磁控溅射的介绍(英文)

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Magnetron sputtering deposition
Magnetron sputtering is a widely used method for film deposition in recent years, which makes a great impact on the industrial research. production and scientific research. Magnetron technology is continuously developing because new advanced films with needed. specific functional properties are needed. There are many applications of magnetron sputtering in electronics, optics, surface component. engineering and electroluminescent component.
Application
The new film solar cells
This type of battery will improve the power of energy efficiency to 40% from 9.6% . The battery raw material costs lower than traditional solar battery does.
Characterization
SEM
AFM
磁控பைடு நூலகம்射的原理
电子在电场的作用下加速飞向基片的过程中与氩原 子发生碰撞，电离出大量的氩离子和电子。电子飞 向基片，氩离子在电场的作用下加速轰击靶材，溅 射出大量的靶材原子，呈中性的靶原子（或分子） 沉积在基片上成膜。二次电子在加速飞向基片的过 程中受磁场洛仑磁力的影响，被束缚在靠近靶面的 等离子体区域内，该区域内等离子体密度很高，二 次电子在磁场的作用下围绕靶面做圆周运动，该电 子的运动路径很长，在运动过程中不断撞击电离出 大量的氩离子轰击靶材，经过多次的碰撞后电子的 能量逐渐降低，拜托磁力线的束缚，远离靶材，最 终沉积在基片上。
The electrons in the electric field under the process of acceleration to fly to the substrate and argon atom in the process electronics. of collision, ionization out lots of argon and electronics. Electronic to fly to the substrate, argon ion in the electric field under the function of accelerating target materials, sputtering along a lot of target materials, a neutral atoms of film. target atoms (or molecular) deposition in the substrate into film. Secondary electron in accelerating the process of flying to the force; substrate by magnetic field, the influence of magnetic force; los was tied to the target near the plasma area, the area plasma density high, secondary electron in the magnetic field around under the action of the target surface to move in a circle, this electronic movement path to a long, in athletic process constantly hit a large amount of ionization argon bombardment target materials, after the collision of Duce after the electronic energy gradually reduced, please the bondage of lines, away from target substrate. materials, eventually deposition in the substrate.
Principle diagram
principle
+ Ti/Au Ar + + Ar+ Ar+ Ar+ Ar+ + + + + + + + + + -negative + + + +positive High Voltage
eTarget Plasma Ar Wafer
Thin film materials NiNi-Cr alloy
With the rapid development of the membrane technology into all kinds of materials, the film has been in a common trend. trend. There are various film materials and they are now commonly used in every filed : superconducting thin film, resistance film, semiconductor film photoelectric magnetic etc. thin film, the magnetic light thin film, etc.
Thin Film Material Instruction
Nowadays, with the science development, a lot of different functional thin film has been widely used. Film material is playing more and more important role as an important material in material field. For example, the role of cell membrane is very large. One application of the film material is sea water desalination. What more, the researchers make use of the film in the hem dialysis, to get rid of the excess water and toxins in the body of people inside.
This facilities are designed by The Chinese Academy of Sciences and our colleague. colleague.
The equipment in my lab
Power device
The outdoor of magnetron sputtering outline
Experiment equipment
FJL560D threeFJL560D2 ultrahigh vacuum three-compartment 560 multimulti-functional coater by magnetron sputtering & sputtering. ion beam sputtering.