水合肼与抗坏血酸还原氧化石墨烯

水合肼与抗坏血酸还原氧化石墨烯

吕亚楠1,2，夏林1，陶呈安1，朱慧1，王建方1,*

1国防科技大学理学院化学与生物学系，湖南长沙，410073

2湖南师范大学化学化工学院，湖南长沙，410081

*Email: wangjianfang@

2004年Geim等发现了石墨烯的电场效应后，石墨烯的研究发展十分迅速，展现出了诱人的发展前景[1]。目前合成石墨烯的方法主要有物理微机械剥离法、氧化-还原法、化学气相沉积(CVD)、SiC热解法等。氧化还原法简便易行而且可以通过改变还原剂或者添加分散剂得到水溶液中分散良好的石墨烯。本文首先运用改进的Hummer方法[2]制备出了氧化石墨烯,然后分别用水合肼100℃回流和抗坏血酸常温N2保护下还原得到石墨烯，并利用傅立叶红外光谱（FT-IR)、X-射线衍射分析（XRD)、透射电子显微镜（TEM）进行分析。结果表明：抗坏血酸可以将氧化石墨上大部分含氧官能团有效去除，并且可以得到分散良好的石墨烯水分散系，该方法有望用于大量制备水溶性石墨烯。

Fig. 1Photographs of aqueous dispersions of GO(A) and RGO

prepared by hydrazine hydrate(B) and ascorbic acid(C)

关键词：改进的Hummer法；水合肼；抗坏血酸

参考文献

[1] Novoselov, K. S.; Geim, A. K.; Morozov, S. V.; Jiang, D.;Zhang, Y.; Dubonos, S. V.; Grigorieva, I. V.; Firsov, A. A. Science 2004, 306, 666-669.

[2] Daniela C. Marcano, Dmitry V. Kosynkin, Jacob M. Berlin, Alexander Sinitskii, Zhengzong Sun,Alexander Slesarev, Lawrence B. Alemany, Wei Lu, and James M. Tour.Nano letter.2010,

4(8). 4806-4814.

Reduction of Graphene Oxide

via Hydrazine Hydrate and Ascorbic Acid

Lv Ya'nan1,2, Xia Lin1,Tao Cheng'an1, Zhu Hui1, Wang Jianfang1,*

1College of Science, National University of Defense Technology, Changsha, 410073 2College of Chemistry and Chemical Engineering , Hunan Normal

University,Changsha,410081

In this paper, we prepared graphite oxide powder by modified Hummer method, then reduced

℃ascorbic acid at room temperature it respectively via hydrazine hydrate refluxing at the 100 and

under the protection of N2. The products were characterized by FT-IR , XRD, TEM. Results indicate that ascorbic acid can remove most of the oxygen functionalities of GO, and we can obtain better RGO aqueous dispersions. This method is more promising in large scale production of water soluble graphene.