Thin-film coatings made by means of plasma-activat
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专利名称：Thin-film coatings made by means of
plasma-activated chemical vapor deposition
of fluorinated cyclic siloxanes
发明人：d'Agostino, Riccardo,Caporiccio,
Gerardo,Favia, Pietro
申请号：EP92306545.2
申请日：19920716
公开号：EP0528540A3
公开日：
19930804
专利内容由知识产权出版社提供
摘要：Coatings produced by means of the deposition of thin films formed by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes having the structure [RR′SiO], where R is an alkyl group with 1-6 carbon atoms, R′ is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. The process consists of introducing vaporized siloxane into a deposition chamber containing the substrate to be coated; the reaction of the vapor is then induced by means of a plasma that has been excited by radio-frequency (RF) [electric field]. The particular coatings thus produced have useful physical properties.
申请人：DOW CORNING CORPORATION
地址：3901 S. Saginaw Road Midland Michigan 48686-0994 US
国籍：US
代理机构：Dowden, Marina
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