光刻胶正胶原材料pac光敏剂

光刻胶正胶原材料pac光敏剂
English Answer:
Photoresist Positive Photoresist Raw Material Pac Photosensitizer.
Positive photoresist is a type of photoresist that is exposed to light through a mask to create a pattern in the resist. The exposed areas of the resist are then dissolved, leaving behind a pattern of unexposed resist that can be used to create a pattern in a substrate.
PAC is a photosensitizer that is used in positive photoresists. PAC is a polycyclic aromatic compound that absorbs light in the ultraviolet (UV) range. When PAC absorbs light, it undergoes a chemical reaction that generates free radicals. These free radicals then react with the polymer in the photoresist, causing it to cross-link and become insoluble.
The concentration of PAC in a photoresist determines
the sensitivity of the resist to light. A higher concentration of PAC will result in a more sensitive resist that is more easily exposed to light.
PAC is a versatile photosensitizer that can be used in
a variety of positive photoresists. It is particularly
well-suited for use in resists that are used in the production of printed circuit boards (PCBs).
Chinese Answer:
光刻胶正胶原材料pac光敏剂。

正胶是一种通过光刻胶掩模版曝光形成图形的光刻胶。

被曝光
的区域经过显影后溶解，留下未被曝光的光刻胶图形，用于将图形
转移至基底上。

PAC是一种用于正胶中的光敏剂。

PAC是一种多环芳香族化合物，可以吸收紫外光。

当PAC吸收光时，会发生化学反应，产生自由基。

这些自由基与光刻胶中的聚合物反应，使其交联并变得不溶。

光刻胶中PAC的浓度决定了光刻胶对光的敏感性。

PAC浓度越高，光刻胶对光越敏感，更容易被曝光。

PAC是一种通用的光敏剂，可用于各种正胶中。

它特别适合用于生产印刷电路板(PCB)的光刻胶。