Roll-to-Roll磁控溅射镀膜系统设计论文解析

目录

中文摘要 (3)

英文摘要 (4)

1 绪论 (5)

1．1真空卷绕镀膜技术及设备的现状与发展 (5)

1.1.1真空卷绕镀膜技术的应用领域 (5)

2磁控溅射原理及溅射沉积工艺参数 (5)

2.1磁控溅射原理与磁控溅射物理过程 (5)

2.2磁控溅射的工艺参数 (6)

2.2.1 磁控溅射的功率 (6)

2.2.2 磁场强度 (7)

2.2.3 溅射气压 (7)

2.2.4 基片的温度 (7)

3 ROLL-TO-ROLL磁控溅射镀膜系统 (8)

3.1R OLL-TO-ROLL磁控溅射镀膜系统的主要组成和工作过程 (8)

3.1.1 Roll-to-Roll磁控溅射系统的组要组成 (8)

3.2平面磁控溅射靶的类型选择 (8)

4 磁控溅射镀膜真空室的设计要求与原则 (9)

4.1设计参数 (9)

4.2磁控溅射镀膜真空室的主要设计原则 (10)

4.3磁控溅射镀膜室对抽气系统的要求 (10)

5 ROLL-TO-ROLL磁控溅射真空镀膜室主要部分的设计与计算 (11)

5.1真空系统的设计与计算 (11)

5.1.1真空室壳体的类型选择 (11)

5.1.2 真空室壳体的计算 (11)

5.1.3抽气系统的设计与计算 (11)

5.1.4主泵的选择 (12)

5.1.5计算扩散泵与真空室排气口管路的流导，验证选K-200型扩散泵是否合适

(12)

5.1.6前级泵的选择 (14)

5.1.7抽气时间的计算 (14)

5.2卷绕系统主轴的ANSYS分析 (15)

5.3真空室的气流速度和压强的FLUENT分析 (20)

5.3.1 气体压强分析 (21)

5.3.2 气体的速度分析 (23)

5.4R OLL-TO-ROLL磁控溅射系统设计 (26)

致谢 (28)

参考文献 (29)

摘要：随着柔性基体材料在太阳能电池和柔性显示屏中的运用，在柔性基体上镀膜的技术越来越受到人们的关注，并且是现代科技发展中的一项关键技术。

磁控溅射镀膜技术是真空镀膜中运用广泛，不仅能够在各种面积的基体上

镀膜，而且还能还能够得到镀膜厚度均匀，性能稳定的薄膜。而R-to-R

磁控溅射镀膜技术不仅具有普通磁控溅射镀膜技术的优点，它还具有能够

在柔性基体上镀膜的特点，解决了在柔性基体上连续镀膜难题。文中在对

平面磁控溅射阴极的工作原理分析的基础上，阐述了磁控溅射镀膜的主要

工艺流程和影响参数，并介绍了R-to-R磁控溅射镀膜系统的主要组成和工

作原理，从而对卷对卷磁控溅射镀膜系统可行性的分析。文中主要对真空

室、抽气系统、传动系统、冷却系统进行设计以及对主轴进行了应力和位

移的ANSYS的分析，对真空室的气流进行压强和气体流速的FLUEND分析。

该抽气系统采用旋片泵做前级泵，扩散泵做主泵，传动系统用带传动和齿

轮传动的结合方式。

关键词：卷对卷、磁控溅射、柔性基体、矩形靶材、镀膜

Abstract:with the flexible base material in solar cell and the application of flexible displays, on the flexible substrate coating technology more and more get the

attention of people, and is a key technology in the development of modern

science and technology. Magnetron sputtering deposition technology is widely

used in vacuum coating, can in all area of the substrate coating not only, but

also can be uniform coating thickness, stable performance of the film. And

Roll-to-Roll magnetron sputtering deposition technology not only possesses the

advantages of ordinary magnetron sputtering deposition technology, it also has

the characteristics of the can on the flexible substrate coating, solved the

difficult problem on the flexible substrate for coating. On planar magnetron

sputtering cathode in this paper based on the analysis of working principle,

elaborated the magnetron sputtering coating process flow and main impact

parameters, and introduces the Roll-to-Roll magnetron sputtering coating

system composition and working principle, main to roll on the roll of the

magnetron sputtering coating system feasibility analysis. This paper mainly on

the vacuum chamber, extraction system, transmission system, cooling system

to carry on the design of main shaft and the stress and displacement of the

ANSYS analysis，on the airflow in vacuum chamber pressure and gas velocity

FLUEND analysis. Before the extraction system adopts the rotary vane pump

as prepump, diffusion pump in charge pump, transmission system with

transmission and gear transmission mode.

Keywords: volume to volume, magnetron sputtering, flexible substrate, rectangular target material, coating