Method of determining local structures in optical
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专利名称：Method of determining local structures in
optical crystals
发明人：Ewald Moersen,Axel Engel,Christian
Lemke,Guenter Grabosch
申请号：US10464402
申请日：20030618
公开号：US06989904B2
公开日：
20060124
专利内容由知识产权出版社提供
专利附图：
摘要：The method for determining local structures in optical materials, especially crystals, includes observing schlieren visually in a material to be tested with divergent
white light in a first step; measuring birefringence of polarized laser light in the material to determine local defects and structure faults in the material with a spatial resolution of 0.5 mm or better in a second step if the material is judged to be suitable in the first step and then interferometrically measuring the material to determine the faults in the material by interferometry in a third step if the material is judged to be suitable in the first and second steps. This method can be part of a method for making optical components, especially for microlithography.
申请人：Ewald Moersen,Axel Engel,Christian Lemke,Guenter Grabosch
地址：Mainz DE,Ingelheim DE,Jena DE,Mainz DE
国籍：DE,DE,DE,DE
代理人：Michael J. Striker
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