Photolithography processing system and method ther
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专利名称：Photolithography processing system and method thereof
发明人：Suing-Jun Lim
申请号：US10178306
申请日：20020625
公开号：US20030013026A1
公开日：
20030116
专利内容由知识产权出版社提供
摘要：The present invention relates to a photolithography processing system and a method thereof that is able to detect the presence of impure matters remaining on the surface of a wafer in the process of forming a pattern mask and then determine a subsequent processing step of the wafer with reference to the result of the detection. The photolithography processing system includes: a table positioned near a loader where a carrier is positioned for supporting a wafer that is being transported by a robot;
a plurality of illumination tools positioned for illuminating the surface of the wafer positioned on the table; a camera for taking pictures of the surface of the wafer; and a controller for controlling operations of the robot, the illumination tools and for detecting the presence of impure matters on the surface of the wafer.
申请人：LIM SUING-JUN
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