧探空仪ozone spectrophotometer,臭氧分光光度仪。
基于PB相位的等离子体超透镜设计
新技术新工艺2020年第8期基于PB相位的等离子体超透镜设计#夏习成,姚赞(中国科学技术大学精密机械与精密仪器系,安徽合肥230027)摘要:相较于传统光学透镜,超透镜具有对光的可操纵性强、设计灵活和易于集成化等众多优点。
然而基于电介质的超透镜需要亚波长尺度的高深宽比结构,对加工技术要求十分苛刻&提出了一种基于PB相位的等离子体超透镜设计方式,通过控制结构单元光轴方向可以实现对圆偏振光的调控,设计中采用的在金膜上刻蚀矩形孔的方式可以大大降低对加工条件的要求。
基于时域有限差分(FDTD)的仿真计算表明,超透镜的焦距与设计值偏差约为2.5%,焦点半高宽(FWHM)与衍射极限偏差约为2.7%,具有较好的吻合度。
关键词:超表面;超透镜;相位调控;PB相位;时域有限差分;圆偏振光中图分类号:TH74文献标志码:ADesign of Plasma Metalens Based on PB PhaseXIA Xicheng,YAO Zan(Department of Precision Machinery and Instrumentation,University of Science and Technology of China,Hefei230027 ,China) Abstract:Compared with traditional optical lens,the metalens had many advantages such as strong maneuverability to light ,flexible design,easy integration and so on.However,dielectric-based metalens required a high aspect ratio structure atthesub-wavelengthscale whichdemandedhighprocessingtechnology APBphase-basedplasmametalensdesignmethod wasproposed bycontro l ingthedirectionoftheopticalaxisofthestructuralunit itwaspossibletoadjustthephaseofthe circularly polarized light,the method of etching rectangular holes in the gold film used in this design could greatly reduce pDocessingDequiDements.The simulation calculation based on finite di f eDence in time domain(FDTD)showed that the devi-ationofthefocallengthofthemetalensfDomthedesignvaluewasabout2.5%and the deviation between the FWHM with thedi D actionlimitwasabout2.7%ithadagoodagDeement.Keywords:metasuDface metalens phasecontDol PBphase finitedi f eDenceintimedomain ciDculaDlypolaDizedlight传统的聚焦透镜对光线的调控依赖于沿着光路的相位积累,因此会受到自然材料折射率的限制’此外,对制造工艺的要求也会很高,想要加工高精度的透镜十分困难’超表面的优越特性吸引了国内外学者的极大兴趣,其概念最早由Yu等提出,他们提出了一种V形纳米天线组成的超表面山,通过改变天线的开口方向可以实现对圆偏振光的调控,并提出了广义斯涅尔定律来解释。
Synopsys TIS Pro 产品介绍说明书
PRODUCT FEATURESDescript ionSynopsys TIS P ro is an optical scattering inst rument for effic ientmeasurements of reflectance, transmittance, and absorption . This fully automated dev ice features an integrated sph ere and spectra l detector assembled in a housing that c ontrols stray lig ht to ensure fas t, accuratemeasurement r esults. Synopsy s TIS Pro deter mines the optic al properties of surfaces and m aterials and pro vides measure ments over the entire visible spectrum at va rious angles of incidence.Synopsys TIS P ro can be used in conjunction with Synopsys Mini-Diff and REFLET 180S p roducts to prov ide a complete , end-to-end so lution that fully characterizes s cattering prope rties of surface s and materials , including bi-directional s cattering distrib ution function (BSDF) and tota l integrated scattering (TIS ) data.Measurement d ata from Synop sys TIS Pro can be imported in to optical desig n software tools to provide reali stic simulation s of your as-built product.Figure 1: Synops ys TIS Pro housin g and instrumen t (prototype pictu red does notnecessarily repre sent the final des ign)Features at a Glance•Practical instrument for accurateoptical scattering measurements over the entire visible spectrum at multiple angles of incidence•Provides reflectance, transmittance, and absorption measurements of surfaces and materials used in optical systems •Designers can import the measurement data into Synopsys optical software tools for high-accuracy product simulationsHow Synopsys TIS Pro WorksOnce you have placed a surface or material sample in the instrument, use the Synopsys TIS Pro software to specify the angles of incidence to measure and start the measurement. The rotation stages from the source and sample will rotate accordingly. Synopsys TIS Pro will then aim light onto the sample and its spectral detector will collect the signal exiting the integrating sphere for the specified positions.Using a standard calibration measurement, the Synopsys TIS Pro software will post-process and compute the reflectance,transmittance, and absorption values of the sample. You can display, save, and export this data to optical design software for high-accuracy product simulations.No SampleReference MeasurementSample MeasurementSampleFigure 2: Synopsys TIS Pro software and transmittance measurement principleApplication ExamplesSynopsys TIS Pro is ideal for assessing the effects of surfaces and materials in optical systems.•Characterize reflector/diffuser materials for automotive design or general lighting systems• Evaluate quality controls in production• Analyze stray light suppression from coatings used in aerospace optics • Measure spectral behavior to incorporate in photorealistic renderings • Study optical properties of cosmetics• Characterize materials for many incident anglesContact us to request a demo of these and other application examples.REFLECTANCE ABSORBANCE TRANSMITTANCEFigure 3: TIS ratio grade exampleSpectral MeasurementsSynopsys TIS Pro uses a halogen source and a spectral detection for both reflectance and transmittance. It allows a full wavelength-dependent measurement. Results are displayed in a 2D plot within the software (TIS values against wavelength for different angles of incidence).Figure 4: Example of green sample spectral reflectanceReflective MaterialsSynopsys TIS Pro provides TIS measurements including reflectance for several incident angles over the entire visible spectral range.• After a two-step calibration (one step for dark signal to offset stray light and one step with a known reference standard to calibrate the response of the spectrophotometer), it is possible to measure:–Reflectors, such as aluminum for general lighting–Paints for automotive or cosmetic applications–Diffusing material sockets–Optical mounts and more, including space optics• The measured reflectance values can be saved as text files–TIS comparison can be made directly from the software for comparison between samples–Synopsys TIS Pro software also accounts for anisotropic material measurementExample: Black CoatingReflector materials can have complex behavior depending on the incident plane. The Synopsys TIS Pro allows you to capture reflective properties for various angles of incidence.Figure 5: Example of black sample reflectance spectrumTransmissive MaterialsSynopsys TIS Pro provides TIS measurements including transmittance for several incident angles over the entire visiblespectral range.• The same source is used for transmittance and reflectance measurements• After a two-step calibration (one step for dark signal to offset stray light and one step with no sample to calibrate the response of the spectrophotometer), it is possible to measure diffusing materials such as:–Dichroic filters–Colored diffusing plastics–Opal glassFigure 6: Example of transmissive materials measurementReflective and Transmissive MaterialsSynopsys TIS Pro provides absorption measurements on diffusers and can create a ready-to- use reflectance and transmittance (RT) file for use in illumination design software and photorealistic simulations.Figure 7: Synopsys TIS Pro data can be used to enhance photorealistic renderings of your product designs ComponentsSynopsys TIS Pro includes:• One calibration sample• Integrated software• High-precision spectrophotometer• Barium sulfate coated sphere• Stray light reduction housingTechnical SpecificationFor more information about Synopsys Optical Solutions, visit /optical-solutions.html or send an email to*******************.©2022 Synopsys, Inc. All rights reserved. Synopsys is a trademark of Synopsys, Inc. in the United States and other countries. A list of Synopsys trademarks isavailable at /copyright.html. All other names mentioned herein are trademarks or registered trademarks of their respective owners.。
GaAs_光阴极像增强器的选通特性
第 31 卷第 17 期2023 年 9 月Vol.31 No.17Sept. 2023光学精密工程Optics and Precision EngineeringGaAs光阴极像增强器的选通特性李冬*,杨凯翔,盛亮,李阳,段宝军,张美(强脉冲辐射环境模拟与效应国家重点实验室(西北核技术研究所),陕西西安 710024)摘要:针对GaAs光阴极像增强器在ns级选通成像中的时空特性,通过引入传输线阻抗完善了光阴极径向RLC传输模型,更准确地描述了选通过程中光快门的变化趋势,实验证实去除防离子反馈膜有利于改善光快门,使得光快门与电快门更为一致,在驱动电脉冲宽度为17.7 ns时,光快门宽度与电快门宽度的差异仅为1.1 ns;基于蒙特卡罗模拟方法,建立了光电子在分段线性快门脉冲电压驱动下经过第一近贴后的空间弥散模型,模拟结果表明:GaAs光阴极相较于S20光阴极在选通成像中的空间分辨下降更小。
在20 lp/mm时,GaAs的动态空间分辨是静态空间分辨的80%,而S20光阴极不足70%,理论模拟与实验结果相一致,所建立的模型可用来分析和优化像增强器结构参数,为优化选通成像性能提供理论依据。
关键词:GaAs光阴极;选通特性;动态空间分辨;像增强器中图分类号:O462.3 文献标识码:A doi:10.37188/OPE.20233117.2505Gating characteristics of GaAs photocathode image intensifier LI Dong*,YANG Kaixiang,SHENG Liang,LI Yang,DUAN Baojun,ZHANG Mei (State Key Laboratory of Intense Pulsed Radiation Simulation and Effect(NorthwestInstitute ofNuclear Technology), Xi’an 710024, China)* Corresponding author, E-mail: lidong@Abstract: Considering the spacetime characteristics of the GaAs photocathode image intensifier in ns-level gated imaging, this study undertakes a theoretical simulation and experimental validation. For theoretical simulation, the radial RLC transmission model of the photocathode is enhanced by incorporating transmis⁃sion line impedance. This refinement enables a more accurate description of the optical shutter's behavior during the gating process.Experimental evidence confirms that removing the anti-ion feedback film en⁃hances the optical shutter, aligning it closely with the electric shutter. Specifically, when the driving elec⁃tric pulse width is 17.7 ns, the difference between the optical shutter width and the electric shutter width is merely 1.1 ns. For experimental validation, a spatial dispersion model of photoelectrons, driven by a seg⁃mented linear shutter pulse voltage after the first close attachment,is established using the Monte Carlo simulation method. Simulation outcomes indicate that the spatial resolution degradation of the GaAs photo⁃cathode in gating imaging is inferior to that of the S20 photocathode. At a spatial resolution of 20-line pairs per millimeter (lp/mm), GaAs maintains 80% of its static spatial resolution, whereas the corresponding figure for the S20 photocathode is less than 70%.Notably,the theoretical simulation aligns seamlessly with the experimental results, affirming the applicability of the model for analyzing and optimizing image 文章编号1004-924X(2023)17-2505-10收稿日期:2023-03-02;修订日期:2023-04-04.基金项目:卓越青年基金资助项目(No.JQZQ021901);国家自然科学基金资助项目(No.12175183)第 31 卷光学精密工程intensifier structural parameters. This model serves as a foundational framework for enhancing gating im⁃aging performance.Key words: GaAs photocathode; gating characteristics; dynamic spatial resolution; image intensifier1 引言对电爆炸、Z箍缩、惯性约束聚变等超快过程的研究[1-3],促进了超快成像的发展。
光学和光子学 光学材料和组件 0.78 μm~25 μm红外光谱用光学材料特性-最新国标
光学和光子学-光学材料和元件-0.78 μm~25 μm红外光谱用光学材料特性1 范围本文件规定了在0.78 μm~25 μm红外光谱范围内使用的光学材料的命名、特性以及表征该类材料特性所需参数,并提供了部分性能的测试方法。
本文件仅适用于制造无源光学元件所用材料。
本文件中的材料也可以透过其它光谱(如微波、可见光或紫外线)。
2 规范性引用文件下列文件中的内容通过文中的规范性引用而构成本文件必不可少的条款。
其中,注日期的引用文件,仅该日期对应的版本适用于本文件;不注日期的引用文件,其最新版本(包括所有的修改单)适用于本文件。
ISO 9385:1990, Glass and glass-ceramics — Knoop hardness testISO 10110-18, Optics and photonics — Preparation of drawings for optical elements and systems —Part 18: Stress birefringence, bubbles and inclusions, homogeneity, and striaeISO 10345-2:1992, Glass determination of stress-optical coefficient—part 2: bending testISO 12123:2018, Optics and photonics — Specification of raw optical glassISO 15368, Optics and photonics — Measurement of reflectance of plane surfaces and transmittance of plane parallel elementsISO 19740:2018, Optics and photonics —Optical materials and components —Test method for homogeneity of infrared optical materialsISO 19741:2018, Optics and photonics — Optical materials and components — Test method for striae in infrared optical materialsISO 19742:2018, Optics and photonics — Optical materials and components — Test method for bubbles and inclusions in infrared optical materialsISO 22007-4:2017, Plastics Determination of thermal conductivity and thermal diffusivity—Laser flash methodISO 80000-7, Quantities and units — Part 7:Light and radiationGB/T 1409-2006 测量电气绝缘材料在工频、音频、高频(包括米波波长在内)下电容率和介质损耗GB/T 7962.14-2010 无色光学玻璃测试方法第14部分:耐酸稳定性GB/T 7962.15 -1987 无色光学玻璃测试方法耐潮稳定性测试方法GB/T 7962.16 -2010 无色光学玻璃测试方法第16部分:线膨胀系数、转变温度和弛垂温度GB/T 7962.20 -2010 无色光学玻璃测试方法第20部分:密度GB/T 7962.6-2010无色光学玻璃测试方法第6部分:杨氏模量、剪切模量及泊松比GB/T 34184-2017红外光学玻璃红外折射率测试方法偏折角法GB/T 38494-2020 陶瓷器抗冲击试验方法3 术语和定义ISO 12123、ISO 80000-7及以下给出的术语和定义均适用于本标准。
单频激光干涉仪非线性误差修正方法
单频激光干涉仪非线性误差修正方法卢明臻;高思田;施玉书;崔建军;杜华【摘要】提出了一种谐波分离的干涉仪信号处理方法,利用傅里叶级数对校准信号进行最小二乘拟合得到修正模型.该方法适合于消除干涉信号中引起非线性误差的各种谐波成分.通过将修正分为初始相位计算和精确相位计算,可以使单频激光干涉仪的非线性误差修正达到最优化.模拟验证结果表明,当噪音信号幅度为基波信号幅度的5%时,残余误差的幅度约为±1 nm;而当噪音为0.5%时,残余误差约为±0.1 nm.【期刊名称】《计量学报》【年(卷),期】2010(031)004【总页数】5页(P289-293)【关键词】计量学;激光干涉仪;非线性误差修正;傅里叶级数;最小二乘法【作者】卢明臻;高思田;施玉书;崔建军;杜华【作者单位】中国计量科学研究院,北京,100013;中国计量科学研究院,北京,100013;中国计量科学研究院,北京,100013;中国计量科学研究院,北京,100013;中国计量科学研究院,北京,100013【正文语种】中文【中图分类】TB921 引言伴随着纳米技术、微电子技术和MEMS的发展,对尺寸和位移测量的精度要求越来越高。
例如美国国家标准技术研究院(NIST)的Teague认为,在集成电路工业中,当线宽将于2014年达到50 nm以下时,国家级计量院应能保证达到0.4 nm的测量精度[1]。
激光干涉仪使用光波的波长作为基本刻度,其测量结果可以直接溯源到米定义波长基准,是长度计量中最为广泛使用的基准测量仪器。
干涉仪的误差来源主要为激光波长的精度、测量噪音和非线性误差。
当激光干涉仪作为纳米计量仪器的测量基准时,为了保证0.4 nm的线宽测量精度,其测量不确定度应达到0.1 nm。
此时非线性误差就成为了干涉仪的最主要的误差来源。
单频激光干涉仪的非线性误差是以λ/2为周期的周期性误差,主要是由相位混叠产生的。
产生相位混叠主要原因是:(1)干涉仪中的波片、分光镜等光学零件均非理想元件,如偏振分光镜不可能将两束偏振光100%的分离、各表面的反射损失、波片的相位延迟误差等;(2)干涉仪的调整不够理想,参考光和测量光的光束不能够完全同轴;(3)光电转换器的非线性。
高速运动目标的光电精密测速系统误差分析
第33卷第3期 光电工程V ol.33, No.3 2006年3月 Opto-Electronic Engineering March, 2006文章编号:1003-501X(2006)03-0058-04高速运动目标的光电精密测速系统误差分析黄战华,刘淼,张伊馨,蔡怀宇,张以谟( 光电信息技术科学教育部重点实验室 天津大学精密仪器与光电子工程学院,天津 300072 ) 摘要:在利用光电精密测速技术时,涉及复杂的空间光交汇计算,通用误差分析方法比较困难。
在目标与光束垂直度适当的情况下,目标运动方向的偏差对测量精度的影响属于二阶小量。
系统整体误差的主要来源为距离测量误差、时间测量误差以及光束不平行度产生的误差。
分析得出,本系统在两光束间的不平行度α=100″,探测器对准精度为0.1mm的情况下,测量精度可以达到0.02%。
关键词:误差分析;光电精密测速;高速运动目标中图分类号:V556 文献标识码:AError analysis of precision opto-electronic velocity measurement forhigh-speed moving objectHUANG Zhan-hua,LIU Miao,ZHANG Yi-xin,CAI Huai-yu,ZHANG Yi-mo ( Key Laboratory of Opto-electronics Information Science and Technology, Ministry of Education,College of Precision Instrument and Opto-Electronics Engineering,Tianjin University, Tianjin 300072, China )Abstract:It was related to complex calculation of attitude in opto-electronic precision velocity measurement technology with general error analysis. The impact on measure precision produced by the deviation of object moving directivity is negligible because it is second order small quantity in the condition that the angle between the direction of object and light beam is as vertical as possible. The entire system error is mainly caused by the length error and time error and light-beams non-parallelism.Analysis shows that when non-parallelism is α=100″and opto-detector alignment precision is 0.1mm, the system measurement precision can be up to 0.02%.Key words:Error analysis; Precision opto-electronic velocity measurement; High-speed moving object引言对于高速运动的物体,如子弹、炮弹等的速度测量,常用的测量方法按测量原理可分成三类,即瞬时速度测量法、平均速度测量法和多普勒原理测量法。
Method and apparatus for measurement of optical de
专利名称:Method and apparatus for measurement ofoptical detector linearity发明人:Predina, Joe Paul,Williams, Frederik Lee申请号:EP05108545.4申请日:20050916公开号:EP1645854A1公开日:20060412专利内容由知识产权出版社提供专利附图:摘要:A system for measuring optical detector linearity according to the present invention employs a laser source that illuminates an integrating sphere. The sphere randomizes the laser signal phase and produces a uniform intensity over the sphereoutput. A collimator expands the sphere output for entry into an interferometer, where the incident optical energy is amplitude modulated in a sinusoidal fashion by a linear mechanical mirror movement. Optical band filters eliminate significant harmonic content being present on a pre-detected optical signal. Sampling of the detected signal energy is performed synchronous to the mechanical mirror position to assure sinusoidal response. The sampled signals are processed to separately determine signal harmonic components attributed to detector non-linearity and multiple laser reflections within the system. The system utilizes at least two measurements at two different laser intensities. An optional third measurement of background radiance may be applied to the first two measurements to enhance accuracy.申请人:ITT MANUFACTURING ENTERPRISES, INC.地址:1105 North Market Street Suite 1217 Wilmington, Delaware 19801 US国籍:US代理机构:Esser, Wolfgang更多信息请下载全文后查看。
Optical Metrology for Precision Manufacturing
Optical Metrology for PrecisionManufacturing光学计量在精密制造中的应用光学计量是一种非接触、高精度的测量技术,广泛应用于精密制造领域。
通过利用光学原理和先进的测量设备,光学计量可以实现对物体形状、表面质量、尺寸等多个方面的精确测量,为精密制造过程提供重要的数据支持。
一、光学计量的原理和方法光学计量的基本原理是利用光的传播和反射特性进行测量。
常见的光学计量方法包括激光干涉测量、相位测量、散斑测量等。
其中,激光干涉测量是一种常用的高精度测量方法,通过激光光束的干涉现象,可以实现对物体表面形貌的测量。
相位测量则利用光的相位差来测量物体的形状和尺寸。
散斑测量则通过分析散斑图案的变化来获得物体表面的形貌信息。
二、光学计量在精密制造中的应用1. 表面形貌测量光学计量可以对物体表面的形貌进行高精度的测量。
在精密制造中,表面形貌的精确度对产品的质量和性能起着至关重要的作用。
通过光学计量,可以实现对产品表面的精确测量,从而保证产品的质量和性能。
2. 尺寸测量光学计量可以实现对物体尺寸的高精度测量。
在精密制造中,尺寸的精确度对产品的组装和配合起着重要的作用。
通过光学计量,可以实现对产品尺寸的精确测量,从而保证产品的装配和配合的精确度。
3. 表面质量测量光学计量可以对物体表面的质量进行高精度的测量。
在精密制造中,表面质量的精确度对产品的外观和使用寿命起着重要的作用。
通过光学计量,可以实现对产品表面质量的精确测量,从而保证产品的外观和使用寿命。
三、光学计量的优势和挑战1. 优势光学计量具有非接触、高精度、高效率等优点。
与传统的接触式测量方法相比,光学计量不会对被测物体造成损伤,同时可以实现对复杂形状和高精度要求的物体进行测量。
此外,光学计量还具有快速、自动化的特点,可以提高制造过程的效率和精确度。
2. 挑战光学计量在应用过程中也面临一些挑战。
首先,光学计量对环境条件要求较高,如光线、温度等因素会对测量结果产生影响。
OOKAndPAMOptical...
OOK And PAM O Drive Push Pull S Alireza Samani 1, David Patel 1, Samir Gh 1Dept. of Electrical and Com 2Currently with Dept. Electrical and Abstract — We report a successful demonstr pulse amplitude modulation using a travelli Mach-Zehnder modulator. The modulator op Gbaud PAM-4 modulation with measured operation of 35 Gbps. Keywords—Electrooptic Modulator; Pho circuits I. I NTRODUCTIONIncreasing need for higher bandwidth has demand for faster optical transmission sysspectral efficiency. As a result 40G-100G networks are now required to meet this dem high spectral efficiency and higher data rates modulation formats together with polarizationdivision multiplexing are required. Quadr modulation (QAM) enables achieving efficiency by using multi-level amplitudes andadvanced modulation formats, quadrature ph (QPSK) has received significant attention [modulation format doubles the spectral efficienlink while increasing the network cost by re detection at the receiver side. Another form increasing the spectral efficiency is p modulation (PAM). One advantage of PAM o possibility of direct detection at the receiver s the cost of the network down. Recently PAM been demonstrated using directly modulated V segmented MZIs in SISCAP process [3]. I demonstrated PAM-4 generation using singlesilicon Mach-Zehnder Modulator. To th knowledge this is the first time PAM signalin using pn junction based silicon MZMs. II. D EVICE DESIGN AND FABRICThe device was fabricated in a multi-project Institute of Microelectronics (IME) /A*STA Fig. 1. (a) Micrograph of sOptical Modulation Using Silicon Mach-Zehnder M hosh 1, Venkat Veerasubramanian 1, Qiuhang Zhong 1, Plant 1mputer Engineering, McGill University, Montreal, Quebec d Computer Engineering, Laval University, Quebec City, **************************.caration of 4 level ing-wave silicon perates up to 20 error free OOK otonic integrated been driving the stems with high optical transport mand. To achieve , advance optical n and wavelength rature amplitudehigher spectrald phases. Among hase shift keying 1]. Using QPSK ncy of the optical equiring coherent mat which allows pulse amplitude over QAM is the side which brings M generation has VCSELs [2], and In this paper we e drive push pull he best of ourng has been done CATION wafer run at theAR in a 220 nmsilicon-on-insulator (SOI) technolog based on carrier depletion of pn j waveguides in each arm of MZI. Pu can be achieved using either a dua arms of MZI are driven differential scheme where the pn junctions in series with opposite direction [4] w to be driven by only a single RF in RF inputs required for dual drive c MZM in this paper is based on sing Fig. 1 shows a micrograph of the circuit schematic of the modulation phase shifter in each arm of M imbalance of 100 μm is used to ac of about 6 nm. The width of Si wav slab thickness is 90 nm. Compact Y end of the MZM as input/output 3-d μm long thermo-optic phase shiftertuning purposes. The travelling wusing coplanar strip configuration;and signal (S) strips loaded with thethe middle. The loaded electrode ischaracteristic impedance and with optical group velocity of the wavestrip line is 100 μm and the separatis 30 μm. As shown in Fig. 1 a 3 V applied between the two pn juncti mm long inductor to isolate DC and III. M EASUREME We first measured the optical tr MZM under different DC reversed Fig. 2, the measured V π of the devicsingle drive push pull MZM (b) Equivalent circuit of the modulation sec g A Single ModulatorWei Shi 2 and David V.c, Canada Quebec, Canadagy. The MZM operation is junctions embedded in rib ush pull operation of MZM al drive scheme where two ly or single drive push pull each arm are connected in which allows the modulatornput as opposed to the twoconfiguration. The reportedgle drive push pull scheme.MZM and the equivalent n section. The length of theMZM is 4.5 mm, and anchieve a free spectral rangeveguides is 500 nm and theY-branches are used at bothdB splitter/combiner. A 200 r is placed on both arms for wave electrode is formed i.e., a pair of ground (G) e two series pn junctions in s designed to achieve 50 Ω RF phase velocity close toeguide. The width of each tion between S and G strips V DC reverse bias voltage is ions through an on chip 3 d RF signals.ENT RESULTS ansmission spectrum of the bias voltages. As shown ine is about 6 V.ctionFig. 2. Optical spectrum of the modulator under various reverse bias voltages.A SHF 12103A bit pattern generator is used to generate 231-1 PRBS binary signals. The RF signal from the pattern generator was amplified to reach 6 V pp and applied to the MZM using a high speed RF probe with SG configuration. The end of the travelling wave electrodes were terminated using a 50 Ωresistor. An Anritsu 1814A 1:4 de-multiplexer was used to de-multiplex the signal into four streams and the bit error measurements for NRZ OOK modulation were performed using an Anritsu MP1800A signal quality analyzer on each stream. Error free operation (BER <10-12) was measured up to 35 Gbps. However we observed clear eye diagrams up to 40 Gbps as shown in Fig. 3.Fig. 3(a) 35 Gbps eye diagram (b) 40 Gbps eye diagram To generate PAM-4 signals, we used two outputs from the bit pattern generator (BPG) and skewed them with respect to each other; additionally we added 20 bit delay to one of the outputs. The two streams were separately amplified. To achieve 4 level amplitudes; one output was attenuated by 3 dB and the second output attenuated by 10 dB, the two signals were then combined. To have even eye openings the amplitude of the two bit streams were adjusted using the BPG’s internal settings. Fig. 5 demonstrates 15, 20 Gbaud PAM-4 eye diagram of the MZM.Fig. 4. (a) 15 Gbaud (30Gbps) PAM-4 eye diagram (b) 20Gbaud (40Gbps)PAM-4 eye diagramIV.C ONCLUSIONWe successfully demonstrated PAM-4 optical modulation up to 20 Gbaud and 35 Gbps error free OOK modulation using a single drive push pull silicon MZM.V.R EFERENCES1 P. Dong, L. Chen, C. Xie, L.L. Buhl, and Y.-K. Chen, Opt. Express 20, 21181 (2012).2 C. Xie, S. Spiga, P. Dong, P.J. Winzer, A. Gnauck, C.Gréus, C. Neumeyr, M. Ortsiefer, M. Müller, and M. Amann, Opt. Fiber Commun. Conf. Th3K.2 (2014).3 X. Wu, B. Dama, P. Gothoskar, P. Metz, K. Shastri, S. Sunder, J. Van Der Spiegel, Y. Wang, M. Webster, and W. Wilson, IEEE international Solid-State Circuits Conference,128 (2013).4 L. Chen, P. Dong, and Y.-K. Chen, IEEE PhotonicsTechnol. Lett. 24, 936 (2012).。
General Photonics PSGA-101-A 光学仪器说明书
Wavelength Tuning Step
50 GHz minimum for internal tunable laser N/A
Operating Power Range Optical Power Accuracy1
-40 dBm to + 2 dBm ± 0.25 dB
-40 dBm to + 2 dBm ± 0.25 dB
100 – 240 VAC, 50 – 60 Hz
GPIB, Ethernet
8” flip-top graphic LCD & 2x20 character front panel LCD USB removable storage media, such as compact flash
100 – 240 VAC, 50 – 60 Hz
MODULES
OCT PRODUCTS
SPECIAL POLARIZATION COMPONENTS
1st and 2nd order PMD measurement (Jones Matrix) of 20mm quartz crystal. Specified DGD=0.627ps, Measured DGD=0.628ps
External Storage Power Supply
GPIB, Ethernet
8” flip-top graphic LCD & 2x20 character front panel LCD USB removable storage media, such as compact flash
polarization extinction ratio (PER) measurement, polarization dependent loss (PDL) measurement, and polarization mode dispersion (PMD) measurement. Another attractive feature of the instrument is its large flip-top LCD graphic display design, an industry first that allows large viewing area on a compact, portable enclosure. Furthermore, a 2x20 character LCD is also included on the front panel for easy operation of the instrument for applications that do not require a graphic display. The instrument comes with an internal tunable laser for PDL and PMD measurement up to 10ps. It can also control tunable lasers from third parties via a GPIB port for measurement of larger PMD values. The instrument also comes with a VGA port for use
EPINION MPM1000光纤电源测试仪说明书
SPECIFICATIONS Detector T ype: GermaniumWavelength:850nm, 1300nm & 1550nm typicalMeasurement Range:+5dBm to -60dBmMeasurement Accuracy:±0.3dBm (±5%) at -23dBm and +20ºC ±3ºC Measurement Resolution: 0.1dBmdBm and dBrel:YesBatteries:2 x AA Alkaline Cells (NiMh on NiCad can be used) Battery Consumption:20mA nominalPower Input:Can operate and charge internal batteries using optional chargerOptical Connector:ST, FC or SC connector adaptors availableCase Dimensions:160mm x 83mm x 30mm InstrumentWeight:230g with battery Operational Temperature: -15ºC to +50ºC (+5ºF to+122ºF)Operational Humidity: 95% at +40ºC (+104ºF) Storage Temperature:-20ºC to +70ºC (-4ºF to+158ºF)MPM1000Fiber Optic Power MeterDESCRIPTIONThe MPM1000 is an accurate optical power meter that can be used for optical loss testing of fibre optic cables. It has been pre-calibrated for absolute power levels with reference to 1mW (dBm) for 850nm, 1300nm and1550 nm wavelengths using multi-mode cables. However, it can also be used in relative power mode and can therefore also be used on single-mode cables. TheMPM1000 is accurate to ±5% (±0.3dBm) and has a wide dynamic range of +5dBm to -60dBm with a resolution of 0.1dBm.It is particularly suitable for the testing of LAN's, FDDI, and other multimode links whether inside or outside a building.Although the MPM1000's main use is in fibre optic cable attenuation testing, other applications include fibre continuity testing, connector testing, and patch lead testing.Battery status warning indicates low battery condition. An optical battery charger is available when using rechargeable batteries.s850, 1300 & 1550nm Germanium Detector s Wide Dynamic Ranges dBm and dBrel (relative) measurement modess Automatic Power Downs Power Down override during dBrel measurementss Exceptional battery lifes Ruggedised waterproof housing to IP54s 3 Year manufacturers warrantyUKArchcliffe Road Dover CT17 9EN EnglandT +44 (0) 1304 502101 F +44 (0) 1304 207342UNITED STATES4271 Bronze WayDallas TX 75237-1088 USAT 800 723 2861 (USA only)T +1 214 333 3201F +1 214 331 7399OTHER TECHNICAL SALES OFFICESNorristown USA, Toronto CANADA,Mumbai INDIA, Trappes FRANCE,Sydney AUSTRALIA, Madrid SPAINand the Kingdom of BAHRAIN.Registered to ISO 9001:2000 Reg no. Q 09290Registered to ISO 14001 Reg no. EMS 61597MPM1000_DS_en_V11Megger is a registered trademark。
杨晖 上海理工大学
上海理工大学 光电信息与计算机工程学院 杨晖 简介杨晖,男,博士,副教授,硕士生导师,1981年生,2009年上海理工大学“光学工程”专业毕业,获得博士学位,2009年留校任教,2010年度上海市“晨光学者”,2013-2014年澳大利亚阿德雷德大学访问学者。
主要研究方向:激光测量、颗粒技术。
09年至今已主持、完成包括国家自然科学基金面上项目和青年基金项目、上海市科委、教委专项基金,以及激光粒度仪开发(中国石化)、数字化显微镜软件开发(西门子中国有限公司)、漏泄电缆辐射场测试系统(上海电缆研究所)、电池电量监测管理系统(福建文创太阳能)等十多项课题,科研经费200多万元。
研究成果在国内外刊物发表论文30余篇,其中SCI检索18余篇,获得发明专利授权8项。
Hui YANG,Male, PhD, Associated Professor, born in 1981QualificationsPhD in Optical Engineering, University of Shanghai for Science & Technology, Shanghai, China, 2009“Genguang Scholar” of Shanghai 2010Visiting scholar in University of Adelaide at Australia from 2013 to 2014. Research Interest:Optical-Electric Precision Measurement Technology;Intelligent Information Processing and System DesignHis work has been supported a number of organizations include: National Natural Science Foundation of China, Shanghai Science and Technology Commission, Shanghai Education Commission. We have finished more than ten projects cooperated with the enterprises which include: Particle Size Analyzer by Laser Light Scattering(with China Sinopec), The Software Development for Digital Medical Microscope (with Siemens Co. Ltd. China), Measurement Systems of Leaky Cable Radiation (with Shanghai Electric Cable Research Institute), Battery Power Monitoring and Management System (with Winchance Solar (Fujian) Technology Co. Ltd.). The above researches result in more than 30 publications, of which more than 18 papers are indexed by SCI, and 8 patents.。
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a rXiv:as tr o-ph/64411v119Apr26Precision Measurement of Optical Pulsation using a Cherenkov Telescope J.A.Hinton a ,b ,∗,G.Hermann a ,P.Kr¨o tz a ,c ,S.Funk a a Max-Planck-Institut f¨u r Kernphysik,P.O.Box 103980,D-69029Heidelberg,Germany b Landessternwarte,K¨o nigstuhl,D-69117Heidelberg,Germany c now at:Physikalisches Institut,Universit¨a t zu K¨o ln,Germany1IntroductionThe six nearby high spin-down luminosity pulsars known at γ-ray energies provide a laboratory for the study of high energy processes under extreme conditions [1].The extremely strong gravitational and magnetic fields close to pulsars make the modelling of such objects rather complex.Indeed,the acceleration processes at work in pulsar magnetospheres,and the associatedbroad-band non-thermal pulsed emission,remain poorly understood despite several decades of effort.Observations in a wide range of wavelength bands are required to provide information not just on different particle energies, but also on different regions within the magnetosphere.Observations above 10GeV are widely seen as key to our understanding of the origin of the high energy emission(see for example[2,3]).A small number of(apparently pulsed) photons above this energy were detected by the EGRET satellite but statis-tics were insufficient to extend pulsed spectra much beyond10GeV[4].The much larger collection area of ground based instruments is required to explore the very high energy(V HE)regime.The major new air-Cherenkov experi-ments for ground basedγ-ray astronomy,such as H.E.S.S.[5],MAGIC[6]and VERITAS[7]exhibit greatly improved sensitivity around100GeV compared to previous instruments[8,9].Detections or upper limits on pulsed emission from these new instruments will likely be based on data taken over months or even years.Especially in the case of non-detection of a pulsed signal,it is necessary to prove the long term stability and accuracy of the timing systems of the experiment.The key components of the timing system are the timing hardware(usually based on GPS clock technology),with associated interface electronics,and the software used to derive phase information for an individ-ual object.Some of theseγ-ray pulsars exhibit pulsed emission detectable at optical wavelengths.The detection of pulsed optical emission using the tim-ing system of aγ-ray instrument can be used as a means to demonstrate its absolute timing capability.Optical pulsar measurements are also interesting in their own right(see for example[10]).The six known optical pulsars exhibit dominantly non-thermal (optical)emission and are all relatively young,and energetic or nearby.The class of pulsars with measured optical pulsations therefore falls close to the class of potential very-high-energyγ-ray emitting pulsars.The optical emission also provides a bridge between the well studied radio and X-ray bands.The recent claim of enhanced optical emission associated with giant radio pulses (GRPs)of the Crab pulsar[11],acts as an additional motivation for further studies.Optical observations of pulsars using conventional optical telescopes are per-formed either with fast readout CCD cameras[12]or photon counting instru-ments[13].The requirements for such a device are time-resolution of∼100µs and sufficient signal/noise to resolve the pulsed emission against the night sky background(NSB).Sensitivity improves linearly with both optical PSF width and mirror diameter.Traditional devices have excellent angular resolu-tion and modest mirror area.An alternate concept is to use the large mirror area of Cherenkov telescopes to compensate for their modest angular resolu-tion.The potential advantages of this approach include smallerfluctuations due to seeing(intensityfluctuations on small angular scales caused be at-mospheric turbulence),potentially deadtime free operation and in general adifferent set of systematic effects.The idea of measuring the optical pulsa-tions of pulsars with Cherenkov telescopes is at least a decade old and pulses from the Crab pulsar have been measured successfully by several instruments: Whipple[14],STACEE[15],CELESTE[9],and HEGRA[16],with a typical sensitivity of0.1σ/t/s and the authors estimate a value of1σ/ture is used for pointing tests using stars.The camera box is equipped with a pneumatic lid.The positioning LEDs are used to monitor pointing and track-ing accuracy via images acquired by a CCD camera mounted at the centre of the telescope dish,with the pulsar camera in itsfield of view.Light GuideApertureLEDFig.1.Photograph showing the principle mechanical components of the optical pul-sar camera:the central pixel aperture,the“veto”pixel light guides,the positioning LEDs and the HV inputs/signal outputs for the photomultipliers mounted within the casing.The analogue signals from the seven camera pixels were fed via50m coaxial cables to an electronics container at the base of the telescope.The camera electronics were housed in this temperature controlled environment.Signals from all channels were amplified with DC-coupled spectroscopic shaper mod-ules,with a characteristic shaping time of100µs(FWHM).The signal was then digitised with an over-sampling factor of∼4using a HYTEC VTR2536 14-bit Flash ADC.This scheme provides a current measurement proportional to the average photonflux on100µs time-scales.Any optical pulsed signal is measured on top of a DC background generated by NSB photons,which have a typical rate of∼100MHz.Timing information was provided by two Meinberg167BGT GPS clocks,one associated with the H.E.S.S.central trigger system[22]and a second identical clock housed on the telescope tracking room.These clocks supply10MHz and1Hz TTL outputs synchronized to UTC.For the H.E.S.S.clock these signals were distributed via opticalfibre from the central control building. Two VME counter models are used to count these TTL pulses and generateFig.2.Wavelength dependent efficiency of the instrument compared to the optical spectrum of the Crab nebula[28],before and after atmospheric absorption.The lower solid curve gives the combined quantum and collection efficiency of the PMT. The dashed curve includes also the reflectivity of the primary mirror and the overall collection efficiency of the light cone.event timestamps.The1Hz channel is used to reset the10MHz counter.Every two seconds an ASCII time-string was read via a serial port on the GPS clock, as an absolute time reference.The clock counters are read out together with each FADC sample via a VME based CPU.A custom data acquisition system (DAQ)developed for this measurement achieved the required over-sampling factor of∼4with an average sampling rate28kHz on all channels.Additional electronics in the electronics container provided temperature monitoring and remote control of photomultiplier HV and the camera lid.Data transmission to a remote machine responsible for data storage occurred in parallel to data taking—resulting in deadtime free operation.Due to the large sampling rate the pulsar camera produced data at a rate comparable with that of the H.E.S.S.960pixel Cherenkov cameras(∼1MB/s).3ObservationsThe observations described here were performed in late October and early November2003,partly contemporaneous with observations using the Effels-berg100m radio telescope(discussed in[23]).The optical measurements de-scribed here were accompanied byγ-ray observations of the Crab nebula with the3remaining H.E.S.S.telescopes.Overall60hours of optical Crab obser-vations were performed of which41hours of on-source observations pass all data quality criteria.Over300GB of raw data were obtained.The observations consisted of data taken tracking the Crab pulsar itself,inter-spersed with occasional off-source runs and periodic pedestal monitoring runs taken with the camera lid closed.Observations occurred semi-automatically, with intervention from the H.E.S.S.shift-crew only at the beginning and end of each night.To keep the camera centred on the pulsar it was necessary to make online corrections for atmospheric refraction and bending in the arms of the telescope.The verification of the absolute pointing of the instrument was done by scanning several stars across the aperture of the central pixel,and also using CCD images of the positioning LEDs and star images on the camera lid.The telescope tracking precision was monitored during the measurement and exhibited a maximum rms deviation of3′′.The total systematic pointing error is estimated as∼30′′,introducing a negligible error on the recorded optical signal.For roughly half of the observing time,two independent GPS clocks were read-out in parallel:the H.E.S.S.central trigger timing system and the independent system of the optical pulsar instrument.The mean difference between the two event time-stamps during this time was2.1µs,consistent with the length of the opticalfibre over which the central clock time was transmitted.The rms of this time difference was150ns,consistent with the precision quoted by the clock manufacturers.The night sky background level in the camera FOV is rather inhomogeneous. The Crab nebula has a V-band magnitude of8.4and a diameter of≈6′, covering essentially the entire central pixel.The brightest star present in the surrounding pixels has M v=9.9,causing significant variation in pixel currents as it rotates around the outer pixels.The mean NSB level in the outer pixels was found to be of∼3×1012photons m−2s−1sr−1.Previous measurements of the NSB level at the H.E.S.S.site found≈2.4×1012photons m−2s−1sr−1 (300-650nm)close to the zenith and levels higher by a factor∼2on the galactic plane in the outer galaxy[29].NSB measurements of thisfield using a HEGRA telescope on La Palma[16]yielded a value of4.3×1012photons m−2 s−1sr−1,in reasonable agreement,given the different site and the different altitude range of our observations.4Analysis&ResultsThefirst step of the analysis is the summation of every four consecutive sam-ples to produce statistically independent measurements of≈140µs duration.A timestamp is generated based on the average time of the four samples.For eachfive minute observation run,pedestal values are subtracted based on the ADC values with the camera lid closed.Periods with unstable weather con-ditions are removed by cuts on the rms and gradient in the signals measured in the veto pixels.Transient background events are removed by excluding2s blocks in which the signal in any surrounding pixel exceeded5times the sig-nal rms for any5consecutive measurements.No cuts are made based on the central pixel signal.4.1Timing and Light-CurveA crucial aspect of the analysis is the barycentering and phase-folding of the event times.For this purpose software developed specifically for H.E.S.S.was employed[24].The software has been compared against the standard TEMPO package[25,26]and no difference greater than1µs found for non-binary pul-sars.Ephemerides from Jodrell Bank were used for the phase calculation[27]. Comparing the ephemerides provided for October and November we derive a second derivative of the pulsar frequency:¨f=9.3×10−21s−3.This value of¨f,together with˙f,f and t0taken from the published November15th ephemerides,was used to calculate the absolute phase information given here. Following phase-folding a clear signal from the Crab pulsar was visible in all datasets.The average signal/noise of the full dataset is such that an average significance of4σ/Fig.3.Average optical signal versus phase for the Crab pulsar for10second,100 second and1hour integration times.The inset shows afit to the main peak for the 10second dataset.For clarity,offsets of±10counts have been added to the10s and1h datasets.The DC signal produced by the Crab nebula and the NSB has been subtracted(∼2×104ADC counts).the Jodrell ephemerides for October and November.The apparent phase shift of the mean peak between January and November2003was≈100µs,again consistent within the accuracy of the radio ephemerides used.The phasogram extracted from the full39hour dataset is shown infigure5. The best published optical phasogram for the Crab nebula is that extracted from2hours of observations with the Hubble Space Telescope(HST)[28].We find generally good agreement between the H.E.S.S.result and that of HST. For example,the ratio of the height of the main pulse to that of the inter-pulse: HST3.78±0.11,H.E.S.S.3.721±0.003;and the FWHM of the main peak:HST 0.0431±0.0003,H.E.S.S.0.0445±0.0001.The H.E.S.S.measurement is40µs wider than that from HST,consistent with the expected smearing introduced by imperfect ephemerides over the long exposure time.Indeed,fits to all489 individual5minute phasograms show a mean value of0.0432±0.0001,identical to the HST result.In our data the phase position of the main optical pulse precedes that of the radio peak by134±2µs,again consistent with previous measurements(100µs[11])within the error introduced by the imperfect radio ephemeris.The signal measured with our instrument corresponds approximately to theFig.4.Reconstructed relative main peak position for the Crab pulsar over one week in October2003.Each point represents one5minute run.wavelength range300-650nm,with a rather non-uniform response illustrated infigure2(more details on the individual optical components can be found in[18]).The most meaningful way to compare the pulsedflux measured here with previous measurements is to convolve the measured Crab pulsed spec-trum with our wavelength dependent response ing the spectrum reconstructed by[28]we predict a pulsed signal of1000photoelectrons per pulse(at46◦zenith).The mean measured value is1200p.e./pulse,in good agreement within the≈30%systematic error introduced by uncertainties in instrumental reflectivities,efficiencies and atmospheric transmission.4.2Search for Giant PulsesExtreme pulse height variability is a common feature of radio pulsars.Giant radio pulses(GRPs)are normally coincident with main pulse and inter-pulse [11]but can apparently also occur in other phase regions[23].While an anal-ogous phenomenon has not so far been seen in the optical,an average3% enhancement influx of the optical pulse,in coincidence with GRPs,has been reported[11].Given the signal/noise of our measurement a few×104simul-taneous GRPs would be required to confirm this value.However,given the relatively long duration of our measurement it is useful to derive a limit on the rate of large optical pulses,independent of the radio pulse height.The major background for such a search in our dataset is meteorites.These are normally detected in several pixels and take≈50ms to cross the camera.Such events,as for example that shown infigure6,are readily rejected from theFig.5.Phasogram extracted from the complete39hour dataset.The main phase regions are marked:the bridge emission(0.1-0.25),the inter-pulse(0.25-0.55),the main pulse(0.9-1.1)and the offpulse region(0.55-0.9).The inset shows the3%of the phase around the main peak position on an expanded scale.The100µs scale bar in the inset corresponds to the shaping time of the measurement,any structures in the light-curve on shorter timescales are unresolvable.analysis using the outer pixel information.However,an irreducible background of events travelling almost on-axis and hence illuminating only the centre pixel, is present.Figure7shows the distribution of integrated signal in each pulse(or on-and off-phase regions)normalised by the expected poissonfluctuations. Nofluctuations>20×the mean pulse amplitude were observed during our measurement,neither on-nor off-phase.We can therefore place a limit on the fraction of such large pulses of1.4×10−6(95%confidence).This result should be compared to the situation at radio frequencies where pulses exceeding the meanflux by several orders of magnitude are frequent.We note that our instrument is sensitive to giant pulses of very short(<1µs)duration,as seen in the radio band,which may not be the case for photon counting instruments. 5Summary and OutlookWe have constructed and tested an optical pulsar monitoring system for in-stallation on Cherenkov telescopes.We have shown that such a system can approach the sensitivity of conventional optical telescopes(with custom builtFig.6.Light-curve in three pixels indicating the passage of a meteorite candidate. The central pixel(upper curve)shows a narrower profile than that of the outer pixels(lower curves)due to its reduced aperture.cameras)in measuring short-time-scale(millisecond-second)optical pulsa-tions.In addition,the excellent agreement on the shape of the Crab pulsar light-curve validates the timing hardware and software used for H.E.S.S.,thus demonstrating the validity of pulsed emission limits from H.E.S.S[30].We also derive an upper limit on the frequency of giant pulses which is complemen-tary to existing limits and measurements in that it includes also very short (∼nanosecond)pulses.As the energy threshold of the IACT technique are pushed down further(e.g. with the second phases of both the H.E.S.S.and MAGIC experiments),the de-tection of pulsed VHEγ-ray emission will become more likely,thereby increas-ing the importance of optical monitoring devices.We consider two possibilities for future instruments of this type.Firstly a small device for monitoring pur-poses,gathering data in parallel toγ-ray with the Cherenkov camera.Ideally such an instrument would replace one pixel of the Cherenkov camera.The problem with this approach is the observing strategy of modern instruments, for example’wobble’mode and convergent pointing,both of which move the target source away from the centre of thefield of view of the telescopes.Field rotation then prevents the observation of a source in a signal pixel through an entire run.The second possibility is to adapt the photo-sensor current mon-itoring of a Cherenkov camera to provide high rate(>1kHz)and resolution sampling of the sky brightness.With integration and sampling rates on com-parable time scales such a camera could be used to measure optical pulsations (and transients)anywhere in the∼4◦field of view of the instrument,in par-Fig.7.Relativefluctuations in the integrated signal in on-and off-phase regions for each pulse(linear scale-left and log.scale-right).The on-phase region corre-sponds to the main pulse and inter-pulse regions shown infigure5.Off-pulse here corresponds to a combination of the true off-pulse region and the bridge region as shown infigure5.After tight quality selection to remove optical transients and un-stable weather,2.2million pulses remain.The off-phase distribution follows closely a normal gaussian distribution(dashed-line)as expected,but with a significant tail to large values.This tail can be attributed to transient events occurring only in the central pixel.A similar tail is seen on the on-phase distribution.allel toγ-ray observations.A camera with these properties is currently under test[31].For the600m2class telescopes of the next generation,deep observa-tions of young pulsars with such a system could lead to the discovery of new optical counterparts to known radio pulsars.Such a system is also desirable in the search for MeV/GeV emission from short time-scale GRBs[32]. AcknowledgementsThe authors would like to acknowledge the support of their host institutions, and additionally support from the German Ministry for Education and Re-search(BMBF).We appreciate the excellent work of the engineering and technical support staffin Heidelberg and Namibia in the construction and operation of the equipment.We would like to thank the entire H.E.S.S.col-laboration for their cooperation and assistance,in particular:F.Breitling,K. Bernl¨o hr,O.Bolz,S.Gillessen,M.Holleran.References[1]Nolan,P.L.,et al.,1996,Astron.Astrophys.Suppl.Ser.120,61.[2]Daugherty,J.K.&Harding,A.K.,1982,ApJ252,337.[3]Hirotani,K.,2001,ApJ549,495.[4]Thompson,D.J.et al.,2005,ApJ Suppl.,157,324.[5]Hinton,J.A.,2004,New Astron.Rev.48,331.[6]Lorenz,E.,2004,New Astron.Rev.48,339.[7]Weekes,T.C.et al.,2002,Astropart.Phys.17,221.[8]Hanna,D.S.,et al.,2002,Nucl.Inst.&Methods A491,126.[9]de Naurois,M.,et al.,2002,ApJ566,343.[10]Shearer, A.&Golden.A,2002,in Neutron stars,Pulsars and Supernova remnants,eds W.Becker,H.Lesch&W.Tr¨u mper,MPE report278,p.44-53 (astro-ph/0208579)[11]Shearer,A.,et al.,2003,Science301,493.[12]Dhillon,V.&Marsh,T.,2001,New Astron.Rev.45,91.[13]Straubmeier,C.,Kanbach,G.&Schrey,F.,2001,Exp.Astron.11,157.[14]Lessard,R.W.,et al.,2000,ApJ531,942.[15]Fortin,P.,2005,Ph.D.Thesis,McGill University.[16]O˜n a-Wilhelmi,E.et al.,2004,Astropart.Phys.22,95.[17]Lucarelli,F.et al.,2005,Proc.29th ICRC(Pune),5,367.[18]Bernl¨o hr,K.et al.,2003,Astropart.Phys.20,111.[19]Cornils,R.et al.,2003,Astropart.Phys.20,129.[20]Franzen,A.et al.,2003,Proc.28th ICRC(Tsukuba),Univ.Academy Press, Tokyo.p.2987.[21]Vincent.P.et al.,2003,Proc.28th ICRC(Tsukuba),Univ.Academy Press, Tokyo.p.2887.[22]Funk,S.et al.,2004,Astropart.Phys.22,285.[23]Jessner,A.et al.,2005,Advances in Space Research,35,1166.[24]Gillessen,S.2004,PhD Thesis,University of Heidelberg.[25]Eifert,T.2006,Diploma Thesis,Humbolt University,Berlin.[26]/tempo/[27]Jodrell Bank pulsar group page,/∼pulsar/[28]Percival,J.W.,et al.,1993,ApJ407,276.[29]Preuss,S.et al.,2002,Nucl.Instrum.Meth.A481,229.[30]Schmidt, F.et al.,2004,2nd Int.Symp.on High Energy Gamma Ray Astronomy,Heidelberg,APS Conf.Proc.745,377[31]Hermann,G.et al.,2005,Proc.Cherenkov2005,Paris(astro-ph/0511519).[32]LeBohec,S.,Krennrich,F&Sleege,G.Astropart.Phys.23,235.。