等离子体化学气相沉积法合成石英玻璃_英文_

朱洪波等：矿渣粉、高钙灰及其改性材料对水泥早期水化进程的影响· 531 ·第36卷第4期

等离子体化学气相沉积法合成石英玻璃

宋学富1，孙元成2，钟海2，王宏杰2，顾真安2

(1. 哈尔滨工业大学材料科学与工程学院，哈尔滨 150001；2. 中国建筑材料科学研究总院，北京 100024)

摘要：用高频等离子体作为热源，采用化学气相沉积法合成了石英玻璃样品。实验分别使用O2和空气作为等离子体电离气体和冷却保护气体，改变等离子体电离工作气体种类时，等离子体火焰长度和石英玻璃沉积温度变化较大，而灯具冷却保护气体的改变对等离子火焰长度和石英玻璃沉积温度的影响不大。当等离子体电离气体和灯具保护气体均为O2时，等离子体火焰长度为12cm，石英基体温度为1300℃，当等离子体电离气体和灯具保护气体均为空气时，等离子体火焰长度可达24cm，石英基体温度升高到1840℃，可确保气相沉积过程进行，合成的石英玻璃在波长190nm处光透过率达84%，羟基含量3.5×10–6，可达到全光谱透过的要求。

关键词：等离子火焰；化学气相沉积；石英玻璃

中图分类号：TQ171；O643 文献标识码：A 文章编号：0454–5648(2008)04–0531–04

SYNTHESIS OF SILICA GLASS BY PLASMA CHEMICAL V APOR DEPOSITION METHOD

SONG Xuefu1，SUN Yuancheng2，ZHONG Hai2，WANG Hongjie2，GU Zhen’an2

(1. School of Material Science and Engineering, Harbin Institute of Technology, Harbin 150001;

2. China Building Materials Academy, Beijing 100024, China)

Abstract: Silica glass was synthesized by plasma chemical vapor deposition method, which uses inductively coupled plasma as the heat source. Air and oxygen were separately used as ionized gas and protecting gas. The influence of ionized gases on the length of plasma flame and the temperature of substrate is more significant than that of the protecting gases. A length of 24cm plasma flame and a deposition temperature of 1300℃were obtained when oxygen was used as both ionized gases and protecting gases, but in the case of air, the length of plasma flame was 24cm and the deposition temperature was 1840℃. Both of the longer plasma flame and the higher deposition temperature offered a good condition to deposit high quality silica glass. The silica glass has 84% transmittance at a wavelength of 190nm and 3.5 10–6 of the hydroxyl group, which is the glass of full-spectrum transmittance.

Key words: plasma flame; chemical vapor deposition; silica glass

Silica glass has the low thermal expansion coefficient, low conductivity, good thermal shock resistance, corro-sion resistance and excellent spectrum transmittance, because of the high bond energy and compactness of the network structure. Thus it has become the fundamental material of the high-tech field and has been widely used in optics, photoelectrons and dielectric materials.[1–2] Higher properties of silica glass are required with the development of space technology, and the silica glass prepared by common chemical vapor deposition (CVD) method does not meet these requirements, because it contains a large quantity of hydroxy groups. Recently, the plasma chemical vapor deposition (PCVD) method has been widely used to prepare optical fiber, nanomaterials and thin films, and in heat treatment of materials.[3–4] The cleanliness of its heat source ensures the purity of materials and avoids secondary pollutant. In this paper, silica glass was synthesized by PCVD.

1 Experimental procedure

A high frequency current was obtained by a modified

收稿日期：2007–10–01。修改稿收到日期：2008–01–30。第一作者：宋学富(1978—)，男，博士研究生。

通讯作者：顾真安(1936—)，男，中国工程院院士。Received date:2007–10–01. Approved date: 2008–01–30.

First author: SONG Xuefu (1978–), male, postgraduate student for doctor degree.

E-mail: songxuefu@

Correspondent author: GU Zhen’an (1936–), male, academician of the

Chinese Academy of Engineering.

E-mail: guzha@

第36卷第4期2008年4月

硅酸盐学报

JOURNAL OF THE CHINESE CERAMIC SOCIETY

Vol. 36，No. 4

April，2008