Residual pressure structure of the pressure sensit
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专利名称：Residual pressure structure of the pressure
sensitivity component which is internalized
to Kith itch
发明人：牛 窪 康 身
申请号：JP実願平5-5422
申请日：19930126
公开号：JP実開平6-60031U
公开日：
19940819
专利内容由知识产权出版社提供
专利附图：
摘要：(57)< Abstract > (Modified) < Objective > Granting specified pushing pressure to the pressure sensor beforehandpointeingude due to Kith itch by putting,Operativity and controllability of the vise improving, in the Kith itch which becomesIt regards the
residual pressure structure of the pressure sensitivity component which is internalized. <Constitution > The occasion where the key top 2 is installed in specific frame 6The residual pressure spring 12 which formed by the leaf spring specification hurrayAs it
installs in the surface of mu 6, the surface of the residual pressure spring the metalFrom
both inside edge center section of the case stand facilities in the spring holding down piece 3a which is doneFrom in order to hold down, kisuitsu which features that it installsResidual pressure structure of the pressure sensitivity component which is internalized to chi.
申请人：ミツミ電機株式会社
地址：東京都調布市国領町8丁目8番地2
国籍：JP
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