半导体一些术语的中英文对照

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半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照离子注入机 ion implanterLSS理论 Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应 channeling effect射程分布 range distribution深度分布 depth distribution投影射程 projected range阻止距离 stopping distance阻止本领 stopping power标准阻止截面 standard stopping cross section退火 annealing激活能 activation energy等温退火 isothermal annealing激光退火 laser annealing应力感生缺陷 stress-induced defect择优取向 preferred orientation制版工艺 mask-making technology图形畸变 pattern distortion初缩 first minification精缩 final minification母版 master mask铬版 chromium plate干版 dry plate乳胶版 emulsion plate透明版 see-through plate高分辨率版 high resolution plate, HRP超微粒干版 plate for ultra-microminiaturization 掩模 mask掩模对准 mask alignment对准精度 alignment precision光刻胶 photoresist又称“光致抗蚀剂”。

负性光刻胶 negative photoresist正性光刻胶 positive photoresist无机光刻胶 inorganic resist多层光刻胶 multilevel resist电子束光刻胶 electron beam resistX射线光刻胶 X-ray resist刷洗 scrubbing甩胶 spinning涂胶 photoresist coating后烘 postbaking光刻 photolithographyX射线光刻 X-ray lithography电子束光刻 electron beam lithography离子束光刻 ion beam lithography深紫外光刻 deep-UV lithography光刻机 mask aligner投影光刻机 projection mask aligner曝光 exposure接触式曝光法 contact exposure method接近式曝光法 proximity exposure method光学投影曝光法 optical projection exposure method 电子束曝光系统 electron beam exposure system分步重复系统 step-and-repeat system显影 development线宽 linewidth去胶 stripping of photoresist氧化去胶 removing of photoresist by oxidation等离子[体]去胶 removing of photoresist by plasma 刻蚀 etching干法刻蚀 dry etching反应离子刻蚀 reactive ion etching, RIE各向同性刻蚀 isotropic etching各向异性刻蚀 anisotropic etching反应溅射刻蚀 reactive sputter etching离子铣 ion beam milling又称“离子磨削”。

半导体词汇(英汉对照)

半导体词汇(英汉对照)

半导体词汇(英汉对照)1. 半导体:semiconductor2. 晶体管:transistor3. 二极管:diode4. 集成电路:integrated circuit5. 电容:capacitor8. 金属氧化物场效应管:Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET)9. 数字信号处理器:Digital Signal Processor (DSP)10. 有机发光二极管:Organic Light-Emitting Diode (OLED)11. 光纤放大器:Optical Fiber Amplifier (OFA)12. 直流-直流变换器:DC-DC Converter13. 脉冲编码调制:Pulse Code Modulation (PCM)14. 光耦合器:Optocoupler15. 调制解调器:Modem16. 电池管理系统:Battery Management System (BMS)17. 片上系统:System-on-a-Chip (SoC)18. 功率电子器件:Power Electronics Device20. 纳米技术:Nanotechnology21. 生物芯片:Biochip23. 激光器:Laser24. 双极型发射极晶体管:Bipolar Junction Transistor (BJT)28. 传感器:Sensor29. 能量收集器:Energy Harvester30. 固态驱动器:Solid State Drive (SSD)31. 磁性存储设备:Magnetic Storage Device32. 屏幕显示器:Display33. 快速门:Fast Gate35. 超高速芯片:Ultra-High-Speed Chip38. 量子计算机:Quantum Computer40. 机器人学:Robotics41. 表面声波器件:Surface Acoustic Wave (SAW) Device45. 长寿命电池:Long-Life Battery46. 红外光电探测器:Infrared Photodetector47. 树莓派:Raspberry Pi48. 可充电电池:Rechargeable Battery49. 无线充电器:Wireless Charger51. 控制电路:Control Circuit53. 逆变器:Inverter55. 拓扑优化器:Topology Optimizer57. 智能家居:Smart Home58. 传输线理论:Transmission Line Theory60. 片上调制器:On-Chip Modulator61. 内存芯片:Memory Chip63. 线性电源:Linear Power Supply64. 电机驱动器:Motor Driver66. 相变存储器:Phase-Change Memory (PCM)68. 氮化镓:Gallium Nitride (GaN)69. 自动驾驶:Autonomous Driving72. 机器学习:Machine Learning77. 差分信号:Differential Signal78. 相位锁定环:Phase Locked Loop (PLL)80. 峰值检测器:Peak Detector84. 相移器:Phase Shifter88. 滤波器:Filter91. 直流伏安表:Digital Multimeter (DMM)92. 频率计:Frequency Counter93. 降噪耳机:Noise-Canceling Headphones94. 耳返系统:In-Ear Monitoring (IEM) System95. 电学模型:Electrical Model97. 声音芯片:Audio Chip98. 跟踪器:Tracker。

半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照离子注入机ionimplanterLSS理论LindhandScharffandSchiotttheory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应channelingeffect射程分布rangedistribution深度分布depthdistribution投影射程projectedrange负性光刻胶negativephotoresist正性光刻胶positivephotoresist无机光刻胶inorganicresist多层光刻胶multilevelresist电子束光刻胶electronbeamresistX射线光刻胶X-rayresist刷洗scrubbing甩胶spinning涂胶photoresistcoating后烘postbaking光刻photolithographyX射线光刻X-raylithography电子束光刻electronbeamlithography离子束光刻ionbeamlithography深紫外光刻deep-UVlithography光刻机maskaligner投影光刻机projectionmaskaligner曝光exposure接触式曝光法contactexposuremethod接近式曝光法proximityexposuremethod光学投影曝光法opticalprojectionexposuremethod磷硅玻璃phosphorosilicateglass硼磷硅玻璃boron-phosphorosilicateglass钝化工艺passivationtechnology 多层介质钝化multilayerdielectricpassivation划片scribing电子束切片electronbeamslicing烧结sintering印压indentation热压焊thermocompressionbonding热超声焊thermosonicbonding冷焊coldwelding点焊spotwelding球焊ballbonding楔焊wedgebonding内引线焊接innerleadbonding外引线焊接outerleadbonding梁式引线beamlead装架工艺mountingtechnology附着adhesion封装packaging金属封装metallicpackagingAmbipolar双极的Ambienttemperature环境温度Amorphous无定形的,非晶体的Amplifier功放扩音器放大器Analogue(Analog)comparator模拟比较器Angstrom埃Anneal退火Anisotropic各向异性的Anode阳极Arsenic(AS)砷Auger俄歇Augerprocess俄歇过程Avalanche雪崩Avalanchebreakdown雪崩击穿Avalancheexcitation雪崩激发Backgroundcarrier本底载流子Backgrounddoping本底掺杂Backward反向Backwardbias反向偏置Ballastingresistor整流电阻Ballbond球形键合Band能带Bandgap能带间隙Barrier势垒Barrierlayer势垒层Barrierwidth势垒宽度Base基极Basecontact基区接触Basestretching基区扩展效应Basetransittime基区渡越时间Basetransportefficiency基区输运系数Base-widthmodulation基区宽度调制Basisvector基矢Bias偏置Bilateralswitch双向开关Binarycode二进制代码Binarycompoundsemiconductor二元化合物半导体Bipolar双极性的BipolarJunctionTransistor(BJT)双极晶体管Bloch布洛赫Blockingband阻挡能带Chargeconservation电荷守恒Chargeneutralitycondition电中性条件Chargedrive/exchange/sharing/transfer/storage电荷驱动/交换/共享/转移/存储Chemmicaletching化学腐蚀法Chemically-Polish化学抛光Chemmically-MechanicallyPolish(CMP)化学机械抛光Chip芯片Chipyield芯片成品率Clamped箝位Clampingdiode箝位二极管Cleavageplane解理面Clockrate时钟频率Clockgenerator时钟发生器Clockflip-flop时钟触发器Close-packedstructure密堆积结构Close-loopgain闭环增益Collector集电极Collision碰撞CompensatedOP-AMP补偿运放Common-base/collector/emitterconnection共基极/集电极/发射极连接Common-gate/drain/sourceconnection共栅/漏/源连接Common-modegain共模增益Common-modeinput共模输入Common-moderejectionratio(CMRR)共模抑制比Compatibility兼容性Compensation补偿Compensatedimpurities补偿杂质Compensatedsemiconductor补偿半导体ComplementaryDarlingtoncircuit互补达林顿电路ComplementaryMetal-Oxide-SemiconductorField-Effect-Transistor(CMOS)互补金属氧化物半导体场效应晶体管Complementaryerrorfunction余误差函数Computer-aideddesign(CAD)/test(CAT)/manufacture(CAM)计算机辅助设计/测试/制De.broglie德布洛意Decderate减速Decibel(dB)分贝Decode译码Deepacceptorlevel深受主能级Deepdonorlevel深施主能级Deepimpuritylevel深度杂质能级Deeptrap深陷阱Defeat缺陷Degeneratesemiconductor简并半导体Degeneracy简并度Degradation退化DegreeCelsius(centigrade)/Kelvin摄氏/开氏温度Delay延迟Density密度Densityofstates态密度Depletion耗尽Depletionapproximation耗尽近似Depletioncontact耗尽接触Depletiondepth耗尽深度Depletioneffect耗尽效应Depletionlayer耗尽层DepletionMOS耗尽MOSDepletionregion耗尽区Depositedfilm淀积薄膜Depositionprocess淀积工艺Designrules设计规则Die芯片(复数dice)Diode二极管Dielectric介电的Dielectricisolation介质隔离Difference-modeinput差模输入Differentialamplifier差分放大器Differentialcapacitance微分电容Diffusedjunction扩散结Diffusion扩散Diffusioncoefficient扩散系数Diffusionconstant扩散常数Diffusivity扩散率Diffusioncapacitance/barrier/current/furnace扩散电容/势垒/电流/炉Electrostatic静电的Element元素/元件/配件Elementalsemiconductor元素半导体Ellipse椭圆Ellipsoid椭球Emitter发射极Emitter-coupledlogic发射极耦合逻辑Emitter-coupledpair发射极耦合对Emitterfollower射随器Emptyband空带Emittercrowdingeffect发射极集边(拥挤)效应Endurancetest=lifetest寿命测试Energystate能态Energymomentumdiagram能量-动量(E-K)图Enhancementmode增强型模式EnhancementMOS增强性MOSEntefic(低)共溶的Environmentaltest环境测试Epitaxial外延的Epitaxiallayer外延层Epitaxialslice外延片Expitaxy外延Equivalentcurcuit等效电路Equilibriummajority/minoritycarriers平衡多数/少数载流子ErasableProgrammableROM(EPROM)可搽取(编程)存储器Errorfunctioncomplement余误差函数Etch刻蚀Etchant刻蚀剂Etchingmask抗蚀剂掩模Excesscarrier过剩载流子Excitationenergy激发能Excitedstate激发态Exciton激子Extrapolation外推法Extrinsic非本征的Extrinsicsemiconductor杂质半导体Face-centered面心立方Falltime下降时间Heatsink散热器、热沉Heavy/lightholeband重/轻空穴带Heavysaturation重掺杂Hell-effect霍尔效应Heterojunction异质结Heterojunctionstructure异质结结构HeterojunctionBipolarTransistor(HBT)异质结双极型晶体Highfieldproperty高场特性High-performanceMOS.(H-MOS)高性能MOS.Hormalized归一化Horizontalepitaxialreactor卧式外延反应器Hotcarrior热载流子Hybridintegration混合集成Image-force镜象力Impactionization碰撞电离Impedance阻抗Imperfectstructure不完整结构Implantationdose注入剂量Implantedion注入离子Impurity杂质Impurityscattering杂志散射Incrementalresistance电阻增量(微分电阻)In-contactmask接触式掩模Indiumtinoxide(ITO)铟锡氧化物Inducedchannel感应沟道Infrared红外的Injection注入Inputoffsetvoltage输入失调电压Insulator绝缘体InsulatedGateFET(IGFET)绝缘栅FETIntegratedinjectionlogic集成注入逻辑Integration集成、积分Interconnection互连Interconnectiontimedelay互连延时Interdigitatedstructure交互式结构Interface界面Interference干涉Internationalsystemofunions国际单位制Internallyscattering谷间散射Matching匹配Maxwell麦克斯韦Meanfreepath平均自由程Meanderedemitterjunction梳状发射极结Meantimebeforefailure(MTBF)平均工作时间Megeto-resistance磁阻Mesa台面MESFET-MetalSemiconductor金属半导体FETMetallization金属化Microelectronictechnique微电子技术Microelectronics微电子学Millenindices密勒指数Minoritycarrier少数载流子Misfit失配Mismatching失配Mobileions可动离子Mobility迁移率Module模块Modulate调制Molecularcrystal分子晶体MonolithicIC单片ICMOSFET金属氧化物半导体场效应晶体管Mos.Transistor(MOST)MOS.晶体管Multiplication倍增Modulator调制Multi-chipIC多芯片ICMulti-chipmodule(MCM)多芯片模块Multiplicationcoefficient倍增因子Nakedchip未封装的芯片(裸片)Negativefeedback负反馈Negativeresistance负阻Nesting套刻Negative-temperature-coefficient负温度系数Noisemargin噪声容限Nonequilibrium非平衡Nonrolatile非挥发(易失)性Normallyoff/on常闭/开Numericalanalysis数值分析Occupiedband满带Officienay功率Photoelectriccell光电池Photoelectriceffect光电效应Photoenicdevices光子器件Photolithographicprocess光刻工艺(photo)resist(光敏)抗腐蚀剂Pin管脚Pinchoff夹断PinningofFermilevel费米能级的钉扎(效应)Planarprocess平面工艺Planartransistor平面晶体管Plasma等离子体Plezoelectriceffect压电效应Poissonequation泊松方程Pointcontact点接触Polarity极性Polycrystal多晶Polymersemiconductor聚合物半导体Poly-silicon多晶硅Potential(电)势Potentialbarrier势垒Potentialwell势阱Powerdissipation功耗Powertransistor功率晶体管Preamplifier前置放大器Primaryflat主平面Principalaxes主轴Print-circuitboard(PCB)印制电路板Probability几率Probe探针Process工艺Propagationdelay传输延时Pseudopotentialmethod膺势发Punchthrough穿通Pulsetriggering/modulating脉冲触发/调制Pulse WidenModulator(PWM)脉冲宽度调制Punchthrough穿通Push-pullstage推挽级Qualityfactor品质因子Quantization量子化Schottkybarrier肖特基势垒Schottkycontact肖特基接触Schrodingen薛定厄Scribinggrid划片格Secondaryflat次平面Seedcrystal籽晶Segregation分凝Selectivity选择性Selfaligned自对准的Selfdiffusion自扩散Semiconductor半导体Semiconductor-controlledrectifier可控硅Sendsitivity灵敏度Serial串行/串联Seriesinductance串联电感Settletime建立时间Sheetresistance薄层电阻Shield屏蔽Shortcircuit短路Shotnoise散粒噪声Shunt分流Sidewallcapacitance边墙电容Signal信号Silicaglass石英玻璃Silicon硅Siliconcarbide碳化硅Silicondioxide(SiO2)二氧化硅SiliconNitride(Si3N4)氮化硅SiliconOnInsulator绝缘硅Siliverwhiskers银须Simplecubic简立方Singlecrystal单晶Sink沉Skineffect趋肤效应Snaptime急变时间Sneakpath潜行通路Sulethreshold亚阈的Solarbattery/cell太阳能电池Solidcircuit固体电路SolidSolubility固溶度Sonband子带Transistoraging(stress)晶体管老化Transittime渡越时间Transition跃迁Transition-metalsilica过度金属硅化物Transitionprobability跃迁几率Transitionregion过渡区Transport输运Transverse横向的Trap陷阱Trapping俘获Trappedcharge陷阱电荷Trianglegenerator三角波发生器Triboelectricity摩擦电Trigger触发Trim调配调整Triplediffusion三重扩散Truthtable真值表Tolerahce容差Tunnel(ing)隧道(穿)Tunnelcurrent隧道电流Turnover转折Turn-offtime关断时间Ultraviolet紫外的Unijunction单结的Unipolar单极的Unitcell原(元)胞Unity-gainfrequency单位增益频率Unilateral-switch单向开关Vacancy空位Vacuum真空Valence(value)band价带Valuebandedge价带顶Valencebond价键Vapourphase汽相Varactor变容管Varistor变阻器Vibration振动Voltage电压Wafer晶片Waveequation波动方程Waveguide波导Wavenumber波数CT:ContaminationThreshold??污染阀值Ctrl:Control控制;管理;抑制D:Die芯片DAC igitalAnalogConverter??数字转换器DSP igitalSignalProcessing数字信号处理EFO:ElevtronicFlame-Off电子打火系统FA:FaceAngle顶锥角(面锥角)FAB:FreeAirBall空气球FD:FloppyDisk软盘,软式磁碟片Frd:Forward??前进GEM:GenericHi:HightMagnification高倍率Hybd:Hybrid混合动力/混合式Impd:Impedence阻抗Ins:Inspection检查,检验L/F eadFrame框架Lo:LowMagnification低倍率PM reventiveMaintenance??PR atternRecognitionT/P:TopPlate??顶板UPH:UnitPerHour??每小时产量UTI:UltrasonicTransducerInterface超声波传感受器接口VLL:VisualLeadLocator导脚定位W/C:WireClamp??线夹W/H:WorkHolder??轨道W/S:WireSpool??线轴ESD:ElectroStaticDischarge静电释放EPa:ESDProtectedarea??静电防护区ESDS??????????????????????静电敏感设备BM:BreakdownMaintenance事后维修CM:CorrectiveMaintenance改良保养PVM:PreventiveMaintenance预防保养MP:MaintencePreventive保养预防PM:ProductionMaintenance生产保养BG:backgrinding??背部研磨DS:diesaw????将wafer切die DA:dieattach??=DB:diebond??装片WB:wirebond焊线????。

半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照离子注入机ion implanterLSS理论Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应channeling effect射程分布range distribution深度分布depth distribution投影射程projected range阻止距离stopping distance阻止本领stopping power标准阻止截面standard stopping cross section退火annealing激活能activation energy等温退火isothermal annealing激光退火laser annealing应力感生缺陷stress-induced defect 择优取向preferred orientation制版工艺mask-making technology 图形畸变pattern distortion初缩first minification精缩final minification母版master mask铬版chromium plate干版dry plate乳胶版emulsion plate透明版see-through plate高分辨率版high resolution plate, HRP超微粒干版plate for ultra-microminiaturization 掩模mask掩模对准mask alignment对准精度alignment precision光刻胶photoresist又称“光致抗蚀剂”。

负性光刻胶negative photoresist正性光刻胶positive photoresist无机光刻胶inorganic resist多层光刻胶multilevel resist电子束光刻胶electron beam resistX射线光刻胶X-ray resist刷洗scrubbing甩胶spinning涂胶photoresist coating后烘postbaking光刻photolithographyX射线光刻X-ray lithography电子束光刻electron beam lithography离子束光刻ion beam lithography深紫外光刻deep-UV lithography光刻机mask aligner投影光刻机projection mask aligner曝光exposure接触式曝光法contact exposure method接近式曝光法proximity exposure method光学投影曝光法optical projection exposure method 电子束曝光系统electron beam exposure system分步重复系统step-and-repeat system显影development线宽linewidth去胶stripping of photoresist氧化去胶removing of photoresist by oxidation等离子[体]去胶removing of photoresist by plasma 刻蚀etching干法刻蚀dry etching反应离子刻蚀reactive ion etching, RIE各向同性刻蚀isotropic etching各向异性刻蚀anisotropic etching反应溅射刻蚀reactive sputter etching离子铣ion beam milling又称“离子磨削”。

半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照精选文档TTMS system office room 【TTMS16H-TTMS2A-TTMS8Q8-半导体一些术语的中英文对照离子注入机 ion implanterLSS理论 Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应 channeling effect射程分布 range distribution深度分布 depth distribution投影射程 projected range阻止距离 stopping distance阻止本领 stopping power标准阻止截面 standard stopping cross section 退火 annealing激活能 activation energy等温退火 isothermal annealing激光退火 laser annealing应力感生缺陷 stress-induced defect择优取向 preferred orientation制版工艺 mask-making technology图形畸变 pattern distortion初缩 first minification精缩 final minification母版 master mask铬版 chromium plate干版 dry plate乳胶版 emulsion plate透明版 see-through plate高分辨率版 high resolution plate, HRP超微粒干版 plate for ultra-microminiaturization 掩模 mask掩模对准 mask alignment对准精度 alignment precision光刻胶 photoresist又称“光致抗蚀剂”。

负性光刻胶 negative photoresist正性光刻胶 positive photoresist无机光刻胶 inorganic resist多层光刻胶 multilevel resist电子束光刻胶 electron beam resistX射线光刻胶 X-ray resist刷洗 scrubbing甩胶 spinning涂胶 photoresist coating后烘 postbaking光刻 photolithographyX射线光刻 X-ray lithography电子束光刻 electron beam lithography 离子束光刻 ion beam lithography深紫外光刻 deep-UV lithography光刻机 mask aligner投影光刻机 projection mask aligner曝光 exposure接触式曝光法 contact exposure method接近式曝光法 proximity exposure method光学投影曝光法 optical projection exposure method 电子束曝光系统 electron beam exposure system分步重复系统 step-and-repeat system显影 development线宽 linewidth去胶 stripping of photoresist氧化去胶 removing of photoresist by oxidation等离子[体]去胶 removing of photoresist by plasma 刻蚀 etching干法刻蚀 dry etching反应离子刻蚀 reactive ion etching, RIE 各向同性刻蚀 isotropic etching各向异性刻蚀 anisotropic etching反应溅射刻蚀 reactive sputter etching 离子铣 ion beam milling又称“离子磨削”。

半导体专业术语(中英对照)

半导体专业术语(中英对照)
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半导体专业词汇汇总
Semiconductor:半导体 MFG (Manufacture):制造部 Wafer :晶片 Boule:晶锭 Ingot:晶棒 As cut wafer:毛片 Particle:含尘量/微尘粒子 Pod :晶盒 Cassette: 晶片夹 Clean Room:洁净室(Class 100000 以上) MO( Miss Operation):误操作 Process Engineering:制程工程师,简称为P.E.简单称为制程。 Equipment Engineering:设备工程师,简称为E.E.简单称为设备。 Recipe: 程式 PM(Prevention Maintenance): 预防保养 Alarm :警讯 OI (Operation Instruction) :规定的标准的正确操作机台的方法的文件

半导体厂务专业名词中英文对照表

半导体厂务专业名词中英文对照表

半导体厂务专业名词中英文对照表Semiconductor Factory Terminologies English-Chinese Comparison1. Semiconductor - 半导体2. Wafer - 晶圆3. Die - 芯片4. Clean Room - 净化室5. Lithography - 光刻6. Etching - 蚀刻7. Deposition - 沉积8. Patterning - 图形化9. Doping - 掺杂10. Metrology - 计量11. Inspection - 检验12. Test - 测试13. Assembly - 组装14. Packaging - 封装15. Back-End - 后端16. Front-End - 前端17. Sputtering - 粒子沉积18. Chemical Vapor Deposition (CVD) - 化学气相沉积19. Physical Vapor Deposition (PVD) - 物理气相沉积20. Thin Film - 薄膜21. Photolithography - 光刻技术22. Ion Implantation - 离子注入23. Diffusion - 扩散24. Planarization - 平坦化25. Ion Etching - 离子蚀刻26. Circuit - 电路27. Integrated Circuit (IC) - 集成电路28. Silicon - 硅29. Gallium Arsenide (GaAs) - 砷化镓30. Silicon dioxide - 二氧化硅This English-Chinese comparison table provides a comprehensive list of key terminologies used in the semiconductor industry. These terms are essential for professionals working in semiconductor manufacturing facilities to communicate effectively with their Chinese counterparts. From basic concepts like wafer and die to advanced processes such as lithography and etching, having a clear understanding of these terms in both languages is crucial for successful collaboration and operations in a semiconductor factory.。

半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照离子注入机 ion implanterLSS理论 Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应 channeling effect射程分布 range distribution深度分布 depth distribution投影射程 projected range阻止距离 stopping distance阻止本领 stopping power标准阻止截面 standard stopping cross section退火 annealing激活能 activation energy等温退火 isothermal annealing激光退火 laser annealing应力感生缺陷 stress-induced defect择优取向 preferred orientation制版工艺 mask-making technology图形畸变 pattern distortion初缩 first minification精缩 final minification母版 master mask铬版 chromium plate干版 dry plate乳胶版 emulsion plate透明版 see-through plate高分辨率版 high resolution plate, HRP超微粒干版 plate for ultra-microminiaturization 掩模 mask掩模对准 mask alignment对准精度 alignment precision光刻胶 photoresist又称“光致抗蚀剂”。

负性光刻胶 negative photoresist正性光刻胶 positive photoresist无机光刻胶 inorganic resist多层光刻胶 multilevel resist电子束光刻胶 electron beam resistX射线光刻胶 X-ray resist刷洗 scrubbing甩胶 spinning涂胶 photoresist coating后烘 postbaking光刻 photolithographyX射线光刻 X-ray lithography电子束光刻 electron beam lithography离子束光刻 ion beam lithography深紫外光刻 deep-UV lithography光刻机 mask aligner投影光刻机 projection mask aligner曝光 exposure接触式曝光法 contact exposure method接近式曝光法 proximity exposure method光学投影曝光法 optical projection exposure method 电子束曝光系统 electron beam exposure system分步重复系统 step-and-repeat system显影 development线宽 linewidth去胶 stripping of photoresist氧化去胶 removing of photoresist by oxidation等离子[体]去胶 removing of photoresist by plasma 刻蚀 etching干法刻蚀 dry etching反应离子刻蚀 reactive ion etching, RIE各向同性刻蚀 isotropic etching各向异性刻蚀 anisotropic etching反应溅射刻蚀 reactive sputter etching离子铣 ion beam milling又称“离子磨削”。

半导体一些术语的中英文对照

半导体一些术语的中英文对照

半导体一些术语的中英文对照离子注入机ion implanterLSS理论Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应channeling effect射程分布range distribution深度分布depth distribution投影射程projected range阻止距离stopping distance阻止本领stopping power标准阻止截面standard stopping cross section 退火annealing激活能activation energy等温退火isothermal annealing激光退火laser annealing应力感生缺陷stress-induced defect择优取向preferred orientation制版工艺mask-making technology图形畸变pattern distortion初缩first minification精缩final minification母版master mask铬版chromium plate干版dry plate乳胶版emulsion plate透明版see-through plate高分辨率版high resolution plate, HRP超微粒干版plate for ultra-microminiaturization 掩模mask掩模对准mask alignment对准精度alignment precision光刻胶photoresist又称“光致抗蚀剂”。

负性光刻胶negative photoresist正性光刻胶positive photoresist无机光刻胶inorganic resist多层光刻胶multilevel resist电子束光刻胶electron beam resistX射线光刻胶X-ray resist刷洗scrubbing甩胶spinning涂胶photoresist coating后烘postbaking光刻photolithographyX射线光刻X-ray lithography电子束光刻electron beam lithography离子束光刻ion beam lithography深紫外光刻deep-UV lithography光刻机mask aligner投影光刻机projection mask aligner曝光exposure接触式曝光法contact exposure method接近式曝光法proximity exposure method光学投影曝光法optical projection exposure method 电子束曝光系统electron beam exposure system分步重复系统step-and-repeat system显影development线宽linewidth去胶stripping of photoresist氧化去胶removing of photoresist by oxidation等离子[体]去胶removing of photoresist by plasma 刻蚀etching干法刻蚀dry etching反应离子刻蚀reactive ion etching, RIE各向同性刻蚀isotropic etching各向异性刻蚀anisotropic etching反应溅射刻蚀reactive sputter etching离子铣ion beam milling又称“离子磨削”。

半导体行业专业术语中英文对译

半导体行业专业术语中英文对译

半导体行业专业术语中英文翻译离子注入机 ion implanterLSS理论 Lindhand Scharff and Schiott theory,又称“林汉德-斯卡夫-斯高特理论”。

沟道效应 channeling effect射程分布 range distribution深度分布 depth distribution投影射程 projected range阻止距离 stopping distance阻止本领 stopping power标准阻止截面 standard stopping cross section退火 annealing激活能 activation energy等温退火 isothermal annealing激光退火 laser annealing应力感生缺陷 stress-induced defect择优取向 preferred orientation制版工艺 mask-making technology图形畸变 pattern distortion初缩 first minification精缩 final minification母版 master mask铬版 chromium plate干版 dry plate乳胶版 emulsion plate透明版 see-through plate高分辨率版 high resolution plate, HRP超微粒干版 plate for ultra-microminiaturization 掩模 mask掩模对准 mask alignment对准精度 alignment precision光刻胶 photoresist,又称“光致抗蚀剂”。

负性光刻胶 negative photoresist正性光刻胶 positive photoresist无机光刻胶 inorganic resist多层光刻胶 multilevel resist电子束光刻胶 electron beam resistX射线光刻胶 X-ray resist刷洗 scrubbing甩胶 spinning涂胶 photoresist coating后烘 postbaking光刻 photolithographyX射线光刻 X-ray lithography电子束光刻 electron beam lithography离子束光刻 ion beam lithography深紫外光刻 deep-UV lithography光刻机 mask aligner投影光刻机 projection mask aligner曝光 exposure接触式曝光法 contact exposure method接近式曝光法 proximity exposure method光学投影曝光法 optical projection exposure method 电子束曝光系统 electron beam exposure system分步重复系统 step-and-repeat system显影 development线宽 linewidth去胶 stripping of photoresist氧化去胶 removing of photoresist by oxidation等离子[体]去胶 removing of photoresist by plasma 刻蚀 etching干法刻蚀 dry etching反应离子刻蚀 reactive ion etching, RIE各向同性刻蚀 isotropic etching各向异性刻蚀 anisotropic etching反应溅射刻蚀 reactive sputter etching离子铣 ion beam milling,又称“离子磨削”。

半导体物理专业术语英汉对照50词.doc

半导体物理专业术语英汉对照50词.doc

1 acceptor 受主2 allowed energy band允带3 binary semiconductor 二元半导体4 charge neutrality condition 电中性条件5 compensated semiconductor 补偿半导体6 conduction band and valence band 导带和价带7 effective mass 有效质量8 density of states function状态密度函数9 diamond structure金刚石结构10 diffusion coefficient扩散系数11 donor施主12 drift velocity 漂移速度13 electron and hole电子和空穴14 elemental semiconductor 元素半导体15 equilibrium carrier concentration热平衡载流子浓度16 expitaxy外延17 extrinsic semiconductor非本征半导体18 Fermi energy (or level)费米能级19 Forbidden energy band禁带20 indirect bandbap semiconductor非直接带隙半导体21 intrinsic semiconductor本征半导体22 majority carrier多数载流子23 MBE分子束外延24 Miller indices密勒指数25 minority carrier少数载流子26 mobility迁移率27 MOCVD金属有机气相沉积28 nondegenerate semiconductor非简并半导体29 n-type material n型材料30 Pauli exclusion principle 泡利不相容原理31 phonon声子32 photon光子33 primitive cell34 quantum state量子态35 quaternary semiconductor四元半导体36 scattering散射37 substrate衬底38 thermal motion热运动39 unit cell单胞40 wave-particle duality波粒二相性41 continuity equations连续性方程42 diffusion length扩散长度43 diffusion coefficient扩散系数44 Einstein relationship爱因斯坦关系45 p-n junction p-n结46 built-in voltage 内建电势差47 carrier lifetime 载流子寿命48 space charge region 空间电荷区49 depletion width 耗尽宽度50 saturation drift velocity 饱和迁移速度。

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离子注入机 ion implanterLSS理论 Lindhand Scharff and Schiott theory 又称“林汉德-斯卡夫-斯高特理论”。

沟道效应 channeling effect射程分布 range distribution深度分布 depth distribution投影射程 projected range阻止距离 stopping distance阻止本领 stopping power标准阻止截面 standard stopping cross section退火 annealing激活能 activation energy等温退火 isothermal annealing激光退火 laser annealing应力感生缺陷 stress-induced defect择优取向 preferred orientation制版工艺 mask-making technology图形畸变 pattern distortion初缩 first minification精缩 final minification母版 master mask铬版 chromium plate干版 dry plate乳胶版 emulsion plate透明版 see-through plate高分辨率版 high resolution plate, HRP超微粒干版 plate for ultra-microminiaturization 掩模 mask掩模对准 mask alignment对准精度 alignment precision光刻胶 photoresist又称“光致抗蚀剂”。

负性光刻胶 negative photoresist正性光刻胶 positive photoresist无机光刻胶 inorganic resist多层光刻胶 multilevel resist电子束光刻胶 electron beam resistX射线光刻胶 X-ray resist刷洗 scrubbing甩胶 spinning涂胶 photoresist coating后烘 postbaking光刻 photolithographyX射线光刻 X-ray lithography电子束光刻 electron beam lithography 离子束光刻 ion beam lithography深紫外光刻 deep-UV lithography光刻机 mask aligner投影光刻机 projection mask aligner 曝光 exposure接触式曝光法 contact exposure method接近式曝光法 proximity exposure method光学投影曝光法 optical projection exposure method 电子束曝光系统 electron beam exposure system分步重复系统 step-and-repeat system显影 development线宽 linewidth去胶 stripping of photoresist氧化去胶 removing of photoresist by oxidation等离子[体]去胶 removing of photoresist by plasma 刻蚀 etching干法刻蚀 dry etching反应离子刻蚀 reactive ion etching, RIE各向同性刻蚀 isotropic etching各向异性刻蚀 anisotropic etching反应溅射刻蚀 reactive sputter etching离子铣 ion beam milling又称“离子磨削”。

等离子[体]刻蚀 plasma etching钻蚀 undercutting剥离技术 lift-off technology又称“浮脱工艺”。

终点监测 endpoint monitoring金属化 metallization互连 interconnection多层金属化 multilevel metallization电迁徙 electromigration回流 reflow磷硅玻璃 phosphorosilicate glass硼磷硅玻璃 boron-phosphorosilicate glass钝化工艺 passivation technology多层介质钝化 multilayer dielectric passivation 划片 scribing电子束切片 electron beam slicing烧结 sintering印压 indentation热压焊 thermocompression bonding 热超声焊 thermosonic bonding冷焊 cold welding点焊 spot welding球焊 ball bonding楔焊 wedge bonding内引线焊接 inner lead bonding外引线焊接 outer lead bonding梁式引线 beam lead装架工艺 mounting technology附着 adhesion封装 packaging金属封装 metallic packaging陶瓷封装 ceramic packaging扁平封装 flat packaging塑封 plastic package玻璃封装 glass packaging微封装 micropackaging又称“微组装”。

管壳 package管芯 die引线键合 lead bonding引线框式键合 lead frame bonding带式自动键合 tape automated bonding, TAB激光键合 laser bonding超声键合 ultrasonic bonding红外键合 infrared bonding微电子辞典Abrupt junction 突变结 Accelerated testing 加速实验Acceptor 受主 Acceptor atom 受主原子Accumulation 积累、堆积 Accumulating contact 积累接触Accumulation region 积累区 Accumulation layer 积累层Active region 有源区 Active component 有源元Active device 有源器件 Activation 激活Activation energy 激活能 Active region 有源(放大)区Admittance 导纳 Allowed band 允带Alloy-junction device合金结器件 Aluminum(Aluminium) 铝Aluminum – oxide 铝氧化物 Aluminum passivation 铝钝化Ambipolar 双极的 Ambient temperature 环境温度Amorphous 无定形的,非晶体的 Amplifier 功放扩音器放大器Analogue(Analog) comparator 模拟比较器 Angstrom 埃Anneal 退火 Anisotropic 各向异性的Anode 阳极 Arsenic (AS) 砷Auger 俄歇 Auger process 俄歇过程Avalanche 雪崩 Avalanche breakdown 雪崩击穿Avalanche excitation雪崩激发Background carrier 本底载流子 Background doping 本底掺杂Backward 反向 Backward bias 反向偏置Ballasting resistor 整流电阻 Ball bond 球形键合Band 能带 Band gap 能带间隙Barrier 势垒 Barrier layer 势垒层Barrier width 势垒宽度 Base 基极Base contact 基区接触 Base stretching 基区扩展效应Base transit time 基区渡越时间 Base transport efficiency基区输运系数Base-width modulation基区宽度调制 Basis vector 基矢Bias 偏置 Bilateral switch 双向开关Binary code 二进制代码Binary compound semiconductor 二元化合物半导体Bipolar 双极性的 Bipolar Junction Transistor (BJT)双极晶体管Bloch 布洛赫 Blocking band 阻挡能带Blocking contact 阻挡接触 Body - centered 体心立方Body-centred cubic structure 体立心结构 Boltzmann 波尔兹曼Bond 键、键合 Bonding electron 价电子Bonding pad 键合点 Bootstrap circuit 自举电路Bootstrapped emitter follower 自举射极跟随器Boron 硼Borosilicate glass 硼硅玻璃 Boundary condition 边界条件Bound electron 束缚电子 Breadboard 模拟板、实验板Break down 击穿 Break over 转折Brillouin 布里渊 Brillouin zone 布里渊区Built-in 内建的 Build-in electric field 内建电场Bulk 体/体内 Bulk absorption 体吸收Bulk generation 体产生 Bulk recombination 体复合Burn - in 老化 Burn out 烧毁Buried channel 埋沟 Buried diffusion region 隐埋扩散区Can 外壳 Capacitance 电容Capture cross section 俘获截面 Capture carrier 俘获载流子Carrier 载流子、载波 Carry bit 进位位Carry-in bit 进位输入 Carry-out bit 进位输出Cascade 级联 Case 管壳Cathode 阴极 Center 中心Ceramic 陶瓷(的) Channel 沟道Channel breakdown 沟道击穿 Channel current 沟道电流Channel doping 沟道掺杂 Channel shortening 沟道缩短Channel width 沟道宽度 Characteristic impedance 特征阻抗Charge 电荷、充电 Charge-compensation effects 电荷补偿效应Charge conservation 电荷守恒 Charge neutrality condition 电中性条件Charge drive/exchange/sharing/transfer/storage 电荷驱动/交换/共享/转移/存储Chemmical etching 化学腐蚀法 Chemically-Polish 化学抛光Chemmically-Mechanically Polish (CMP) 化学机械抛光 Chip 芯片Chip yield 芯片成品率 Clamped 箝位Clamping diode 箝位二极管 Cleavage plane 解理面Clock rate 时钟频率 Clock generator 时钟发生器Clock flip-flop 时钟触发器 Close-packed structure 密堆积结构Close-loop gain 闭环增益 Collector 集电极Collision 碰撞 Compensated OP-AMP 补偿运放Common-base/collector/emitter connection 共基极/集电极/发射极连接Common-gate/drain/source connection 共栅/漏/源连接Common-mode gain 共模增益 Common-mode input 共模输入Common-mode rejection ratio (CMRR) 共模抑制比Compatibility 兼容性 Compensation 补偿Compensated impurities 补偿杂质 Compensated semiconductor 补偿半导体Complementary Darlington circuit 互补达林顿电路Complementary Metal-Oxide-Semiconductor Field-Effect-Transistor(CMOS)互补金属氧化物半导体场效应晶体管Complementary error function 余误差函数Computer-aided design (CAD)/test(CAT)/manufacture(CAM) 计算机辅助设计/ 测试 /制造Compound Semiconductor 化合物半导体 Conductance 电导Conduction band (edge) 导带(底) Conduction level/state 导带态Conductor 导体 Conductivity 电导率Configuration 组态 Conlomb 库仑Conpled Configuration Devices 结构组态 Constants 物理常数Constant energy surface 等能面 Constant-source diffusion恒定源扩散Contact 接触 Contamination 治污Continuity equation 连续性方程 Contact hole 接触孔Contact potential 接触电势 Continuity condition 连续性条件Contra doping 反掺杂 Controlled 受控的Converter 转换器 Conveyer 传输器Copper interconnection system 铜互连系统Couping 耦合Covalent 共阶的 Crossover 跨交Critical 临界的 Crossunder 穿交Crucible坩埚 Crystal defect/face/orientation/lattice 晶体缺陷/晶面/晶向/晶格Current density 电流密度 Curvature 曲率Cut off 截止 Current drift/dirve/sharing 电流漂移/驱动/共享Current Sense 电流取样 Curvature 弯曲Custom integrated circuit 定制集成电路 Cylindrical 柱面的Czochralshicrystal 直立单晶Czochralski technique 切克劳斯基技术(Cz法直拉晶体J)Dangling bonds 悬挂键 Dark current 暗电流Dead time 空载时间 Debye length 德拜长度德布洛意 Decderate 减速Decibel (dB) 分贝 Decode 译码Deep acceptor level 深受主能级 Deep donor level 深施主能级Deep impurity level 深度杂质能级 Deep trap 深陷阱Defeat 缺陷Degenerate semiconductor 简并半导体 Degeneracy 简并度Degradation 退化 Degree Celsius(centigrade) /Kelvin 摄氏/开氏温度Delay 延迟 Density 密度Density of states 态密度 Depletion 耗尽Depletion approximation 耗尽近似 Depletion contact 耗尽接触Depletion depth 耗尽深度 Depletion effect 耗尽效应Depletion layer 耗尽层 Depletion MOS 耗尽MOSDepletion region 耗尽区 Deposited film 淀积薄膜Deposition process 淀积工艺 Design rules 设计规则Die 芯片(复数dice) Diode 二极管Dielectric 介电的 Dielectric isolation 介质隔离Difference-mode input 差模输入 Differential amplifier 差分放大器Differential capacitance 微分电容 Diffused junction 扩散结Diffusion 扩散 Diffusion coefficient 扩散系数Diffusion constant 扩散常数 Diffusivity 扩散率Diffusion capacitance/barrier/current/furnace 扩散电容/势垒/电流/炉Digital circuit 数字电路 Dipole domain 偶极畴Dipole layer 偶极层 Direct-coupling 直接耦合Direct-gap semiconductor 直接带隙半导体 Direct transition 直接跃迁Discharge 放电 Discrete component 分立元件Dissipation 耗散 Distribution 分布Distributed capacitance 分布电容 Distributed model 分布模型Displacement 位移 Dislocation 位错Domain 畴 Donor 施主Donor exhaustion 施主耗尽 Dopant 掺杂剂Doped semiconductor 掺杂半导体 Doping concentration 掺杂浓度Double-diffusive MOS(DMOS)双扩散MOS.Drift 漂移 Drift field 漂移电场Drift mobility 迁移率 Dry etching 干法腐蚀Dry/wet oxidation 干/湿法氧化 Dose 剂量Duty cycle 工作周期 Dual-in-line package (DIP)双列直插式封装Dynamics 动态 Dynamic characteristics 动态属性Dynamic impedance 动态阻抗Early effect 厄利效应 Early failure 早期失效Effective mass 有效质量 Einstein relation(ship) 爱因斯坦关系Electric Erase Programmable Read Only Memory(E2PROM) 一次性电可擦除只读存储器Electrode 电极 Electrominggratim 电迁移Electron affinity 电子亲和势 Electronic -grade 电子能Electron-beam photo-resist exposure 光致抗蚀剂的电子束曝光Electron gas 电子气 Electron-grade water 电子级纯水Electron trapping center 电子俘获中心 Electron Volt (eV) 电子伏Electrostatic 静电的 Element 元素/元件/配件Elemental semiconductor 元素半导体 Ellipse 椭圆Ellipsoid 椭球 Emitter 发射极Emitter-coupled logic 发射极耦合逻辑Emitter-coupled pair 发射极耦合对Emitter follower 射随器 Empty band 空带Emitter crowding effect 发射极集边(拥挤)效应Endurance test =life test 寿命测试 Energy state 能态Energy momentum diagram 能量-动量(E-K)图 Enhancement mode 增强型模式Enhancement MOS 增强性MOS Entefic (低)共溶的Environmental test 环境测试 Epitaxial 外延的Epitaxial layer 外延层 Epitaxial slice 外延片Expitaxy 外延 Equivalent curcuit 等效电路Equilibrium majority /minority carriers 平衡多数/少数载流子Erasable Programmable ROM (EPROM)可搽取(编程)存储器Error function complement 余误差函数Etch 刻蚀 Etchant 刻蚀剂Etching mask 抗蚀剂掩模 Excess carrier 过剩载流子Excitation energy 激发能 Excited state 激发态Exciton 激子 Extrapolation 外推法Extrinsic 非本征的 Extrinsic semiconductor 杂质半导体Face - centered 面心立方 Fall time 下降时间Fan-in 扇入 Fan-out 扇出Fast recovery 快恢复 Fast surface states 快界面态Feedback 反馈 Fermi level 费米能级Fermi-Dirac Distribution 费米-狄拉克分布 Femi potential 费米势Fick equation 菲克方程(扩散) Field effect transistor 场效应晶体管Field oxide 场氧化层 Filled band 满带Film 薄膜 Flash memory 闪烁存储器Flat band 平带 Flat pack 扁平封装Flicker noise 闪烁(变)噪声 Flip-flop toggle 触发器翻转Floating gate 浮栅 Fluoride etch 氟化氢刻蚀Forbidden band 禁带 Forward bias 正向偏置Forward blocking /conducting正向阻断/导通Frequency deviation noise频率漂移噪声Frequency response 频率响应 Function 函数Gain 增益 Gallium-Arsenide(GaAs) 砷化钾Gamy ray r 射线 Gate 门、栅、控制极Gate oxide 栅氧化层 Gauss(ian)高斯Gaussian distribution profile 高斯掺杂分布Generation-recombination 产生-复合Geometries 几何尺寸 Germanium(Ge) 锗Graded 缓变的 Graded (gradual) channel 缓变沟道Graded junction 缓变结 Grain 晶粒Gradient 梯度 Grown junction 生长结Guard ring 保护环 Gummel-Poom model 葛谋-潘模型Gunn - effect 狄氏效应Hardened device 辐射加固器件 Heat of formation 形成热Heat sink 散热器、热沉 Heavy/light hole band 重/轻空穴带Heavy saturation 重掺杂 Hell - effect 霍尔效应Heterojunction 异质结 Heterojunction structure 异质结结构Heterojunction Bipolar Transistor(HBT)异质结双极型晶体High field property 高场特性High-performance MOS.( H-MOS)高性能MOS. Hormalized 归一化Horizontal epitaxial reactor 卧式外延反应器 Hot carrior 热载流子Hybrid integration 混合集成Image - force 镜象力 Impact ionization 碰撞电离Impedance 阻抗 Imperfect structure 不完整结构Implantation dose 注入剂量 Implanted ion 注入离子Impurity 杂质 Impurity scattering 杂志散射Incremental resistance 电阻增量(微分电阻)In-contact mask 接触式掩模Indium tin oxide (ITO) 铟锡氧化物 Induced channel 感应沟道Infrared 红外的 Injection 注入Input offset voltage 输入失调电压 Insulator 绝缘体Insulated Gate FET(IGFET)绝缘栅FET Integrated injection logic集成注入逻辑Integration 集成、积分 Interconnection 互连Interconnection time delay 互连延时 Interdigitated structure 交互式结构Interface 界面 Interference 干涉International system of unions国际单位制 Internally scattering 谷间散射Interpolation 内插法 Intrinsic 本征的Intrinsic semiconductor 本征半导体 Inverse operation 反向工作Inversion 反型 Inverter 倒相器Ion 离子 Ion beam 离子束Ion etching 离子刻蚀 Ion implantation 离子注入Ionization 电离 Ionization energy 电离能Irradiation 辐照 Isolation land 隔离岛Isotropic 各向同性Junction FET(JFET) 结型场效应管 Junction isolation 结隔离Junction spacing 结间距 Junction side-wall 结侧壁Latch up 闭锁 Lateral 横向的Lattice 晶格 Layout 版图Lattice binding/cell/constant/defect/distortion 晶格结合力/晶胞/晶格/晶格常熟/晶格缺陷/晶格畸变Leakage current (泄)漏电流 Level shifting 电平移动Life time 寿命 linearity 线性度Linked bond 共价键 Liquid Nitrogen 液氮Liquid-phase epitaxial growth technique 液相外延生长技术Lithography 光刻 Light Emitting Diode(LED) 发光二极管Load line or Variable 负载线 Locating and Wiring 布局布线Longitudinal 纵向的 Logic swing 逻辑摆幅Lorentz 洛沦兹 Lumped model 集总模型Majority carrier 多数载流子 Mask 掩膜板,光刻板Mask level 掩模序号 Mask set 掩模组Mass - action law质量守恒定律 Master-slave D flip-flop主从D触发器Matching 匹配 Maxwell 麦克斯韦Mean free path 平均自由程 Meandered emitter junction梳状发射极结Mean time before failure (MTBF) 平均工作时间Megeto - resistance 磁阻 Mesa 台面MESFET-Metal Semiconductor金属半导体FETMetallization 金属化 Microelectronic technique 微电子技术Microelectronics 微电子学 Millen indices 密勒指数Minority carrier 少数载流子 Misfit 失配Mismatching 失配 Mobile ions 可动离子Mobility 迁移率 Module 模块Modulate 调制 Molecular crystal分子晶体Monolithic IC 单片IC MOSFET金属氧化物半导体场效应晶体管Mos. Transistor(MOST )MOS. 晶体管 Multiplication 倍增Modulator 调制 Multi-chip IC 多芯片ICMulti-chip module(MCM) 多芯片模块 Multiplication coefficient倍增因子Naked chip 未封装的芯片(裸片) Negative feedback 负反馈Negative resistance 负阻 Nesting 套刻Negative-temperature-coefficient 负温度系数 Noise margin 噪声容限Nonequilibrium 非平衡 Nonrolatile 非挥发(易失)性Normally off/on 常闭/开 Numerical analysis 数值分析Occupied band 满带 Officienay 功率Offset 偏移、失调 On standby 待命状态Ohmic contact 欧姆接触 Open circuit 开路Operating point 工作点 Operating bias 工作偏置Operational amplifier (OPAMP)运算放大器Optical photon =photon 光子 Optical quenching光猝灭Optical transition 光跃迁 Optical-coupled isolator光耦合隔离器Organic semiconductor有机半导体 Orientation 晶向、定向Outline 外形 Out-of-contact mask非接触式掩模Output characteristic 输出特性 Output voltage swing 输出电压摆幅Overcompensation 过补偿 Over-current protection 过流保护Over shoot 过冲 Over-voltage protection 过压保护Overlap 交迭 Overload 过载Oscillator 振荡器 Oxide 氧化物Oxidation 氧化 Oxide passivation 氧化层钝化Package 封装 Pad 压焊点Parameter 参数 Parasitic effect 寄生效应Parasitic oscillation 寄生振荡 Passination 钝化Passive component 无源元件 Passive device 无源器件Passive surface 钝化界面 Parasitic transistor 寄生晶体管Peak-point voltage 峰点电压 Peak voltage 峰值电压Permanent-storage circuit 永久存储电路 Period 周期Periodic table 周期表 Permeable - base 可渗透基区Phase-lock loop 锁相环 Phase drift 相移Phonon spectra 声子谱Photo conduction 光电导 Photo diode 光电二极管Photoelectric cell 光电池Photoelectric effect 光电效应Photoenic devices 光子器件 Photolithographic process 光刻工艺(photo) resist (光敏)抗腐蚀剂 Pin 管脚Pinch off 夹断 Pinning of Fermi level 费米能级的钉扎(效应)Planar process 平面工艺 Planar transistor 平面晶体管Plasma 等离子体 Plezoelectric effect 压电效应Poisson equation 泊松方程 Point contact 点接触Polarity 极性 Polycrystal 多晶Polymer semiconductor聚合物半导体 Poly-silicon 多晶硅Potential (电)势 Potential barrier 势垒Potential well 势阱 Power dissipation 功耗Power transistor 功率晶体管 Preamplifier 前置放大器Primary flat 主平面 Principal axes 主轴Print-circuit board(PCB) 印制电路板 Probability 几率Probe 探针 Process 工艺Propagation delay 传输延时 Pseudopotential method 膺势发Punch through 穿通 Pulse triggering/modulating 脉冲触发/调制Pulse Widen Modulator(PWM) 脉冲宽度调制Punchthrough 穿通 Push-pull stage 推挽级Quality factor 品质因子 Quantization 量子化Quantum 量子 Quantum efficiency量子效应Quantum mechanics 量子力学 Quasi – Fermi-level准费米能级Quartz 石英Radiation conductivity 辐射电导率 Radiation damage 辐射损伤Radiation flux density 辐射通量密度 Radiation hardening 辐射加固Radiation protection 辐射保护 Radiative - recombination辐照复合Radioactive 放射性 Reach through 穿通Reactive sputtering source 反应溅射源 Read diode 里德二极管Recombination 复合 Recovery diode 恢复二极管Reciprocal lattice 倒核子 Recovery time 恢复时间Rectifier 整流器(管) Rectifying contact 整流接触Reference 基准点基准参考点 Refractive index 折射率Register 寄存器 Registration 对准Regulate 控制调整 Relaxation lifetime 驰豫时间Reliability 可靠性 Resonance 谐振Resistance 电阻 Resistor 电阻器Resistivity 电阻率 Regulator 稳压管(器)Relaxation 驰豫 Resonant frequency共射频率Response time 响应时间 Reverse 反向的Reverse bias 反向偏置Sampling circuit 取样电路 Sapphire 蓝宝石(Al2O3)Satellite valley 卫星谷 Saturated current range电流饱和区Saturation region 饱和区 Saturation 饱和的Scaled down 按比例缩小 Scattering 散射Schockley diode 肖克莱二极管 Schottky 肖特基Schottky barrier 肖特基势垒 Schottky contact 肖特基接触Schrodingen 薛定厄 Scribing grid 划片格Secondary flat 次平面Seed crystal 籽晶 Segregation 分凝Selectivity 选择性 Self aligned 自对准的Self diffusion 自扩散 Semiconductor 半导体Semiconductor-controlled rectifier 可控硅 Sendsitivity 灵敏度Serial 串行/串联 Series inductance 串联电感Settle time 建立时间 Sheet resistance 薄层电阻Shield 屏蔽 Short circuit 短路Shot noise 散粒噪声 Shunt 分流Sidewall capacitance 边墙电容 Signal 信号Silica glass 石英玻璃 Silicon 硅Silicon carbide 碳化硅 Silicon dioxide (SiO2) 二氧化硅Silicon Nitride(Si3N4) 氮化硅 Silicon On Insulator 绝缘硅Siliver whiskers 银须 Simple cubic 简立方Single crystal 单晶 Sink 沉Skin effect 趋肤效应 Snap time 急变时间Sneak path 潜行通路 Sulethreshold 亚阈的Solar battery/cell 太阳能电池 Solid circuit 固体电路Solid Solubility 固溶度 Sonband 子带Source 源极 Source follower 源随器Space charge 空间电荷 Specific heat(PT) 热Speed-power product 速度功耗乘积 Spherical 球面的Spin 自旋 Split 分裂Spontaneous emission 自发发射 Spreading resistance扩展电阻Sputter 溅射 Stacking fault 层错Static characteristic 静态特性 Stimulated emission 受激发射Stimulated recombination 受激复合 Storage time 存储时间Stress 应力 Straggle 偏差Sublimation 升华 Substrate 衬底Substitutional 替位式的 Superlattice 超晶格Supply 电源 Surface 表面Surge capacity 浪涌能力 Subscript 下标Switching time 开关时间 Switch 开关Tailing 扩展 Terminal 终端Tensor 张量 Tensorial 张量的Thermal activation 热激发 Thermal conductivity 热导率Thermal equilibrium 热平衡 Thermal Oxidation 热氧化Thermal resistance 热阻 Thermal sink 热沉Thermal velocity 热运动 Thermoelectricpovoer 温差电动势率Thick-film technique 厚膜技术 Thin-film hybrid IC薄膜混合集成电路Thin-Film Transistor(TFT) 薄膜晶体 Threshlod 阈值Thyistor 晶闸管 Transconductance 跨导Transfer characteristic 转移特性 Transfer electron 转移电子Transfer function 传输函数 Transient 瞬态的Transistor aging(stress) 晶体管老化 Transit time 渡越时间Transition 跃迁 Transition-metal silica 过度金属硅化物Transition probability 跃迁几率 Transition region 过渡区Transport 输运 Transverse 横向的Trap 陷阱 Trapping 俘获Trapped charge 陷阱电荷 Triangle generator 三角波发生器Triboelectricity 摩擦电 Trigger 触发Trim 调配调整 Triple diffusion 三重扩散Truth table 真值表 Tolerahce 容差Tunnel(ing) 隧道(穿) Tunnel current 隧道电流Turn over 转折 Turn - off time 关断时间Ultraviolet 紫外的 Unijunction 单结的Unipolar 单极的 Unit cell 原(元)胞Unity-gain frequency 单位增益频率 Unilateral-switch单向开关Vacancy 空位 Vacuum 真空Valence(value) band 价带 Value band edge 价带顶Valence bond 价键 Vapour phase 汽相Varactor 变容管 Varistor 变阻器Vibration 振动 Voltage 电压Wafer 晶片 Wave equation 波动方程Wave guide 波导 Wave number 波数Wave-particle duality 波粒二相性 Wear-out 烧毁Wire routing 布线 Work function 功函数Worst-case device 最坏情况器件Yield 成品率Zener breakdown 齐纳击穿Zone melting 区熔法。

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