Method for filtering particles out of a beam of ra
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专利名称：Method for filtering particles out of a beam of radiation and filter for a lithographic
apparatus
发明人：Levinus Pieter Bakker,Derk Jan Wilfred
Klunder,Maarten Marinus Johannes
Wilhelmus Van Herpen
申请号：US11493848
申请日：20060727
公开号：US07692169B2
公开日：
20100406
专利内容由知识产权出版社提供
专利附图：
摘要：A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.
申请人：Levinus Pieter Bakker,Derk Jan Wilfred Klunder,Maarten Marinus Johannes Wilhelmus Van Herpen
地址：Helmond NL,Geldrop NL,Heesch NL
国籍：NL,NL,NL
代理机构：Pillsbury Winthrop Shaw Pittman, LLP
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