ALIGNMENT
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专利名称：ALIGNMENT
发明人：NISHI TAKECHIKA 申请号：JP16405287
申请日：19870702
公开号：JPS649636A
公开日：
19890112
专利内容由知识产权出版社提供
摘要：PURPOSE:To make it possible to perform alignment at a position, where rotation errors are hard to ocurr and the areas of marking regions are small, by performing the alignment based on position relationship between selected substrate marks and masking marks. CONSTITUTION:Mark patterns YR, #9R, YL and thetaL, which are formed on one street region, are located between reticle marks RR and RL. The patterns are the same in the right and left marks on the reticle. On the left reticle mark region, the position deviation in the direction (y) between the marks RR and RL and the mark patterns thetaR and thetaL are detected. In the right reticle mark region, the position deviations in the direction (y) between the marks RR and RL and the mark patterns YR and YL are detected. Thus the alignments in the direction (y) and the rotating direction for the reticle and a chip region Cn can be performed. Since the lengths of the marks can be made same as the width of the street line, the SN ratio of an alignment signal is enhanced.
申请人：NIKON CORP
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