AUTOMATIC ALIGNMENT DEVICE
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专利内容由知识产权出版社提供
专利名称：AUTOMATIC ALIGNMENT DEVICE 发明人：SUZUKI AKYOSHI 申请号：J P 184 00082 申请日：19821020 公开号：J P H 0121614 B 2 公开日：198904 21
摘要：PURPOSE:To negate the influence of chromatic aberration of a projection optical system by a method wherein a polarization beam splitter to alignment wavelength is used between a reticle and a wafer, and a nearly conjugate position to the reticle or the wafer is provided in the introduced optical system. CONSTITUTION:When the beam splitter 5 is arranged between the front group 4-1 and the back group 4-2 of the projection optical system 4 to project in the image of the reticle 1 on the wafer 2 by reduction or equimultiple, the splitter acts as the polarization beam splitter to an alignment beam, and as a simple parallel plane plate to an exposure beam. Out of an incident beam to the beam splitter 5 after passing through a relay lens 10, a reflected beam forms an image on the wafer 2, and scans on the wafer. The reflected beam is reflected again by the splitter, and enters in an optoelectric detector system 15-17. A transmitted beam enters in a lambda/4 plate 6, reflected by a mirror 8, the beam whose polarizational direction is changed is reflected by the splitter 5 this time to enter in the front group 4-1, reaches the reticle 1, the returned beam passes through the splitter this time because the polarizational direction is rotated, and is led to the photo detector 17.
更多信息请下载全文后查看
专利内容由知识产权出版社提供
专利名称：AUTOMATIC ALIGNMENT DEVICE 发明人：SUZUKI AKYOSHI 申请号：J P 184 00082 申请日：19821020 公开号：J P H 0121614 B 2 公开日：198904 21
摘要：PURPOSE:To negate the influence of chromatic aberration of a projection optical system by a method wherein a polarization beam splitter to alignment wavelength is used between a reticle and a wafer, and a nearly conjugate position to the reticle or the wafer is provided in the introduced optical system. CONSTITUTION:When the beam splitter 5 is arranged between the front group 4-1 and the back group 4-2 of the projection optical system 4 to project in the image of the reticle 1 on the wafer 2 by reduction or equimultiple, the splitter acts as the polarization beam splitter to an alignment beam, and as a simple parallel plane plate to an exposure beam. Out of an incident beam to the beam splitter 5 after passing through a relay lens 10, a reflected beam forms an image on the wafer 2, and scans on the wafer. The reflected beam is reflected again by the splitter, and enters in an optoelectric detector system 15-17. A transmitted beam enters in a lambda/4 plate 6, reflected by a mirror 8, the beam whose polarizational direction is changed is reflected by the splitter 5 this time to enter in the front group 4-1, reaches the reticle 1, the returned beam passes through the splitter this time because the polarizational direction is rotated, and is led to the photo detector 17.