半导体专业英语词汇手册
半导体行业英文术语
半导体行业英文术语English:Some common terms in the semiconductor industry include:1. Integrated Circuit (IC): A small electronic device made out of a semiconductor material that can perform an extensive range of functions.2. Semiconductor manufacturing: The process of creating integrated circuits and semiconductor devices, including design, fabrication, and packaging.3. Wafer: A thin slice of semiconductor material used as the substrate for the fabrication of integrated circuits.4. Photolithography: A process used to transfer circuit patterns onto the wafer surface using light and photoresist materials.5. Die: A single piece of an integrated circuit, typically cut from a wafer after fabrication and packaging.6. Yield: The percentage of functional and operational semiconductor devices produced during the manufacturing process.7. Moore's Law: The observation that the number of transistors in a dense integrated circuit doubles approximately every two years, leading to exponential growth in processing power.8. Quantum tunneling: A phenomenon in which electrons penetrate through a potential barrier they classically shouldn't be able to cross, crucial for the operation of semiconductor devices.中文翻译:半导体行业的一些常见术语包括:1. 集成电路(IC):由半导体材料制成的小型电子器件,可执行广泛的功能。
半导体词汇(英汉对照)
半导体词汇(英汉对照)1. 半导体:semiconductor2. 晶体管:transistor3. 二极管:diode4. 集成电路:integrated circuit5. 电容:capacitor8. 金属氧化物场效应管:Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET)9. 数字信号处理器:Digital Signal Processor (DSP)10. 有机发光二极管:Organic Light-Emitting Diode (OLED)11. 光纤放大器:Optical Fiber Amplifier (OFA)12. 直流-直流变换器:DC-DC Converter13. 脉冲编码调制:Pulse Code Modulation (PCM)14. 光耦合器:Optocoupler15. 调制解调器:Modem16. 电池管理系统:Battery Management System (BMS)17. 片上系统:System-on-a-Chip (SoC)18. 功率电子器件:Power Electronics Device20. 纳米技术:Nanotechnology21. 生物芯片:Biochip23. 激光器:Laser24. 双极型发射极晶体管:Bipolar Junction Transistor (BJT)28. 传感器:Sensor29. 能量收集器:Energy Harvester30. 固态驱动器:Solid State Drive (SSD)31. 磁性存储设备:Magnetic Storage Device32. 屏幕显示器:Display33. 快速门:Fast Gate35. 超高速芯片:Ultra-High-Speed Chip38. 量子计算机:Quantum Computer40. 机器人学:Robotics41. 表面声波器件:Surface Acoustic Wave (SAW) Device45. 长寿命电池:Long-Life Battery46. 红外光电探测器:Infrared Photodetector47. 树莓派:Raspberry Pi48. 可充电电池:Rechargeable Battery49. 无线充电器:Wireless Charger51. 控制电路:Control Circuit53. 逆变器:Inverter55. 拓扑优化器:Topology Optimizer57. 智能家居:Smart Home58. 传输线理论:Transmission Line Theory60. 片上调制器:On-Chip Modulator61. 内存芯片:Memory Chip63. 线性电源:Linear Power Supply64. 电机驱动器:Motor Driver66. 相变存储器:Phase-Change Memory (PCM)68. 氮化镓:Gallium Nitride (GaN)69. 自动驾驶:Autonomous Driving72. 机器学习:Machine Learning77. 差分信号:Differential Signal78. 相位锁定环:Phase Locked Loop (PLL)80. 峰值检测器:Peak Detector84. 相移器:Phase Shifter88. 滤波器:Filter91. 直流伏安表:Digital Multimeter (DMM)92. 频率计:Frequency Counter93. 降噪耳机:Noise-Canceling Headphones94. 耳返系统:In-Ear Monitoring (IEM) System95. 电学模型:Electrical Model97. 声音芯片:Audio Chip98. 跟踪器:Tracker。
半导体制造专业英语术语
球栅阵列舞厅式布局,超净间的布局 圆桶型反应室 阻挡层金属势垒电压backing film 背膜baffle vt ・ 困惑,阻碍,为难(挡片)baffle assembly n. 集合,装配,集会,集结,汇 编 (挡片块)丨 基极,基区 batch 批 bay and chase beam blow-up离子束膨胀 beam deceleration 束流减速分类代码号双极双极技术(工艺) bird ' s beak effect 鸟嘴效应blanket deposition 均厚淀积blower增压泵boat 舟BOE 氧化层刻蚀缓冲剂Bon voyage [法]再见,一路顺风[平安]bonding pads 压点bonding wire 焊线,引线boron(B) 硼boron trichloride(BCL3) 三氯化硼boron trifluoride (B F3)三氟化硼borophosphosilicate glass(BPSG)硼磷硅玻璃borosilicate glass(BSG) 硼硅玻璃bottom antireflective coating(BARC)下减反射涂层boule单晶锭bracket n.墙上凸出的托架,括弧,支架v.括在一起breakthrough step 突破步骤,起始的干法刻蚀步骤brightfield detection 亮场检查brush scrubbing 涮洗bubbler 带鼓泡槽buffered oxide etch(BOE) 氧化层腐蚀缓冲液bulk chemical distribution 批量化学材料配送bulk gases 大批气体bulkhead equipment layout 穿壁式设备布局bumped chip 凸点式芯片buried layer 埋层burn-box 燃烧室(或盒) burn-in 老化CCA 化学放大(胶) cantilever n. 建]悬臂cantilever paddle 悬臂桨cap oxide 掩蔽氧化层capacitance 电容capacitance-voltage test(C-Vtest) 电容-电压测试capacitive coupled plasma 电容偶合等离子体capacitor 电容器carbon tetrafluoride(CF4) 四氟化碳caro ' s acid3 号液carrier 载流子carrier-depletion region 载流子耗尽层carrier gas 携带气体cassette (承)片架cation 阳离子caustic 腐蚀性的cavitation 超声波能CD 关键尺寸CD- SEM 线宽扫描电镜Celsius adj.摄氏的center of focus(COF) 焦点焦平面center slow 中心慢速central processing unit(CPU) 中央处理器ceramic substrate 陶瓷圭寸装CERDIP 陶瓷双列直插封装Channel 沟道channel length 沟道长度channeling 沟道效应charge carrier 载流子chase技术夹层chelating agent 螯合齐ijchemical amplification(CA) 化学放大胶chemical etch mechanism 化学刻蚀机理chemical mechanical planarization(CMP) 化学机械平坦化chemical solution 化学溶液chemical vapor deposition(CVD) 化学气相淀积chip 芯片chip on board(COB)板上芯片chip scale package(CSP)芯片尺寸圭寸装circuit geometries 电路几何尺寸class number 净化级另卩cleanroom 净化间cleanroom protocol 净化间操作规程Clearfield mask 亮场掩膜板Cluster tool 多腔集成设备CMOS 互补金属氧化物半导体CMP 化学机械平坦化Coater/developer track 涂胶/显影轨道Cobalt silicide 钻硅化合物coefficient n. [数]系数Coefficient of thermal expansion(CTE)热涨系数Coherence probe microscope 相干探测显微镜Coherent light 相干光coil v. 盘绕,卷Cold wall 冷壁Collector 集电极Collimated light 平行光Collimated sputtering 准直溅射Compensate v.偿还,补偿,付报酬Compound semiconductor 化合物半导体Concentration 浓度Condensation 浓缩Conductor 导体constantly adv・不变地,经常地,坚持不懈地Confocal microscope 共聚焦显微镜Conformal step coverage 共型台阶覆盖Contact 接触(孔)Contact alignment 接触式对准(光刻)Contact angle meter 接触角度仪Contamination 沾污、污染conti boat 连柱舟conticaster [冶]连铸机Continuous spray develop 连续喷雾显影Contour maps 包络图、等位图、等值图Contrast 对比度、反差contribution n.捐献,贡献,投稿Conventional-line photoresist 常规I 线光刻胶Cook' s theory库克理论Copper CVD 铜CVD Copper interconnect 铜互连Cost of ownership(COO) 业主总成本Covalent bond 共价键Critical dimension 关键尺寸Cryogenic aerosol cleaning 冷凝浮质清洗Cryogenic pump(cryopump) 冷凝泵Crystal 晶体Crystal activation 晶体激活Crystal defect 晶体缺陷Crystal growth 晶体生长Crystal lattice 晶格Crystal orientation 晶向CTE 热涨系数Current-driven current amplifier 电流驱动电流放大器CVD 化学气相淀积Cycle time 周期CZ crystal puller CZ 拉单晶设备Czochralski(CZ) method 切克劳斯基法Ddamascene 大马士革工艺darkfiled detection 暗场检测darkfiled mask 暗场掩膜版DC bias 直流偏压decompose v. 分解,(使)腐烂deep UV(DUV) 深紫外光default n.默认(值),缺省(值),食言,不履行责任,[律]缺席v.疏怠职责,缺席,拖欠,默认defects density 缺陷密度defect 缺陷deglaze 漂氧化层degree of planarity(DP) 平整度dehydration bake 去湿烘培,脱水烘培density 密度deplention mode 耗尽型degree of focus 焦深deposit n.堆积物,沉淀物,存款,押金,保证金,存放物vt ・存放,堆积vi.沉淀deposition 淀积deposited oxide layer 淀积氧化层depth of focus 焦深descum 扫底膜design for test(DFT)可测试设计desorption 解吸附作用develop inspect 显影检查development 显影developer 显影液deviation n.背离device isolation 器件隔离device technology 器件工艺DI water 去离子水Diameter n.直径diameter grinding 磨边diborane ( B2H6 )乙硼烷dichlorosilane(H2SiCL2) 二氯甲硅烷die 芯片die array 芯片阵列die attach 粘片die-by-die alignment 逐个芯片对准dielectric 介质dielectric constant 介电常数die matrix 芯片阵列die separation 分片diffraction 衍射diffraction-limited optics 限制衍射镜片diffusion 扩散diffusion controlled 受控扩散digital/analog数字/模拟digital circuit diluent direct chip attach( DCA) directionality discrete dishing dislocation dissolution ratedissolution rate monitor(DRM) 溶解率监测DNQ-novolak 重氮柰醌一酚醛树脂Donor 施主dopant profile 掺杂刨面) doped虚拟的, region 掺杂区 doping 掺杂 dose monitor剂量检测仪 dose,Q 剂量 downstream reactor 顺流法反应 drain 漏 drive-in推进 dry etch 干法刻蚀 dry mechanical pump干式机械泵 dry oxidation 干法氧化dummy n.哑巴,傀儡,假人,假货 adj. 假的,虚构的 n.[计]哑元 dynamic adj. 动力的,动力学的,动态的 E economies of scale 规模经济 edge bead removal 边缘去胶 edge die 边缘芯片edge exclusion 无效边缘区域 electrically erasable PROM 电可擦除 EPROM electrode 电极 electromigration 电迁徙 electron beam lithography 电子束光刻electron cyclotron resonance 电子共振回旋加速器 electron shower 电子簇射,电子喷淋 electron stopping 电子阻止 electronic wafer map 硅片上电性能分布图 electroplating 电镀 electropolishing 电解拋光electrostatic chuck 静电吸盘 electrostatic discharge(ESD)静电放电 ellipsometry 椭圆偏振仪,椭偏仪emitter 发射极 endpoint detection 终点检测 engineering n.工程(学) electrostatic discharge(EDX)能量弥散谱仪 enhancement mode 增强型 epi 夕卜延epitaxial layer 夕卜延层epoxy underfill 环氧树脂填充不足erasable PROM 可擦除可编程只读存储器erosion腐蚀,浸蚀establish vt・建立,设立,安置,使定居,使人民接受,确定v.建立etch 刻蚀etch bias刻蚀涨缩量etch profile 刻蚀刨面etch rate 刻蚀速率etch residue 刻蚀残渣etch uniformity 刻蚀均匀性etchant 刻蚀剂etchback planarization 返刻平坦化eutectic attach 共晶焊接eutectic temperature 共晶温度evaporation 蒸发even adj.平的,平滑的,偶数的,一致的,平静的,恰好的,平均的,连贯的adv.[加强语气]甚至(・・・也), 连…都,即使,恰好,正当vt.使平坦,使相等vi. 变平,相等n.偶数,偶校验exceed vt. 超越,胜过vi.超过其他excimer laser 准分之激光exposal n. 曝光,显露exposure 曝光exposure dose 曝光量extraction electrode 吸极extreme UV 极紫外线extrinsic silicon 掺杂硅F Fables无制造厂公司fabrication 制造facilities 设施factor n.因素,要素,因数,代理人fast ramp furnaces 快速升降温炉fault model 失效模式FCC diamond 面心立方金刚石feature size 特征尺寸FEOL 前工序Fick ' s lawsFICK 定律field-effect transistor 场效应晶体管field oxide 场氧化field-by-field alignment 逐场对准field-programmable PROM 现场可编程只读存储器film 膜film stress 膜应力final assembly and packaging 最终装配和圭寸装final test 终测first interlayer dielectric(ILD-1)第一层层间介质fixed oxide charge 固定氧化物电荷flats 定位边flip chip 倒装芯片float zone 区熔法fluorosilicate glass(FSG) 氟化玻璃focal length 焦距focal plane 焦平面focal point 焦点focus聚焦focus ion beam(FIB) 聚焦离子束footprint 占地面积formula n.公式,规则,客套语forward bias 正偏压four-point probe 四探针frenkel defect Frenkel 缺陷front-opening unified pod(FOUP)前开口盒functional test 功能测试furnace flat zone 恒温区G g-line G 线gallium(Ga)镓gallium arsenide(GaAs)砷化镓gap fill间隙填充gas 气体gas cabinet 气柜gas manifold 气瓶集装gas phase nucleation 气相成核gas purge 气体冲洗gas throughput 气体产量gate 栅gate oxide 栅氧化硅gate oxide integrity 栅氧完整性germanium(Ge) 错getter 俘获glass玻璃glazing 光滑表面global alignment 全局对准global planarization 全局平坦化glow discharge 起辉放电gray area 灰区,技术夹层gross defect 层错grove n. 小树林grown oxide layer 热氧化生长氧化层HHalogen 卤素hardbake 坚膜hardware n.五金器具,(电脑的)硬件,(电子仪器的)部件HEPA filter 高效过滤器hermetic sealing 密圭寸heteroepitaxy 异质外延heterogeneous reaction 异质反应hexamethyldisilazane(HMDS)六甲基二硅氨烷high-density plasma(HDPCVD) 高密度等离子体化学气相淀积高温扩散炉 high-density plasma etch 高密度等离子刻蚀 high-pressure oxidation 高压氧化high-temperature diffusion furnace high vacuum 高真空 high vacuum pumps 高真空泵 hillock 小丘(铝)尖刺 homoepitaxy 同质外延 homogeneous reaction 同质反应 horizontal adj.地平线的,水平的 horizontal furnace 臣卜式炉 hot electron 热电子 hot wall 热壁 hydrochloric acid(HCL)盐酸 hydrofluoric acid(HF)氢氟酸 hydrogen(H2)氢气 hydrogen chloride(HCL)氯化氢 hydrogen peroxide(H2O2)双氧水 hydeophilic 亲水性 hydrophobic 憎水性,疏水性 hyperfiltration 超过滤Ii-line I 线IC packaging 集成电路封装IC reliability 集成电路可靠性 Iddq testing 静态漏电流测试 image resolution 图象清晰度 图象分解力implant v.灌输(注入) impurity 杂质 increment n.增力口,增量 initial adj.最初的,词首的,初始的 n.词首大写 字母 in situ measurements 在线测量 index of refraction 折射率 indium 铟 inductively coupled plasma (ICP )电感耦合等离子体 inert gas惰性气体infrared interference 红外干涉ingot 锭ink mark墨水标识in-line parametric test 在线参数测试input/output(I/O)pin 输入/ 输出管脚institute n. 学会,学院,协会vt.创立,开始,制定,开始(调查),提起(诉讼) insulator 绝缘体integrate vt.使成整体,使一体化,求…的积分v.结合integrated circuit(IC)集成电路integrated measurement tool 集成电路测量仪interval n.间隔,距离,幕间休息n.时间间隔interconnect 互连interconnect delay 互连连线延迟interface-trapped charge 界面陷阱电荷interferometer 干涉仪interlayer dielectric(ILD) 层间介质interstitial 间隙(原子) intrinsic silicon 本征硅invoke v.调用ion 离子ion analyzer 离子分析仪ion beam milling or ion beam etching(IBE) 离子铣或离子束刻蚀ion implantation 离子注入ion implantation damage 离子注入损伤ion implantation doping 离子注入掺杂ion implanter离子注入机ion projection lithography(IPL) 离子投影机PVD ionization 离子化ionized metal plasma PVD 离子化金属等离子IPA vapor dry 异丙醇气相干燥isolation regions 隔离区isotropic etch profile各向同性刻蚀刨面JJEFT结型场效应管junction(pn) PN 结junction depth 结深junction spiking 结尖刺KKelvin绝对温度killer defect致命缺陷kinetically controlled reaction 功能控制效应L laminar air flow 层状空气流,层流式lapping 拋光latchup闩锁效应lateral diffusion 横向扩散law of reflection 反射定律LDD轻掺杂漏Leadframe 引线框架leakage cuttent 漏电流len透镜lens compaction 透镜收缩light 光light intensity 光强light scattering 光散射lightly doped drain(LDD) 轻掺杂漏linear 线性linear accelerator 线性加速器linear stage 线宽阶段,线性区linewidth 线宽liquid 液体lithography 光刻loaded brush沾污的毛刷loaded effect 负载效应loadlock真空锁local interconnect(LI)局部互连local planarization 局部平坦化local oxidation of silicon(LOCOS)硅局部氧化隔离法logic逻辑lot批low-pressure chemical vapor deposition (LPCVD) 低压化学气相淀积LSI大规模集成电路Mmagnetic CZ( MCZ )磁性切克劳斯基晶体生长法magnetically enhanced RIE(MERIE)磁增强反应离子刻蚀magnetron sputtering 磁控溅射Magnification n. 扩大,放大倍率magnificent adj. 华丽的,高尚的,宏伟的majority carrier 多子make-up loop补偿循环mask掩膜版n.面具,掩饰,石膏面像vt.戴面具,掩饰,使模糊vi.化装,戴面具,掩饰,参加化装舞会mask-programmable gate array 掩膜可编程门阵歹Umass flow controller(MFC) 质量流量计mass spectrometer 质谱仪mass-transport limited reaction 质量传输限制效应mathematical adj.数学的,精确的mean free path(MFP) 平均自由程medium vacuum 中真空adj. megasonic cleaning 超声清洗melt熔融membrane contactor薄膜接触器,隔膜接触器membrane filter薄膜过滤器,隔膜过滤器merchant n. 商人,批发商,贸易商,店主商业的,商人的mercury arc lamp 汞灯MESFET用在砷化镓结型场效应晶体管中的金属栅metal contact 金属接触孔metal impurities 金属杂质metal stack复合金属,金属堆叠metallization 金属化metalorganic CVD金属有机化学气相淀积metrology 度量衡学microchip微芯片microdefect 微缺陷microlithography 微光刻microloading微负载,与刻蚀相关的深宽比micron微米microprocessor n.[计]微处理器microprocessor unit 微处理器microroughness 微粗糙度Miller indices 密勒指数minienvironment 微环境minimum geometry 最小尺寸minority carrier 少子mix and match 混合与匹配mobile ionic contaminants(MIC)可动离子沾污mobile oxide charge 可动氧化层电荷module n.模数,模块,登月舱,指令舱modify vt・更改,修改v.修改molecular beam epitaxy (MBE) 分子束外延molecular flow 分子流monitor wafer(test wafer) 陪片,测试片,样片monocrystal 单晶monolithic device 单片器件Moore's law 摩尔定律MOS 金属氧化物半导体MOSFET 金属氧化物半导体场效应管motor curreant endpoint 电机电流终点检测(法) MSI中规模集成电路Multiplier n.增加者,繁殖者,乘数,增效器,乘法器multichip module(MCM) 多芯片模式multilenel metallization 多重金属化Murphy's model 墨菲模型N nanometer(nm)纳米native oxide 自然氧化层n-channel MOSFET n 沟道MOSFET negatine resist 负性光刻胶negative n.否定,负数,底片adj.否定的,消极的,负的,阴性的vt.否定,拒绝(接受) negatine resist development 负性光刻胶显影neutral beam trap 中性束陷阱next-generation lithography 下一代光刻技术nitric acid(HNO3)硝酸nitrogen(N2)氮气nitrogen trifluoride(NF3) 三氟化氮nitrous oxide (N2O) 一氧化二氮、笑气nMOS n沟道MOS场效应晶体管noncritical layer 非关键层nonvolatile memory 非挥发性存储器normality 归一化notch 定位槽novolak苯酚甲醛聚树脂材料npn npn 型(三极管) n-type silicon n 型硅nuclear stopping 离子终止nucleation 成核现象,晶核形成nuclei coalescence 核合并numericalaperture(NA) 数值孑L径n-well n 阱Oobjective (显微镜的)物镜off-axis illumination(OAI) 偏轴式曝光,离轴式曝光ohmic contact 欧姆接触op amp 运算放大器optical interferometry endpoint 光学干涉法终点检测optical lithography 光学光刻optical microscope(light microscope) 光学显微镜optical proximity correction(OPC)光学临近修正optical pyrometer 光学高温计optics 光学organic compound 有机化合物氧化诱生层积 vi.划桨,戏 out-diffusion 反扩散 outgassing 除气作用 overdrive 过压力 overetch step 过刻蚀 overflow rinser 溢流清洗 overlay accuracy 套准精度 overlay budget 套准偏差 overlay registration 套刻对准 oxidation 氧化 oxidation-induced stacking faults(OISF) 缺陷,氧化诱生堆垛层错 oxide 氧化物、氧化层、氧化膜 oxidezer 氧化齐ij oxide-trapped charge 氧化层陷阱电荷 ozone(O3)臭氧Ppackage 封装管壳 pad conditioning 垫修整 pad oxide 垫氧化膜 paddle 悬臂 n.短桨,划桨,明轮翼 水,涉水 vt ・用桨划,搅,拌parabolic stage 拋物线阶段parallel-plate(planar)reactor 平板反应parallel testing 并行测试 parameter 参数parametric test 参数测试 parasitic 寄生parasitic capacitance 寄生电容 parasiticresistance 寄生电阻 parasitic transistor 寄生电阻器 partial pressure 分压 particledensity 颗粒密度 particle per wafer perpass(PWP)每步每片上的颗粒 数passivation 钝化 passivation layer 钝化层passive components 无源元件pattern sensitivity 图形灵敏性patterned etching 图形刻蚀pattern wafer 带图形硅片patterning 图形转移,图形成型,刻印pc board 印刷电路版完成任务 p-channel MOSFETp 沟道 MOSFET PCM 工艺控制监测 PEB 曝光后烘焙 PECVD 等离子体增强化学气相淀积PEL 允许曝露极限值pellicle 贴膜 pentavalent 五价元素 perform vt ・ 履行,执行,表演,演出 v. performing adj. 表演的,履行的 perimete array 周边阵列式(圭寸装) pH scale pH 值 phase-shift mask(PSM) 相移掩膜技术 phosphine(PH3) 磷化氢 phosphoric acid(H3PO4)磷酸 phosphorus(P)磷 phosphorus oxychloride(POCL3)三氯氧磷 phosphosilicate glass(PSG)磷硅玻璃 photoacid generator(PAG)光酸产生剂 photoacoustics 光声的 photoactive compound(PAC)感光化合物 photography n.摄影,摄影术 光刻photolithography 光刻(技术) photomask 光掩膜 photoresist 光刻胶 photoresist stripping 去胶、光刻胶去除 physical etch mechanism 物理刻蚀机理 physical vapor deposition(PVD)物理气相淀积 pigtail 引出头 pin grid array(PGA) 针栅阵列式(封装)pinhole 针孑 L piranha 3 号液 pitch 间距 planar 平面 planar capacitor 平面电容 planar process 平面工艺 planarization 平坦化 plasma 等离子体 n.[解]血浆,乳浆,[物]等离子体,plasma-induced damage 等离子体诱导损伤plasma potential distribution 等离子体势分布plastic dual in-line package(DIP) 双列直插塑料圭寸装plastic leaded chip carrier(PLCC) 塑料电极芯片载体plastic packaging 塑料圭寸装plug塞,填充vt.堵,塞,插上,插栓n塞子,插头, 插销pMOS(p-channel) p 沟道MOSpn junction diode pn 结型二极管pnp pnp型三极管point defect 点缺陷Poisson's model 泊松模型polarization 极化,偏振polarized light 极化光,偏振光polish拋光polish rate 拋光速率polished wafer edge(edge grind) 倒角polishing loop 磨拋循环polishing pad 拋光(衬)垫polycide 多晶硅化物光刻胶显影post-develop inspection 显影后检查post-exposure bake(PEB) 曝光后烘焙ppb 十亿分之几ppm 百万分之几ppt 万亿分之几preamorphization 预非晶化precursor 先驱物predeposition 预淀积premetaldielectric(PMD) 金属前介质preston equation Preston 方程primary orientation flat 主定位边print bias光刻涨缩量printed circuit boade(PCB) 印刷电路板probe探针probe card 探针卡prober探针台process 工艺process chamber工艺腔,工艺反应室process chemical 工艺化学process control monitor(PCM)工艺控制监测(图形) process latitude工艺水平,工艺能力process recipe 工艺菜单programmable arraylogic(PLA) 可编程阵列逻辑programmable logic device 可编程逻辑器件programmable read-only memory 可编程只读存储器projected range 投影射程prompt n.提示,付款期限vt・提示,鼓动,促使, (给演员)提白adj.敏捷的,迅速的,即时的adv.准时地n. DOS命令:改变DOS系统提示符的风格proportion n.比例,均衡,面积,部分vt.使成比例,使均衡,分摊proportional adj. 比例的,成比例的,相称的,均衡的proportional band 比例区,比例带,比例尺范围proximityaligner 接近式光刻机p-type silicon P 型硅puddle develop搅拌式显影pump speed 抽气速率punchthrough 穿通purge (冲气)清洗purge cycle (冲气抽气)清洗循环PVD物理气相淀积p-well P 阱pyrogenic steam 热流pyrogen 热原(质)pyrolytic 热解pyrophoric 自燃的Qquad flatpack(QFP)方型管壳封装quadrupole mass analyzer (QMA)四极质量分析仪quality measure 质量测量quarz石英quarz tube 石英管quarz wafer boat 石英舟queue time排队时间R radiation damage 辐射损伤radical 激发random access memory(RAM) 随机存储器range射程rapid thremal anneal(RTA) 快速热退火rapid thermal processor(RTP)快速热处理RCA clean RCA 清洗reaction rate limited 反应速率限制reactive ion etch(RIE)反应离子刻蚀reactivity 反应性reactor反应室,反应腔read-only memory(ROM)只读存储器recombination 复合redistribution 再分布reflection spectroscopy 反射光谱仪reflective notching 反射开槽reflow回流refraction 折身寸refractory metal 难融金属regeneration 再生regeneration套准精度relative index of refraction,n removal n. 移动,免职,切除repeat n.重复,反复vt・重做,复述,向他人转述,复制,使再现vi.重复,留有味道representation n. 表示法,表现,陈述,请求,扮演,画像,继承,代表reset v.重新安排residual gas analyzer(RGA)残余气体分析器resist光刻胶resist development 光刻胶显影resistance 电阻resistivity 电阻率resolution 分辨率reticle掩膜版retrograde well 倒掺杂阱reverse bias 反偏reverse osmosis(RO)反向渗透RF射频RF sputtering射频溅射rinse v嗽口,(用清水)刷,冲洗掉,漂净n.清洗嗽洗,漂洗,漂清,冲洗RO反向渗透Roots blower罗茨(机械增压)泵roughing pump 低真空泵,机械泵RTA快速热退火RTP快速热处理Ssatisfy vt.满足,使满意,说服,使相信v.满意,确保Scaling按比例缩小SCALPEL具有角度限制分散投影电子束光刻Scanner扫描仪scanning electron microscope(SEM)扫描电子显微镜scanning projection aligner 扫描投影光刻机schottky diode 肖特基二极管screen oxide layer 掩蔽氧化层scribe line 戈H 片道scribe line monitor(SLM)戈J片线监测scumming 底膜secondary electron 二次电子secondary electron flood 二次电子流secondary ion mass spectrometry(SIMS)二次离子质谱 (法) seed' s model SEE 模型selective etching 选择性刻蚀selective oxidation 选择性氧化selectivity 选择性semiconductor grade silicon 半导体极硅semiconductor 半导体sensitivity 灵敏度shallow trench isolation(STI)浅沟槽隔离sheet resistance,RS 方块电阻sheet resistivity,方块电阻率shot size胶(点)尺寸shrinking 缩小SI units 公制Sidewall spacer 侧墙Silane(siH4)硅烷Silicide硅化合物silicon 硅silicon dioxide(SIO2)二氧化硅silicon nitride(SI3N4)氮化硅silicon on sapphire 蓝宝石伤硅silicon on insulator(SOI)绝缘体上硅silicontetrachloride(SIC4) 碳化硅silicon tetrafluoride(SIF4)四氟化硅silicon tetrachloride(SICL4)四氯化硅single crystal silicon 单晶硅silylation硅烷化(作用)SIMOX 由注入氧隔离,一种SOI材料single crystal 单晶slip滑移slurry磨料SMIF标准机械接口Sodium hydroxide(NaOH)氢氧化钠soft bake 前烘solid固体solvent 溶齐ijSOS蓝宝石上硅Source 源source drain implants 源漏注入spacer n.取间隔的装置,逆电流器spatial coherence 空间相干spatial signature analysis 空间信号分析specialty gase 特种气体species 种类specific gravity 比重specific heat 比热speckle 斑点spectroscipic ellipsometry 椭圆偏振仪spin coating光刻胶旋涂spin dryer 旋转式甩干桶spin-on-dielectric(SOD)旋转介质法spin-on-glass(SOG)旋转玻璃法spray cleaning 喷雾清洗spray rinser喷雾清洗槽spreading resistance probe 扩散电阻探测sputter n・喷溅声,劈啪声,急语,咕哝vi.唾沫飞溅,发劈啪声,急忙地讲vt.喷出,飞溅出,气急败坏地说sputtering 溅射sputter etch溅射刻蚀sputtered aluminum 溅射铝sputtering yield 溅射产额SSI小规模集成电路stacking fault层积缺陷,堆垛层错standard clean 1(SC-1) 1 号清洗液standard clean 2(SC-2) 2 号清洗液standard mechanical interface(SMIF)机械标准接口standing wave 驻波static RAM静态存储器statistical process control ( SPC)统计过程控制step coverage台阶覆盖step height台阶高度step-and-repeat aligner 分步重复光刻机step-and-scan system步进扫描光刻机stepper步进光刻机stepping motor driver步进电机驱动器电路stepper步进光刻机stoichiometry化学计量(配比) staggle投射标准偏差stress应力striation 条纹strip vt・剥,剥去n. 条,带stripping 去胶structure 结构subatmospheric CVD亚大气压化学气相淀积submicron 亚微米sub-quarter micron 亚0・25微米substrate 衬底sublimation 升华substitutional atom 替位原子subtract v (〜from)减去,减subwaverlength lithography 亚波长光刻sulfur hexafluoride(SF6)六氟化硫sulfuric acid (H2SO4 )硫酸surface profiler 表面形貌surface tension 表面张力susceptor 基座Ttarget chamber 靶室target 靶temperature ramp rate 温度斜率temperature 温度TEOS正硅酸乙脂test algorithm 测试算法test coverage 测试覆盖test structure 测试结构test vector测试向量thermal budget 热预算thermal oxide 热氧化thermocompression bonding 热压键合thermocouple 热电偶thermogravimetric analysis (TGA) 热重量分析thermosonic bonding 热超声键合thin film 薄膜thin small outline package(TSOP)薄小型圭寸装川-V compound 三/五族化合物thorough adj.十分的,彻底的Threshold 域值threshold voitage 域值电压threshold voltage adjustment implant 调栅注入,域值调整注入throughput 产量tilt [tilt] v.(使)倾斜,(使)翘起,以言词或文字抨击time of flight SIMS(TOF -SIMS) 飞行时间二次离子质谱titanium silicide 钛硅化合物TLV极限域值top surface imaging 上表面图形topography 形貌torr 托toxic有毒track system(also track) 轨道系统transient enhanced diffusion(TED)瞬时增强扩散transistor 晶体管trench 槽trench capacitor 槽电容trichlorosilane(TCS or SiHCL3)三氯氢硅triode planar reactor三真空管平面反应室triple well 三阱trivalent 三价tungsten(W)钨tungsten stch back 钨反刻tungsten hexafluoride(WF6)六氟化钨tungstenplug钨塞,钨填充turbomolecular pump(turbo pump) 涡轮分子泵twin planes(twinning) 双平面twin-well(twin-tub)双阱UULSI甚大规模集成电路ultralow penetration air(ULPA)超低穿透空气ultrafiltration 超过滤ultrafine particle 超细颗粒ultrahigh purity 超高纯度ultrahigh vacuum 超高真空ultrashallow junction 超浅结ultrashallow junction 超声键合(压焊) ultraviolet 紫外线undercut 钻蚀uniformity 均匀性unit cell元包,晶胞unpatterned etching(spripping)无图形刻蚀(剥离) unpatterned wafer 无图形硅片unplug v.拔去(塞子,插头等),去掉…的障碍物UV紫外线VVacancy 空位vacuum 真空vacuum wand真空吸片棒,真空镊子van der pauw method 范德堡法vapor phase epotaxy(VPE)气相外延vapor pressure 气压vapor prime气相熏增粘剂,气相成底膜vaporization 气化variable n.[数]变数,可变物,变量adj. 可变的,不定的,。
半导体行业专业词汇
半导体行业专业词汇. acceptance testing (WAT: wafer acceptance testing)2. acceptor: 受主,如B,掺入Si中需要接受电子3. ACCESS:一个EDA(Engineering Data Analysis)系统4. Acid:酸5. Active device:有源器件,如MOS FET(非线性,可以对信号放大)6. Align mark(key):对位标记7. Alloy:合金8. Aluminum:铝9. Ammonia:氨水10. Ammonium fluoride:NH4F11. Ammonium hydroxide:NH4OH12. Amorphous silicon:α-Si,非晶硅(不是多晶硅)13. Analog:模拟的14. Angstrom:A(1E-10m)埃15. Anisotropic:各向异性(如POLY ETCH)16. AQL(Acceptance Quality Level):接受质量标准,在一定采样下,可以95%置信度通过质量标准(不同于可靠性,可靠性要求一定时间后的失效率)17. ARC(Antireflective coating):抗反射层(用于METAL等层的光刻)18. Antimony(Sb)锑19. Argon(Ar)氩20. Arsenic(As)砷21. Arsenic trioxide(As2O3)三氧化二砷22. Arsine(AsH3)23. Asher:去胶机24. Aspect ration:形貌比(ETCH中的深度、宽度比)25. Autodoping:自搀杂(外延时SUB的浓度高,导致有杂质蒸发到环境中后,又回掺到外延层)26. Back end:后段(CONTACT以后、PCM测试前)27. Baseline:标准流程28. Benchmark:基准29. Bipolar:双极30. Boat:扩散用(石英)舟31. CD:(Critical Dimension)临界(关键)尺寸。
半导体行业的英单词和术语
半导体行业的英单词和术语1. Semiconductor(半导体):指一种导电性能介于导体和绝缘体之间的材料,广泛应用于电子器件中。
3. Integrated Circuit(集成电路):简称IC,将大量的微小电子元件(如晶体管、电阻、电容等)集成在一块半导体芯片上。
4. Transistor(晶体管):一种半导体器件,具有放大信号和开关功能,是现代电子设备的基础组件。
5. Diode(二极管):一种具有单向导通特性的半导体器件,常用于整流、稳压等电路。
6. MOSFET(金属氧化物半导体场效应晶体管):一种常见的晶体管类型,广泛应用于放大器和开关电路。
7. CMOS(互补金属氧化物半导体):一种集成电路技术,采用NMOS和PMOS晶体管组合,具有低功耗、高集成度等优点。
8. Wafer(晶圆):指经过切割、抛光等工艺处理的半导体材料,用于制造集成电路。
9. Photolithography(光刻):在半导体制造过程中,利用光刻技术将电路图案转移到晶圆上的过程。
10. Etching(刻蚀):在半导体制造过程中,通过化学反应或物理方法去除晶圆表面不需要的材料。
11.掺杂(Doping):在半导体材料中引入其他元素,以改变其导电性能。
12. Chip(芯片):指经过封装的集成电路,是电子设备的核心组成部分。
13. PCB(印刷电路板):一种用于支撑和连接电子元件的板材,上面布满了导电线路。
14. Moore's Law(摩尔定律):指集成电路上可容纳的晶体管数量大约每两年翻一番,预测了半导体行业的发展趋势。
15. EDA(电子设计自动化):指利用计算机软件辅助设计电子系统,包括电路设计、仿真、验证等环节。
16. Foundry(代工厂):专门为其他公司生产半导体芯片的企业。
17. Semiconductor Equipment Manufacturer(半导体设备制造商):为半导体行业提供生产设备的公司。
半导体制造专业英语术语
球栅阵列舞厅式布局,超净间的布局 圆桶型反应室 阻挡层金属势垒电压backing film 背膜baffle vt ・ 困惑,阻碍,为难(挡片)baffle assembly n. 集合,装配,集会,集结,汇 编 (挡片块)丨 基极,基区 batch 批 bay and chase beam blow-up离子束膨胀 beam deceleration 束流减速分类代码号双极双极技术(工艺) bird ' s beak effect 鸟嘴效应blanket deposition 均厚淀积blower增压泵boat 舟BOE 氧化层刻蚀缓冲剂Bon voyage [法]再见,一路顺风[平安]bonding pads 压点bonding wire 焊线,引线boron(B) 硼boron trichloride(BCL3) 三氯化硼boron trifluoride (B F3)三氟化硼borophosphosilicate glass(BPSG)硼磷硅玻璃borosilicate glass(BSG) 硼硅玻璃bottom antireflective coating(BARC)下减反射涂层boule单晶锭bracket n.墙上凸出的托架,括弧,支架v.括在一起breakthrough step 突破步骤,起始的干法刻蚀步骤brightfield detection 亮场检查brush scrubbing 涮洗bubbler 带鼓泡槽buffered oxide etch(BOE) 氧化层腐蚀缓冲液bulk chemical distribution 批量化学材料配送bulk gases 大批气体bulkhead equipment layout 穿壁式设备布局bumped chip 凸点式芯片buried layer 埋层burn-box 燃烧室(或盒) burn-in 老化CCA 化学放大(胶) cantilever n. 建]悬臂cantilever paddle 悬臂桨cap oxide 掩蔽氧化层capacitance 电容capacitance-voltage test(C-Vtest) 电容-电压测试capacitive coupled plasma 电容偶合等离子体capacitor 电容器carbon tetrafluoride(CF4) 四氟化碳caro ' s acid3 号液carrier 载流子carrier-depletion region 载流子耗尽层carrier gas 携带气体cassette (承)片架cation 阳离子caustic 腐蚀性的cavitation 超声波能CD 关键尺寸CD- SEM 线宽扫描电镜Celsius adj.摄氏的center of focus(COF) 焦点焦平面center slow 中心慢速central processing unit(CPU) 中央处理器ceramic substrate 陶瓷圭寸装CERDIP 陶瓷双列直插封装Channel 沟道channel length 沟道长度channeling 沟道效应charge carrier 载流子chase技术夹层chelating agent 螯合齐ijchemical amplification(CA) 化学放大胶chemical etch mechanism 化学刻蚀机理chemical mechanical planarization(CMP) 化学机械平坦化chemical solution 化学溶液chemical vapor deposition(CVD) 化学气相淀积chip 芯片chip on board(COB)板上芯片chip scale package(CSP)芯片尺寸圭寸装circuit geometries 电路几何尺寸class number 净化级另卩cleanroom 净化间cleanroom protocol 净化间操作规程Clearfield mask 亮场掩膜板Cluster tool 多腔集成设备CMOS 互补金属氧化物半导体CMP 化学机械平坦化Coater/developer track 涂胶/显影轨道Cobalt silicide 钻硅化合物coefficient n. [数]系数Coefficient of thermal expansion(CTE)热涨系数Coherence probe microscope 相干探测显微镜Coherent light 相干光coil v. 盘绕,卷Cold wall 冷壁Collector 集电极Collimated light 平行光Collimated sputtering 准直溅射Compensate v.偿还,补偿,付报酬Compound semiconductor 化合物半导体Concentration 浓度Condensation 浓缩Conductor 导体constantly adv・不变地,经常地,坚持不懈地Confocal microscope 共聚焦显微镜Conformal step coverage 共型台阶覆盖Contact 接触(孔)Contact alignment 接触式对准(光刻)Contact angle meter 接触角度仪Contamination 沾污、污染conti boat 连柱舟conticaster [冶]连铸机Continuous spray develop 连续喷雾显影Contour maps 包络图、等位图、等值图Contrast 对比度、反差contribution n.捐献,贡献,投稿Conventional-line photoresist 常规I 线光刻胶Cook' s theory库克理论Copper CVD 铜CVD Copper interconnect 铜互连Cost of ownership(COO) 业主总成本Covalent bond 共价键Critical dimension 关键尺寸Cryogenic aerosol cleaning 冷凝浮质清洗Cryogenic pump(cryopump) 冷凝泵Crystal 晶体Crystal activation 晶体激活Crystal defect 晶体缺陷Crystal growth 晶体生长Crystal lattice 晶格Crystal orientation 晶向CTE 热涨系数Current-driven current amplifier 电流驱动电流放大器CVD 化学气相淀积Cycle time 周期CZ crystal puller CZ 拉单晶设备Czochralski(CZ) method 切克劳斯基法Ddamascene 大马士革工艺darkfiled detection 暗场检测darkfiled mask 暗场掩膜版DC bias 直流偏压decompose v. 分解,(使)腐烂deep UV(DUV) 深紫外光default n.默认(值),缺省(值),食言,不履行责任,[律]缺席v.疏怠职责,缺席,拖欠,默认defects density 缺陷密度defect 缺陷deglaze 漂氧化层degree of planarity(DP) 平整度dehydration bake 去湿烘培,脱水烘培density 密度deplention mode 耗尽型degree of focus 焦深deposit n.堆积物,沉淀物,存款,押金,保证金,存放物vt ・存放,堆积vi.沉淀deposition 淀积deposited oxide layer 淀积氧化层depth of focus 焦深descum 扫底膜design for test(DFT)可测试设计desorption 解吸附作用develop inspect 显影检查development 显影developer 显影液deviation n.背离device isolation 器件隔离device technology 器件工艺DI water 去离子水Diameter n.直径diameter grinding 磨边diborane ( B2H6 )乙硼烷dichlorosilane(H2SiCL2) 二氯甲硅烷die 芯片die array 芯片阵列die attach 粘片die-by-die alignment 逐个芯片对准dielectric 介质dielectric constant 介电常数die matrix 芯片阵列die separation 分片diffraction 衍射diffraction-limited optics 限制衍射镜片diffusion 扩散diffusion controlled 受控扩散digital/analog数字/模拟digital circuit diluent direct chip attach( DCA) directionality discrete dishing dislocation dissolution ratedissolution rate monitor(DRM) 溶解率监测DNQ-novolak 重氮柰醌一酚醛树脂Donor 施主dopant profile 掺杂刨面) doped虚拟的, region 掺杂区 doping 掺杂 dose monitor剂量检测仪 dose,Q 剂量 downstream reactor 顺流法反应 drain 漏 drive-in推进 dry etch 干法刻蚀 dry mechanical pump干式机械泵 dry oxidation 干法氧化dummy n.哑巴,傀儡,假人,假货 adj. 假的,虚构的 n.[计]哑元 dynamic adj. 动力的,动力学的,动态的 E economies of scale 规模经济 edge bead removal 边缘去胶 edge die 边缘芯片edge exclusion 无效边缘区域 electrically erasable PROM 电可擦除 EPROM electrode 电极 electromigration 电迁徙 electron beam lithography 电子束光刻electron cyclotron resonance 电子共振回旋加速器 electron shower 电子簇射,电子喷淋 electron stopping 电子阻止 electronic wafer map 硅片上电性能分布图 electroplating 电镀 electropolishing 电解拋光electrostatic chuck 静电吸盘 electrostatic discharge(ESD)静电放电 ellipsometry 椭圆偏振仪,椭偏仪emitter 发射极 endpoint detection 终点检测 engineering n.工程(学) electrostatic discharge(EDX)能量弥散谱仪 enhancement mode 增强型 epi 夕卜延epitaxial layer 夕卜延层epoxy underfill 环氧树脂填充不足erasable PROM 可擦除可编程只读存储器erosion腐蚀,浸蚀establish vt・建立,设立,安置,使定居,使人民接受,确定v.建立etch 刻蚀etch bias刻蚀涨缩量etch profile 刻蚀刨面etch rate 刻蚀速率etch residue 刻蚀残渣etch uniformity 刻蚀均匀性etchant 刻蚀剂etchback planarization 返刻平坦化eutectic attach 共晶焊接eutectic temperature 共晶温度evaporation 蒸发even adj.平的,平滑的,偶数的,一致的,平静的,恰好的,平均的,连贯的adv.[加强语气]甚至(・・・也), 连…都,即使,恰好,正当vt.使平坦,使相等vi. 变平,相等n.偶数,偶校验exceed vt. 超越,胜过vi.超过其他excimer laser 准分之激光exposal n. 曝光,显露exposure 曝光exposure dose 曝光量extraction electrode 吸极extreme UV 极紫外线extrinsic silicon 掺杂硅F Fables无制造厂公司fabrication 制造facilities 设施factor n.因素,要素,因数,代理人fast ramp furnaces 快速升降温炉fault model 失效模式FCC diamond 面心立方金刚石feature size 特征尺寸FEOL 前工序Fick ' s lawsFICK 定律field-effect transistor 场效应晶体管field oxide 场氧化field-by-field alignment 逐场对准field-programmable PROM 现场可编程只读存储器film 膜film stress 膜应力final assembly and packaging 最终装配和圭寸装final test 终测first interlayer dielectric(ILD-1)第一层层间介质fixed oxide charge 固定氧化物电荷flats 定位边flip chip 倒装芯片float zone 区熔法fluorosilicate glass(FSG) 氟化玻璃focal length 焦距focal plane 焦平面focal point 焦点focus聚焦focus ion beam(FIB) 聚焦离子束footprint 占地面积formula n.公式,规则,客套语forward bias 正偏压four-point probe 四探针frenkel defect Frenkel 缺陷front-opening unified pod(FOUP)前开口盒functional test 功能测试furnace flat zone 恒温区G g-line G 线gallium(Ga)镓gallium arsenide(GaAs)砷化镓gap fill间隙填充gas 气体gas cabinet 气柜gas manifold 气瓶集装gas phase nucleation 气相成核gas purge 气体冲洗gas throughput 气体产量gate 栅gate oxide 栅氧化硅gate oxide integrity 栅氧完整性germanium(Ge) 错getter 俘获glass玻璃glazing 光滑表面global alignment 全局对准global planarization 全局平坦化glow discharge 起辉放电gray area 灰区,技术夹层gross defect 层错grove n. 小树林grown oxide layer 热氧化生长氧化层HHalogen 卤素hardbake 坚膜hardware n.五金器具,(电脑的)硬件,(电子仪器的)部件HEPA filter 高效过滤器hermetic sealing 密圭寸heteroepitaxy 异质外延heterogeneous reaction 异质反应hexamethyldisilazane(HMDS)六甲基二硅氨烷high-density plasma(HDPCVD) 高密度等离子体化学气相淀积高温扩散炉 high-density plasma etch 高密度等离子刻蚀 high-pressure oxidation 高压氧化high-temperature diffusion furnace high vacuum 高真空 high vacuum pumps 高真空泵 hillock 小丘(铝)尖刺 homoepitaxy 同质外延 homogeneous reaction 同质反应 horizontal adj.地平线的,水平的 horizontal furnace 臣卜式炉 hot electron 热电子 hot wall 热壁 hydrochloric acid(HCL)盐酸 hydrofluoric acid(HF)氢氟酸 hydrogen(H2)氢气 hydrogen chloride(HCL)氯化氢 hydrogen peroxide(H2O2)双氧水 hydeophilic 亲水性 hydrophobic 憎水性,疏水性 hyperfiltration 超过滤Ii-line I 线IC packaging 集成电路封装IC reliability 集成电路可靠性 Iddq testing 静态漏电流测试 image resolution 图象清晰度 图象分解力implant v.灌输(注入) impurity 杂质 increment n.增力口,增量 initial adj.最初的,词首的,初始的 n.词首大写 字母 in situ measurements 在线测量 index of refraction 折射率 indium 铟 inductively coupled plasma (ICP )电感耦合等离子体 inert gas惰性气体infrared interference 红外干涉ingot 锭ink mark墨水标识in-line parametric test 在线参数测试input/output(I/O)pin 输入/ 输出管脚institute n. 学会,学院,协会vt.创立,开始,制定,开始(调查),提起(诉讼) insulator 绝缘体integrate vt.使成整体,使一体化,求…的积分v.结合integrated circuit(IC)集成电路integrated measurement tool 集成电路测量仪interval n.间隔,距离,幕间休息n.时间间隔interconnect 互连interconnect delay 互连连线延迟interface-trapped charge 界面陷阱电荷interferometer 干涉仪interlayer dielectric(ILD) 层间介质interstitial 间隙(原子) intrinsic silicon 本征硅invoke v.调用ion 离子ion analyzer 离子分析仪ion beam milling or ion beam etching(IBE) 离子铣或离子束刻蚀ion implantation 离子注入ion implantation damage 离子注入损伤ion implantation doping 离子注入掺杂ion implanter离子注入机ion projection lithography(IPL) 离子投影机PVD ionization 离子化ionized metal plasma PVD 离子化金属等离子IPA vapor dry 异丙醇气相干燥isolation regions 隔离区isotropic etch profile各向同性刻蚀刨面JJEFT结型场效应管junction(pn) PN 结junction depth 结深junction spiking 结尖刺KKelvin绝对温度killer defect致命缺陷kinetically controlled reaction 功能控制效应L laminar air flow 层状空气流,层流式lapping 拋光latchup闩锁效应lateral diffusion 横向扩散law of reflection 反射定律LDD轻掺杂漏Leadframe 引线框架leakage cuttent 漏电流len透镜lens compaction 透镜收缩light 光light intensity 光强light scattering 光散射lightly doped drain(LDD) 轻掺杂漏linear 线性linear accelerator 线性加速器linear stage 线宽阶段,线性区linewidth 线宽liquid 液体lithography 光刻loaded brush沾污的毛刷loaded effect 负载效应loadlock真空锁local interconnect(LI)局部互连local planarization 局部平坦化local oxidation of silicon(LOCOS)硅局部氧化隔离法logic逻辑lot批low-pressure chemical vapor deposition (LPCVD) 低压化学气相淀积LSI大规模集成电路Mmagnetic CZ( MCZ )磁性切克劳斯基晶体生长法magnetically enhanced RIE(MERIE)磁增强反应离子刻蚀magnetron sputtering 磁控溅射Magnification n. 扩大,放大倍率magnificent adj. 华丽的,高尚的,宏伟的majority carrier 多子make-up loop补偿循环mask掩膜版n.面具,掩饰,石膏面像vt.戴面具,掩饰,使模糊vi.化装,戴面具,掩饰,参加化装舞会mask-programmable gate array 掩膜可编程门阵歹Umass flow controller(MFC) 质量流量计mass spectrometer 质谱仪mass-transport limited reaction 质量传输限制效应mathematical adj.数学的,精确的mean free path(MFP) 平均自由程medium vacuum 中真空adj. megasonic cleaning 超声清洗melt熔融membrane contactor薄膜接触器,隔膜接触器membrane filter薄膜过滤器,隔膜过滤器merchant n. 商人,批发商,贸易商,店主商业的,商人的mercury arc lamp 汞灯MESFET用在砷化镓结型场效应晶体管中的金属栅metal contact 金属接触孔metal impurities 金属杂质metal stack复合金属,金属堆叠metallization 金属化metalorganic CVD金属有机化学气相淀积metrology 度量衡学microchip微芯片microdefect 微缺陷microlithography 微光刻microloading微负载,与刻蚀相关的深宽比micron微米microprocessor n.[计]微处理器microprocessor unit 微处理器microroughness 微粗糙度Miller indices 密勒指数minienvironment 微环境minimum geometry 最小尺寸minority carrier 少子mix and match 混合与匹配mobile ionic contaminants(MIC)可动离子沾污mobile oxide charge 可动氧化层电荷module n.模数,模块,登月舱,指令舱modify vt・更改,修改v.修改molecular beam epitaxy (MBE) 分子束外延molecular flow 分子流monitor wafer(test wafer) 陪片,测试片,样片monocrystal 单晶monolithic device 单片器件Moore's law 摩尔定律MOS 金属氧化物半导体MOSFET 金属氧化物半导体场效应管motor curreant endpoint 电机电流终点检测(法) MSI中规模集成电路Multiplier n.增加者,繁殖者,乘数,增效器,乘法器multichip module(MCM) 多芯片模式multilenel metallization 多重金属化Murphy's model 墨菲模型N nanometer(nm)纳米native oxide 自然氧化层n-channel MOSFET n 沟道MOSFET negatine resist 负性光刻胶negative n.否定,负数,底片adj.否定的,消极的,负的,阴性的vt.否定,拒绝(接受) negatine resist development 负性光刻胶显影neutral beam trap 中性束陷阱next-generation lithography 下一代光刻技术nitric acid(HNO3)硝酸nitrogen(N2)氮气nitrogen trifluoride(NF3) 三氟化氮nitrous oxide (N2O) 一氧化二氮、笑气nMOS n沟道MOS场效应晶体管noncritical layer 非关键层nonvolatile memory 非挥发性存储器normality 归一化notch 定位槽novolak苯酚甲醛聚树脂材料npn npn 型(三极管) n-type silicon n 型硅nuclear stopping 离子终止nucleation 成核现象,晶核形成nuclei coalescence 核合并numericalaperture(NA) 数值孑L径n-well n 阱Oobjective (显微镜的)物镜off-axis illumination(OAI) 偏轴式曝光,离轴式曝光ohmic contact 欧姆接触op amp 运算放大器optical interferometry endpoint 光学干涉法终点检测optical lithography 光学光刻optical microscope(light microscope) 光学显微镜optical proximity correction(OPC)光学临近修正optical pyrometer 光学高温计optics 光学organic compound 有机化合物氧化诱生层积 vi.划桨,戏 out-diffusion 反扩散 outgassing 除气作用 overdrive 过压力 overetch step 过刻蚀 overflow rinser 溢流清洗 overlay accuracy 套准精度 overlay budget 套准偏差 overlay registration 套刻对准 oxidation 氧化 oxidation-induced stacking faults(OISF) 缺陷,氧化诱生堆垛层错 oxide 氧化物、氧化层、氧化膜 oxidezer 氧化齐ij oxide-trapped charge 氧化层陷阱电荷 ozone(O3)臭氧Ppackage 封装管壳 pad conditioning 垫修整 pad oxide 垫氧化膜 paddle 悬臂 n.短桨,划桨,明轮翼 水,涉水 vt ・用桨划,搅,拌parabolic stage 拋物线阶段parallel-plate(planar)reactor 平板反应parallel testing 并行测试 parameter 参数parametric test 参数测试 parasitic 寄生parasitic capacitance 寄生电容 parasiticresistance 寄生电阻 parasitic transistor 寄生电阻器 partial pressure 分压 particledensity 颗粒密度 particle per wafer perpass(PWP)每步每片上的颗粒 数passivation 钝化 passivation layer 钝化层passive components 无源元件pattern sensitivity 图形灵敏性patterned etching 图形刻蚀pattern wafer 带图形硅片patterning 图形转移,图形成型,刻印pc board 印刷电路版完成任务 p-channel MOSFETp 沟道 MOSFET PCM 工艺控制监测 PEB 曝光后烘焙 PECVD 等离子体增强化学气相淀积PEL 允许曝露极限值pellicle 贴膜 pentavalent 五价元素 perform vt ・ 履行,执行,表演,演出 v. performing adj. 表演的,履行的 perimete array 周边阵列式(圭寸装) pH scale pH 值 phase-shift mask(PSM) 相移掩膜技术 phosphine(PH3) 磷化氢 phosphoric acid(H3PO4)磷酸 phosphorus(P)磷 phosphorus oxychloride(POCL3)三氯氧磷 phosphosilicate glass(PSG)磷硅玻璃 photoacid generator(PAG)光酸产生剂 photoacoustics 光声的 photoactive compound(PAC)感光化合物 photography n.摄影,摄影术 光刻photolithography 光刻(技术) photomask 光掩膜 photoresist 光刻胶 photoresist stripping 去胶、光刻胶去除 physical etch mechanism 物理刻蚀机理 physical vapor deposition(PVD)物理气相淀积 pigtail 引出头 pin grid array(PGA) 针栅阵列式(封装)pinhole 针孑 L piranha 3 号液 pitch 间距 planar 平面 planar capacitor 平面电容 planar process 平面工艺 planarization 平坦化 plasma 等离子体 n.[解]血浆,乳浆,[物]等离子体,plasma-induced damage 等离子体诱导损伤plasma potential distribution 等离子体势分布plastic dual in-line package(DIP) 双列直插塑料圭寸装plastic leaded chip carrier(PLCC) 塑料电极芯片载体plastic packaging 塑料圭寸装plug塞,填充vt.堵,塞,插上,插栓n塞子,插头, 插销pMOS(p-channel) p 沟道MOSpn junction diode pn 结型二极管pnp pnp型三极管point defect 点缺陷Poisson's model 泊松模型polarization 极化,偏振polarized light 极化光,偏振光polish拋光polish rate 拋光速率polished wafer edge(edge grind) 倒角polishing loop 磨拋循环polishing pad 拋光(衬)垫polycide 多晶硅化物光刻胶显影post-develop inspection 显影后检查post-exposure bake(PEB) 曝光后烘焙ppb 十亿分之几ppm 百万分之几ppt 万亿分之几preamorphization 预非晶化precursor 先驱物predeposition 预淀积premetaldielectric(PMD) 金属前介质preston equation Preston 方程primary orientation flat 主定位边print bias光刻涨缩量printed circuit boade(PCB) 印刷电路板probe探针probe card 探针卡prober探针台process 工艺process chamber工艺腔,工艺反应室process chemical 工艺化学process control monitor(PCM)工艺控制监测(图形) process latitude工艺水平,工艺能力process recipe 工艺菜单programmable arraylogic(PLA) 可编程阵列逻辑programmable logic device 可编程逻辑器件programmable read-only memory 可编程只读存储器projected range 投影射程prompt n.提示,付款期限vt・提示,鼓动,促使, (给演员)提白adj.敏捷的,迅速的,即时的adv.准时地n. DOS命令:改变DOS系统提示符的风格proportion n.比例,均衡,面积,部分vt.使成比例,使均衡,分摊proportional adj. 比例的,成比例的,相称的,均衡的proportional band 比例区,比例带,比例尺范围proximityaligner 接近式光刻机p-type silicon P 型硅puddle develop搅拌式显影pump speed 抽气速率punchthrough 穿通purge (冲气)清洗purge cycle (冲气抽气)清洗循环PVD物理气相淀积p-well P 阱pyrogenic steam 热流pyrogen 热原(质)pyrolytic 热解pyrophoric 自燃的Qquad flatpack(QFP)方型管壳封装quadrupole mass analyzer (QMA)四极质量分析仪quality measure 质量测量quarz石英quarz tube 石英管quarz wafer boat 石英舟queue time排队时间R radiation damage 辐射损伤radical 激发random access memory(RAM) 随机存储器range射程rapid thremal anneal(RTA) 快速热退火rapid thermal processor(RTP)快速热处理RCA clean RCA 清洗reaction rate limited 反应速率限制reactive ion etch(RIE)反应离子刻蚀reactivity 反应性reactor反应室,反应腔read-only memory(ROM)只读存储器recombination 复合redistribution 再分布reflection spectroscopy 反射光谱仪reflective notching 反射开槽reflow回流refraction 折身寸refractory metal 难融金属regeneration 再生regeneration套准精度relative index of refraction,n removal n. 移动,免职,切除repeat n.重复,反复vt・重做,复述,向他人转述,复制,使再现vi.重复,留有味道representation n. 表示法,表现,陈述,请求,扮演,画像,继承,代表reset v.重新安排residual gas analyzer(RGA)残余气体分析器resist光刻胶resist development 光刻胶显影resistance 电阻resistivity 电阻率resolution 分辨率reticle掩膜版retrograde well 倒掺杂阱reverse bias 反偏reverse osmosis(RO)反向渗透RF射频RF sputtering射频溅射rinse v嗽口,(用清水)刷,冲洗掉,漂净n.清洗嗽洗,漂洗,漂清,冲洗RO反向渗透Roots blower罗茨(机械增压)泵roughing pump 低真空泵,机械泵RTA快速热退火RTP快速热处理Ssatisfy vt.满足,使满意,说服,使相信v.满意,确保Scaling按比例缩小SCALPEL具有角度限制分散投影电子束光刻Scanner扫描仪scanning electron microscope(SEM)扫描电子显微镜scanning projection aligner 扫描投影光刻机schottky diode 肖特基二极管screen oxide layer 掩蔽氧化层scribe line 戈H 片道scribe line monitor(SLM)戈J片线监测scumming 底膜secondary electron 二次电子secondary electron flood 二次电子流secondary ion mass spectrometry(SIMS)二次离子质谱 (法) seed' s model SEE 模型selective etching 选择性刻蚀selective oxidation 选择性氧化selectivity 选择性semiconductor grade silicon 半导体极硅semiconductor 半导体sensitivity 灵敏度shallow trench isolation(STI)浅沟槽隔离sheet resistance,RS 方块电阻sheet resistivity,方块电阻率shot size胶(点)尺寸shrinking 缩小SI units 公制Sidewall spacer 侧墙Silane(siH4)硅烷Silicide硅化合物silicon 硅silicon dioxide(SIO2)二氧化硅silicon nitride(SI3N4)氮化硅silicon on sapphire 蓝宝石伤硅silicon on insulator(SOI)绝缘体上硅silicontetrachloride(SIC4) 碳化硅silicon tetrafluoride(SIF4)四氟化硅silicon tetrachloride(SICL4)四氯化硅single crystal silicon 单晶硅silylation硅烷化(作用)SIMOX 由注入氧隔离,一种SOI材料single crystal 单晶slip滑移slurry磨料SMIF标准机械接口Sodium hydroxide(NaOH)氢氧化钠soft bake 前烘solid固体solvent 溶齐ijSOS蓝宝石上硅Source 源source drain implants 源漏注入spacer n.取间隔的装置,逆电流器spatial coherence 空间相干spatial signature analysis 空间信号分析specialty gase 特种气体species 种类specific gravity 比重specific heat 比热speckle 斑点spectroscipic ellipsometry 椭圆偏振仪spin coating光刻胶旋涂spin dryer 旋转式甩干桶spin-on-dielectric(SOD)旋转介质法spin-on-glass(SOG)旋转玻璃法spray cleaning 喷雾清洗spray rinser喷雾清洗槽spreading resistance probe 扩散电阻探测sputter n・喷溅声,劈啪声,急语,咕哝vi.唾沫飞溅,发劈啪声,急忙地讲vt.喷出,飞溅出,气急败坏地说sputtering 溅射sputter etch溅射刻蚀sputtered aluminum 溅射铝sputtering yield 溅射产额SSI小规模集成电路stacking fault层积缺陷,堆垛层错standard clean 1(SC-1) 1 号清洗液standard clean 2(SC-2) 2 号清洗液standard mechanical interface(SMIF)机械标准接口standing wave 驻波static RAM静态存储器statistical process control ( SPC)统计过程控制step coverage台阶覆盖step height台阶高度step-and-repeat aligner 分步重复光刻机step-and-scan system步进扫描光刻机stepper步进光刻机stepping motor driver步进电机驱动器电路stepper步进光刻机stoichiometry化学计量(配比) staggle投射标准偏差stress应力striation 条纹strip vt・剥,剥去n. 条,带stripping 去胶structure 结构subatmospheric CVD亚大气压化学气相淀积submicron 亚微米sub-quarter micron 亚0・25微米substrate 衬底sublimation 升华substitutional atom 替位原子subtract v (〜from)减去,减subwaverlength lithography 亚波长光刻sulfur hexafluoride(SF6)六氟化硫sulfuric acid (H2SO4 )硫酸surface profiler 表面形貌surface tension 表面张力susceptor 基座Ttarget chamber 靶室target 靶temperature ramp rate 温度斜率temperature 温度TEOS正硅酸乙脂test algorithm 测试算法test coverage 测试覆盖test structure 测试结构test vector测试向量thermal budget 热预算thermal oxide 热氧化thermocompression bonding 热压键合thermocouple 热电偶thermogravimetric analysis (TGA) 热重量分析thermosonic bonding 热超声键合thin film 薄膜thin small outline package(TSOP)薄小型圭寸装川-V compound 三/五族化合物thorough adj.十分的,彻底的Threshold 域值threshold voitage 域值电压threshold voltage adjustment implant 调栅注入,域值调整注入throughput 产量tilt [tilt] v.(使)倾斜,(使)翘起,以言词或文字抨击time of flight SIMS(TOF -SIMS) 飞行时间二次离子质谱titanium silicide 钛硅化合物TLV极限域值top surface imaging 上表面图形topography 形貌torr 托toxic有毒track system(also track) 轨道系统transient enhanced diffusion(TED)瞬时增强扩散transistor 晶体管trench 槽trench capacitor 槽电容trichlorosilane(TCS or SiHCL3)三氯氢硅triode planar reactor三真空管平面反应室triple well 三阱trivalent 三价tungsten(W)钨tungsten stch back 钨反刻tungsten hexafluoride(WF6)六氟化钨tungstenplug钨塞,钨填充turbomolecular pump(turbo pump) 涡轮分子泵twin planes(twinning) 双平面twin-well(twin-tub)双阱UULSI甚大规模集成电路ultralow penetration air(ULPA)超低穿透空气ultrafiltration 超过滤ultrafine particle 超细颗粒ultrahigh purity 超高纯度ultrahigh vacuum 超高真空ultrashallow junction 超浅结ultrashallow junction 超声键合(压焊) ultraviolet 紫外线undercut 钻蚀uniformity 均匀性unit cell元包,晶胞unpatterned etching(spripping)无图形刻蚀(剥离) unpatterned wafer 无图形硅片unplug v.拔去(塞子,插头等),去掉…的障碍物UV紫外线VVacancy 空位vacuum 真空vacuum wand真空吸片棒,真空镊子van der pauw method 范德堡法vapor phase epotaxy(VPE)气相外延vapor pressure 气压vapor prime气相熏增粘剂,气相成底膜vaporization 气化variable n.[数]变数,可变物,变量adj. 可变的,不定的,。
半导体英语词汇大全
11. acceptance testing (WAT: wafer acceptance testing)2. acceptor: 受主,如B,掺入Si中需要接受电子3. ACCESS:一个EDA(Engineering Data Analysis)系统4. Acid:酸5. Active device:有源器件,如MOS FET(非线性,可以对信号放大)6. Align mark(key):对位标记7. Alloy:合金8. Aluminum:铝9. Ammonia:氨水10. Ammonium fluoride:NH4F11. Ammonium hydroxide:NH4OH12. Amorphous silicon:α-Si,非晶硅(不是多晶硅)13. Analog:模拟的14. Angstrom:A(1E-10m)埃15. Anisotropic:各向异性(如POLY ETCH)16. AQL(Acceptance Quality Level):接受质量标准,在一定采样下,可以95%置信度通过质量标准(不同于可靠性,可靠性要求一定时间后的失效率)17. ARC(Antireflective coating):抗反射层(用于METAL等层的光刻)18. Antimony(Sb)锑19. Argon(Ar)氩20. Arsenic(As)砷21. Arsenic trioxide(As2O3)三氧化二砷22. Arsine(AsH3)223. Asher:去胶机24. Aspect ration:形貌比(ETCH中的深度、宽度比)25. Autodoping:自搀杂(外延时SUB的浓度高,导致有杂质蒸发到环境中后,又回掺到外延层)26. Back end:后段(CONTACT以后、PCM测试前)27. Baseline:标准流程28. Benchmark:基准29. Bipolar:双极30. Boat:扩散用(石英)舟31. CD:(Critical Dimension)临界(关键)尺寸。
半导体专业术语(中英对照)
Semiconductor:半导体 MFG (Manufacture):制造部 Wafer :晶片 Boule:晶锭 Ingot:晶棒 As cut wafer:毛片 Particle:含尘量/微尘粒子 Pod :晶盒 Cassette: 晶片夹 Clean Room:洁净室(Class 100000 以上) MO( Miss Operation):误操作 Process Engineering:制程工程师,简称为P.E.简单称为制程。 Equipment Engineering:设备工程师,简称为E.E.简单称为设备。 Recipe: 程式 PM(Prevention Maintenance): 预防保养 Alarm :警讯 OI (Operation Instruction) :规定的标准的正确操作机台的方法的文2
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半导体专业术语英语..
半导体专业术语英语半导体是当今最重要的技术领域之一。
随着半导体技术的不断发展,半导体专业术语英语越来越重要。
在本文中,我们将介绍一些常见的半导体专业术语英语,帮助读者更好地理解和掌握半导体技术。
基本概念1.Semiconductor:半导体2.Doping:掺杂3.Carrier:载流子4.Hole:空穴5.Electron:电子6.Bandgap:能隙7.Mobility:迁移率8.Resistivity:电阻率9.Conductivity:电导率10.PN Junction:PN结11.Schottky Junction:肖特基结半导体晶体结构1.Crystal:晶体ttice:晶格3.Unit Cell:单元胞4.Wafer:晶片5.Silicon Wafer:硅晶片6.Epitaxy:外延7.Deposition:沉积8.Etch:蚀刻9.Annealing:退火典型器件1.Transistor:晶体管2.Diode:二极管3.Capacitor:电容器4.Resistor:电阻器5.Inductor:电感器6.MOSFET:MOS场效应晶体管7.BJT:双极性晶体管8.LED:发光二极管9.IGBT:绝缘栅双极晶体管10.SCR:可控硅制程工艺1.Lithography:光刻2.Ion Implantation:离子注入3.Chemical Vapor Deposition (CVD):化学气相沉积4.Physical Vapor Deposition (PVD):物理气相沉积5.Wet Etch:湿法蚀刻6.Dry Etch:干法蚀刻7.Annealing:退火8.Configurations:构型9.Metrology:计量学10.Yield:良率11.Process Integration:制程集成半导体技术对现代社会的影响越来越大,而英语是半导体专业中的重要工具之一。
学习和掌握半导体专业术语英语,有助于提高在半导体行业的各种交流和合作能力。
半导体专业术语(中英对照)
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半导体专业词汇汇总
2023最新整理收集 do something
Semiconductor:半导体
MFG (Manufacture):制造部
Wafer :晶片
Boule:晶锭
Ingot:晶棒
As cut wafer:毛片
Particle:含尘量/微尘粒子 Pod :晶盒 Cassette: 晶片夹 Clean Room:洁净室(Class 100000 以上) MO( Miss Operation):误操作 Process Engineering:制程工程师,简称为P.E.简单称为制程。 Equipment Engineering:设备工程师,简称为E.E.简单称为设备。
半导体制造专业英语术语
球栅阵列舞厅式布局,超净间的布局 圆桶型反应室 阻挡层金属势垒电压backing film 背膜baffle vt ・ 困惑,阻碍,为难(挡片)baffle assembly n. 集合,装配,集会,集结,汇 编 (挡片块)丨 基极,基区 batch 批 bay and chase beam blow-up离子束膨胀 beam deceleration 束流减速分类代码号双极双极技术(工艺) bird ' s beak effect 鸟嘴效应blanket deposition 均厚淀积blower增压泵boat 舟BOE 氧化层刻蚀缓冲剂Bon voyage [法]再见,一路顺风[平安]bonding pads 压点bonding wire 焊线,引线boron(B) 硼boron trichloride(BCL3) 三氯化硼boron trifluoride (B F3)三氟化硼borophosphosilicate glass(BPSG)硼磷硅玻璃borosilicate glass(BSG) 硼硅玻璃bottom antireflective coating(BARC)下减反射涂层boule单晶锭bracket n.墙上凸出的托架,括弧,支架v.括在一起breakthrough step 突破步骤,起始的干法刻蚀步骤brightfield detection 亮场检查brush scrubbing 涮洗bubbler 带鼓泡槽buffered oxide etch(BOE) 氧化层腐蚀缓冲液bulk chemical distribution 批量化学材料配送bulk gases 大批气体bulkhead equipment layout 穿壁式设备布局bumped chip 凸点式芯片buried layer 埋层burn-box 燃烧室(或盒) burn-in 老化CCA 化学放大(胶) cantilever n. 建]悬臂cantilever paddle 悬臂桨cap oxide 掩蔽氧化层capacitance 电容capacitance-voltage test(C-Vtest) 电容-电压测试capacitive coupled plasma 电容偶合等离子体capacitor 电容器carbon tetrafluoride(CF4) 四氟化碳caro ' s acid3 号液carrier 载流子carrier-depletion region 载流子耗尽层carrier gas 携带气体cassette (承)片架cation 阳离子caustic 腐蚀性的cavitation 超声波能CD 关键尺寸CD- SEM 线宽扫描电镜Celsius adj.摄氏的center of focus(COF) 焦点焦平面center slow 中心慢速central processing unit(CPU) 中央处理器ceramic substrate 陶瓷圭寸装CERDIP 陶瓷双列直插封装Channel 沟道channel length 沟道长度channeling 沟道效应charge carrier 载流子chase技术夹层chelating agent 螯合齐ijchemical amplification(CA) 化学放大胶chemical etch mechanism 化学刻蚀机理chemical mechanical planarization(CMP) 化学机械平坦化chemical solution 化学溶液chemical vapor deposition(CVD) 化学气相淀积chip 芯片chip on board(COB)板上芯片chip scale package(CSP)芯片尺寸圭寸装circuit geometries 电路几何尺寸class number 净化级另卩cleanroom 净化间cleanroom protocol 净化间操作规程Clearfield mask 亮场掩膜板Cluster tool 多腔集成设备CMOS 互补金属氧化物半导体CMP 化学机械平坦化Coater/developer track 涂胶/显影轨道Cobalt silicide 钻硅化合物coefficient n. [数]系数Coefficient of thermal expansion(CTE)热涨系数Coherence probe microscope 相干探测显微镜Coherent light 相干光coil v. 盘绕,卷Cold wall 冷壁Collector 集电极Collimated light 平行光Collimated sputtering 准直溅射Compensate v.偿还,补偿,付报酬Compound semiconductor 化合物半导体Concentration 浓度Condensation 浓缩Conductor 导体constantly adv・不变地,经常地,坚持不懈地Confocal microscope 共聚焦显微镜Conformal step coverage 共型台阶覆盖Contact 接触(孔)Contact alignment 接触式对准(光刻)Contact angle meter 接触角度仪Contamination 沾污、污染conti boat 连柱舟conticaster [冶]连铸机Continuous spray develop 连续喷雾显影Contour maps 包络图、等位图、等值图Contrast 对比度、反差contribution n.捐献,贡献,投稿Conventional-line photoresist 常规I 线光刻胶Cook' s theory库克理论Copper CVD 铜CVD Copper interconnect 铜互连Cost of ownership(COO) 业主总成本Covalent bond 共价键Critical dimension 关键尺寸Cryogenic aerosol cleaning 冷凝浮质清洗Cryogenic pump(cryopump) 冷凝泵Crystal 晶体Crystal activation 晶体激活Crystal defect 晶体缺陷Crystal growth 晶体生长Crystal lattice 晶格Crystal orientation 晶向CTE 热涨系数Current-driven current amplifier 电流驱动电流放大器CVD 化学气相淀积Cycle time 周期CZ crystal puller CZ 拉单晶设备Czochralski(CZ) method 切克劳斯基法Ddamascene 大马士革工艺darkfiled detection 暗场检测darkfiled mask 暗场掩膜版DC bias 直流偏压decompose v. 分解,(使)腐烂deep UV(DUV) 深紫外光default n.默认(值),缺省(值),食言,不履行责任,[律]缺席v.疏怠职责,缺席,拖欠,默认defects density 缺陷密度defect 缺陷deglaze 漂氧化层degree of planarity(DP) 平整度dehydration bake 去湿烘培,脱水烘培density 密度deplention mode 耗尽型degree of focus 焦深deposit n.堆积物,沉淀物,存款,押金,保证金,存放物vt ・存放,堆积vi.沉淀deposition 淀积deposited oxide layer 淀积氧化层depth of focus 焦深descum 扫底膜design for test(DFT)可测试设计desorption 解吸附作用develop inspect 显影检查development 显影developer 显影液deviation n.背离device isolation 器件隔离device technology 器件工艺DI water 去离子水Diameter n.直径diameter grinding 磨边diborane ( B2H6 )乙硼烷dichlorosilane(H2SiCL2) 二氯甲硅烷die 芯片die array 芯片阵列die attach 粘片die-by-die alignment 逐个芯片对准dielectric 介质dielectric constant 介电常数die matrix 芯片阵列die separation 分片diffraction 衍射diffraction-limited optics 限制衍射镜片diffusion 扩散diffusion controlled 受控扩散digital/analog数字/模拟digital circuit diluent direct chip attach( DCA) directionality discrete dishing dislocation dissolution ratedissolution rate monitor(DRM) 溶解率监测DNQ-novolak 重氮柰醌一酚醛树脂Donor 施主dopant profile 掺杂刨面) doped虚拟的, region 掺杂区 doping 掺杂 dose monitor剂量检测仪 dose,Q 剂量 downstream reactor 顺流法反应 drain 漏 drive-in推进 dry etch 干法刻蚀 dry mechanical pump干式机械泵 dry oxidation 干法氧化dummy n.哑巴,傀儡,假人,假货 adj. 假的,虚构的 n.[计]哑元 dynamic adj. 动力的,动力学的,动态的 E economies of scale 规模经济 edge bead removal 边缘去胶 edge die 边缘芯片edge exclusion 无效边缘区域 electrically erasable PROM 电可擦除 EPROM electrode 电极 electromigration 电迁徙 electron beam lithography 电子束光刻electron cyclotron resonance 电子共振回旋加速器 electron shower 电子簇射,电子喷淋 electron stopping 电子阻止 electronic wafer map 硅片上电性能分布图 electroplating 电镀 electropolishing 电解拋光electrostatic chuck 静电吸盘 electrostatic discharge(ESD)静电放电 ellipsometry 椭圆偏振仪,椭偏仪emitter 发射极 endpoint detection 终点检测 engineering n.工程(学) electrostatic discharge(EDX)能量弥散谱仪 enhancement mode 增强型 epi 夕卜延epitaxial layer 夕卜延层epoxy underfill 环氧树脂填充不足erasable PROM 可擦除可编程只读存储器erosion腐蚀,浸蚀establish vt・建立,设立,安置,使定居,使人民接受,确定v.建立etch 刻蚀etch bias刻蚀涨缩量etch profile 刻蚀刨面etch rate 刻蚀速率etch residue 刻蚀残渣etch uniformity 刻蚀均匀性etchant 刻蚀剂etchback planarization 返刻平坦化eutectic attach 共晶焊接eutectic temperature 共晶温度evaporation 蒸发even adj.平的,平滑的,偶数的,一致的,平静的,恰好的,平均的,连贯的adv.[加强语气]甚至(・・・也), 连…都,即使,恰好,正当vt.使平坦,使相等vi. 变平,相等n.偶数,偶校验exceed vt. 超越,胜过vi.超过其他excimer laser 准分之激光exposal n. 曝光,显露exposure 曝光exposure dose 曝光量extraction electrode 吸极extreme UV 极紫外线extrinsic silicon 掺杂硅F Fables无制造厂公司fabrication 制造facilities 设施factor n.因素,要素,因数,代理人fast ramp furnaces 快速升降温炉fault model 失效模式FCC diamond 面心立方金刚石feature size 特征尺寸FEOL 前工序Fick ' s lawsFICK 定律field-effect transistor 场效应晶体管field oxide 场氧化field-by-field alignment 逐场对准field-programmable PROM 现场可编程只读存储器film 膜film stress 膜应力final assembly and packaging 最终装配和圭寸装final test 终测first interlayer dielectric(ILD-1)第一层层间介质fixed oxide charge 固定氧化物电荷flats 定位边flip chip 倒装芯片float zone 区熔法fluorosilicate glass(FSG) 氟化玻璃focal length 焦距focal plane 焦平面focal point 焦点focus聚焦focus ion beam(FIB) 聚焦离子束footprint 占地面积formula n.公式,规则,客套语forward bias 正偏压four-point probe 四探针frenkel defect Frenkel 缺陷front-opening unified pod(FOUP)前开口盒functional test 功能测试furnace flat zone 恒温区G g-line G 线gallium(Ga)镓gallium arsenide(GaAs)砷化镓gap fill间隙填充gas 气体gas cabinet 气柜gas manifold 气瓶集装gas phase nucleation 气相成核gas purge 气体冲洗gas throughput 气体产量gate 栅gate oxide 栅氧化硅gate oxide integrity 栅氧完整性germanium(Ge) 错getter 俘获glass玻璃glazing 光滑表面global alignment 全局对准global planarization 全局平坦化glow discharge 起辉放电gray area 灰区,技术夹层gross defect 层错grove n. 小树林grown oxide layer 热氧化生长氧化层HHalogen 卤素hardbake 坚膜hardware n.五金器具,(电脑的)硬件,(电子仪器的)部件HEPA filter 高效过滤器hermetic sealing 密圭寸heteroepitaxy 异质外延heterogeneous reaction 异质反应hexamethyldisilazane(HMDS)六甲基二硅氨烷high-density plasma(HDPCVD) 高密度等离子体化学气相淀积高温扩散炉 high-density plasma etch 高密度等离子刻蚀 high-pressure oxidation 高压氧化high-temperature diffusion furnace high vacuum 高真空 high vacuum pumps 高真空泵 hillock 小丘(铝)尖刺 homoepitaxy 同质外延 homogeneous reaction 同质反应 horizontal adj.地平线的,水平的 horizontal furnace 臣卜式炉 hot electron 热电子 hot wall 热壁 hydrochloric acid(HCL)盐酸 hydrofluoric acid(HF)氢氟酸 hydrogen(H2)氢气 hydrogen chloride(HCL)氯化氢 hydrogen peroxide(H2O2)双氧水 hydeophilic 亲水性 hydrophobic 憎水性,疏水性 hyperfiltration 超过滤Ii-line I 线IC packaging 集成电路封装IC reliability 集成电路可靠性 Iddq testing 静态漏电流测试 image resolution 图象清晰度 图象分解力implant v.灌输(注入) impurity 杂质 increment n.增力口,增量 initial adj.最初的,词首的,初始的 n.词首大写 字母 in situ measurements 在线测量 index of refraction 折射率 indium 铟 inductively coupled plasma (ICP )电感耦合等离子体 inert gas惰性气体infrared interference 红外干涉ingot 锭ink mark墨水标识in-line parametric test 在线参数测试input/output(I/O)pin 输入/ 输出管脚institute n. 学会,学院,协会vt.创立,开始,制定,开始(调查),提起(诉讼) insulator 绝缘体integrate vt.使成整体,使一体化,求…的积分v.结合integrated circuit(IC)集成电路integrated measurement tool 集成电路测量仪interval n.间隔,距离,幕间休息n.时间间隔interconnect 互连interconnect delay 互连连线延迟interface-trapped charge 界面陷阱电荷interferometer 干涉仪interlayer dielectric(ILD) 层间介质interstitial 间隙(原子) intrinsic silicon 本征硅invoke v.调用ion 离子ion analyzer 离子分析仪ion beam milling or ion beam etching(IBE) 离子铣或离子束刻蚀ion implantation 离子注入ion implantation damage 离子注入损伤ion implantation doping 离子注入掺杂ion implanter离子注入机ion projection lithography(IPL) 离子投影机PVD ionization 离子化ionized metal plasma PVD 离子化金属等离子IPA vapor dry 异丙醇气相干燥isolation regions 隔离区isotropic etch profile各向同性刻蚀刨面JJEFT结型场效应管junction(pn) PN 结junction depth 结深junction spiking 结尖刺KKelvin绝对温度killer defect致命缺陷kinetically controlled reaction 功能控制效应L laminar air flow 层状空气流,层流式lapping 拋光latchup闩锁效应lateral diffusion 横向扩散law of reflection 反射定律LDD轻掺杂漏Leadframe 引线框架leakage cuttent 漏电流len透镜lens compaction 透镜收缩light 光light intensity 光强light scattering 光散射lightly doped drain(LDD) 轻掺杂漏linear 线性linear accelerator 线性加速器linear stage 线宽阶段,线性区linewidth 线宽liquid 液体lithography 光刻loaded brush沾污的毛刷loaded effect 负载效应loadlock真空锁local interconnect(LI)局部互连local planarization 局部平坦化local oxidation of silicon(LOCOS)硅局部氧化隔离法logic逻辑lot批low-pressure chemical vapor deposition (LPCVD) 低压化学气相淀积LSI大规模集成电路Mmagnetic CZ( MCZ )磁性切克劳斯基晶体生长法magnetically enhanced RIE(MERIE)磁增强反应离子刻蚀magnetron sputtering 磁控溅射Magnification n. 扩大,放大倍率magnificent adj. 华丽的,高尚的,宏伟的majority carrier 多子make-up loop补偿循环mask掩膜版n.面具,掩饰,石膏面像vt.戴面具,掩饰,使模糊vi.化装,戴面具,掩饰,参加化装舞会mask-programmable gate array 掩膜可编程门阵歹Umass flow controller(MFC) 质量流量计mass spectrometer 质谱仪mass-transport limited reaction 质量传输限制效应mathematical adj.数学的,精确的mean free path(MFP) 平均自由程medium vacuum 中真空adj. megasonic cleaning 超声清洗melt熔融membrane contactor薄膜接触器,隔膜接触器membrane filter薄膜过滤器,隔膜过滤器merchant n. 商人,批发商,贸易商,店主商业的,商人的mercury arc lamp 汞灯MESFET用在砷化镓结型场效应晶体管中的金属栅metal contact 金属接触孔metal impurities 金属杂质metal stack复合金属,金属堆叠metallization 金属化metalorganic CVD金属有机化学气相淀积metrology 度量衡学microchip微芯片microdefect 微缺陷microlithography 微光刻microloading微负载,与刻蚀相关的深宽比micron微米microprocessor n.[计]微处理器microprocessor unit 微处理器microroughness 微粗糙度Miller indices 密勒指数minienvironment 微环境minimum geometry 最小尺寸minority carrier 少子mix and match 混合与匹配mobile ionic contaminants(MIC)可动离子沾污mobile oxide charge 可动氧化层电荷module n.模数,模块,登月舱,指令舱modify vt・更改,修改v.修改molecular beam epitaxy (MBE) 分子束外延molecular flow 分子流monitor wafer(test wafer) 陪片,测试片,样片monocrystal 单晶monolithic device 单片器件Moore's law 摩尔定律MOS 金属氧化物半导体MOSFET 金属氧化物半导体场效应管motor curreant endpoint 电机电流终点检测(法) MSI中规模集成电路Multiplier n.增加者,繁殖者,乘数,增效器,乘法器multichip module(MCM) 多芯片模式multilenel metallization 多重金属化Murphy's model 墨菲模型N nanometer(nm)纳米native oxide 自然氧化层n-channel MOSFET n 沟道MOSFET negatine resist 负性光刻胶negative n.否定,负数,底片adj.否定的,消极的,负的,阴性的vt.否定,拒绝(接受) negatine resist development 负性光刻胶显影neutral beam trap 中性束陷阱next-generation lithography 下一代光刻技术nitric acid(HNO3)硝酸nitrogen(N2)氮气nitrogen trifluoride(NF3) 三氟化氮nitrous oxide (N2O) 一氧化二氮、笑气nMOS n沟道MOS场效应晶体管noncritical layer 非关键层nonvolatile memory 非挥发性存储器normality 归一化notch 定位槽novolak苯酚甲醛聚树脂材料npn npn 型(三极管) n-type silicon n 型硅nuclear stopping 离子终止nucleation 成核现象,晶核形成nuclei coalescence 核合并numericalaperture(NA) 数值孑L径n-well n 阱Oobjective (显微镜的)物镜off-axis illumination(OAI) 偏轴式曝光,离轴式曝光ohmic contact 欧姆接触op amp 运算放大器optical interferometry endpoint 光学干涉法终点检测optical lithography 光学光刻optical microscope(light microscope) 光学显微镜optical proximity correction(OPC)光学临近修正optical pyrometer 光学高温计optics 光学organic compound 有机化合物氧化诱生层积 vi.划桨,戏 out-diffusion 反扩散 outgassing 除气作用 overdrive 过压力 overetch step 过刻蚀 overflow rinser 溢流清洗 overlay accuracy 套准精度 overlay budget 套准偏差 overlay registration 套刻对准 oxidation 氧化 oxidation-induced stacking faults(OISF) 缺陷,氧化诱生堆垛层错 oxide 氧化物、氧化层、氧化膜 oxidezer 氧化齐ij oxide-trapped charge 氧化层陷阱电荷 ozone(O3)臭氧Ppackage 封装管壳 pad conditioning 垫修整 pad oxide 垫氧化膜 paddle 悬臂 n.短桨,划桨,明轮翼 水,涉水 vt ・用桨划,搅,拌parabolic stage 拋物线阶段parallel-plate(planar)reactor 平板反应parallel testing 并行测试 parameter 参数parametric test 参数测试 parasitic 寄生parasitic capacitance 寄生电容 parasiticresistance 寄生电阻 parasitic transistor 寄生电阻器 partial pressure 分压 particledensity 颗粒密度 particle per wafer perpass(PWP)每步每片上的颗粒 数passivation 钝化 passivation layer 钝化层passive components 无源元件pattern sensitivity 图形灵敏性patterned etching 图形刻蚀pattern wafer 带图形硅片patterning 图形转移,图形成型,刻印pc board 印刷电路版完成任务 p-channel MOSFETp 沟道 MOSFET PCM 工艺控制监测 PEB 曝光后烘焙 PECVD 等离子体增强化学气相淀积PEL 允许曝露极限值pellicle 贴膜 pentavalent 五价元素 perform vt ・ 履行,执行,表演,演出 v. performing adj. 表演的,履行的 perimete array 周边阵列式(圭寸装) pH scale pH 值 phase-shift mask(PSM) 相移掩膜技术 phosphine(PH3) 磷化氢 phosphoric acid(H3PO4)磷酸 phosphorus(P)磷 phosphorus oxychloride(POCL3)三氯氧磷 phosphosilicate glass(PSG)磷硅玻璃 photoacid generator(PAG)光酸产生剂 photoacoustics 光声的 photoactive compound(PAC)感光化合物 photography n.摄影,摄影术 光刻photolithography 光刻(技术) photomask 光掩膜 photoresist 光刻胶 photoresist stripping 去胶、光刻胶去除 physical etch mechanism 物理刻蚀机理 physical vapor deposition(PVD)物理气相淀积 pigtail 引出头 pin grid array(PGA) 针栅阵列式(封装)pinhole 针孑 L piranha 3 号液 pitch 间距 planar 平面 planar capacitor 平面电容 planar process 平面工艺 planarization 平坦化 plasma 等离子体 n.[解]血浆,乳浆,[物]等离子体,plasma-induced damage 等离子体诱导损伤plasma potential distribution 等离子体势分布plastic dual in-line package(DIP) 双列直插塑料圭寸装plastic leaded chip carrier(PLCC) 塑料电极芯片载体plastic packaging 塑料圭寸装plug塞,填充vt.堵,塞,插上,插栓n塞子,插头, 插销pMOS(p-channel) p 沟道MOSpn junction diode pn 结型二极管pnp pnp型三极管point defect 点缺陷Poisson's model 泊松模型polarization 极化,偏振polarized light 极化光,偏振光polish拋光polish rate 拋光速率polished wafer edge(edge grind) 倒角polishing loop 磨拋循环polishing pad 拋光(衬)垫polycide 多晶硅化物光刻胶显影post-develop inspection 显影后检查post-exposure bake(PEB) 曝光后烘焙ppb 十亿分之几ppm 百万分之几ppt 万亿分之几preamorphization 预非晶化precursor 先驱物predeposition 预淀积premetaldielectric(PMD) 金属前介质preston equation Preston 方程primary orientation flat 主定位边print bias光刻涨缩量printed circuit boade(PCB) 印刷电路板probe探针probe card 探针卡prober探针台process 工艺process chamber工艺腔,工艺反应室process chemical 工艺化学process control monitor(PCM)工艺控制监测(图形) process latitude工艺水平,工艺能力process recipe 工艺菜单programmable arraylogic(PLA) 可编程阵列逻辑programmable logic device 可编程逻辑器件programmable read-only memory 可编程只读存储器projected range 投影射程prompt n.提示,付款期限vt・提示,鼓动,促使, (给演员)提白adj.敏捷的,迅速的,即时的adv.准时地n. DOS命令:改变DOS系统提示符的风格proportion n.比例,均衡,面积,部分vt.使成比例,使均衡,分摊proportional adj. 比例的,成比例的,相称的,均衡的proportional band 比例区,比例带,比例尺范围proximityaligner 接近式光刻机p-type silicon P 型硅puddle develop搅拌式显影pump speed 抽气速率punchthrough 穿通purge (冲气)清洗purge cycle (冲气抽气)清洗循环PVD物理气相淀积p-well P 阱pyrogenic steam 热流pyrogen 热原(质)pyrolytic 热解pyrophoric 自燃的Qquad flatpack(QFP)方型管壳封装quadrupole mass analyzer (QMA)四极质量分析仪quality measure 质量测量quarz石英quarz tube 石英管quarz wafer boat 石英舟queue time排队时间R radiation damage 辐射损伤radical 激发random access memory(RAM) 随机存储器range射程rapid thremal anneal(RTA) 快速热退火rapid thermal processor(RTP)快速热处理RCA clean RCA 清洗reaction rate limited 反应速率限制reactive ion etch(RIE)反应离子刻蚀reactivity 反应性reactor反应室,反应腔read-only memory(ROM)只读存储器recombination 复合redistribution 再分布reflection spectroscopy 反射光谱仪reflective notching 反射开槽reflow回流refraction 折身寸refractory metal 难融金属regeneration 再生regeneration套准精度relative index of refraction,n removal n. 移动,免职,切除repeat n.重复,反复vt・重做,复述,向他人转述,复制,使再现vi.重复,留有味道representation n. 表示法,表现,陈述,请求,扮演,画像,继承,代表reset v.重新安排residual gas analyzer(RGA)残余气体分析器resist光刻胶resist development 光刻胶显影resistance 电阻resistivity 电阻率resolution 分辨率reticle掩膜版retrograde well 倒掺杂阱reverse bias 反偏reverse osmosis(RO)反向渗透RF射频RF sputtering射频溅射rinse v嗽口,(用清水)刷,冲洗掉,漂净n.清洗嗽洗,漂洗,漂清,冲洗RO反向渗透Roots blower罗茨(机械增压)泵roughing pump 低真空泵,机械泵RTA快速热退火RTP快速热处理Ssatisfy vt.满足,使满意,说服,使相信v.满意,确保Scaling按比例缩小SCALPEL具有角度限制分散投影电子束光刻Scanner扫描仪scanning electron microscope(SEM)扫描电子显微镜scanning projection aligner 扫描投影光刻机schottky diode 肖特基二极管screen oxide layer 掩蔽氧化层scribe line 戈H 片道scribe line monitor(SLM)戈J片线监测scumming 底膜secondary electron 二次电子secondary electron flood 二次电子流secondary ion mass spectrometry(SIMS)二次离子质谱 (法) seed' s model SEE 模型selective etching 选择性刻蚀selective oxidation 选择性氧化selectivity 选择性semiconductor grade silicon 半导体极硅semiconductor 半导体sensitivity 灵敏度shallow trench isolation(STI)浅沟槽隔离sheet resistance,RS 方块电阻sheet resistivity,方块电阻率shot size胶(点)尺寸shrinking 缩小SI units 公制Sidewall spacer 侧墙Silane(siH4)硅烷Silicide硅化合物silicon 硅silicon dioxide(SIO2)二氧化硅silicon nitride(SI3N4)氮化硅silicon on sapphire 蓝宝石伤硅silicon on insulator(SOI)绝缘体上硅silicontetrachloride(SIC4) 碳化硅silicon tetrafluoride(SIF4)四氟化硅silicon tetrachloride(SICL4)四氯化硅single crystal silicon 单晶硅silylation硅烷化(作用)SIMOX 由注入氧隔离,一种SOI材料single crystal 单晶slip滑移slurry磨料SMIF标准机械接口Sodium hydroxide(NaOH)氢氧化钠soft bake 前烘solid固体solvent 溶齐ijSOS蓝宝石上硅Source 源source drain implants 源漏注入spacer n.取间隔的装置,逆电流器spatial coherence 空间相干spatial signature analysis 空间信号分析specialty gase 特种气体species 种类specific gravity 比重specific heat 比热speckle 斑点spectroscipic ellipsometry 椭圆偏振仪spin coating光刻胶旋涂spin dryer 旋转式甩干桶spin-on-dielectric(SOD)旋转介质法spin-on-glass(SOG)旋转玻璃法spray cleaning 喷雾清洗spray rinser喷雾清洗槽spreading resistance probe 扩散电阻探测sputter n・喷溅声,劈啪声,急语,咕哝vi.唾沫飞溅,发劈啪声,急忙地讲vt.喷出,飞溅出,气急败坏地说sputtering 溅射sputter etch溅射刻蚀sputtered aluminum 溅射铝sputtering yield 溅射产额SSI小规模集成电路stacking fault层积缺陷,堆垛层错standard clean 1(SC-1) 1 号清洗液standard clean 2(SC-2) 2 号清洗液standard mechanical interface(SMIF)机械标准接口standing wave 驻波static RAM静态存储器statistical process control ( SPC)统计过程控制step coverage台阶覆盖step height台阶高度step-and-repeat aligner 分步重复光刻机step-and-scan system步进扫描光刻机stepper步进光刻机stepping motor driver步进电机驱动器电路stepper步进光刻机stoichiometry化学计量(配比) staggle投射标准偏差stress应力striation 条纹strip vt・剥,剥去n. 条,带stripping 去胶structure 结构subatmospheric CVD亚大气压化学气相淀积submicron 亚微米sub-quarter micron 亚0・25微米substrate 衬底sublimation 升华substitutional atom 替位原子subtract v (〜from)减去,减subwaverlength lithography 亚波长光刻sulfur hexafluoride(SF6)六氟化硫sulfuric acid (H2SO4 )硫酸surface profiler 表面形貌surface tension 表面张力susceptor 基座Ttarget chamber 靶室target 靶temperature ramp rate 温度斜率temperature 温度TEOS正硅酸乙脂test algorithm 测试算法test coverage 测试覆盖test structure 测试结构test vector测试向量thermal budget 热预算thermal oxide 热氧化thermocompression bonding 热压键合thermocouple 热电偶thermogravimetric analysis (TGA) 热重量分析thermosonic bonding 热超声键合thin film 薄膜thin small outline package(TSOP)薄小型圭寸装川-V compound 三/五族化合物thorough adj.十分的,彻底的Threshold 域值threshold voitage 域值电压threshold voltage adjustment implant 调栅注入,域值调整注入throughput 产量tilt [tilt] v.(使)倾斜,(使)翘起,以言词或文字抨击time of flight SIMS(TOF -SIMS) 飞行时间二次离子质谱titanium silicide 钛硅化合物TLV极限域值top surface imaging 上表面图形topography 形貌torr 托toxic有毒track system(also track) 轨道系统transient enhanced diffusion(TED)瞬时增强扩散transistor 晶体管trench 槽trench capacitor 槽电容trichlorosilane(TCS or SiHCL3)三氯氢硅triode planar reactor三真空管平面反应室triple well 三阱trivalent 三价tungsten(W)钨tungsten stch back 钨反刻tungsten hexafluoride(WF6)六氟化钨tungstenplug钨塞,钨填充turbomolecular pump(turbo pump) 涡轮分子泵twin planes(twinning) 双平面twin-well(twin-tub)双阱UULSI甚大规模集成电路ultralow penetration air(ULPA)超低穿透空气ultrafiltration 超过滤ultrafine particle 超细颗粒ultrahigh purity 超高纯度ultrahigh vacuum 超高真空ultrashallow junction 超浅结ultrashallow junction 超声键合(压焊) ultraviolet 紫外线undercut 钻蚀uniformity 均匀性unit cell元包,晶胞unpatterned etching(spripping)无图形刻蚀(剥离) unpatterned wafer 无图形硅片unplug v.拔去(塞子,插头等),去掉…的障碍物UV紫外线VVacancy 空位vacuum 真空vacuum wand真空吸片棒,真空镊子van der pauw method 范德堡法vapor phase epotaxy(VPE)气相外延vapor pressure 气压vapor prime气相熏增粘剂,气相成底膜vaporization 气化variable n.[数]变数,可变物,变量adj. 可变的,不定的,。
半导体专业英语词汇手册
引線框的內腳 步进夹子 电感 紅外線 紅外線回流焊 引线框 管脚长度 托板 烘箱容量 定位孔 機器/機台 料盒 芯片版号(光罩号) 显微镜 混管、混料 氮气柜 目检 最終目檢 外觀檢 外观检 引線框的外腳 烘箱 氧化 产品外形测量 鋁墊/压区尺寸 投影仪 电抗 电阻 随件单 随件单 报废 值班长 出货 镀银层 可焊性 擋板
英文 Air Ionizer Antistatic Bag antistatic gloves Antistatic wrist strip backside metal (Au/Ag) baking / curing bare fingers bond pad bond pad opening capacitance centrifugal drier concentration conductive table mat contamination coplanarity date code deionized water (DI water) Defect Defect Rate Die Bond (DB) Die or chip dispatch sheet dust-free paper ESD (ElectroStatic Discharge) ESD label ESD table mat ESD tester package fine pitch package Finger cots nitrogen gas (N2) flow rate of nitrogen gas (N2) Film frame impedance impulse current
Transit box On line Inspection Qualtity Control (QC) Traveling inspection Tube tweezer viscosity Wafer wafer diameter WIP(Work In Process) Yield yield lose yield lose rate Film frame Cassette Ring cassette Plasma cleaner ejector pin ejector pin hole
半导体专业词汇
半导体专业词汇PCB词汇一、综合词汇1、印制电路:printed circuit2、印制线路:printed wiring3、印制板:printed board4、印制板电路:printed circuit board (pcb)5、印制线路板:printed wiring board(pwb)6、印制元件:printed component7、印制接点:printed contact8、印制板装配:printed board assembly9、板:board10、单面印制板:single-sided printed board(ssb)11、双面印制板:double-sided printed board(dsb)12、多层印制板:mulitlayer printed board(mlb)13、多层印制电路板:mulitlayer printed circuit board14、多层印制线路板:mulitlayer prited wiring board15、刚性印制板:rigid printed board16、刚性单面印制板:rigid single-sided printed borad17、刚性双面印制板:rigid double-sided printed borad18、刚性多层印制板:rigid multilayer printed board19、挠性多层印制板:flexible multilayer printed board20、挠性印制板:flexible printed board21、挠性单面印制板:flexible single-sided printed board22、挠性双面印制板:flexible double-sided printed board23、挠性印制电路:flexible printed circuit (fpc)24、挠性印制线路:flexible printed wiring25、刚性印制板:flex-rigid printed board, rigid-flex printed board 26、刚性双面印制板:flex-rigid double-sided printedboard, rigid-flex double-sided printed 27、刚性多层印制板:flex-rigid multilayer printed board, rigid-flex multilayer printed board 28、齐平印制板:flush printed board 29、金属芯印制板:metal core printed board 30、金属基印制板:metal base printed board 31、多重布线印制板:mulit-wiring printed board 32、陶瓷印制板:ceramic substrate printed board 33、导电胶印制板:electroconductive paste printed board 34、模塑电路板:molded circuit board 35、模压印制板:stamped printed wiring board 36、顺序层压多层印制板:sequentially-laminated mulitlayer 37、散线印制板:discrete wiring board 38、微线印制板:micro wire board 39、积层印制板:buile-up printed board 40、积层多层印制板:build-up mulitlayer printed board (bum) 41、积层挠印制板:build-up flexible printed board 42、表面层合电路板:surface laminar circuit (slc) 43、埋入凸块连印制板:b2it printed board 44、多层膜基板:multi-layered film substrate(mfs) 45、层间全内导通多层印制板:alivh multilayer printed board 46、载芯片板:chip on board (cob) 47、埋电阻板:buried resistance board 48、母板:mother board 49、子板:daughter board 50、背板:backplane 51、裸板:bare board 52、键盘板夹心板:copper-invar-copper board 53、动态挠性板:dynamic flex board 54、静态挠性板:static flex board 55、可断拼板:break-away planel 56、电缆:cable 57、挠性扁平电缆:flexible flat cable (ffc) 58、薄膜开关:membrane switch 59、混合电路:hybrid circuit 60、厚膜:thick film 61、厚膜电路:thick film circuit 62、薄膜:thin film 63、薄膜混合电路:thin film hybrid circuit 64、互连:interconnection 65、导线:conductor trace line 66、齐平导线:flush conductor 67、传输线:transmission line 68、跨交:crossover 69、板边插头:edge-board contact 70、增强板:stiffener 71、基底:substrate 72、基板面:real estate 73、导线面:conductor side 74、元件面:component side 75、焊接面:solderside 76、印制:printing 77、网格:grid 78、图形:pattern 79、导电图形:conductive pattern 80、非导电图形:non-conductive pattern 81、字符:legend 82、标志:mark 二、基材: 1、基材:base material 2、层压板:laminate 3、覆金属箔基材:metal-clad bade material 4、覆铜箔层压板:copper-clad laminate (ccl) 5、单面覆铜箔层压板:single-sided copper-clad laminate 6、双面覆铜箔层压板:double-sided copper-clad laminate 7、复合层压板:composite laminate 8、薄层压板:thin laminate 9、金属芯覆铜箔层压板:metal core copper-clad laminate 10、金属基覆铜层压板:metal base copper-clad laminate 11、挠性覆铜箔绝缘薄膜:flexible copper-clad dielectric film 12、基体材料:basis material 13、预浸材料:prepreg 14、粘结片:bonding sheet 15、预浸粘结片:preimpregnated bonding sheer 16、环氧玻璃基板:epoxy glass substrate 17、加成法用层压板:laminate for additive process 18、预制内层覆箔板:mass lamination panel 19、内层芯板:core material 20、催化板材:catalyzed board ,coated catalyzed laminate 21、涂胶催化层压板:adhesive-coated catalyzed laminate 22、涂胶无催层压板:adhesive-coated uncatalyzed laminate 23、粘结层:bonding layer 24、粘结膜:film adhesive 25、涂胶粘剂绝缘薄膜:adhesive coated dielectric film 26、无支撑胶粘剂膜:unsupported adhesive film 27、覆盖层:cover layer (cover lay) 28、增强板材:stiffener material 29、铜箔面:copper-clad surface 30、去铜箔面:foil removal surface 31、层压板面:unclad laminate surface 32、基膜面:base film surface 33、胶粘剂面:adhesive faec 34、原始光洁面:plate finish 35、粗面:matt finish 36、纵向:length wise direction 37、模向:cross wise direction 38、剪切板:cutto size panel 39、酚醛纸质覆铜箔板:phenolic cellulose paper copper-clad laminates(phenolic/paper ccl) 40、环氧纸质覆铜箔板:epoxide cellulose paper copper-clad laminates (epoxy/paper ccl)41、环氧玻璃布基覆铜箔板:epoxide woven glass fabric copper-clad laminates 42、环氧玻璃布纸复合覆铜箔板:epoxide cellulose paper core, glass cloth surfaces copper-clad laminates 43、环氧玻璃布玻璃纤维复合覆铜箔板:epoxide non woven/woven glass reinforced copper-clad laminates 44、聚酯玻璃布覆铜箔板:ployester woven glass fabric copper-clad laminates 45、聚酰亚胺玻璃布覆铜箔板:polyimide woven glass fabric copper-clad laminates 46、双马来酰亚胺三嗪环氧玻璃布覆铜箔板:bismaleimide/triazine/epoxide woven glass fabric copper-clad lamimates 47、环氧合成纤维布覆铜箔板:epoxide synthetic fiber fabric copper-clad laminates 48、聚四乙烯玻璃纤维覆铜箔板:teflon/fiber glass copper-clad laminates 49、超薄型层压板:ultra thin laminate 50、陶瓷基覆铜箔板:ceramics base copper-clad laminates 51、紫外线阻挡型覆铜箔板:uv blocking copper-clad laminates 三、基材的材料 1、 a阶树脂:a-stage resin 2、 b阶树脂:b-stage resin 3、 c阶树脂:c-stage resin 4、环氧树脂:epoxy resin 5、酚醛树脂:phenolic resin 6、聚酯树脂:polyester resin 7、聚酰亚胺树脂:polyimide resin 8、双马来酰亚胺三嗪树脂:bismaleimide-triazine resin 9、丙烯酸树脂:acrylic resin 10、三聚氰胺甲醛树脂:melamine formaldehyde resin 11、多官能环氧树脂:polyfunctional epoxy resin 12、溴化环氧树脂:brominated epoxy resin 13、环氧酚醛:epoxy novolac 14、氟树脂:fluroresin 15、硅树脂:silicone resin 16、硅烷:silane 17、聚合物:polymer 18、无定形聚合物:amorphous polymer 19、结晶现象:crystalline polamer 20、双晶现象:dimorphism 21、共聚物:copolymer 22、合成树脂:synthetic 23、热固性树脂:thermosetting resin 24、热塑性树脂:thermoplastic resin 25、感光性树脂:photosensitive resin 26、环氧当量:weight per epoxy equivalent (wpe) 27、环氧值:epoxy value 28、双氰胺:dicyandiamide 29、粘结剂:binder 30、胶粘剂:adesive 31、固化剂:curing agent 32、阻燃剂:flame retardant 33、遮光剂:opaquer 34、增塑剂:plasticizers 35、不饱和聚酯:unsatuiated polyester 36、聚酯薄膜:polyester 37、聚酰亚胺薄膜:polyimide film (pi) 38、聚四氟乙烯:polytetrafluoetylene (ptfe) 39、聚全氟乙烯丙烯薄膜:perfluorinated ethylene-propylene copolymer film (fep) 40、增强材料:reinforcing material 41、玻璃纤维:glass fiber 42、 e玻璃纤维:e-glass fibre 43、d玻璃纤维:d-glass fibre 44、s玻璃纤维:s-glass fibre 45、玻璃布:glass fabric 46、非织布:non-woven fabric 47、玻璃纤维垫:glass mats 48、纱线:yarn 49、单丝:filament 50、绞股:strand 51、纬纱:weft yarn 52、经纱:warp yarn 53、但尼尔:denier 54、经向:warp-wise 55、纬向:weft-wise, filling-wise 56、织物经纬密度:thread count 57、织物组织:weave structure 58、平纹组织:plain structure 59、坏布:grey fabric 60、稀松织物:woven scrim 61、弓纬:bow of weave62、断经:end missing 63、缺纬:mis-picks 64、纬斜:bias 65、折痕:crease 66、云织:waviness 67、鱼眼:fish eye 68、毛圈长:feather length 69、厚薄段:mark 70、裂缝:split 71、捻度:twist of yarn 72、浸润剂含量:size content 73、浸润剂残留量:size residue 74、处理剂含量:finish level 75、浸润剂:size 76、偶联剂:couplint agent 77、处理织物:finished fabric 78、聚酰胺纤维:polyarmide fiber 79、聚酯纤维非织布:non-woven polyester fabric 80、浸渍绝缘纵纸:impregnating insulation paper 81、聚芳酰胺纤维纸:aromatic polyamide paper 82、断裂长:breaking length 83、吸水高度:height of capillary rise 84、湿强度保留率:wet strength retention 85、白度:whitenness 86、陶瓷:ceramics 87、导电箔:conductive foil 88、铜箔:copper foil 89、电解铜箔:electrodeposited copper foil (ed copper foil) 90、压延铜箔:rolled copper foil 91、退火铜箔:annealed copper foil 92、压延退火铜箔:rolled annealed copper foil (ra copper foil) 93、薄铜箔:thin copper foil 94、涂胶铜箔:adhesive coated foil 95、涂胶脂铜箔:resin coated copper foil (rcc) 96、复合金属箔:composite metallic material 97、载体箔:carrier foil 98、殷瓦:invar 99、箔(剖面)轮廓:foil profile 100、光面:shiny side 101、粗糙面:matte side 102、处理面:treated side 103、防锈处理:stain proofing 104、双面处理铜箔:double treated foil 四、设计 1、原理图:shematic diagram 2、逻辑图:logic diagram 3、印制线路布设:printed wire layout 4、布设总图:master drawing 5、可制造性设计:design-for-manufacturability 6、计算机辅助设计:computer-aided design.(cad) 7、计算机辅助制造:computer-aided manufacturing.(cam) 8、计算机集成制造:computer integrat manufacturing.(cim) 9、计算机辅助工程:computer-aided engineering.(cae) 10、计算机辅助测试:computer-aided test.(cat) 11、电子设计自动化:electric design automation .(eda) 12、工程设计自动化:engineering design automaton .(eda2) 13、组装设计自动化:assembly aided architectural design. (aaad) 14、计算机辅助制图:computer aided drawing 15、计算机控制显示:computer controlled display .(ccd) 16、布局:placement 17、布线:routing 18、布图设计:layout 19、重布:rerouting 20、模拟:simulation 21、逻辑模拟:logic simulation 22、电路模拟:circit simulation 23、时序模拟:timing simulation 24、模块化:modularization25、布线完成率:layout effeciency 26、机器描述格式:machine descriptionm format .(mdf) 27、机器描述格式数据库:mdf databse 28、设计数据库:design database 29、设计原点:design origin 30、优化(设计):optimization (design) 31、供设计优化坐标轴:predominant axis 32、表格原点:table origin 33、镜像:mirroring 34、驱动文件:drive file 35、中间文件:intermediate file 36、制造文件:manufacturing documentation 37、队列支撑数据库:queue support database 38、元件安置:component positioning 39、图形显示:graphics dispaly 40、比例因子:scaling factor 41、扫描填充:scan filling 42、矩形填充:rectangle filling 43、填充域:region filling44、实体设计:physical design 45、逻辑设计:logic design 46、逻辑电路:logic circuit 47、层次设计:hierarchical design 48、自顶向下设计:top-down design 49、自底向上设计:bottom-up design 50、线网:net 51、数字化:digitzing 52、设计规则检查:design rule checking 53、走(布)线器:router (cad) 54、网络表:net list 55、计算机辅助电路分析:computer-aided circuit analysis 56、子线网:subnet 57、目标函数:objective function 58、设计后处理:post design processing (pdp) 59、交互式制图设计:interactive drawing design 60、费用矩阵:cost metrix 61、工程图:engineering drawing 62、方块框图:block diagram 63、迷宫:moze 64、元件密度:component density 65、巡回售货员问题:traveling salesman problem 66、自由度:degrees freedom 67、入度:out going degree 68、出度:incoming degree 69、曼哈顿距离:manhatton distance 70、欧几里德距离:euclidean distance 71、网络:network 72、阵列:array 73、段:segment 74、逻辑:logic 75、逻辑设计自动化:logic design automation 76、分线:separated time 77、分层:separated layer 78、定顺序:definite sequence 五、形状与尺寸: 1、导线(通道):conduction (track) 2、导线(体)宽度:conductor width 3、导线距离:conductor spacing 4、导线层:conductor layer 5、导线宽度/间距:conductor line/space 6、第一导线层:conductor layer no.1 7、圆形盘:round pad 8、方形盘:square pad 9、菱形盘:diamond pad 10、长方形焊盘:oblong pad 11、子弹形盘:bullet pad 12、泪滴盘:teardrop pad 13、雪人盘:snowman pad 14、 v形盘:v-shaped pad 15、环形盘:annular pad 16、非圆形盘:non-circular pad 17、隔离盘:isolation pad 18、非功能连接盘:monfunctional pad 19、偏置连接盘:offset land 20、腹(背)裸盘:back-bard land 21、盘址:anchoring spaur 22、连接盘图形:land pattern 23、连接盘网格阵列:land grid array 24、孔环:annular ring 25、元件孔:component hole 26、安装孔:mounting hole 27、支撑孔:supported hole 28、非支撑孔:unsupported hole 29、导通孔:via 30、镀通孔:plated through hole (pth) 31、余隙孔:access hole 32、盲孔:blind via (hole) 33、埋孔:buried via hole 34、埋/盲孔:buried /blind via 35、任意层内部导通孔:any layer inner via hole (alivh) 36、全部钻孔:all drilled hole 37、定位孔:toaling hole 38、无连接盘孔:landless hole 39、中间孔:interstitial hole 40、无连接盘导通孔:landless via hole 41、引导孔:pilot hole 42、端接全隙孔:terminal clearomee hole 43、准表面间镀覆孔:quasi-interfacing plated-through hole 44、准尺寸孔:dimensioned hole 45、在连接盘中导通孔:via-in-pad 46、孔位:hole location 47、孔密度:hole density 48、孔图:hole pattern 49、钻孔图:drill drawing 50、装配图:assembly drawing 51、印制板组装图:printed board assembly drawing 52、参考基准:datum referance。
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Transit box On line Inspection Qualtity Control (QC) Traveling inspection Tube tweezer viscosity Wafer wafer diameter WIP(Work In Process) Yield yield lose yield lose rate Film frame Cassette Ring cassette Plasma cleaner ejector pin ejector pin hole
英文 Air Ionizer Antistatic Bag antistatic gloves Antistatic wrist strip backside metal (Au/Ag) baking / curing bare fingers bond pad bond pad opening capacitance centrifugal drier concentration conductive table mat contamination coplanarity date code deionized water (DI water) Defect Defect Rate Die Bond (DB) Die or chip dispatch sheet dust-free paper ESD (ElectroStatic Discharge) ESD label ESD table mat ESD tester package fine pitch package Finger cots nitrogen gas (N2) flow rate of nitrogen gas (N2) Film frame impedance impulse current
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