芯片制造流程

Chip Manufacturing Process – Deposition 芯片制作过程 – 沉积
SMIC
A layer of silicon dioxide (SiO2) glass is grown on the wafer by exposing the wafer to oxygen at very high temperatures. A process called chemical vapor deposition (CVD) is then used to coat silicon dioxide onto the wafer surface. Because it will not conduct electricity, this layer is called “dielectric”. Later, channels will be etched or otherwise formed in the dielectric for conducting materials. SiO2 may also be grown or deposited during later steps in the process as layers of the circuit are built onto the chips: 制作晶片的第一步是在晶圆上沉积一层不导电的二氧化硅。在晶 片的后续制作过程中，二氧化硅层的成长、沉积会进行很多次。 在高温下使晶圆曝氧可以使二氧化硅层成长。然后使用化学气相 沉积方法使二氧化硅层沉积在晶圆表面。
Chip Manufacturing Process – Etching 芯片制作过程– 蚀刻
SMIC
The wafers exposure to light in lithography causes portions of the resist to “harden” (or become resistant to certain chemicals). The “non-hardened” resist is washed away. Then the material below it, for example SiO2, is etched away. Finally, the “hardened” resist is stripped off so that the material underneath forms a three-dimensional pattern on the wafer. The first lithography and etch process will result in a pattern of SiO2. 光刻制程后，感光部分的光刻胶具有强的抗腐蚀性，抗腐蚀性 弱的光刻胶在接下来的制程里被洗去。接着光刻胶下面的部分 被蚀刻制程除去。最后，抗腐蚀性强的光刻胶也被剥离。 光刻与蚀刻制程在晶圆表面形成3D的图案。
SMIC 0.13u Cu BEOL Flow
1ML DD FLOW
CVD SIN DEP FSG DEP SION DEP VIA PHOTO VIA DRY ETCH VIA CLEAN BARC COATING PLUG ETCH BACK MTOX PHOTO MT DRY ETCH MT CLEAN STOP LAYER REMOVE POST-SLR CLEAN TaN/Ta & Cu SEED CU PLATING M2 CU CMP
SMIC
Photolithography, or lithography for short, is used to create multiple layers of circuit patterns on a chip. First, the wafer is coated with a light-sensitive chemical called photoresist. Then light is shone through a patterned plate called a mask or reticle to expose the resist—much the same way film is exposed to light to form a photographic image. 下面使用光刻制程在芯片建立多层电路图案。 首先，晶圆表面上覆盖上一层感光性强的化学制品光刻胶。象光 透过电影底片形成图象一样，光透过光掩膜在晶圆上形成图案。
SMIC is currently running 1P6M, 1P8M process
Chip Manufacturing Process – Assembly&Testing 芯片制作过程– 切割、封装
SMIC
Each chip on a completed wafer is tested for electrical performance. Any chips that fail are marked so they can be discarded when sawed into individual dies. The chips are put into individual packages which will protect the chips and provide connections from the chips to the products for which they are designed. For example, chips destined for computers are placed In packaging that can be plugged into computer circuit boards. Once packaged, chips are tested again to make sure they function properly before being shipped to distributors or placed in electronic products. 晶圆上的每一个晶粒都需要进行测试。有缺陷的晶粒被标记起来， 在进行晶圆切割时这些晶粒被剔除。每个晶粒都按要实现功能的 不同进行单独封装。比如要应用在电脑上的晶粒被封装后能够插 入电脑集成电路板。封装好后，在进行最终使用前，晶粒将进行 再一次测试以确保功能正常。
Introduction of the Semiconductor Packages and Assembly Package Types and Applications (1)
Chip Manufacturing Process – Ion Implantation 芯片制作过程– 离子植入
SMIC
To control the flow of electricity through a chip, certain areas of the wafer are exposed to chemicals that change its ability to conduct electricity. Atoms from the chemicals, called doping materials, can be “diffused, ” or forced, into areas of the silicon wafer through chemical exposure and heating. 为了能在晶片上控制电流，加热晶圆，使晶圆部分区域接触添加 剂。添加剂里的原子能够替换晶圆里的部分硅原子来改变其导电 性。
切割、封装 切割、 Assembly&Testing
(Die,晶粒)
(Chip,晶芯)
Raw Material for Wafers 晶圆制作所需原料
To make wafers, polycrystalline silicon is melted. The melted silicon is used to grow silicon crystals (or ingots) that are sliced into wafers. 首先融化多晶硅，生成晶柱，然后切割成 晶圆。
What is microlithography?
Microlithography: transfer the pattern of circuitry from a mask to a wafer.
Chip Manufacturing Process – Photolithography 芯片制作过程– 光刻
Raw Material for Wafers (Cont’d) 晶圆制作所需原料 (接上页)
To remove the tiniest scratches and impurities, one side of each wafer is polished to a mirror-like surface. Chips are built on this surface. 切下的晶圆要经过清洁、磨光等步骤以去 除杂质，使平面光滑。
Chip Manufacturing Process – Electroplating 芯片制作过程– 电路连接
SMIC
The portions of a chip that conduct electricity form the chip’s interconnections. A conducting metal (usually a form of aluminum) is deposited on the entire wafer surface. Unwanted metal removed during lithography and etching leaves microscopically thin lines of metal interconnects. All the millions of individual conductive pathways must be connected in order for the chip to function. This includes vertical interconnections between the layers as well as horizontal Interconnections across each layer of the chip. 进行电连接。导电金属（通常是铝）在晶圆表面沉积。使用光刻 和蚀刻制程去除没有用的金属。现在复杂的晶片都需要很多层绝 缘体。一个正常运作的晶片需要连接数以百万计的传导线路，包 括层上水平连接和各层之间的垂直连接。
Chip Manufacturing Process – Forming Multiple Layers
芯片制作过程– 生成多层
SMIC
Through several lithography and etch steps, subsequent layers of various patterned materials are built up on the wafer to form multiple layers of circuit patterns on a single chip. 经过几次光刻与蚀刻步骤，在晶圆表面叠 加成多层不同图案
Silicon Ingot
Chip Manufacturing Overview 光罩制作/光刻 光罩制作 光刻 晶柱 沉积 晶圆 Mask Making/ Deposition 芯片制作概述 Photolithography
Wafer
百度文库
蚀刻 Etching
离子植入 Ion Implantation
电镀 Electroplating