C-T-RTHB
冀教版七年级上册英语Unit 2 Unit 2 单元主题阅读与写作课件 写作一课一法
【点拨】本题采用词语辨析法。句意：看！那边那位女士 是我们的老师。她教我们英语。根据“ourteacher”可判 断她教“我们”英语，she是主语，teach是谓语动词， 故选择we的宾格形式us。故选A。
课堂练习
10.—It’scoldtoday. ______B___yourjacket. —OK, Mum. A. WearB. Puton C. WearingD. Puttingon
4.—Isthis______B___dictionary? [天门] —Yes, it’smine. A. myB. your C. hisD. her
【点拨】本题采用词语辨析法。my我的；your你的；his 他的；her她的。根据答语“Yes, it’smine.”可知，问句是 询问“这是你的字典吗？”。故选B。
pink. (dress).
Pledarsesesleosok__________29thispicture. at Thisismymother.
__________30 (she) Hfaevrouritecolourisblue.
课堂练习
Wearenotthesame.
Todaysheiswearinghersari.
课堂练习
3.—Greenismyfavouritecolour. _______C__? —Idon’tlikegreen. Myfavouritecolourisred. A. WhataretheyB. Whatisit C. HowaboutyouD. Howmanycolours
课堂练习
He/Shelooksnicein...
话题与写作
Lenti-Pac HIVqRT-PCR Titration Kits 产品说明书
1.IDENTIFICATION OF THE SUBSTRANCE/PREPARATION AND THECOMPANY/UNDERTAKINGPOSITION/INFORMATION ON INGREDIENTS3.HAZARDS IDENTIFICATIONMaterial Safety Data SheetRevision Date:February 23,2018Product code LT005,LT006Product name Lenti-Pac™HIV qRT-PCR Titration KitsContact manufacturer GeneCopoeia,Inc.9620Medical Center Drive,Suite 101Rockville,MD 20850USAPhone:301-762-0888Toll free:1-866-360-9531Fax:301-762-3888Chemical Name CAS-No Weight %Phenol108-95-230-60Guanidine isothiocyanate 593-84-015-40Ammonium thiocyanate 1762-95-47-13Glycerol56-81-540-70Contact with acids or bleach liberates toxic gases.DO NOT ADD acids or bleach to any liquid wastes containing this product.We recommend handling all chemicals with caution.GHS –Classification Signal Word DANGERHealth HazardsAcute oral toxicity Category 4Acute dermal toxicityCategory 4Acute Inhalation Toxicity -Vapors Category 4Skin corrosion/irritationCategory 1B Serious eye damage/eye irritationCategory 1Specific target organ systemic toxicity (single exposure)Category 3Specific target organ systemic toxicity(repeated exposure)Category3Mutagenicity Mutagenic category2Physical hazardsNot hazardousHazard StatementsH314-Causes severe skin burns and eye damageH341-Suspected of causing genetic defectsH373-May cause damage to organs through prolonged or repeated exposureH412-Harmful to aquatic life with long lasting effectsH302-Harmful if swallowedH312-Harmful in contact with skinH332-Harmful if inhaledH335-May cause respiratory irritationPrecautionary StatementsP301+P312-IF SWALLOWED:Call a POISON CENTER or doctor/physician if you feel unwellP304+P340-IF INHALED:Remove victim to fresh air and keep at rest in a position comfortable for breathingP301+P330+P331-IF SWALLOWED:rinse mouth.Do NOT induce vomitingP303+P361+P353-IF ON SKIN(or hair):Remove/Take off immediately all contaminated clothing.Rinse skin withwater/showerP305+P351+P338-IF IN EYES:Rinse cautiously with water for several minutes.Remove contact lenses,if present and easy to do.Continue rinsingP310-Immediately call a POISON CENTER or doctor/physicianP308+P313-IF exposed or concerned:Get medical advice/attentionP273-Avoid release to the environmentP280-Wear protective gloves/protective clothing/eye protection/face protectionPrinciple Routes of ExposurePotential Health EffectsEyes Causes burns.Risk of serious damage to eyes.Corrosive to the eyesand may cause severe damage including blindness.Skin Causes burns.Possible risk of irreversible effects.Harmful in contactwith skin.Irritating to skin and mucous membranes.Inhalation Harmful by inhalation.Ingestion Harmful if swallowed.Ingestion causes burns of the upper digestive andrespiratory tracts.Ingestion may cause gastrointestinal irritation,nausea,vomiting and diarrhea.Specific effectsCarcinogenic effects Phenol has been classified by the International Agency for Research onCancer(IARC)as not classifiable as to carcinogenicity to humans(Group3).Mutagenic effects Not ApplicableReproductive toxicity Not ApplicableSensitization Not ApplicableTarget Organ Effects SkinLungsLiverSpleenKidney4.FIRST AID MEASURES5.FIRE-FIGHTING MEASURES6.ACCIDENTAL RELEASE MEASURES7.HANDLING AND STORAGEHMISHealth 3*Chronic HazardFlammability 1ReactivitySkin contact Wash off immediately with soap and plenty of water while removing all contaminated clothes and shoes.Call a physician immediately.Eye contactIF IN EYES:Rinse cautiously with water for several minutes.Remove contact lenses,if present and easy to do.Continue rinsing.Rinseimmediately with plenty of water,also under the eyelids,for at least 15minutes.Call a physician immediately.Ingestion Call a physician or poison control center immediately.Rinse mouth.Do not induce vomiting without medical advice.Never give anything by mouth to an unconscious person.InhalationRemove to fresh air.Call a physician or poison control center immediately.Notes to physicianTreat symptomatically.Suitable extinguishing media Dry chemical.Carbon dioxide (CO2).Water spray.Foam.Special protective equipment for firefightersWear self-contained breathing apparatus and protective suit.Australia HazChem Code2XPersonal precautionsELIMINATE all ignition sources (no smoking,flares,sparks or flames in immediate area).Use personal protection equipment.Avoid contact with skin,eyes or clothing.Ensure adequate ventilation.Keep people away from and upwind of spill/leak.Evacuate personnel to safe areas.Methods for cleaning upPrevent product from entering drains.Soak up with inert absorbentmaterial.Neutralize spill with slaked lime,sodium bicarbonate or crushed limestone.Collect powdered material and deposit in sealed containers and dispose of phenol as hazardous waste.Isolate area and deny entry.Environmental precautionsPrevent further leakage or spillage if safe to do so.Prevent product from entering drains.Do not allow material to contaminate ground water system.See Section 12for more information8.EXPOSURE CONTROLS /PERSONAL PROTECTIONHandling Always wear recommended Personal Protective Equipment.Avoid contact with skin,eyes or clothing.Remove all sources of ignition.StorageKeep containers tightly closed in a cool,well-ventilated place.Keep away from heat,sparks,flame and other sources of ignition (i.e.,pilot lights,electric motors and static electricity).Protect from sunlight.Exposure limitsChemical name OSHA PELOSHA PEL (Ceiling)ACGIH OEL (TWA)ACGIH OEL (STEL)Phenol5ppm 19mg/m 3None 5ppm None Guanidine isothiocyanate None None None None Ammonium thiocyanate 5mg/m 3None None None Glycerol15mg/m 3None10mg/m 3NoneEngineering measures Use in a chemical fume hoodPersonal protective equipmentPersonal Protective Equipment requirements are dependent on the user institution's risk assessment and are specific to the risk assessment for each laboratory where this material may be used.Respiratory protection In case of insufficient ventilation wear suitable respiratory equipment RespiratorUp to 50ppmRecommendations,National Institute of Occupational Safety and Health,U.S.(APF =10)Any air-purifying half-mask respirator with organic vaporcartridge(s)in combination with an N95,R95,or P95filter.The following filters may also be used:N99,R99,P99,N100,R100,P100.(APF =10)Any supplied-air respirator Up to 125ppm:(APF =25)Any supplied-air respirator operated in a continuous-flow mode.(APF =25)Any powered air-purifying respirator with an organic vapor cartridge in combination with a high-efficiency particulate filter.Up to 250ppm:(APF =50)Any air-purifying full-facepiece respirator equipped with organic vapor cartridge(s)in combination with an N100,R100,or P100filter.(APF =50)Any air-purifying,full-facepiece respirator (gas mask)with a chin-style,front-or back-mounted organic vapor canister having an N100,R100,or P100filter.(APF =50)Any powered,air-purifying respirator with a tight-fitting facepiece and organic vapor cartridge(s)in combination with a high-efficiency particulate filter.(APF =50)Any self-contained breathing apparatus with a full facepiece.(APF =50)Any supplied-air respirator with a full facepiece.Emergency or planned entry into unknown concentrations or IDLH conditions:(APF =10,000)Any self-contained breathing apparatus that has a full facepiece and is operated in a pressure-demand or other positive-pressure mode.9.PHYSICAL AND CHEMICAL PROPERTIES10.STABILITY AND REACTIVITY11.TOXICOLOGICAL INFORMATION(APF =10,000)Any supplied-air respirator that has a full facepiece and is operated in a pressure-demand or other positive-pressure mode in combination with an auxiliary self-contained positive-pressure breathing apparatus.Escape:(APF =50)Any air-purifying,full-facepiece respirator (gas mask)with a chin-style,front-or back-mounted organic vapor canister having an N100,R100,or P100filter./Any appropriate escape-type,self-contained breathing apparatus.Hand protectionImpervious gloves.S24-Avoid contact with skin.S36-Wear suitable protective clothing.Eye protectionTight sealing safety goggles.Skin and body protection Impervious clothing.Hygiene measuresContaminated work clothing should not be allowed out of the workplace.Avoid contact with skin,eyes or clothing.Handle in accordance with good industrial hygiene and safety practice.Environmental exposure ControlsPrevent product from entering drains.General information FormLiquid.Appearance Red,maroon.OdorMedicinal,sweet,tar-like.Boiling point/range °C No data available °F No data available Melting point/range °C No data available °F No data available Flash point°C No data available °F No data available Autoignition temperature °C No data available °F No data availableOxidizing properties No information available Water solubilitySolubleStabilityStable under normal conditions.Materials to avoidStrong oxidizing agents.Strong acids.Isocyanates.Heat.Nitriles,Nitrides.Alkaline earth metals.Strong oxidizers,alkali metals and alkaline earth metals may cause fires or explosions.Hazardous decomposition Toxic gas.Sulphur oxides.Hydrogen cyanide (hydrocyanic acid).Carbon oxides,ProductsNitrogen Oxides.PolymerizationHazardous polymerization does not occur.Acute toxicityChemical name LD50(oral,rat/mouse)LD50(dermal,rat/rabbit)LC50(inhalation,rat/mouse)Phenol=317mg/kg (Rat)No data available =316mg/m3(Rat)Guanidine isothiocyanate571mg/kg2000mg/kg5.319mg/L (4H)12.ECOLOGICAL INFORMATIONAmmonium thiocyanate =500mg/kg (Rat)No data available No data available Glycerol =12600mg/kg (Rat)No data available No data availablePrinciple Routes of Exposure Potential Health Effects Eyes Causes burns.Risk of serious damage to eyes Corrosive to the eyes and may cause severe damage including blindness.Skin Causes burns.Possible risk of irreversible effects Harmful in contact with skin.Irritating to skin and mucous membranes.Inhalation Harmful by inhalationIngestionHarmful if swallowed Ingestion causes burns of the upper digestive and respiratory tracts Ingestion may cause gastrointestinal irritation,nausea,vomiting and diarrheaCarcinogenic effects Phenol has been classified by the International Agency for Research on Cancer (IARC)as not classifiable as to carcinogenicity to humans (Group 3).Mutagenic effects No information available.Reproductive toxicity No information available.SensitizationNo information available.Target organ effectsSkin.Lungs.Liver.Spleen.Kidney.EcotoxicityHarmful to aquatic organisms,may cause long-term adverse effects in the aquatic environment.Chronic aquatic toxicity Category 3MobilitySee log PowBiodegradation Inherently biodegradable Bioaccumulation No information availableChemical name Freshwater algae data Water flea data Freshwater fish species dataMicrotox dataLog Pow PhenolDesmodesmusDaphnia magna =316mg/m3(Rat)logPow1.subspicatus EC50187EC5047-279mg/L (72h) 4.24-10.7mg/L Pseudokirchneriella (48subcapitata EC50h)Daphnia 46.42mg/L (96h)magnaEC5010.2-15.5mg/L (48h)13.DISPOSAL CONSIDERATIONS14.TRANSPORT INFORMATION15.REGULATARY INFORMATIONGlycerolDaphnia magna EC50>500mg/L (24h)logPow1.76Dispose of contents/containers in accordance with local regulations.IATAProper shipping name Corrosive liquid,n.o.s.(guanidine thiocyanate-phenol solution).Hazard Class 8Subsidiary class None Packing group II UN-No 1760ERG Code153ComponentTSCA Phenol,108-95-2(30-60)Listed Guanidine isothiocyanate,593-84-0(15-40)Listed Ammonium thiocyanate 1762-95-4(7-13)Listed Glycerol,56-81-5(40-70)ListedUS Federal Regulations SARA 313This product contains the following toxic chemical(s)subject to the notification requirements of section 313of Title III of the Superfund Amendments and Reauthorization Act of 1986.This law requires certain manufacturers to report on annual emissions of specified chemicals and chemical categories.Please note that if you repackage,or otherwise redistribute,this product to industrial customers,a notice similar to this one should be sent to those customers:Chemical name CAS-No.Weight %SARA 313-Threshold values Phenol108-95-230-60 1.0Ammonium thiocyanate1762-95-47-131.0Clean Air Act,Section 112Hazardous Air Pollutants (HAPs)(see 40CFR 61)This product contains the following HAPs:Component CAS-No.Weight %HAPS data Phenol108-95-230-60PresentAmmonium thiocyanate1762-95-47-13Present (XCN where X=H or any16.OTHER INFORMATIONother group where a formal dissociation may occur.For example KCN or Ca[CN]2)US state regulations Chemical name Massachusetts -RTK New Jersey-RTK Pennsylvania-RTK Illinois-RTK Rhode Island-RTK PhenolListed Listed Listed Listed Listed Guanidine isothiocyanate -----Ammonium thiocyanate Listed -Listed Listed Listed GlycerolListed-Listed-ListedCalifornia Proposition 65This product does not contain any Proposition 65chemicals.WHMIS Hazard Class D1A -Very toxic materials E -Corrosive materialThis product has been classified in accordance with the hazard criteria of the Controlled Products Regulations (CPR)and the MSDS contains all the information required by the CPR.Reason for revision Not Applicable.SDS sections updated.For research use only."The above information was acquired by diligent search and/or investigation and the recommendations are based on prudent application of professional judgment.The information shall not be taken as being all inclusive and is to be used only as a guide.All materials and mixtures may present unknown hazards and should be used withcaution.Since the Company cannot control the actual methods,volumes,or conditions of use,the Company shall not be held liable for any damages or losses resulting from the handling or from contact with the product as described herein.THE INFORMATION IN THIS SDS DOES NOT CONSTITUTE A WARRENTY,EXPRESSED OR IMPLIED,INCLUDING ANY IMPLIED WARRANTY OF MERCHANTABILITY OR FITNESS FOR ANY PARTICULAR PUPOSE"End of Safety Data Sheet。
化学发光法生物素标记核酸检测试剂盒 D3308 说明书
化学发光法生物素标记核酸检测试剂盒产品编号 产品名称包装 D3308化学发光法生物素标记核酸检测试剂盒1000cm 2产品简介：化学发光法生物素检测试剂盒(Chemiluminescent Biotin-labeled Nucleic Acid Detection Kit)是一种通过Streptavidin-HRP 及后续的BeyoECL Moon 试剂来实现化学发光检测Biotin 标记核酸的检测试剂盒。
适用于Southern blot 、Northern blot 、ribonuclease protection assay (RPA)或EMSA 等实验中，采用生物素标记的DNA 或RNA 探针时的检测。
本试剂盒不适用于生物素标记蛋白的检测。
本试剂盒同时还提供了封闭液、洗涤液等检测时所需的配套试剂。
本试剂盒采用了高质量的Streptavidin-HRP Conjugate ，HRP 和Streptavidin 共价交联的比例大于3，这样比采用Streptavidin 和Biotin-HRP conjugate 两种试剂进行检测要更方便，并且灵敏度更高。
采用了非特异性结合比avidin 更低的strepatavidin ，使检测结果背景更低灵敏度更高。
本试剂盒没有提供生物素探针标记相关的试剂，生物素标记的DNA 探针或EMSA 探针的制备可以相应地使用碧云天生产的生物素3'末端DNA 标记试剂盒(D3106)或EMSA 探针生物素标记试剂盒(GS008)。
本试剂盒可以用于检测至少10块10×10cm 有生物素标记EMSA 探针的膜，即共1000cm 2。
包装清单：产品编号 产品名称包装 D3308-1 BeyoECL Moon A 液 55ml D3308-2 BeyoECL Moon B 液 55ml D3308-3 Streptavidin-HRP Conjugate100µl D3308-4 封闭液 380ml D3308-5 洗涤液(5X)250ml D3308-6检测平衡液 250ml —说明书1份保存条件：D3308-3 Streptavidin-HRP Conjugate 在-20ºC 保存，其余可4ºC 保存。
西部马脑脊髓炎病毒实时荧光RT-PCR检测方法建立及标准质控品制备
谷 强 ，吴亚琼 ，高 志强 ２ 刘 环 ，张 伟 ，蒲 静 ，乔彩 霞 ，张 崔 乌 晓。 ，吴清 民
（ Ｉ ． 中国农业大学 动物医学院，北京 １ ０ ０ ０ ９ ４ ；２ ． 北京 出入境检验检疫局，北京 １ ０ ０ ０ ２ ６ ）
Ａｂ ｓ ｔ ｒ ａ ｃ ｔ ：Ｔｈ ｅ ｃ ｏ ｎ ｓ ｅ ｒ ｖ ｅ ｄ ｒ ｅ ｇ ｉ ｏ ｎ ｗａ ｓ ｕ ｓ ｅ ｄ ｔ ｏ ｄ ｅ ｓ ｉ ｇ ｎ ａ ｎ ｄ ｓ ｙ ｎ ｔ ｈ ｅ ｔ ｉ ｚ ｅ ｐ ｉ ｒ ｍｅ ｒ ｓ ａ ｎ ｄ Ｔ ａ ｑ Ｍａ ｎ ｐ ｒ ｏ ｂ ｅ ｂ ｙ ａ ｌ ｉ ｇ ｎ ｉ ｎ ｇ ｎ ｕ ｃ ｌ ｅ ｉ ｃ ａ ｃ ｉ ｄ
Ｇｕ Ｑｉ ａ ｎ ｇ ２ Ｗｕ Ｙ ａ ｑ ｉ ｏ ｎ ｇ ，Ｇ ａ ｏ Ｚ ｈ ｉ ｑ ｉ ａ ｎ ｇ ，Ｌ ｉ ｕ Ｈ ｕ ａ ｎ ，Ｚ ｈ ａ ｎ ｇ Ｗｅ ｉ ，
Ｐ ｕ Ｊ ｉ ｎ ｇ ，Ｑ ｉ ａ ｏ Ｃ ａ ｉ ｘ ｉ ａ ２ ，Ｚ ｈ ａ ｎ ｇ Ｈ ｅ ｘ ｉ ａ ｏ ２ ｗｕ Ｑｉ ｎ ｇ ｒ ｎ ｉ ｎ
ｗａ ｓ ｄ ｅ ｖ ｅ ｌ ｏ ｐ ｅ ｄ ｔ ｏ ｄ ｅ ｔ ｅ ｃ ｔ ＷＥ Ｅ Ｖ ｂ ｖ ｔ ｈ ｅ ｏ ｐ ｔ ｉ ｍｉ ｚ ａ ｔ ｉ ｏ ｎ ｏ ｆ ｐ ｉ ｒ ｍｅ ｒ ｓ ，ｐ ｒ ｏ ｂ ｅ ａ ｎ ｄ ｒ ｅ ａ ｃ ｔ ｉ ｏ ｎ ｃ ｏ ｎ ｄ ｉ ｔ ｉ ｏ ｎ ｓ ． Ｔ １ １ ｅ ｅ ｓ ｔ ａ ｂ ｌ ｉ ｓ ｈ ｅ ｄ ＲＲＴ － Ｐ ＣＲ ｗａ ｓ ｕ ｓ ｅ ｄ ｔ ｏ ｄ ｅ ｔ ｅ ｃ ｔ ａ ｐ ａ ｎ ｅ ｌ ｏ ｆ ｅ ｘ ｔ ｒ ａ ｃ ｔ ｅ ｄ ｖ ｉ ｕｓ ｒ ＲＮＡ／ ＤＮＡｓ ｉ ｎ ｃ ｌ ｕ ｄ ｉ ｎ ｇ ｔ ｈ ｏ ｓ ｅ ｏ ｆ Ｗ ＥＥ Ｖ， ｅ ａ ｓ ｔ ｅ ｎ ｒ ｅ ｑ ｕ ｉ ｎ ｅ ｅ ｎ ｃ ｅ ｐ ｈ ａ ｌ ｏ ｍｙ ｅ ｌ ｉ ｔ ｉ ｓ
三氧化二钨
Reduction of NO x by H 2on Pt/WO 3/ZrO 2catalysts in oxygen-rich exhaustF.J.P.Schott,P.Balle,J.Adler,S.Kureti *Institut fu¨r Technische Chemie und Polymerchemie,Universita ¨t Karlsruhe,Kaiserstrasse 12,D-76128Karlsruhe,Germany 1.IntroductionNitrogen oxides (NO x )emitted by lean-burn engines con-tribute to various environmental problems,for instance forma-tion of acid rain as well as ozone.As a consequence,the emission limits have been worldwide tightened in the past.For the removal of NO x from oxygen-rich exhaust the selective catalytic reduction (SCR)using NH 3and NO x storage reduction catalyst (NSR)are currently the most favoured technologies.However,a serious constraint of these techniques is the minor deNO x performance below 2008C.Contrary,the catalytic reduction of NO x by H 2(H 2-deNO x )reveals an interesting potential for the low-temperature NO x abatement being particularly crucial for diesel passenger cars.In the driving cycle of the European Union the exhaust temperature is below 1508C for about 60%of cycle time.Thus,SCR and NSR do not cover the most part of the certification cycle and might therefore come under pressure when the exhaust limits will be markedly tightened in the future.This clearly indicates the need for a deNO x technique operating at low temperatures.Furthermore,low-temperature NO x reduction exhibits a potential for industrial applications as well, e.g.for fossil power plants,waste combustion plants,nitric acid production and air separation.First published in 1971Jones et al.show the effective NO x reduction by H 2in slight excess of O 2using a Pt/Al 2O 3catalyst [1].High NO x conversions are observed between 65and 2008C while indicating a high yield of nitrous oxide as well;at maximum deNO x the molar ratio of N 2/N 2O is shown to be unity.The mechanism of the reaction of NO with H 2on Pt/Al 2O 3involves the reduction of the active Pt sites by H 2followed by adsorption and dissociation of NO [2].The recombination of two N atoms leads to the formation of N 2,whereas the oxygen is retained onto the Pt surface.Contrary,N 2O is produced by combination of a N atom and NO being adsorbed on neighbouring Pt sites.In the last years some Pt H 2-deNO x catalysts are presented revealing considerable low-temperature activity even under strongly oxidising conditions [3–6].Wildermann reports on a very active Pt/Al 2O 3catalyst that shows maximum performance already at 708C [3].However,this material produces a huge proportion of N 2O being in line with the results from Jones et al.[1].For example,at peak NO x conversion the N 2O selectivity amounts to 80%.Moreover,Wildermann indicates the enhancement of activity and N 2production of Pt/Al 2O 3by using the promoter Mo (3.4wt.%)resulting in a N 2selectivity of 40%.The performance of this Pt/Mo/Al 2O 3catalyst is additionally enhanced by Co,whereas the N 2selectivity is slightly increased only.However,the activityApplied Catalysis B:Environmental 87(2009)18–29A R T I C L E I N F O Article history:Received 30June 2008Received in revised form 19August 2008Accepted 26August 2008Available online 31August 2008Keywords:NO x reduction H 2Pt WO 3ZrO 2Diesel exhaust Mechanism DRIFTSA B S T R A C TThis work addresses the low-temperature NO x abatement under oxygen-rich conditions using H 2as reductant.For this purpose Pt/ZrO 2and Pt/WO 3/ZrO 2catalysts are developed and characterised by temperature-programmed desorption of H 2(H 2-TPD),N 2physisorption (BET)and powder X-ray diffraction (PXRD).The most active catalyst is a Pt/WO 3/ZrO 2pattern with a Pt load of 0.3wt.%and a W content of 11wt.%.This material reveals high deNO x activity below 2008C and high overall N 2selectivity of about 90%.Additionally,the catalyst exhibits outstanding hydrothermal stability as well as resistance against SO x .Furthermore,the transfer from the powder level to real honeycomb systems leads to promising performance as well.Diffuse reflectance Fourier transform infrared spectroscopic studies,kinetic modelling of tempera-ture-programmed desorption of O 2(O 2-TPD)and NO x -TPD examinations indicate that the pronounced H 2-deNO x performance of the Pt/WO 3/ZrO 2catalyst is related to the electronic interaction of WO 3with the precious metal.The tungsten promoter increases the electron density on the Pt thus activating the sample for H 2-deNO x and N 2formation,respectively.Contrary,NO x surface species formed on the WO 3/ZrO 2support are not supposed to be involved in the H 2-deNO x reaction.ß2008Elsevier B.V.All rights reserved.*Corresponding author.Tel.:+497216088090;fax:+497216082816.E-mail address:kureti@ict.uni-karlsruhe.de (S.Kureti).Contents lists available at ScienceDirectApplied Catalysis B:Environmentalj o ur n a l h o m e p a g e :w w w.e l se v i e r.c om /l oc a t e /a p c a t b0926-3373/$–see front matter ß2008Elsevier B.V.All rights reserved.doi:10.1016/j.apcatb.2008.08.021declines when CO exceeds0.15vol.%[7,8]being in accordance with Lambert and Macleod[9,10].Costa et al.report a Pt/La0.7Sr0.2Ce0.1FeO3catalyst with pronounced low-temperature activity as well as substantially increased N2selectivity up to80–90%[11,12].Detailed examina-tions performed with a related Pt/La0.5Sr0.2Ce0.51MnO3sample[12] indicate a different reaction mechanism as compared to that elucidated for Pt/Al2O3[2].Costa et al.postulate chemisorption of NO x on the support resulting in nitro and nitrato surface species, while H2adsorbs dissociatively on the Pt component.Then,the atomic hydrogen spills over to the support reducing the NO x surface complexes to release N2and H2O.Following Costa et al.this mechanism suppresses the formation of N2O.A very similar mechanism is postulated for a Pt/MgO–CeO2catalyst being very active as well[13,14].In contrast to platinum,Ru,Ir,Rh,Pd and Ag [3,15]as well as perovskite catalysts[11,16–18]reveal no or at least low performance in excess of O2.An exception is Pd/LaCoO3 showing considerable activity[19].Furthermore,it is worth mentioning that the H2-deNO x reaction is an important feature of the TWC technology as well as in regeneration of NSR catalystsreducing NO x under stoichiometric and rich conditions,respec-tively.The aim of this paper is the development of a H2-deNO x catalyst showing both pronounced low-temperature activity and minimum N2O production,whereas the present study mainly focuses on diesel exhaust.For this purpose a series of Pt/ZrO2and Pt/WO3/ ZrO2samples is systematically prepared,characterised andfinally tested for H2-deNO x.These systems are selected as a result of pre-studies in which different support materials have been screened [20,21],e.g.Al2O3,SiO2,ZrO2,TiO2and MgO carriers all modified with alkaline and alkaline earth metals,elements of the1st period of transition metals,Ce,La and Mo.For the evaluation of the technical potential of the most promising catalyst relevant conditions are varied,while a coated honeycomb is employed as well.Additionally,mechanistic examinations are performed to gain insight into the effectiveness of the best catalyst.2.Experimental2.1.Development of the ZrO2support and catalyst preparationPreliminary catalytic investigations show that the synthesis route,crystalline phase and BET surface area of the ZrO2substrate strongly affect the performance of the H2-deNO x catalysts[22].The best result is obtained with a self-prepared zirconia existing in the tetragonal phase.This material is synthesised by advancing the so-called hydrazine route[23,24]providing reliable product quality and sufficient mass to coat several full size honeycombs for automotive applications.For the synthesis a solution of234g ZrO(NO3)2(Fluka)in 1.6l distilled H2O is added to a boiling mixture of400ml N2H4ÁH2O(Fluka)and1.2l distilled H2O.The resulting blend is digested for12h under reflux,whereas shorter reaction time leads to unwanted monoclinic ZrO2as well(Fig.1). Afterfiltration and washing with H2O the solid is dried overnight at 1008C and calcined in air at7508C for6h.The yield of ZrO2is almost100%(85g).The introduction of Pt is carried out by incipient wetness method.In this impregnation a defined volume of Pt(NO3)2 (Chempur)solution is taken such that it is completely absorbed by the substrate.The adjusted Pt loads referring to the support range from0.1to2.0wt.%.After impregnation,the samples are dried overnight at1008C and are then activated by dosing a gas mixture of9vol.%H2and91vol.%N2.In the activation step the temperature is increased from20to3008C at the rate of1.0K minÀ1;the end temperature is held for30min.Finally,the samples are condi-tioned by heating in air at5008C for5h.For reference purposes a classical Pt/Al2O3catalyst is also prepared taking commercially available g-Al2O3balls(d=0.6mm,Sasol).The modification of ZrO2with tungsten is performed by incipient wetness method as well using a solution of (NH4)6H2W12O41(Fluka).Different loads of W(up to22wt.%) relating to the mass of ZrO2are established by varying the concentration of(NH4)6H2W12O41.After impregnation,the sample is dried overnight at1008C and is then impregnated by Pt as mentioned above.It is worth noting that in the H2activation tungsten oxide is not reduced[24].2.2.Characterisation of the catalystsCrystalline phase of the pure supports as well as catalysts is examined by powder X-ray diffraction(PXRD).The PXRD patterns are recorded at room temperature on a Siemens D501using Ni filtered Cu K a radiation.A2u step size of0.028is used with an integration time of4s.The diffractogram of the commercial Al2O3 carrier confirms the g-modification,while the prepared ZrO2is in the tetragonal phase as already demonstrated in Fig.1.Regardless of the load of W no reflexes of crystalline tungsten oxide are observed suggesting amorphous WO x domains,at least at W contents above6wt.%when tungsten oxide exists in sufficient abundance to be monitored.Additionally,signals of Pt are not found as well being associated with its low contents.The dispersion of Pt is studied by temperature-programmed desorption of H2(H2-TPD).In these analyses,same laboratory bench is used as in the catalytic investigations(Section2.4).Respective sample(1.5g)is charged into the quartz glass tube reactor(i.d. 8mm)and pre-treated in Arflow at6008C for15min.Subsequently, the catalyst is cooled to3008C and exposed to a gas mixture of 5vol.%H2and95vol.%Ar for30min to reduce the active Pt surface. The pattern is then rapidly cooled to308C in the H2/Arflow.After saturation,it isflushed with Ar and H2-TPD is started using Ar as carrier gas(100ml minÀ1,STP).In TPD the catalyst is heated to 6008C at the rate of20K minÀ1,whereupon temperature is recorded by a K type thermocouple(TC)fitted directly in front of the sample. Desorbing H2is continuously monitored by thermal conductivity detection(TCD,Shimadzu).For specific analysis of H2the reactor effluents pass a cold trap(À508C)removing H2O.The Pt dispersion (d Pt)is determined by supposing that one H adsorbs per active Pt site (Eq.(1))[25].The molar amount of desorbing H2ðn H2Þis obtained by integrating the corresponding TCD signal,whereas the total proportion of Pt(n Pt)is known from the impregnationprocedure. Fig.1.PXRD patterns of the prepared ZrO2support depending on the digestion time (a)5min,(b)1h,(c)4h,(d)7h,(e)12h and(f)17h;*monoclinic phase;+ tetragonal phase);final calcination is performed in air at7508C for6h;analytical parameters of PXRD are described in next section.F.J.P.Schott et al./Applied Catalysis B:Environmental87(2009)18–2919As derived from blank experiments,e.g.Pt free 11W/ZrO 2,the H 2desorption is specific for Pt.d Pt ¼0:5n H 2n Pt(1)Furthermore,the ZrO 2-based catalyst with a Pt load of 0.3wt.%and a W content of 11wt.%is exemplarily characterised by X-ray photoelectron spectroscopy.The spectrometer is a Phoibos 150MCD from Specs being equipped with a Mg anode (E (Mg K a )=1253eV).The spectrum shows a clear absorption at 36eV (W4f 7/2)being related to W 6+species [26].The BET surface area of the catalysts is investigated by multi-point Sorptomatic 1990using N 2as adsorbate.The BET data are listed in Table 1along with the loading,Pt dispersion and sample codes.It is worth mentioning that the declining BET surface area of the 0.3Pt/W/ZrO 2samples is mainly related to the increasing proportion of WO 3exhibiting negligible surface area and it is not due to the blocking of pores of the ZrO 2carrier.2.3.O 2-and NO x -TPD studiesO 2-TPD studies are performed to investigate the kinetics of the adsorption and desorption of O 2on selected catalysts.Oxygen is used as probe molecule since it represents a dominating species on the Pt surface under lean burn conditions [27].The procedure of O 2-TPD is similar to that described above for H 2-TPD.The catalyst (5.00g)is heated in Ar at 7508C for 15min,cooled to 508C and is then exposed to a mixture of 2vol.%O 2and 98vol.%Ar (99.996%,<6ppm O 2)until the sample is saturated.After flushing with Ar (500ml min À1,STP)TPD is started with a rate of 20K min À1.O 2is detected by CIMS (Airsense 500,V &F).As the axial and radial temperature gradients along the catalyst bed are below 10K heat transfer effects are to be neglected.Furthermore,Mears and Weisz Prater criteria [28],that amount to 10À5and 10À2,respectively,exclude transport limitation by film and pore diffusion.NO x -TPD examinations are conducted similar to H 2-TPD as well using a catalyst mass of 1.50g.After the pre-treatment performed at 5008C the sample is cooled to 1258C in Ar flow and is then exposed to a mixture of 2800ppm NO and 6vol.%O 2in Ar.In this treatment NO is partially converted into NO 2(15%)due to catalytic oxidation.After saturation,the dosage of NO and O 2is stopped and the reactor is flushed by Ar followed by starting the TPD with a rateof 20K min À1.Additionally,before beginning the TPD a mixture of (a)1500ppm H 2,6vol.%O 2,Ar (balance)or (b)1500ppm H 2in Ar is added for 10min to study the reaction of NO x surface species with H 2.Subsequently,it is purged again and TPD is finally started employing exclusively the CLD analyzer mentioned in the following section.2.4.H 2-deNO x studiesThe catalytic investigations are performed on a laboratory bench using a diesel model exhaust.Before the measurements,the samples are pressed to pellet with 40MPa,granulated and sieved in a mesh size of 125–250m m;an exception is the Pt/Al 2O 3pattern which is kept in form of balls.The samples (1.50g)are charged into the quartz glass tube reactor (i.d.8mm),fixed with quartz wool and pre-treated in Ar flow at 5008C for 15min to remove possible impurities and to provide reproducible conditions.Subsequently,the model exhaust is added and the temperature is decreased to 408C with a rate (b )of 1.0K min À1.Furthermore,some experi-ments are carried out under stationary conditions at selected temperatures.The standard feed (500ml min À1,STP)is composed of 500ppm NO,2000ppm H 2,6.0vol.%O 2and Ar as balance.To evaluate the best catalyst the concentration of H 2and O 2is varied and other relevant exhaust gas species,i.e.CO,H 2O and CO 2are dosed additionally.The feed is obtained by blending a special mixture of 2000ppm H 2and 6.0vol.%O 2in Ar with the other components (Air Liquide).The flow of each component is controlled by independent mass flow controllers (MKS Instru-ments),whereas water is supplied by a liquid pump (Kronlab).Temperature is measured by a K type TC located directly in front of and behind the catalyst ing the standard feed the temperature difference between inlet and outlet is below 10K and therefore only the inlet temperature is presented.The analysis of NO x is conducted by means of CLD (EL-ht,Eco Physics),while N 2O,CO and CO 2are monitored by NDIR spectroscopy (Uras 10E,Hartmann &Braun).N 2is detected by GC/TCD (RGC 202withpacked columns Haye Sep Q 60and mol sieve 5A˚,Siemens)resulting in a time resolution of 9min that corresponds to a temperature interval of 15K.Oxygen is analysed by using magnetomechanics (Magnos 6G,Hartmann &Braun).The NO x conversion (X (NO x ))refers to the formation of N 2and N 2O as defined by Eq.(2),whereas the temperature programmed H 2-deNO x data are found to be equal to stationary results.For the major part of the reaction the mass of N is balanced being associated with the production of N 2and N 2O thus excluding the genesis of NH 3.Nevertheless,below 808C H 2-deNO x is slightly interfered by NO x adsorption corresponding to less than 10%conversion.X ðNO x Þ¼2c ðN 2Þþ2c ðN 2O Þc ðNO x Þin(2)The selectivity of N 2(S (N 2))is defined by Eq.(3),whereupon a corresponding expression is used for the N 2O selectivity (S (N 2O)).Moreover,for the comparison of different catalysts the overall selectivity of N 2(S (N 2)overall )is taken as well (Eq.(4));T 1and T 2are the temperatures with NO x conversion of 20%.Selectivity data are exclusively presented for deNO x above 20%to minimise error propagation.S ðN 2Þ¼c ðN 2Þ22(3)S ðN 2Þoverall ¼ZT 2T 1S ðN 2Þd T21(4)Table 1Load of Pt and W,sample code,BET surface area and Pt dispersion of the H 2-deNO x catalysts Catalyst system m(Pt)(%)m(W)(%)Sample codeS BET(m 2g À1)d Pt (%)Pt/Al 2O 30.50.5Pt/Al 2O 3150522Pt/Al 2O 31489Pt/ZrO 20.10.1Pt/ZrO 299300.30.3Pt/ZrO 2100250.50.5Pt/ZrO 21003622Pt/ZrO 29811Pt/WO 3/ZrO 2a0.330.3Pt/3W/ZrO 297360.360.3Pt/6W/ZrO 2106500.3110.3Pt/11W/ZrO 268900.3220.3Pt/22W/ZrO 26295b 2112Pt/11W/ZrO 27011aThe loads of Pt and W refer to the ZrO 2support.bWhile the Pt dispersion of 0.3Pt/11W/ZrO 2is checked by HRTEM (particles <2nm),double H 2desorption is observed for 0.3Pt/22W/ZrO 2.Hence,different H/Pt stoichiometry is assumed being speculated to be 2.This change might be associated with Pt–W interactions dominating at high tungsten oxide coverages amounting to ca.45%for 22%W.F.J.P.Schott et al./Applied Catalysis B:Environmental 87(2009)18–29202.5.DRIFTS studiesThe DRIFT spectroscopic studies are performed with a Nicolet 5700FTIR spectrometer(Thermo Electron)being equipped with a MCT detector and DRIFTS optics(Thermo Mattson).The sample compartment is continuously purged with N2to avoid diffusion of air.The IR cell made of stainless steel contains a ZnSe window and is connected to a gas-handling system.The spectra are recorded in the range from1000to4000cmÀ1with an instrument resolution of 4cmÀ1.100scans are accumulated to a spectrum resulting in a time resolution of1min.Before the analysis,the catalyst powder is charged into the sample holder of the cell and is heated for30min at 5008C in N2or Arflow(500ml minÀ1,STP).In the studies using CO as probe molecule the sample is then exposed at2508C for30min to a mixture of2000ppm H2and6vol.%O2(N2balance);this is done to establish similar conditions as in catalytic studies(Section2.4). Subsequently,the catalyst is cooled in N2flow to258C and then a background spectrum is recorded.After this,the sample is treated for5min with a mixture of500ppm CO in N2followed by purging with N2.Finally,the sample spectrum is collected.The DRIFTS investigation of H2-deNO x is performed sequen-tially.Firstly,the catalyst is cooled from500to1258C under flowing Ar and then the background spectrum is taken.Subse-quently,the sample is exposed for10min to a mixture of 1000ppm NO and6vol.%O2(Ar balance)followed by purging with Ar and taking the spectrum.After this,the blend of40or2000ppm H2and6vol.%O2(Ar balance)is added while continuously collecting data.The H2concentration of40ppm is adjusted to definitely avoid hot spots on the catalyst.The DRIFT spectra are presented in terms of Kubelka Munk transformation defined as F(R)=(1ÀR)2/(2R)with R=R s/R r, whereas R s is the reflectance of the sample under reaction conditions and R r that under the Arflow.3.Results and discussion3.1.Performance of the Pt/Al2O3reference and the Pt/ZrO2catalystsA preliminary investigation performed in the absence of a catalyst shows no conversion of NO x excluding H2-deNO x by gas-phase reactions.In contrast to that,the0.5Pt/Al2O3referencereveals pronounced low-temperature activity,whereas the opera-tion window is rather narrow(50–1508C)and N2O forms as the major product;S(N2)overall amounts to20%(Fig.2).The perfor-mance of Pt/Al2O3is considered to be in fair agreement with literature addressing the same catalytic system[1,3,4].Fig.3illustrates the performance of0.3Pt/ZrO2indicating NO x conversion in the entire temperature range with two deNO x maxima at140and1708C.Furthermore,the peak NO x removal is higher as compared to0.5Pt/Al2O3.Another interesting feature is the markedly improved N2selectivity of0.3Pt/ZrO2,i.e.N2is formed as the major product showing an overall selectivity of55%.The Pt/ZrO2samples with Pt contents of0.1and0.5wt.%show similar peak NO x conversions of78and82%,respectively,whereas their operation range is restricted covering a range of ca.140K only.Furthermore,S(N2)overall is very similar to0.3Pt/ZrO2.Hence, the latter material is considered to be superior and is therefore adopted to the Pt/WO3/ZrO2system.The superiority of0.3Pt/ZrO2 is difficult to explain as Table1shows very similar physical–chemical properties for the Pt/ZrO2samples.3.2.Performance of the0.3Pt/W/ZrO2catalystsFor comparison of the0.3Pt/W/ZrO2samples revealing different loads of W the maximum NO x conversion(X(NO x)max)is used in addition to S(N2)overall.Fig.4shows that a little amount of tungsten is sufficient to increase deNO x as well as N2selectivity.The optimum content of W is11wt.%resulting in an overall N2 selectivity of85%and a peak NO x conversion of95%;assuming planar tungsten oxide the ZrO2coverage by WO3is estimated to be 0.22being significantly less than a monolayer.Furthermore,the results of XPS and PXRD suggest that the tungsten component exists in the form of amorphous WO3.For clarity the performance of the0.3Pt/11W/ZrO2catalyst is presented in Fig.5.The data point to a broad range of deNO x with two conversion peaks at90and2508C.As a consequence,0.3Pt/ 11W/ZrO2covers the low-as well as high-temperature regime thus representing a promising catalytic material.Nevertheless,it should be stated that the low-temperature activity is much more pronounced,while above2508C deNO x declines.The latter feature is attributed to increasing conversion of H2with O2being present in excess;a more detailed discussion of the educt selectivity is presented in Section3.4.The two NO x conversion maximums are ascribed to different active Pt sites as stated in Section 3.5.3, whereas no evidence for active NO x species located on the support is found as discussed in Section3.5.3as well.Contrary,the bare 11W/ZrO2support does not directly participate in deNO x as deduced from a measurement without Pt.However,0.3Pt/11W/ ZrO2still shows significant formation of N2O below1508C,e.g.at Fig.2.H2-deNO x performance of0.5Pt/Al2O3(X(NO x)—,S(N2)--,S(N2O)). Conditions:m=1.50g,c(NO)=500ppm,c(H2)=2000ppm,c(O2)=6.0vol.%,Ar balance,F=500ml minÀ1(STP),S.V.=22.000hÀ1,b=1.0K minÀ1.Fig.3.H2-deNO x performance of0.3Pt/ZrO2(X(NO x)—,S(N2)--,S(N2O)). Conditions:m=1.50g,c(NO)=500ppm,c(H2)=2000ppm,c(O2)=6.0vol.%,Ar balance,F=500ml minÀ1(STP),S.V.=22,000hÀ1,b=1.0K minÀ1.F.J.P.Schott et al./Applied Catalysis B:Environmental87(2009)18–2921the low-temperature deNO x peak S (N 2O)is about 45%.In contrast to that,N 2O is substantially suppressed above 2008C correspond-ing to a N 2selectivity of approximately 90%.Furthermore,it should be mentioned that no NH 3forms in H 2-deNO x on the 0.3Pt/11W/ZrO 2catalyst as referred from a NDIR analysis (Binos 1.1,Leybold-Heraeus).The suppression of NH 3formation is reported to be typical for NO x reduction by H 2on Pt catalysts under oxygen-rich conditions [1].The turnover frequency (TOF)being defined as the number of converted NO x molecules per Pt atom and time is 8.0Â10À3s À1for the deNO x peak at 90%and 5.0Â10À3s À1for the 2508C maximum.These specific H 2-deNO x data are very close to that of 0.1Pt/MgO–CeO 2showing a TOF of ca.8Â10À3s À1(908C)in a similar NO/H 2/O 2feed [14].A direct comparison of the activity range of both catalysts is problematic as data recorded under analogue condi-tions are not available in the study of 0.1Pt/MgO–CeO 2[14].3.3.Evaluation of the 0.3Pt/11W/ZrO 2catalyst3.3.1.Effect of O 2and CO on H 2-deNO x performanceThe previous section provides evidence that the content of O 2is a crucial parameter for the H 2-deNO x reaction.Hence,theeffect of O 2is systematically investigated,whereas for simplicity the performance of 0.3Pt/11W/ZrO 2is exemplarily illustrated at 1258C being representative for the low-temperature range (Fig.6).It is apparent that the O 2concentration does not drastically affect the low-temperature activity, e.g.deNO x is about 90%for 1.5vol.%O 2and ca.75%for 18vol.%.Moreover,the N 2selectivity does not change at all.On the contrary,the high-temperature activity declines markedly with growing O 2content being completely suppressed above 12vol.%O 2(Fig.7).This effect is referred to the increasing reaction of H 2with O 2(Section 3.4).However,diesel engines provide low temperatures in connection with rather high O 2concentrations and vice versa,e.g.at 1508C the O 2content is in the range of 10–15vol.%.Therefore,the decline in high-temperature deNO x observed for relatively high O 2contents is not a substantial issue for practical application.Furthermore,the effect of CO on H 2-deNO x is investigated as well,since this component is known to block active Pt sites at low temperatures which might affect the performance of 0.3Pt/11W/ZrO 2[27].For this examination two representative CO concentra-tions are supplied,i.e.a rather low (40ppm)and a rather high one (400ppm).Fig.8shows that the latter CO concentrationcausesFig.4.Effect of W load on the H 2-deNO x performance of the 0.3Pt/W/ZrO 2samples (X (NO x )max *,S (N 2)overall *).Conditions:m =1.50g,c (NO)=500ppm,c (H 2)=2000ppm,c (O 2)=6.0vol.%,Ar balance,F =500ml min À1(STP),S.V.=22.000h À1,b =1.0K min À1.Fig.5.H 2-deNO x performance of 0.3Pt/11W/ZrO 2(X (NO x )—,S (N 2)--,S (N 2O)).Conditions:m =1.50g,c (NO)=500ppm,c (H 2)=2000ppm,c (O 2)=6.0vol.%,Ar balance,F =500ml min À1(STP),S.V.=22.000h À1,b =1.0K min À1.Fig.6.Effect of O 2on the H 2-deNO x performance of 0.3Pt/11W/ZrO 2at 1258C (X (NO x )*,S (N 2)*).Conditions:m =1.50g,c (NO)=500ppm,c (H 2)=2000ppm,c (O 2)=1.5–18vol.%,Ar balance,F =500ml min À1(STP),S.V.=22.000h À1,b =1.0K min À1.Fig.7.H 2-deNO x performance of 0.3Pt/11W/ZrO 2with a O 2content of 12vol.%(X (NO x )—,S (N 2)--,S (N 2O)).Conditions:m =1.50g,c(NO)=500ppm,c (H 2)=2000ppm,c (O 2)=12vol.%,Ar balance,F =500ml min À1(STP),S.V.=22.000h À1,b =1.0K min À1.F.J.P.Schott et al./Applied Catalysis B:Environmental 87(2009)18–2922a drastic decline in catalytic activity,whereupon significant deNO x begins in parallel to the CO light-off (ca.1108C).This effect is in line with the literature which shows the appearance of free Pt sites being capable of reducing NO only when CO removal starts [29].Consequently,as deNO x is inhibited below 1108C no substantial quantity of N 2O is formed resulting in an overall N 2selectivity of about 90%.Additionally,it is worth mentioning that four maxima of NO x conversion appear pointing to a broad variety of active Pt sites.Furthermore,the CO concentration of 40ppm does not affect the performance of 0.3Pt/11W/ZrO 2at all.These results clearly show that high CO concentrations have to be avoided in practice to maintain H 2-deNO x .Indeed,this can be simply achieved by using a diesel oxidation catalyst (DOC)located in front the H 2-deNO x catalyst.DOC systems are a state-of-the-art technology and are applied in every diesel vehicle released in the industry countries oxidising CO and HC close to the engine outlet.3.3.2.Hydrothermal stability and resistance against SO xFor the use of 0.3Pt/11W/ZrO 2in diesel exhaust its hydrothermal resistance as well as chemical stability towards SO x is of particular concern.To pursue these requirements the catalyst (1.50g)is hydrothermally aged at 7808C for 15h adjusting a gas mixture of 2.5vol.%H 2O and 97.5vol.%Ar (500ml/min,STP),whereas exposure to SO x is carried out at 3508C for 24h while supplying a blend of 40ppm SO 2and synthetic air (500ml min À1,STP).The latter conditions are considered to be appropriate to form SO 3on the catalyst being a strong catalyst poison [30].Nevertheless,both aging procedures do not affect the catalytic performance at all evidencing high resistance of 0.3Pt/11W/ZrO 2against hydrothermal and sulphur exposure.parison of the reducing efficiency of H 2with C 3H 6and COTo assess the efficiency of H 2in the deNO x reaction on 0.3Pt/11W/ZrO 2additional reductants are used.For this purpose C 3H 6and CO are taken as they are potentially formed as major or side product in the on-board production of H 2from diesel,e.g.by catalytic cracking,catalytic partial oxidation or catalytic steam reforming [31];C 3H 6is taken as a model hydrocarbon.For an accurate comparison 10,000ppm H 2,1000ppm C 3H 6or 9000ppm CO are dosed to the standard feed.These concentra-tions demand very similar amount of oxygen for complete conversion.Fig.9shows that the presence of 10,000ppm H 2causes outstanding NO x conversion.Contrary,in the study withC 3H 6significant deNO x appears between 160and 3208C only with a peak conversion of ca.80%corresponding to a N 2selectivity of 45%.A minor deNO x activity is obtained with CO being in line with the results demonstrated in Section 3.3.1.As discussed there,the inhibition of deNO x is related to the blocking of active Pt sites by C 3H 6and CO suppressing substantial dissociation of NO [29].This effect is obviously stronger for CO,whereas it has to be taken into account that much more CO molecules are dosed as compared to C 3H 6.Additionally,Fig.9demonstrates that C 3H 6and CO mainly react with O 2,particularly above 3008C.Finally,from the present experiments it is concluded that among the tested reductants only H 2shows efficient NO x reduction on 0.3Pt/11W/ZrO 2.Fig.9.Effect of H 2,C 3H 6and CO on the deNO x performance of 0.3Pt/11W/ZrO 2(X (NO x )—,S (N 2)--,S (N 2O),X (C 3H 6)—,X (CO)—),The concentration of reducing agent 10,000ppm H 2,1000ppm C 3H 6or 9000ppm CO;remaining conditions are the same as described in Fig.5.Fig.8.Effect of CO on the H 2-deNO x performance of 0.3Pt/11W/ZrO 2(X (NO x )—,S (N 2)--,S (N 2O),X (CO)—).Conditions:m =1.50g,c (NO)=500ppm,c (CO)=400ppm,c (H 2)=2000ppm,c (O 2)=6.0vol.%,Ar balance,F =500ml min À1(STP),S.V.=22.000h À1,b =1.0K min À1.F.J.P.Schott et al./Applied Catalysis B:Environmental 87(2009)18–2923。
MOSFET参数详解
Power MOSFET Technical TrainingDatasheet OverviewGiovanni PriviteraSenior Product EngineerMOSFET & IGBT DIVISIONgiovanni.privitera@MaximumRatingsRepresent the extreme capability of the devices.To be used as worst conditions (single parameter) that the design shouldguarantee will not be exceeded. [only VDS & VDGR may be exceeded in limited avalanche conditions]Never exceed !!!!!!!!!!!!The avalanche breakdown voltage of ST’s PowerMOSFET is always higher than its voltage rating due to normal production process margins.In order to achieve high forecasted reliability the worst case operatingvoltage should be lower than the maximum one. The maximum voltageduring turn off should not exceed 70 to 90% of the rated voltage. Thisderating is suggested by the years of experience.For the Drain-Gate Voltage capability(Rgs to avoid floating gate)Exceeding Vgs may result in permanent device degradation due tooxide breakdown and dielectric rupture.The real oxide breakdown capability is higher than this value, and is related to the oxide thickness; but this value, with a reasonable guardband, is the 100% TESTED & warranted oneTj must be always lower than 150ºCReflects a minimum device service lifetime.Operation at conditions that guarantee a junction temperature less than Tjmax may enhance long term operating life.Ptot=dT/Rthjc=(150-25)/Rthjc derating=1/RthjcThe majority of reliability tests are done at maximum junction temperature, especially the HTRB (High Temperature Reversed Bias) and HTFB (High Temperature Forward Bias). These test results are used as input information for calculation of acceleration factors in different reliability models. In order to achieve high forecasted reliability the maximum operating temperature should be lower than the maximum one. For example, by theoretical models, reducing the junction temperature by 30°C will improve the MTBF (Mean Time Between Failure) of the MOSFET by an order of magnitude.P tot =Ron(@Tjmax)*I²P tot = (Tjmax-Tc)/R THj-cI= (Tjmax-Tc)/Ron(@Tjmax)*RthjcLimited also by wire size : to avoid any fuse effectLimited by Ptot & RdsonMaximum dv/dt capability during diode reverse recovery (dynamic dv/dt) To be distinguished two kind of dv/dt (static and dynamic)Due to the false turn-on, the device falls into the current conduction state, andin severe cases, high power dissipation develops in the device and createsdestructive failure.Static dv/dta) False turn onb) Parasitic transistor turn onIf the parasitic bipolar transistor is turned on, thebreakdown voltage of the device is reduced from BVCBOto BVCEO which is 50 ~ 60 [%] of BVCBO . If theapplied drain voltage is larger than BVCEO, the devicewill be brought into the avalanche breakdown, and if thedrain current cannot be limited externally, the device couldbe destroyed by the second breakdown of parasitic bipolar.Diode recovery dv/dtThe value of di/dt and dv/dt becomes larger as Rg is reduced.The device is destroyed by the simultaneous stressessuch as high drain current, high drain source voltageand the displacement current of the parasiticcapacitance.Highest Stress pointST insulated packages are tested 100% to guarantee this value.Thermal resistanceParameter which indicates how "easily" the heat flows between two points A and BSmall R TH implies that the heat is transferred from A to B with little temperature difference between A and BLarge R TH implies that the transfer of the same quantity of heat from A to B requires a greater temperature difference between the two pointsThermal resistance is defined as : R THb-a= (T b-T a)/P dissThermal resistanceIn electronic devices the two most important temperatures are the ambient temperature T a and the temperature reached by the junction TjThe R THj-a(device) depends by frame dimension and frame material.The R THj-a(module) depends by the device, insulation, mounting method, heatsink size and cooling method (forcedair,radiation....)Thermal resistance Thermal chain exists from thesilicon to the ambient throughthe die attach, the frame, thecontact and the externaldissipator.R THj-a=R THj-c+R THc-s+R THs-aThermal model for transient takesinto account thermal capacitancesRthjc=1/0.32=3.1 K/WV=Ron(@Tj)*IK=0.1Zth=kRth V I=(Tj-Tc)/Zth K=0.04K=0.01K=1Allowed but not reachable regionZth: Transient Thermal ImpedancePtot(dc)=(Tj-Tc)/Rth(j-c)Ptot(pulse)=(Tj-Tc)/Zth(j-c)Iar, defined as the maximum current that can flow through the device during the avalanche operations without any bipolar latching phenomenon.EAS(Energy during Avalanche for Single Pulse) is defined as the maximum energy that can be dissipated in the device during a single avalanche operation, at the Iar and at the starting junction temperature of 25°C, to bring the junction temperature up to the maximum one stated in the absolute maximum ratings.E=0.5*L*I 2*(V(BR)eff/(V(BR)eff-VDD))E=0.5*V(br)eff*Io*tavUnclamped Inductive SwitchingN-P+N+S GDDR pS GFailure modeVbeId1-As soon as the current begins to interest the p region causing a sufficient drop of voltage to equal the VBEon of the BJT, the current of the base, IB, in conjunction with the of the transistor will cause the localized BJT turn-on. Subsequent local temperature increase decreases Vbeon and runaway occurs.2-The power that is dissipated in the MOSFET causes an increase of temperature of the junction. If the temperature increases to a critical value set by the property of the silicon, the failure, without the contribution of the parasitic bipolar, occurs because of the creation of thermally generated carriers in the epitaxyal / bulk region and so the creation of hot spots.At K P T 320=D Very short rectangular pulses (~tens ms)Triangular impulses haven’t the same thermal response time TjAt K Zth =At K P T 0=D Eas calculation: thermal modelDie AreaThe EAS is function of Die size Silicon characteristics Peak power Starting and maximum temperature202204921KP T A t P Eas av D ==2202229K P T A t av D =with00.050.10.150.20.250.30.350.40.45T (50µs/div )-200020040060080010001200V d s (V )-50510********I d (A )FAIL FOR PARASITIC CONDUCTIONUIS ON ST W8NB90Vdd=150V; L=1mH; Vgs=10V; Rg=47 ohm; startingTj=25°C0.20.40.60.811.21.41.61.8T (200µs/div )-200020040060080010001200V d s (V )-2024681012I d (A )FAILURE FOR ENERGYUIS ON STW8NB90Vdd=150V; L=16mH; Vgs=10V; Rg=47 ohm; startingTj=25°CUIS:Failure mode●Current Crowding due to Parasitic BJT Turn-on●Thermal Dissipation with Tj highly exceeding the guaranteed Tjmax (150 degC)DGSTracer waveformAs junction temperature increases, BV also increases linearly,DGS IDSS is sensitive to the temperature and it has positive temperature coefficient.D GSDGS Threshold voltage VGS(th) is the minimum gatevoltage that initiates drain current flow.VGS(th) has a negative temperature coefficientDGS RDS(on) is not constant vs IdRDS(on) has a positive temperature coefficientDSGGfs=di dsdv gs Vds=const TGDSC GSC DSC GDC iss = C GD + C GS C oss = C DS + C GD C rss = C GDTemperature variations have very little effectResistive load switchingV DV G =0I D =0I DS [A]V DS [V]50043210143256Resistive load switching1V DV G =0I D ~0V G = V Th50043210143256Charging the Ciss to Vth.No evident drain current flows;Vds remains essentially at VddV DS [V]DS1V DV G =0I D =0V T50043210143256Continues the Ciss Charging. Drain current starts to flow;Vds remains essentially at VddV DS [V]DS1V DV G =0I D =0V G = V GmV T50043210143256Continues the Ciss Charging.Drain current flows to the maximum;Vds remains essentially at VddV DS [V]DSV G =01V DI D =0V G = V GmV T50043210143256Cgd is Charging and Ciss increases mantaining Vg flat. Id constantVds approaches to VdsonV DS [V]DS1V DV G =0I D =0V T50043210143256MOSFET in ohmic region.Vg increases to applied voltage charging input capacitancesV DS [V]DSV G =01V DI D =0V T50043210143256V DS [V]DSV G =01V DI D =0V T50043210143256V DS [V]DS10V It is used to determine the amount of charge, defined as Qg, required to bring the Ciss from 0V to 10VDSGISDIrrmQ rr~0.5t rr*I rrm。
C-T-UCP2 training
3 2 1 故障自 2 动复位 输出 1 2 冷冻水 流开关 1 2 冷却水 流开关 1
J22 J24
水温度
外部启停
2 3
冷冻水泵 继电器 1 冷却水泵 继电器 1 3 运行 2 状态 1
2
2
J12
11 12 3 4 5
J5
紧急停机
4 5 6
A-S Air-Conditioning System (Tianjin) Ltd
5 6
C相电流
A-S Air-Conditioning System (Tianjin) Ltd
UCPII Control Penal
J1
1 2
内部信息 处理通讯 冷凝器饱和 冷媒温度 排气压缩机冷 媒吸入温度
2
24 VAC
1
J2
1 2
3
排出电 磁阀
2 1
J4
排气模块 3U1
J3
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液体缸 电磁阀 排气压 缩机
XXX.X F XXX.X F
+
蒸发器进水温度 蒸发器出水温度
XXX.X F XXX.X F
-
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报告
冷凝器进水温度 冷凝器出水温度
XXX.X F XXX.X F
TRANE
TM
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A-S Air-Conditioning System (Tianjin) Ltd
冷水机组状态,水温及设定值 按 (↑) (↓) 继续 客户 报告 操作人员 设定 冷水机 报告 维修 设定 冷媒 报告 维修 测试 压缩机 报告 诊断
实际冷冻水设定值 蒸发器出水温度
XXX.X F XXX.X F
Gene Copoeia Lentifect Lentiviral Particles说明书
shRNA Scrambled Control Lentifect™Purified Lentiviral ParticlesCat.No.LP519-025,LP519-100(Old Cat.No.LPP-CSHCTR001-LVRU6GP-025-C,LPP-CSHCTR001-LVRU6GP-100-C)Ready-to-use lentiviral particles for the transduction of a variety of mammalian cells including difficult-to-transfect,primary,stem and non-dividing cells.DescriptionGene:A short non-coding stufferPromoter:U6Tag:N/AReporter:eGFPResistance marker:PuromycinAdditional note:N/AGeneCopoeia Lentifect™Lentiviral Particles are produced from a standardized protocol using purified plasmid DNA and the proprietary reagents,EndoFectin™Lenti(for transfection)and TiterBoost™solution.The protocol uses a third generation self-inactivating packaging system meeting BioSafety Level2requirements.Contents and storageProvided as1vial of25µl or4vials of25µl of purified CSHCTR001-LVRU6GP lentiviral particles with titers of~1x108TU/ml.Lentifect particles are shipped on dry ice and must be stored at-80°C immediately upon receipt.Avoid repeated freeze-thaw cyclesas this will reduce titers.Quality controlThe lentiviral expression construct was validated by full-length sequencing,restriction enzyme digestion and PCR-size validation using gene-specific and vector-specific primers.Product is confirmed free of bacteria,fungi and common Mycoplasma contamination.Viral titerThe transduction unit(TU or IFU)of the lentiviral particles was estimated using the formula-1TU=30copies of viral genomic RNA.The physical copy numbers of the viral genomic RNA was determined using qRT-PCR.The customer should test the transduction at MOI=0.3,1,3,5,10for their specific cell lines in order to get the best transduction efficiency.Overview of productionThe CSHCTR001-LVRU6GP OmicsLink™shRNA clone plasmid(GeneCopoeia Cat.No.CSHCTR001-LVRU6GP)was co-transfected into293Ta cells(GeneCopoeia Cat.No.LT008)with the Lenti-Pac HIV Packaging Mix(GeneCopoeia Cat.No.LT001).Lentivirus-containing supernatants were harvested48hours after transfection and stored at-80°C.User manualPlease contact GeneCopoeia for a copy or download at:https:///wp-content/uploads/2018/03/Lentivirus-protocol-GeneCopoeia.pdfGeneCopoeia,Inc.9620Medical Center Drive,Suite101Rockville,Maryland20850Tel:301-762-0888Fax:301-762-8333Email:***********************Web:GeneCopoeia Products are for Research Use Only Copyright©2021GeneCopoeia Inc. Trademarks:Lentifect™,Lenti-Pac™,OmicsLink™,EndoFectin™,TiterBoost™(GeneCopoeia Inc.)LP519-040721。
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特灵中央空调机组RTHD详细介绍
B1—180 B2—200 C1—250 C2—300
D1—300 D2—360 D3—450 E3—480（epinal）
RTHD压缩机
压缩机剖视图
RTHD压缩机
剖视图
加载/卸载电磁阀
Unload
Load
压缩机
负荷控制—全载荷
压缩机
负荷控制—部分载荷
水冷螺杆式冷水机 RTHD
主要内容
RTHD 概况 RTHD与RTHB、RTHC机组的比较 RTHD 主 要 部 件 及 运 行
控制、蒸发器、压缩机、EXV、油系统、冷凝器
RTHD 概况
产品系列: 175-450 Tons 单压缩机, 直接驱动 单制冷回路 0.572-0.677 kW/Ton (at ARI) 78 dBa 声压 电子膨胀阀 制冷剂: HFC-134a CH530
—直到888RLA 固态启动器
—直到623RLA 65,000 Amp短路电路
承载额定电压460V 35,000 Amp短路电路
承载额定电压600V
星-三角启动器
压缩机(CHHC)
两极电机 双排气管 额外的钢材 R-134a 制冷剂 卸载到 25% 双螺杆
RTHD机组的压缩机CHHC
RTHD EXV 视镜 –位置指示器
位置指示器用来比较实际位置与CH530显示位置 用来机械诊断EXV故障
阀门开度位置指示器
关闭
半开
全开
油系统
增高了油槽 —阻碍油迁移 —在反向启动条件帮助油流动 —改变光学油感应器位置
隔离阀 过滤器 油电磁阀 油传感器
油路
油路没有油冷却器
油路
的压降
降膜蒸发器
高亮度三色PLCC6黑体LED数据手册说明书
ASMT-YTC2-0AA02High Brightness Tricolor PLCC6 Black Body LEDData SheetDescriptionThe high brightness black top surface tri-color PLCC-6 family of SMT LEDs has a separate heat path for each LED dice, enabling the LED to be driven at higher current. These SMT LEDs are in the high brightness category, are high reliability devices, are high performance and are designed for a wide range of environmental condi-tions. By integrating the black top surface Avago devices deliver better contrast enhancement for your applica-tion. They also provide super wide viewing angle at 120° with the built in reflector pushing up the intensity of the light output. The high reliability characteristics and other features make the black top surface tri-color PLCC-6 family ideally suitable for exterior and interior full color signs ap-plication conditions.For easy pick & place, the LEDs are shipped in EIA-com-pliant tape and reel. Every reel is shipped from a single intensity and color bin; except red color providing betteruniformity. These tri-color LEDs are compatible with reflow soldering process.Featuresx Industry Standard PLCC-6 package (Plastic Leaded Chip Carrier) with individual addressable pin-out for higher flexibility of driving configuration x High reliability LED package with silicone encapsulation x High brightness using AlInGaP and InGaN dice technologies x Wide viewing angle at 120qx Compatible with reflow soldering process x JEDEC MSL 2ax Water-Resistance (IPX6*) per IEC 60529:2001* The test is conducted on component level by mounting the components on PCB with proper potting to protect the leads. It is strongly recommended that customers perform necessary tests on the components for their final application.Applications x Indoor full color display CAUTION: LEDs are Class 1C ESD sensitive. Please observe appropriate precautions during han-dling and processing. Please refer to Avago Application Note AN-1142 for additional details.Table 1. Device Selection GuidePart NumberColor 1 - AlInGaP Red Color 2 - InGaN Green Color 3 - InGaN Blue Min. Iv @20mATyp. Iv @ 20mA Max Iv @ 20mA Min. Iv @ 20mA Typ. Iv @ 20mA Max Iv @ 20mA Min. Iv @ 20mA Typ. Iv @ 20mA Max Iv @ 20mA Bin ID (mcd)(mcd)(mcd)Bin ID (mcd)(mcd)(mcd)Bin ID (mcd)(mcd)(mcd)ASMT-YTC2-0AA02T2355450715U1450560900R2140180285Notes:1. The luminous intensity I V , is measured at the mechanical axis of the LED package and it is tested in pulsing condition. The actual peak of the spatial radiation pattern may not be aligned with this axis.2. Tolerance = ± 12%Part Numbering SystemPackaging Option Color Bin Selection Intensity Bin Limit Intensity Bin SelectionDevice Specification Configuration Package Type C: Black Body Tricolor ColorT: TricolorProduce FamilyY: Silicone Based PLCC6Notes:1. All Dimensions are in millimeters2. Tolerance = ±0.2 mm unless otherwise specified3. Terminal Finish: Ag plating4. Encapsulantion material: silicone resin (Full Black Body)Lead Configuration1Cathode Blue 2Cathode Green 3Cathode Red 4Anode Red 5Anode Green 6AnodeBluePackage Dimensions10.534256Table 2. Absolute Maximum Ratings (T A = 25°C)Parameter Red Green & Blue Unit DC forward current [1] 5030mA Peak forward current [2]100100mA Power dissipation125114mW Reverse voltage4V[3]V Maximum junction temperature T j max125°C Operating temperature range -40 to + 110[4]°C Storage temperature range-40 to + 120°C Notes:1. Derate linearly as shown in Figure 4a & 4b.2. Duty Factor = 10% Frequency = 1KHz3. Driving the LED in reverse bias condition is suitable for short term only4. Refer to Figure 4a and figure 4b for more informationTable 3. Optical Characteristics (T A = 25°C)ColorDominant Wavelength,O d (nm) [1]Peak Wavelength,O p (nm)Viewing Angle2T½[2] (Degrees)Luminous EfficacyK V[3] (lm/W)Luminous EfficiencyK e (lm/W) Min Typ.Max Typ.Typ.Typ.Typ.Red61862262862912021022Green525530 53752112053525Blue465470477464120845Notes:1. The dominant wavelength is derived from the CIE Chromaticity Diagram and represents the perceived color of the device.2. T½ is the off axis angle where the luminous intensity is ½ the peak intensity3. Radiant intensity, Ie in watts / steradian, may be calculated from the equation Ie = I V / K V, where I V is the luminous intensity in candelas and K V isthe luminous efficacy in lumens / watt.4. )V is the total luminous flux output as measured with an integrating sphere at mono pulse condition.Table 4. Electrical Characteristics (T A = 25°C)ColorForward Voltage,V F (V) [1]Reverse VoltageV R @ 100P AReverse VoltageV R @ 10P AThermal ResistanceR T J-P (°C/W) [2] Min Typ.Max.Min.Min.TypRed 1.80 2.10 2.504–280 Green2.80 3.20 3.80–4180 Blue 2.80 3.20 3.80–4180 Notes:1. Tolerance ± 0.1V.2. One chip on thermal resistanceFigure 1. Relative Intensity vs Wavelength Figure 2. Forward Current-mA vs Forward Voltage-VFigure 3. Relative Intensity vs Forward CurrentFigure 4a. Maximum forward current vs. ambient temperature. Derated based on T JMAX = 125°C. (3 chips)Figure 4b. Maximum forward current vs. ambient temperature. Derated based on T JMAX = 125°C. (single chip)0.00.20.40.60.81.0WAVELENGTH - nmR E L A T I V E I N T E N S I T Y 020406080100FORWARD VOLTAGE-VF O R W A R D C U R R E N T -m A0.00.51.01.52.02.53.03.54.04.55.0DC FORWARD CURRENT-mAR E L A T I V E L U M I N O U S I N T E N S I T Y (N O R M A L I Z E D A T 20m A )010203040506020406080100120AMBIENT TEMPERATURE (°C)M A X A L L O W A B L E C U R R E N T -m A AlInGaPInGaN 0102030405060020406080100120AMBIENT TEMPERATURE (°C)M A X A L L O W A B L E C U R R E N T - m AAlInGaPInGaNFigure 5a. Radiation Pattern for X axisFigure 5b. Radiation Pattern for Y axisFigure 5c. Component Axis for Radiation PatternsFigure 6. Relative Intensity vs Junction Temperature Figure 7. Forward Voltage vs Junction TemperatureXX YYN O R M A L I Z E D L O P a t T J =25°C0.1110----0.0.F O R W A R D V O L T A G E S H I F T - VT J - J UNC TI ON TE MP E RA T UR E &T J - J UNC TI ON TE MP E RA T UR E &0.00.20.40.60.81.0-90-60-300306090ANGU L AR D I SP L AC E M E N T - D E GR EEN O R M A L I Z E D I N T E N S I T Y00.20.40.60.81ANGU L AR D I SP L AC E M E N T - D E GR EEN O R M A L I Z E D I N T E N S I T YFigure 8b. LED Configuration on land patternFigure 9. Recommended Pick and Place Nozzle TipTI METI MET E M P E R A T U R EFigure 10. Recommended leaded reflow soldering profile.Figure 11. Recommended Pb-free reflow soldering profile.Note: For detail information on reflow soldering of Avago surface mount LEDs, do refer to Avago Application Note AN 1060 Surface Mounting SMTLED Indicator ComponentsFigure 8a. Recommended soldering land pattern.I DI D = 1.7mm OD = 3.5mme fl o w l der ing i re cti o nFigure 12. Carrier tape DimensionFigure 13. Reel DimensionWITH DEPRESSION (0.25 mm)4.00P a ck a g e 10+–0.11101Figure 14. Reeling OrientationIntensity Bin LimitBin IDMin (mcd)Max (mcd)R2140.0180.0S1180.0224.0S2224.0285.0T1285.0355.0T2355.0450.0U1450.0560.0U2560.0715.0V1715.0900.0Tolerance for each bin limits is ±12%Color Bin Selection (X 2, X 3)Individual reel will contain parts from 1 half bin onlyX 2Min Iv Bin (Minimum Intensity Bin)RedGreenBlueAT2U1R2X 3Number of Half Bin from X 2RedGreenBlueA333Color Bin Selection (X 4)Individual reel will contain parts from 1 full bin onlyX 4Color Bin CombinationsRedGreenBlueFulldistributionA,B,CA,B,C,D,EPackaging Option (X 5)OptionTest CurrentReel Size220mA7 inchColor Bin Limits Red Color Bin TableBin IDMin DomMax DomFullDistribution618628x 0.68730.66960.68660.7052y0.31260.31360.29670.2948Tolerance of each bin limit is ± 1 nmGreen Color Bin TableBin IDMin DomMax DomA 525.0531.0x 0.11420.17990.21380.1625y 0.82620.67830.66090.8012B 528.0534.0x 0.13870.19710.22980.1854y 0.81480.67030.65070.7867C531.0537.0x 0.16250.21380.24540.2077y0.80120.66090.63970.7711Tolerance of each bin limit is ± 1 nmBlue Color Bin TableBin IDMin DomMax DomCorner Point1234A 465.0469.0x 0.13550.17510.1680.127y 0.03990.09860.10940.053B 467.0471.0x 0.13140.17180.16380.122y 0.04590.10340.11670.063C 469.0473.0x 0.12670.1680.15930.116y 0.05340.10940.12550.074D 471.0475.0x 0.12150.16380.15430.1096y 0.06260.11670.13610.0868E473.0477.0x 0.11580.15930.14890.1028y0.07360.12550.14900.1029Tolerance of each bin limit is ± 1 nmFor product information and a complete list of distributors, please go to our web site: Avago, Avago Technologies, and the A logo are trademarks of Avago Technologies in the United States and other countries.Data subject to change. Copyright © 2005-2010 Avago Technologies. All rights reserved. AV02-2589EN - October 5, 2010DISCLAIMER: Avago’s pro ducts and so ftware are no t specifically designed, manufactured o r autho rized fo r sale as parts, co mpo nents o r assemblies fo r the planning, co nstructio n, maintenenace o r direct o peratio n o f a nuclear facility or for use in medical devices or applications. Customer is solely responsible, and waives all rights to make claims against avago or its suppliers, for all loss, damage, expense or liability in connection with such use.Handling PrecautionThe encapsulation material of the LED is made of silicone for better product reliability. Since silicone is a soft material, avoid pressing on the silicon or poking the silicon with a sharp object as the product could be damaged and cause premature failure. During assembly handling, the unit should be held by the body only. Please refer to Avago Application Note AN 5288 for additional handling infor-mation and proper procedures.Moisture SensitivityThis product has a Moisture Sensitive Level 2a rating perJEDEC J-STD-020. Refer to Avago Application Note AN5305, Handling o f Mo isture Sensitive Surface Mo unt Devices, for additional details and a review of proper handling procedures.A. Storage before use– An Unopened moisture barrier bag (MBB) can be storedat <40°C/90%RH for 12 months. If the actual shelf life has exceeded 12 months and the humidity Indicator Card (HIC) indicates that baking is not required, then it is safe to reflow the LEDs per the original MSL rating.– It is recommended that the MBB not be opened prior to assembly (e.g. for IQC).B. Control after opening the MBB– The humidity indicator card (HIC) shall be read immedi-ately upon opening of MBB.– The LEDs must be kept at <30°C/60%RH at all times and all high temperature related processes including soldering, curing or rework need to be completed within 672 hours.C. Control for unfinished reel– Unused LEDs must be stored in a sealed MBB with desiccant or desiccator at <5%RH.D. Control of assembled boards – If the PCB soldered with the LEDs is to be subjected to other high temperature processes, the PCB need to be stored in sealed MBB with desiccant or desiccator at<5%RH to ensure that all LEDs have not exceeded theirfloor life of 672 hours.E. Baking is required if:– The HIC indicator is not BROWN at 10% and is AZURE at 5%.– The LEDs are exposed to condition of >30°C/60% RH atany time.– The Led floor life exceeded 672hrs.The recommended baking condition is: 60±5°C for 20hrs。
COMLAB维护手册详细
COMLA 直放站维护手册 一、光纤直放站工作原理光纤直放站主要有以下几个部分组成：光近端机、光纤、光远端机。
光近端机和光远端机都包括射频单元（RF 单元）和光单元。
无线信号从基站中耦合岀来后，进入光近端机，通过电光转换， 电信号转变为光信号， 从光近端机输入至光纤，经过光纤传输到光远端机，光远端机把光信号转为电信号，进入 RF 单元进行放大，信号经过放大后送入发射天线，覆盖目标区域。
上行链路的 工作原理一样，手机发射的信号通过接收天线至光远端机，再到近端机，回到基站。
COMLA 直放站系统图：、COMLAB 光纤直放站的概述 直放站设备主要应用于隧道内 直放站是扩大网络覆盖，提高网络质量和设备利用率的有效手段。
武广高铁全线使用 COMLAB 光纤直放站。
1）设备硬件介绍Maeile- mv ■ *37 dBm -ino ：£m£.'N-EldBffl ArnmhUplinKK°r»tKWTirik-TDdBm叫•专日韓SKPUl "MR口4皿j-Qna DniMt-IICMilTI-ftGSM-R 的信号覆盖，也兼顾外部空间场强GSM-R 信号收发。
光纤f© FibJ陆"■ <—IMUSTSfl[3-Co 』g fHkk =7Z dBrnvmMiri■41-1G4&-iMTPOdDri■IWBrr1—MU-6 md RU G 11 ForREdunnanl repentef SysiFm-e TdEEMU设备图：1 / 16电源线的接入处馈线接入3dB电桥处诩线的一* 的3dB iU桥巧一端连接到10dB耦舍器匕的舞汁端-48设备图：RU谨接竭子煮接线孔天线丸ANTI) 人线2(ANT 2) 龙扑礼忻。
］) +.1>'：L (POWER)(N-female>(N-female) SC/APC (int^md)R'W 3'2.5uin,.J2 / 16(内部的连卸ANT 1 AST：^^T(FOI ■也源詫地线(.EaHh.i■外部的连接光模块注意：各种线缆最小弯曲半径：电源线200 mm、光纤200 mm、馈线100 mm2）设备特点MU的主要特点：1、每台MU用2根馈线通过定向耦合器连接连接到1个基站上，直接提供两路射频输出2、 MU用光纤以星型方式连接到RU上。
QuantiNova SYBR Green PCR Kit Ultrafast说明书
Stringent hot start
Single copy detection
QIAGEN Rotor-Gene® Q
Wide orm. Fluoro.
9
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6
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1 5 10 15 20 25 30 35 40 Cycle
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Cq value 45 40 35 30 25
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ViiA 7 11.33 14.67 18.11 21.74 25.08 28.57 31.85 35.39
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CFX96 11.55 14.94 18.37 22.12 25.40 28.74 32.29 36.02
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Applied Biosystems ViiA 7
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RFU 2000
Bio-Rad CFX96
3.0
1500
2.0
1000
不同类型太阳能辅助三联供系统的评价与案例分析
ISSN 1002-4956 CN11-2034/T实验技术与管理Experimental Technology and Management第38卷第3期202丨年3月Vol.38 No.3 Mar. 2021DOI: 10.16791 /j .cnki.sjg.2021.03.011不同类型太阳能辅助三联供系统的评价与案例分析杨晓辉，刘康(南昌大学信息工程学院，江西南昌330031 )摘要：为了研究太阳能光热辅助三联供系统（ST-CCHP )、太阳能光伏辅助〒联供系统（PV-CCHP )、太阳能光 伏光热辅助三联供系统（PVT-CCHP )在4种配置方案下，分别以电定热（F E L)和热定电（FTL )运行模式运行时，各项评价指标的变化规律，建立了热力学、经济性、环境性3项评价指标，以综合性能指标最高为目标函数进行优化结果表明，在同一配置方案及运行模式下PVT-CCHP系统仅能保持一次能源节约率最高，年度总成本 节约率、C O:减排率、综合性能并不始终优于ST-CCHP. PV-CCHP系统_ST-CCHP系统一次能源节约宇.、C02减排率、综合性能则维持在最低水平：关键词：太阳能辅助三联供系统；运行模式；评价指标；优化配贤中图分类号：TM715 文献标识码：A 文章编号：1002-4956(2021)03-0051-06Evaluation and case analysis of different types ofsolar-assisted triple generation systemsYANG Xiaohui,LIU Kang(School of Information Engineering, Nanchang University, Nanchang 330031, China)Abstract: To study three types of solar energy auxiliary trigeneration systems, i.e., solar thermal-assisted trigeneration systems (ST-CCHP), solar photovoltaic-assisted trigeneration systems (PV-CCHP), solar photovoltaic and thermal collector-assisted trigeneration systems (PVT-CCHP) under the four-configuration scheme, the variation rules of various evaluation indexes are observed, when the solar energy auxiliary trigeneration systems run with following electric load (FEL) and following thermal load (FTL) operation strategies. Three evaluation indexes of thermodynamics, economy, and environment are established, and the highest comprehensive performance index is taken as the objective function for optimization. The results show that the PVT-CCHP system can only maintain the highest primary energy saving rate under the same configuration scheme and operation mode, and the annual total cost-saving rate, emission reduction rate, and comprehensive performance are not always better than the ST-CCHP and PV-CCHP systems. The primary energy saving rate, emission reduction rate, and comprehensive performance of the ST-CCHP system remain at the lowest level.Key words: solar energy auxiliary trigeneration system; operation model; evaluation index; optimizing configuration太阳能是一种清洁且可再生的能源，人们在日常 生活中利用太阳能的方式多种多样，典型的太阳能系 统主要有3类：将太阳能转化为热能的太阳能光热系 统（ST );将太阳能转化为电能的太阳能光伏系统 (PV);将太阳能同时转化为热能和电能的太阳能光 伏光热系统（PVT)。
SECURE TACTILE DISPLAY SYSTEMS
专利名称：SECURE TACTILE DISPLAY SYSTEMS发明人：GALEN RAFFERTY,Austin WALTERS,JeremyGOODSITT申请号：US17061379申请日：20201001公开号：US20220108630A1公开日：20220407专利内容由知识产权出版社提供专利附图：摘要：In certain embodiments, secure data presentation may be facilitated for a tactile system. In some embodiments, the tactile system may include a display havingcarbon nanotube-based components having a surface that absorbs at least 96% of visiblelight. The tactile system may obtain tactile data and present the tactile data on the display by adjusting one or more positions of the carbon nanotube-based components based on the tactile data. In some embodiments, the tactile system may obtain environmental data (e.g., lighting data, presence data, etc.) for an environment (in which the display is located) and perform the adjustment of the positions of the carbon nanotube-based components based on (i) the tactile data and (ii) the environmental data.申请人：Capital One Services, LLC地址：McLean VA US国籍：US更多信息请下载全文后查看。
探讨多巴胺转运蛋白显像剂11C-β-CFT合成效率的影响因素
探讨多巴胺转运蛋白显像剂11C-β-CFT合成效率的影响因素李海峰; 徐仁根; 李云钢; 陈志军; 张晓军; 张锦明【期刊名称】《《同位素》》【年(卷),期】2018(031)005【摘要】本文以^(11)C-Triflate-CH3为甲基化试剂合成多巴胺转运蛋白显像剂^(11)C-β-CFT,探讨^(11)C-β-CFT合成效率的影响因素,优化合成条件,提高其合成效率。
使用国产合成模块PET-CM-3H-IT-Ⅰ全自动化合成^(11)C-β-CFT,通过研究合成过程中反应溶剂、轰靶时间、前体量及淋洗终产品条件等影响因素,得到优化后^(11)C-β-CFT的生产条件:轰靶时长10~24 min,前体浓度为0.5~1.0g/L,以0.2 mL体积比V(丙酮)∶V(乙腈)=1∶1为溶剂,反应条件为室温。
从传输^(11)C-CO2到终产品的总合成时间为16min,产量为(8.07±1.94)GBq(n=76);此条件下^(11)C-β-CFT的合成效率为(76.93±6.49)%(n=76,^(11)CTriflate-CH3校正效率),产品的放化纯度大于97%,比活度(56.26±1.55)TBq/g。
优化后的生产条件可以提高^(11)C-β-CFT合成效率,解决了Sep-Pak C18柱残留产品过多的问题,可实现稳定、全自动化合成^(11)C-β-CFT且保证产品满足临床需求。
【总页数】6页(P304-309)【作者】李海峰; 徐仁根; 李云钢; 陈志军; 张晓军; 张锦明【作者单位】江西省肿瘤医院核医学科南昌330029; 中国人民解放军总医院核医学科北京100853【正文语种】中文【中图分类】TL92+3【相关文献】1.自动化制备多巴胺转运蛋白显像剂11C-β-CFT及其在正常新生猪脑内PET/CT 显像中的应用 [J], 张妍芬;王晓明;曹礼;王晓煜;刘长平;李云涛;辛军;郭启勇2.多巴胺转运蛋白显像剂11C-β-CFT的全自动化合成 [J], 文富华;邓怀福;王红亮;易畅;杨云英;吴克宁;史新冲;唐刚华3.多巴胺转运蛋白显像剂FP-β-CIT的合成及碘标记 [J], 方平;陈正平;周翔4.在线自动化制备多巴胺转运蛋白显像剂^(11)C-β-CFT [J], 张锦明;田嘉禾;郭喆;丁为民;姚树林;尹大一;刘伯里5.多巴胺转运蛋白显像剂^(18)F-β-FP-CIT的合成与质量控制 [J], 唐刚华;唐小兰;王明芳;黄祖汉因版权原因，仅展示原文概要，查看原文内容请购买。
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特灵螺杆式水冷冷水机组
特灵螺杆式水冷冷水机组•特灵空调产品简介
•螺杆式机组组成部分
•螺杆式机组制冷循环
•螺杆式机组压缩机能量控制
•螺杆式机组运行操作
特灵螺杆式水冷冷水机组
第一部分内容
特灵空调产品简介
冷冻水循环主要组成及集中控制
冷却塔
冷却水循环泵
空气处理机
末端设备
制冷主机
蓄冰筒
冷冻水循环泵中控主机控制模块
特灵吸收式冷水机特灵离心式冷水机特灵风冷式,水冷式螺杆式冷水机
特灵商用型空调产品
大型分体往复式机组
特灵空调末端产品
变风量末端箱可调节风量阀门
风机盘管
特灵专业空调中央控制系统
不断完善创新的
空调中央控制
硬件及软件
全新的理念-购买冷水,而不是主机
为一所大学提供2400
冷吨的冷量为一家工厂提供8700 冷吨的冷量全新的理念-购买冷水,而不是主机
舒适的生活环境
我们的目标
为您提供“舒适的生活环境”
特灵螺杆式水冷冷水机组
第二部分内容
机组组成部分
特灵螺杆式水冷冷水机组
第一代RTHA螺杆式机组
特灵螺杆式水冷冷水机组
第二代RTHB螺杆式机组
特灵螺杆式水冷冷水机组
第三代RTHC螺杆式机组
特灵螺杆式水冷冷水机组
•直接传动,低速运转,运行可靠
•采用五级轴承,与飞机引擎同级
•用制作核潜艇螺旋浆的多头钻床
加工螺杆压缩机
•结构简单,只有三个运转部件,易损件少
可靠性高
•滑阀调节制冷量,15%~100%无级调节
冷水机组内部结构
蒸发器
控制盘
冷凝器电子膨胀阀
节能器启动柜
电机压缩机油分离器
螺杆压缩机
•优秀第四代阳阴5~7转子
•最精密的转子加工设备,确保
最精确的转子间隙
•运转更平稳,效率更高,噪声更低
•滑阀调节制冷量,15%~100%无级调节
阴阳螺杆的加工过程
直接传动螺杆压缩机及电机
•密闭式,直接驱动,转速2950转
•液态制冷剂直接冷却,运行可靠
•采用5级轴承,与飞机引擎轴承同级
•无齿轮变速箱,避免部分负荷齿轮传动
造成的能量损失
螺杆压缩机阴阳转子
7齿阴转子5齿阳转子
螺杆压缩机基本组成
阴转子
阴转子
阳转子
压缩机外壳
滑阀
排气口
螺杆压缩机基本组成
吸气口
螺杆压缩制冷剂过程
吸气口
阴阳转子与外壳
封存的制冷剂蒸气(V)
螺杆压缩制冷剂过程
吸气口
封存的制冷剂
蒸气(V)
排气口
螺杆压缩制冷剂过程
封存的制冷剂
蒸气(V)
排气口
测量记录点
螺杆压缩制冷剂过程
封存的制冷剂
蒸气(V)
排气口
测量记录点
螺杆压缩制冷剂过程
封存的制冷剂
蒸气被排出(V)
测量记录点
复式固定孔板流量控制装置
特灵专利的复式固定孔板流量控制装置取消了运转部件,可在任何负荷情况可靠运行
进入蒸发器节流孔板制冷剂液位H1复式固定孔板流量控制装置
全负荷运行情况
制冷剂液体经过节流孔板状态
闪发制冷剂蒸气
复式固定孔板流量控制装置
进入蒸发器
节流孔板
部分负荷运行情况
制冷剂液体经过节流孔板状态
制冷剂
液位H2
经第一级节流闪发制冷剂蒸气
经第二级节流加第一级
节流闪发制冷剂蒸气
复式固定孔板流量控制装置
全负荷与部分负荷
全负荷
均能够有效的控制制冷剂流量部分负荷
控制盘
•提供主机三相过载保护
•主机运转状况及诊断监视
•LCD液晶清晰显示,多种语言显示
•薄膜触摸式键盘输入,操作方便
•多种安全控制,三种故障诊断等级
•自动记录启动时间,发生故障时间
先进的自动控制系统
...
时间
高压停机设定点冷凝压力
冷凝压力过高限制点
多种的先进的自动控制,如PID(比例积分微分)冷凝压力控制
螺杆机油分离器
油分离器
制冷剂蒸气排气口高温高压
制冷剂蒸气
集油槽(内有油加热器)
螺杆机供油系统
油分离器
螺杆轴承
油流量开关
C B A
油过滤器主电磁阀
电机冷却及节能器
12
2
2
2
34
5
6
1.电动机转子
2.电动机定子
3.节能器挡液网
4.集油槽
5.冷却电机液体制冷剂入口
6.回到压缩机制冷剂蒸气管
3
问题及讨论
特灵螺杆式水冷冷水机组
第三部分内容
机组制冷循环
制冷循环基本组成部分
冷凝器
蒸发器压缩机
节
流
装
置
去冷却塔去空调系统
压-焓图(LogP-H)
过冷制冷剂液体
气液混合区
40.5 Btu/lb
压力
过热制冷剂蒸气
B
A
222.4 psia
112.3 Btu/lb
饱和气体线
饱和液体线
RTHB 螺杆机制冷循环
14
9
6
32
5
7
8
10
11
1.蒸发器
2.挡液滤网
3.压缩机
4.止回阀
5.油分离器
6.冷凝器
7.电子膨胀阀8.制冷剂过滤器9.压缩机电机10.节能器
11.复合固定节流孔板
RTHB 螺杆机制冷循环
1
4
6
325
7
8
9
RTHB 螺杆机制冷循环(P-H 图表示)
1
23
46
7
压力
蒸发器冷凝器膨胀节流装置
8
9
P e
P c P 15
节能器
特灵螺杆式水冷冷水机组
第四部分内容
压缩机能量控制
压缩机能量控制
能量控制滑阀
排气口
滑阀控制机构
来自油箱的高压润滑油
加载电磁阀减载电磁阀
回
到
压
缩
机
部
分
弹簧气缸
活
塞
滑阀控制全负荷
去到排气口
轴向口
径向口
滑阀控制部分负荷
回到吸气口
去到排气口
径向口
滑阀开口
滑阀控制加减载
径向口
径向口
轴向口
滑阀开口
滑阀运动方向关闭滑阀
加载滑阀运动方向打开滑阀
减载。