ANTI-REFLECTIVE COATING PROCESS AND APPARATUS
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专利名称：ANTI-REFLECTIVE COATING PROCESS AND APPARATUS
发明人：ROBERTS, William R.,STROBL, Marlene
申请号：EP01903025.3
申请日：20010111
公开号：EP1246706B1
公开日：
20040728
专利内容由知识产权出版社提供
摘要：A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.
申请人：INFINEON TECHNOLOGIES CORP,INFINEON TECHNOLOGIES RICHMOND 地址：US,US
国籍：US,US
代理机构：Epping Hermann & Fischer 更多信息请下载全文后查看。