THIN-FILM VAPOUR DEPOSITION DEVICE
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专利名称：THIN-FILM VAPOUR DEPOSITION DEVICE
发明人：HWANG, Sang-Soo,LEE, Woo-Jin,SHIN, Ki-
Jo,CHA, Dong-Il
申请号：EP14746326.9
申请日：20140203
公开号：EP2874180A1
公开日：
20150520
专利内容由知识产权出版社提供
专利附图：
摘要：Disclosed therein is a thin film deposition apparatus. The thin film deposition apparatus includes: a chamber having a predetermined inner space; a substrate support part disposed inside the chamber and supporting a substrate; and a gas supply device
having at least one supply channel for supplying process gas to the substrate and an activation channel which has a gas activation unit for activating the process gas, wherein the activation channel has an opened lower portion and a sealed upper portion.
申请人：Tes Co., Ltd.,Hwang, Sang-soo,Lee, Woo-Jin,Shin, Ki-jo,Cha, Dong-il
地址：2374-36 Jungbudae-ro Yangji-myeon Cheoin-gu Yongin-si, Gyeonggi-do 449-825 KR,Seongji Apt. Songpa-dong 102-1208 11 Songi-ro 12-gil Songpa-gu Seoul 138-854 KR,Myeongji Queendum Apt. Myeongji-dong 304-802 51 Myeongji Ocean City 11-ro Gangseo-gu Busan 618-710 KR,Daewoo 3 Cha Apt. Jeungpo-dong 301-102 35 Iseopdaecheon-ro 1407-gil Icheon-si, Gyeonggi-do 467-110 KR,Halla Vivaldi Park Apt. Gwonseon-dong 410 33 Hyowon-ro 256-gil Gwonseon-gu Suwon-si, Gyeonggi-do 441-822 KR
国籍：KR,KR,KR,KR,KR
代理机构：Louis Pöhlau Lohrentz
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