光刻工艺培训--喷胶状态调整

March 18
Resist Dispense System - Resist Filter
No Filtration
•for high viscosity Resist and Polyimide •very low stress dispense •Low COO
Membrane Filter
11960.0
11940.0
-80
-60
-40
11920.0 -20 0
20
40
60
80
Resist temperature Calibration
•calibration needs to be done regularly (every 3 - 6 month) •watch for right measurement position (old and new style)
Resist Film Thickness [A]
Resist Film Uniformity vs. Resist Temperature
11980.0
22.0° C 22.1° C 22.2° C 22.3° C 22.4° C 3-s: 32.2 A 3-s: 11.1A 3-s: 9.2A 3-s: 15.1A 3-s: 25.4A
March 18
Resist Dispense System - Pump type
Pneumatic driven Pumps
•already since long time in use •not for low dispense volumes •limited dispense volume repeatability •no good dispense rate control •low investment costs •IWAKI SB pump •MILLIPORE WCDS / WCDP pump •IDI Pump
Stepper Motor driven Pumps
•can control low dispense volume •good to excellent dispense volume repeatability •can control low dispense rates •high investment cost •IWAKI FT 100-1 pump •CYBOR 5120 pump •MILLIPORE GEN2 •MILLIPORE IntelliGEN •TEL RDS pump
March 18
Resist Dispense System - Dispense line
March 18
Resist Dispense System - Pump type
Single Stage Pumps
•Resist is dispensed through the filter •Dispense rate = filtration rate •poor dispense rate control •high stress on the Resist •Dispense start and shut off problems •problems with high viscosity Resist •air vent after filter difficult •low recovery time •less expensive •all pneumatic driven pumps •CYBOR 5120 •IWAKI FT 100-1
Accuracy Photoresist Viscosity Surface Tension Density Outgassing Tubing Length Diameter Nozzle length, diameter, and shape Material Gap above wafer Pump Rate of dispense Volume of dispense Pressure on valves Motor torque high none none none high high medium none none high low high high Uniformity medium medium low low low medium high low high high low none none Suckback low medium medium medium low high high low low medium low none none
Dispense adjustment
panc
Resist Dispense Parameter
• • • • Coating process parameter Pump Air-operator valve Resist
Coating Process Parameter
Resist Dispense
March 18
Resist Dispense System - Resist Filter
Spontaneous Wettability of Typical Photochemical Filters
W e t s U P E S u r f a c e T e n s i o n W e t s U P E W e t s P T F E ( I m p a c t a n d ( d y n e s / c m a t ( O p t i m i z e r ) ( W a f e r g a r d ) M i n i c h e m ) 2 5 C ) ( Y e s / N o ) ( Y e s / N o ) ( Y e s / N o ) n B u t y l A c e t a t e P G M E A E L M M P C y c l o h e x a n o n e E C A N M P W a t e r 2 8 2 8 2 9 3 0 3 7 3 2 4 1 7 3 Y e s Y e s Y e s Y e s Y e s Y e s Y e s N o N R N R N R N R N R N R N R Y e s Y e s Y e s N o N o N o N o N o N o
Hollow Fibre Filter
•relatively new on the marked •no prewet necessary •filter material: UPE •not yet tested for all chemicals •no experience with high viscosity Resist
Double Stage Pumps
•First stage pump filters the Resist •Second stage pump dispenses Resist •Filtration rate independent from dispense rate •low stress on the Resist •excellent dispense rate control (multi rate possible) •extended filter life time •reduced maintenance requirements •efficient air vent included •long recovery times •expensive •MILLIPORE GEN2 •MILLIPORE IntelliGEN •MILLIPORE Photo250 •TEL RDS
•Resist Temperature •Resist Dispense system •Pump type (pneumatic / motor driven, single / double stage) •Resist Filter (material, type, pore size) •Dispense line (length, diameter, material, nozzle diameter) •Resist Dispense •Resist Dispense Volume •Resist Dispense Rate •Dispense Pump adjustment
Resist temperature measurement at nozzle block shows large error
March 18
Resist Temperature
Resist Temperature influence on uniformity
•major parameter to adjust coating uniformity •recommended setting range: 21.0 - 24.0°C •best temperatures of different Resists at same track should be as close as possible (temperature settling time between two recipes) •inside water jacked are just 7 cc of resist (no multiple dummy dispense before process start)
Wafer Diameter
Resist Dispense
•A low resist temperature will cause an additional suckback due to contraction of resist (adjust low initial suckback) •A high Resist temperature will cause a dripping of Resist due to expansion of Resist (adjust a high initial suckback)
March 18
Resist Dispense System PiGEN CYBOR 5120
IDI 400
Millipore WCDS Millipore GEN2
March 18
Resist Dispense System - window of operation
•today mostly used •pore size and number of stacks depend on application (viscosity) •membrane made from PTFE (some UPE) •sometimes levelling agents first need to cover filter surface after installation (striations for 24h) •PTFE filter need prewet with solvent prior to the use with Resist
Motor Flange Temperature
March 18
Resist Temperature
Old style water jacked New style water jacked
Resist temperature measurement at nozzle block possible
Filter live time
•depend on used Resist (type and supplier quality) •depend on used filter type •depend on used Pump type •continuous (daily/weekly particle check is recommended)