半导体工艺简介
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14
空 气 净 化 动 力 装 置
芯 片 制 造 净 化 区 域 走 廊
15
离子注入
16
化学汽 相沉积 CVD
17
化学汽 相沉积 CVD
18
检查晶圆
19
烘箱老化
在烤箱中 100% 检测
20
激光打字
21
源自文库
12英寸 和8英寸 氧化扩 散炉
Currently our PS300A and PS300B diffusion tools are capable of running both 200mm & 300mm wafers. We can even process the two sizes in the same furnace load without suffering any uniformity problems! (Thermal Oxide Only)
2
投 影 式 光 刻 机
Here in the Fab Two Photolithography area we see one of our 200mm 0.35 micron I-Line Steppers. this stepper can image and align both 6 & 8 inch wafers. 3
5
12 英 寸 氧 化 扩 散 炉
As we look in this window we see the World's First true 300mm production furnace. Our development and design of this tool began in 1992, it was installed in December of 1995 and became fully operational in January of 1996. 6
投 影 式 光 刻 机
Another view of one of the Fab Two Photolithography areas.
4
硅 片 清 洗 装 置
Here we see a technician loading 300mm wafers into the SemiTool. The wafers are in a 13 wafer Teflon cassette co-designed by Process Specialties and SemiTool in 1995. Again these are the world's first 300mm wet process cassettes (that can be spin rinse dried).
8
PVD
2,500 additional square feet of "State of the Art" Class One Cleanroom is currently processing wafers! With increased 300mm & 200mm processing capabilities including more PVD Metalization, 300mm Wet processing / Cleaning capabilities and full wafer 300mm 0.35um Photolithography, all in a Class One enviroment. 9
扫描 电镜 SEM 检测 工序
One of two SEM Labs located in our facility. In this one we are using a field emission tool for everything from looking at photoresist profiles and measuring CD's to double checking metal deposition thicknesses. At the helm, another one of our process engineers you may have spoken with Mark Hinkle.12
集成电路制造工艺简介
生产工厂简介
国外某集成电路工厂外景
1
1级净化厂房/10级净化厂房
Fab Two was completed January 2, 1996 and is a "State of the Art" facility. This 2,200 square foot facility was constructed using all the latest materials and technologies. In this set of cleanrooms we change the air 390 times per hour, if you do the math with ULPA filtration this is a Class One facility. We have had it tested and it does meet Class One parameters (without any people working in it). Since we are not making microprocessors here and we don't want to wear "space suits", we run it as a class 10 fab. Even though it consistently runs well below Class Ten.
10
检 测 工 序
Accuracy in metrology is never an issue at Process Specialties. We use the most advanced robotic laser ellipsometers and other calibrated tools for precision thin film, resistivity, CD and step height measurement. Including our new Nanometrics 8300 full wafer 300mm thin film measurement and mapping tool. We also use outside laboratories and our excellent working relationships with our Metrology tool customers, for additional correlation and calibration. 11
库房
Here we are looking at the Incoming material disposition racks
13
去 离 子 水 生 产 装 置
Above you are looking at a couple of views of the facilities on the west side of Fab One. Here you can see one of our 18.5 Meg/Ohm DI water systems and one of four 10,000 CFM air systems feeding this fab (left picture), as well as one of our waste air scrubber units (right picture). Both are inside the building for easier maintenance, longer life and better control.
12 英 寸 氧 化 扩 散 炉 装 片 工 序
Here we can see the loading of 300mm wafers onto the Paddle.
7
12英寸氧 化扩散炉 取片工序 （已生长 Si3N4）
Process Specialties has developed the world's first production 300mm Nitride system! We began processing 300mm LPCVD Silicon Nitride in May of 1997.
空 气 净 化 动 力 装 置
芯 片 制 造 净 化 区 域 走 廊
15
离子注入
16
化学汽 相沉积 CVD
17
化学汽 相沉积 CVD
18
检查晶圆
19
烘箱老化
在烤箱中 100% 检测
20
激光打字
21
源自文库
12英寸 和8英寸 氧化扩 散炉
Currently our PS300A and PS300B diffusion tools are capable of running both 200mm & 300mm wafers. We can even process the two sizes in the same furnace load without suffering any uniformity problems! (Thermal Oxide Only)
2
投 影 式 光 刻 机
Here in the Fab Two Photolithography area we see one of our 200mm 0.35 micron I-Line Steppers. this stepper can image and align both 6 & 8 inch wafers. 3
5
12 英 寸 氧 化 扩 散 炉
As we look in this window we see the World's First true 300mm production furnace. Our development and design of this tool began in 1992, it was installed in December of 1995 and became fully operational in January of 1996. 6
投 影 式 光 刻 机
Another view of one of the Fab Two Photolithography areas.
4
硅 片 清 洗 装 置
Here we see a technician loading 300mm wafers into the SemiTool. The wafers are in a 13 wafer Teflon cassette co-designed by Process Specialties and SemiTool in 1995. Again these are the world's first 300mm wet process cassettes (that can be spin rinse dried).
8
PVD
2,500 additional square feet of "State of the Art" Class One Cleanroom is currently processing wafers! With increased 300mm & 200mm processing capabilities including more PVD Metalization, 300mm Wet processing / Cleaning capabilities and full wafer 300mm 0.35um Photolithography, all in a Class One enviroment. 9
扫描 电镜 SEM 检测 工序
One of two SEM Labs located in our facility. In this one we are using a field emission tool for everything from looking at photoresist profiles and measuring CD's to double checking metal deposition thicknesses. At the helm, another one of our process engineers you may have spoken with Mark Hinkle.12
集成电路制造工艺简介
生产工厂简介
国外某集成电路工厂外景
1
1级净化厂房/10级净化厂房
Fab Two was completed January 2, 1996 and is a "State of the Art" facility. This 2,200 square foot facility was constructed using all the latest materials and technologies. In this set of cleanrooms we change the air 390 times per hour, if you do the math with ULPA filtration this is a Class One facility. We have had it tested and it does meet Class One parameters (without any people working in it). Since we are not making microprocessors here and we don't want to wear "space suits", we run it as a class 10 fab. Even though it consistently runs well below Class Ten.
10
检 测 工 序
Accuracy in metrology is never an issue at Process Specialties. We use the most advanced robotic laser ellipsometers and other calibrated tools for precision thin film, resistivity, CD and step height measurement. Including our new Nanometrics 8300 full wafer 300mm thin film measurement and mapping tool. We also use outside laboratories and our excellent working relationships with our Metrology tool customers, for additional correlation and calibration. 11
库房
Here we are looking at the Incoming material disposition racks
13
去 离 子 水 生 产 装 置
Above you are looking at a couple of views of the facilities on the west side of Fab One. Here you can see one of our 18.5 Meg/Ohm DI water systems and one of four 10,000 CFM air systems feeding this fab (left picture), as well as one of our waste air scrubber units (right picture). Both are inside the building for easier maintenance, longer life and better control.
12 英 寸 氧 化 扩 散 炉 装 片 工 序
Here we can see the loading of 300mm wafers onto the Paddle.
7
12英寸氧 化扩散炉 取片工序 （已生长 Si3N4）
Process Specialties has developed the world's first production 300mm Nitride system! We began processing 300mm LPCVD Silicon Nitride in May of 1997.