An extreme ultraviolet light source device and a m

专利名称：An extreme ultraviolet light source device
and a method for generating extreme
ultraviolet radiation
发明人：Hosokai, Tomonao,Horioka, Kazuhiko,Seki,
Kyohei,Mizokoshi, Hiroshi
申请号：EP08018235.5
申请日：20081017
公开号：EP2051140A1
公开日：
20090422
专利内容由知识产权出版社提供
专利附图：
摘要：High temperature plasma raw material (21) is added drop-wise, for example,
and evaporated by irradiation with a laser beam (23). The laser beam (23) passes through a discharge area between a pair of electrodes (21) and irradiates the high temperature plasma raw material (11,12). Pulsed power is applied to the space between the electrodes (11,12) in such a way that discharge current reaches a specified threshold value (Ip) at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes (11,12), plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap (3), is collected by EUV radiation collector optics (2) and then extracted. The irradiation of the laser beam (23) allows selling of the space density of the high temperature plasma raw material (21) to a specified distribution and defining of the position of a discharge channel.
申请人：Tokyo Institute of Technology,USHIODENKI KABUSHIKI KAISHA
地址：2-12-1, Ookayama Meguro-ku Tokyo 152-8550 JP,6-1, Otemachi 2-chome Chiyoda-ku, Tokyo JP
国籍：JP,JP
代理机构：Tomerius, Isabel
更多信息请下载全文后查看。