二次配系统使用简介

Secondary process system introduction

Working characteristics

1. Wafer factory

2. Fab features and capabilities of the gas required

3. Chemical substances and their properties required for fab

4. Work contents

1. Wafer factory

FAB is a modern plant producing chips, the main workplace for the cleanroom. Clean room is a constant temperature and humidity, temperature is 21 °c. Relative humidity 65%. Fab clean rooms divided into the diffusion zone (furnace batch), yellow, etching, thin film areas.

2. Fab features and functionality of the gas required

Due to the manufacturing process on the need and use of many kinds of gases in semiconductor factories. We generally are based on gas properties to distinguish words. Specialty gases and gas can be divided into two broad categories. The former to use less gas. Such as SiH4, andNF3 . Which use large amounts of gas. Such as N2, andCDA . Due to a larger amount; General gas often in " bulk gas " call. The Bulk Gas. Specialty gas -Specialty Gas.

2-1 Bulk GasIn the semiconductor manufacturing process, need to provide a variety of high purity gas used in pneumatic equipment power, chemicals or pressure medium is used as an inert environment, or take part in the reaction or to remove impurities, such as different functions. Because of increasingly sophisticated semiconductor production, its requests for gas purity is ever mentioned. Semiconductor factory will be briefly described below the general quality requirements and the necessary equipment for gas and its functions.

2-1-1Bulk gas products:

Bulk gas Semiconductor plants can use, there are generally CDA 、 GN2 、PN2 、 PAr 、 PO2 、 PH2 、 PHe 7 Species.

2-1-2 Bulk gas manufacturing:

<1> CDA/ICA(Clean Dry Air)Clean, dry air.

CDASources taken from the air compressed by compressor dehumidifier, then by a filter or activated carbon adsorption to remove dust and hydrocarbons to supply the clean room CDA/ZCD 。

CDA System:Air compressor Buffer storage tank cooling dryer

Filter CDA

<2> GN2

Compressed using compressor cooling gas into liquid gas. Catalytic converter, CO reaction to CO2, H2, reaction to H2O, then sieve absorption of CO2, andH2O And then slip separation O2&CnHm.

N2=-195.6°C O2=-183°C

PN2

GN2 Through the Purifier (Purifier) Purification, producing high purity N2 。

Liquid original nitrogen purity99.9999%

After purification for purification of nitrogen purity99.9999999%

GN2&PN2 System(See attached map)

<3> PO2

Compressor compressed cooled gas into liquid gas, awarded by second slip 99% Above in purity O2 And then drop N2 、 Ar 、 CnHm 。 Another by electrolytic dissociationH2&O2

PO2 System(See photos)

<4> PAr

Compressor compressed cooled gas into liquid gas, awarded by second slip