Detection of an inner gaseous component in a Herbig Be star accretion disk Near- and mid-in
食品中铁、锰元素检测方法探讨
食品科技食品中铁、锰元素检测方法探讨史秋梅(临沂市河东区疾病预防控制中心,山东临沂 276034)摘 要:铁元素和锰元素是人体必需的微量元素,在多种生理机能中发挥着关键作用。
然而,过度摄入可能会对人体产生不利的影响,因此食品中铁元素和锰元素的分析检测显得尤为重要。
本文介绍了食品中铁元素和锰元素分析的必要性,并针对食品中铁、锰元素的检测分析方法,如原子吸收光谱法、高效液相色谱法、电感耦合等离子体原子发射光谱法、电感耦合等离子体质谱法以及X射线荧光光谱法等进行了概述,以期保障食品中铁、锰元素含量的安全性和合规性,从而更好地服务于食品分析领域。
关键词:铁元素;锰元素;分析方法;应用;食品安全Exploration of Detection Methods for Iron and ManganeseElements in FoodSHI Qiumei(Hedong District Center for Disease Control and Prevention, Linyi 276034, China) Abstract: Iron and manganese are essential trace elements for the human body and play crucial roles in various physiological functions. However, excessive intake may have adverse effects on the human body, so the analysis and detection of iron and manganese elements in food is particularly important. This article introduces the necessity of analyzing iron and manganese elements in food, and provides an overview of detection and analysis methods for iron and manganese elements in food, such as atomic absorption spectroscopy, high-performance liquid chromatography, ionization coupled plasma atomic emission spectroscopy, ionization coupled plasma mass spectrometry, and X-ray fluorescence spectroscopy, in order to ensure the safety and compliance of iron and manganese content in food, so as to better serve the field of food analysis.Keywords: iron; manganese; analytical methods; applications; food safety铁和锰是食品中的两种微量元素,对维持身体健康具有重要意义[1]。
无损检测中英文对照
无损检测常用词汇中英文对照表English 中文释义中文释义 A.C magnetic saturation 交流磁饱和交流磁饱和 Absorbed dose 吸收剂量吸收剂量 Absorbed dose rate 吸收剂量率吸收剂量率Acceptance criteria 验收准则验收准则 Acceptanc limits 验收范围验收范围Acceptable quality level 可验收质量等级可验收质量等级可验收质量等级 Acceptance level 验收水平(验收等级)验收水平(验收等级) Acceptance standard 验收标准验收标准 Accumulation test 累积检测累积检测 Acoustic emission count (emission count ) 声发射计数(发射计数)声发射计数(发射计数) Acoustic emission transducer 声发射换能器(声发射传感器)声发射换能器(声发射传感器) Acoustic emission(AE) 声发射声发射 Acoustic holography 声全息术声全息术 Acoustic impedance 声阻抗声阻抗 Acoustic impedance matching 声阻抗匹配声阻抗匹配 Acoustic impedance method 声阻法声阻法 Acoustic wave 声波声波 Acoustical lens 声透镜声透镜 Acoustic —ultrasonic 声-超声(AU ) Activation 活化活化 Activity 活度活度 Adequate shielding 安全屏蔽安全屏蔽 Ampere turns 安匝数安匝数 Amplitude 幅度幅度 Angle beam method 斜射法斜射法 Angle of incidence 入射角入射角 Angle of reflection 反射角反射角 Angle of spread 指向角指向角 Angle of squint 偏向角偏向角 Angle probe 斜探头斜探头 Angstrom unit 埃(A) Area amplitude response curve 面积幅度曲线面积幅度曲线 Area of interest 评定区评定区 Artificial discontinuity 人工不连续性人工不连续性 Artifact 假缺陷假缺陷 Artificial defect 人工缺陷人工缺陷 Artificial discontinuity 标准人工缺陷标准人工缺陷 A-scan A 型扫描型扫描 A-scope; A-scan A 型显示型显示 Attenuation coefficient 衰减系数衰减系数 Attenuator 衰减器衰减器 Audible leak indicator 音响泄漏指示器音响泄漏指示器 Automatic testing 自动检测自动检测 Autoradiography 自射线照片自射线照片 Avaluation 评定评定Background 背景背景 Barium concrete 钡混凝土钡混凝土 Barn 靶 Base fog 片基灰雾片基灰雾 Bath 槽液(浸湿)槽液(浸湿) Bayard- Alpert ionization gage B- A 型电离计型电离计 Beam 声束声束 Beam ratio 光束比光束比 Beam angle 束张角束张角 Beam axis 声束轴线声束轴线 Beam index 声束入射点声束入射点 Beam path location 声程定位声程定位 Beam path; path length 声程声程 Beam spread 声束扩散声束扩散 Betatron 电子感应加速器电子感应加速器 Bimetallic strip gage 双金属片计双金属片计 Bipolar field 双极磁场双极磁场 Black light filter 黑光滤波器黑光滤波器 Black light; ultraviolet radiation 黑光黑光 Blackbody 黑体黑体 Blackbody equivalent temperature 黑体等效温度黑体等效温度 Bleakney mass spectrometer 波利克尼质谱仪波利克尼质谱仪 Bleedout 渗出渗出 Bottom echo 底面回波底面回波 Bottom surface 底面底面 Boundary echo(first) 边界一次回波边界一次回波 Bremsstrahlung 轫致辐射轫致辐射 Broad-beam condition 宽射束宽射束 Brush application 刷涂刷涂 B-scan presenfation B 型扫描显示型扫描显示 B-scope; B-scan B 型显示型显示 C- scan C 型扫描型扫描 Calibration, instrument 设备校准设备校准 Capillary action 毛细管作用毛细管作用 Carrier fluid 载液载液 Carry over of penetrate 渗透剂移转渗透剂移转 Cassette 暗合暗合 Cathode 阴极阴极 Central conductor method 中心导体法中心导体法 Characteristic curve 特性曲线特性曲线 Characteristic curve of film 胶片特性曲线胶片特性曲线 Characteristic radiation 特征辐射特征辐射 Chemical fog 化学灰雾化学灰雾 Cine-radiography 射线(活动)电影摄影术电影摄影术 Cintact pads 接触垫接触垫 Circumferential coils 圆环线圈圆环线圈 Circumferential field 周向磁场周向磁场 Circumferential magnetization method 周向磁化法周向磁化法 Clean 清理清理 Clean- up 清除清除 Clearing time 定透时间定透时间 Coercive force 矫顽力矫顽力 Coherence 相干性相干性 Coherence length 相干长度(谐波列长度)相干长度(谐波列长度) Coi1,test 测试线圈测试线圈 Coil size 线圈大小线圈大小 Coil spacing 线圈间距线圈间距 Coil technique 线圈技术线圈技术 Coil method 线圈法线圈法 Coilreference 线圈参考线圈参考 Coincidence discrimination 符合鉴别符合鉴别 Cold-cathode ionization gage 冷阴极电离计冷阴极电离计 Collimator 准直器准直器 Collimation 准直准直 Collimator 准直器准直器Colour contrast penetrant 着色渗透剂着色渗透剂 Combined colour comtrast and fluorescent penetrant 着色荧光渗透剂着色荧光渗透剂 Compressed air drying 压缩空气干燥压缩空气干燥 Compressional wave 压缩波压缩波 Compton scatter 康普顿散射康普顿散射 Continuous emission 连续发射连续发射 Continuous linear array 连续线阵连续线阵 Continuous method 连续法连续法 Continuous spectrum 连续谱连续谱 Continuous wave 连续波连续波 Contract stretch 对比度宽限对比度宽限 Contrast 对比度对比度 Contrast agent 对比剂对比剂 Contrast aid 反差剂反差剂 Contrast sensitivity 对比灵敏度对比灵敏度 Control echo 监视回波监视回波 Control echo 参考回波参考回波 Couplant 耦合剂耦合剂 Coupling 耦合耦合 Coupling losses 耦合损失耦合损失 Cracking 裂解裂解 Creeping wave 爬波爬波 Critical angle 临界角临界角 Cross section 横截面横截面 Cross talk 串音串音 Cross-drilled hole 横孔横孔 Crystal 晶片晶片 C-scope; C-scan C 型显示型显示 Curie point 居里点居里点 Curie temperature 居里温度居里温度 Curie(Ci) 居里居里 Current flow method 通电法通电法 Current induction method 电流感应法电流感应法 Current magnetization method 电流磁化法电流磁化法 Cut -off level 截止电平截止电平截止电平 Dead zone 盲区盲区 Decay curve 衰变曲线衰变曲线 Decibel(dB) 分贝分贝 Defect 缺陷缺陷 Defect resolution 缺陷分辨力缺陷分辨力 Defect detection sensitivity 缺陷检出灵敏度缺陷检出灵敏度Detection sensitivity 检测灵敏度检测灵敏度Detection threshold 检测门槛检测门槛 Defect resolution 缺陷分辨力缺陷分辨力 Definition 清晰度清晰度 Definition , image definition 清晰度,图像清晰度清晰度,图像清晰度 Demagnetization 退磁退磁 Demagnetization factor 退磁因子退磁因子 Demagnetizer 退磁装置退磁装置 Densitometer 黑度计黑度计 Density 黑度(底片)黑度(底片) Density comparison strip 黑度比较片黑度比较片 Detecting medium 检验介质检验介质 Detergent remover 洗净液洗净液 Developer 显像剂显像剂 Developer , agueons 水性显象剂水性显象剂水性显象剂 Developer , dry 干显象剂干显象剂干显象剂 Developer , liquid film 液膜显象剂液膜显象剂 Developer , nonaqueous (sus- pendible ) 非水(可悬浮)显象剂非水(可悬浮)显象剂 Developing time 显像时间显像时间 Development 显影显影 Diffraction mottle 衍射斑衍射斑 Diffuse indications 松散指示松散指示 Diffusion 扩散扩散 Digital image acquisition system 数字图像识别系统数字图像识别系统 Dilatational wave 膨胀波膨胀波 Dip and drain station 浸渍和流滴工位浸渍和流滴工位Dip rinse 浸洗浸洗 Direct contact magnetization 直接接触磁化直接接触磁化 Direct exposure imaging 直接曝光成像直接曝光成像 Direct contact method 直接接触法直接接触法 Directivity 指向性指向性 Discontinuity 不连续性不连续性 Distance- gain- size-German A VG 距离- 增益- 尺寸(DGS 德文为A VG ) Distance marker; time marker 距离刻度距离刻度 Dose equivalent 剂量当量剂量当量 Dose rate meter 剂量率计剂量率计 Dosemeter 剂量计剂量计 Double crystal probe 双晶片探头双晶片探头 Double probe technique 双探头法双探头法 Double transceiver technique 双发双收法双发双收法 Double traverse technique 二次波法二次波法 Dragout 带出带出 Drain time 滴落时间滴落时间 Drain time 流滴时间流滴时间 Drift 漂移漂移 Dry method 干法干法 Dry powder 干粉干粉 Dry technique 干粉技术干粉技术 Dry developer 干显显像剂干显显像剂 Dry developing cabinet 干显像柜干显像柜 Dry method 干粉法干粉法 Drying oven 干燥箱干燥箱 Drying station 干燥工位干燥工位 Drying time 干燥时间干燥时间 D-scope; D-scan D 型显示型显示 Dual-focus tube 双焦点管双焦点管 Dual purpose penetrant 两用渗透剂 Dual search unit 双探头双探头 Duplex-wire image quality indicator 双线像质指示器双线像质指示器 Duration 持续时间持续时间 Dwell time 停留时间停留时间 Dye penetrant 着色渗透剂着色渗透剂 Dynamic leak test 动态泄漏检测动态泄漏检测 Dynamic leakage measurement 动态泄漏测量动态泄漏测量 Dynamic range 动态范围动态范围 Dynamic radiography 动态射线透照术动态射线透照术 Echo 回波回波 Echo frequency 回波频率回波频率 Echo height 回波高度回波高度 Echo indication 回波指示回波指示 Echo transmittance of sound pressure 往复透过率往复透过率 Echo width 回波宽度回波宽度 Eddy current 涡流涡流 Eddy current flaw detector 涡流探伤仪涡流探伤仪 Eddy current testiog 涡流检测涡流检测 Edge 端面端面 Edge effect 边缘效应边缘效应 Edge echo 棱边回波棱边回波 Edge effect 边缘效应边缘效应 Effective depth penetration (EDP ) 有效穿透深度有效穿透深度 Effective focus size 有效焦点尺寸有效焦点尺寸 Effective magnetic permeability 有效磁导率有效磁导率 Effective permeability 有效磁导率有效磁导率 Effective reflection surface of flaw 缺陷有效反射面缺陷有效反射面 Effective resistance 有效电阻有效电阻 Elastic medium 弹性介质弹性介质 Electric displacement 电位移电位移Electrostatic spraying 静电喷射静电喷射静电喷射 Electrical center 电中心电中心 Electrode 电极电极 Electromagnet 电磁铁电磁铁 Electro-magnetic acoustic transducer 电磁声换能器电磁声换能器 Electromagnetic induction 电磁感应电磁感应 Electromagnetic radiation 电磁辐射电磁辐射 Electromagnetic testing 电磁检测电磁检测 Electro-mechanical coupling factor 机电耦合系数机电耦合系数 Electron radiography 电子辐射照相术电子辐射照相术 Electron volt 电子伏恃电子伏恃 Electronic noise 电子噪声电子噪声 Electrostatic spraying 静电喷涂静电喷涂 Emulsification 乳化乳化Emulsification of penetrant 渗透剂的乳化渗透剂的乳化 Emulsification time 乳化时间乳化时间 Emulsifier 乳化剂乳化剂 Encircling coils 环绕式线圈环绕式线圈 End effect 端部效应端部效应 Energizing cycle 激励周期 Equalizing filter 均衡滤波器均衡滤波器 Equivalent 当量当量 Equivalent I .Q. I. Sensitivity 象质指示器当量灵敏度象质指示器当量灵敏度 Equivalent nitrogen pressure 等效氮压等效氮压 Equivalent penetrameter sensifivty 透度计当量灵敏度透度计当量灵敏度 Equivalent method 当量法当量法 Erasabl optical medium 可探光学介质可探光学介质 Etching 浸蚀浸蚀 Evaluation 评定评定 Evaluation threshold 评价阈值评价阈值 Event count 事件计数事件计数 Event count rate 事件计数率 Examination area 检测范围检测范围 Examination region 检验区域检验区域Excess penetrant removal 多余渗透剂的去除多余渗透剂的去除 Exhaust pressure/discharge pressure 排气压力排气压力 Exhaust tubulation 排气管道排气管道 Expanded time-base sweep 时基线展宽时基线展宽 Exposure 曝光曝光 Exposure table 曝光表格曝光表格 Exposure chart 曝光曲线曝光曲线 Exposure fog 曝光灰雾曝光灰雾 Exposure ,radiographic exposure 曝光,射线照相曝光曝光,射线照相曝光曝光,射线照相曝光 Extended source 扩展源扩展源 Facility scattered neutrons 条件散射中子条件散射中子 False indication 假指示(伪显示)假指示(伪显示) Family 族 Far field 远场远场 Feed-through coil 穿过式线圈穿过式线圈 Field , resultant magnetic 复合磁场复合磁场 Fill factor 填充系数 Film speed 胶片速度胶片速度 Film badge 胶片襟章剂量计胶片襟章剂量计 Film base 片基片基 Film contrast 胶片对比度胶片对比度 Film gamma 胶片γ值 Film processing 胶片冲洗加工胶片冲洗加工 Film speed 胶片感光度胶片感光度 Film unsharpness 胶片不清晰度胶片不清晰度 Film viewing screen 观察屏观察屏 Filter 滤波器/滤光板滤光板 Final test 复探复探 Flat-bottomed hole 平底孔平底孔 Flat-bottomed hole equivalent 平底孔当量平底孔当量 Flaw 伤 Flaw characterization 伤特性伤特性 Flaw echo 缺陷回波缺陷回波 Flexural wave 弯曲波弯曲波 Floating threshold 浮动阀值浮动阀值 Fluorescence 荧光荧光 Fluorescent examination method 荧光检验法荧光检验法 Fluorescent intensity 荧光强度荧光强度Fluorescent penetrant 荧光渗透剂荧光渗透剂 Fluorescent magnetic particle inspection 荧光磁粉检验荧光磁粉检验 Fluorescent dry deposit penetrant 干沉积荧光渗透剂干沉积荧光渗透剂 Fluorescent light 荧光荧光 Fluorescent magnetic powder 荧光磁粉荧光磁粉 Fluorescent penetrant 荧光渗透剂荧光渗透剂 Fluorescent screen 荧光屏荧光屏 Fluoroscopy 荧光检查法荧光检查法 Flux leakage field 磁通泄漏场磁通泄漏场 Flux lines 磁通线磁通线 Focal spot 焦点焦点 Focal distance 焦距焦距 Focus length 焦点长度焦点长度 Focus size 焦点尺寸焦点尺寸 Focus width 焦点宽度焦点宽度 Focus(electron) 电子焦点电子焦点 Focused beam 聚焦声束聚焦声束 Focusing probe 聚焦探头聚焦探头 Focus-to-film distance(f.f.d) 焦点-胶片距离(焦距)胶片距离(焦距) Fog 底片灰雾底片灰雾 Fog density 灰雾密度灰雾密度 Footcandle 英尺烛光英尺烛光 Freguency 频率频率 Frequency constant 频率常数频率常数 Fringe 干涉带干涉带 Front distance 前沿距离前沿距离 Front distance of flaw 缺陷前沿距离缺陷前沿距离 Full- wave direct current (FWDC ) 全波直流全波直流 Fundamental frequency 基频基频 Furring 毛状迹痕毛状迹痕 Gage pressure 表压表压 Gain 增益增益 Gamma radiography γ射线透照术射线透照术 Gamma ray source γ射线源射线源 Gamma ray source container γ射线源容器射线源容器 Gamma rays γ射线射线 Gamma-ray radiographic equipment γ射线透照装置射线透照装置 Gap scanning 间隙扫查间隙扫查 Gas 气体气体 Gate 闸门闸门 Gating technique 选通技术选通技术 Gauss 高斯高斯 Geiger-Muller counter 盖革弥勒计数器弥勒计数器 Geometric unsharpness 几何不清晰度几何不清晰度 Gray(Gy) 戈瑞戈瑞 Grazing incidence 掠入射掠入射 Grazing angle 掠射角掠射角 Group velocity 群速度群速度 Half life 半衰期半衰期 Half- wave current (HW ) 半波电流半波电流 Half-value layer(HVL) 半值层半值层 Half-value method 半波高度法半波高度法 Halogen 卤素卤素 Halogen leak detector 卤素检漏仪卤素检漏仪 Hard X-rays 硬X 射线射线 Hard-faced probe 硬膜探头硬膜探头 Harmonic analysis 谐波分析谐波分析 Harmonic distortion 谐波畸变谐波畸变 Harmonics 谐频谐频 Head wave 头波头波 Helium bombing 氦轰击法氦轰击法 Helium drift 氦漂移氦漂移 Helium leak detector 氦检漏仪氦检漏仪 Hermetically tight seal 气密密封气密密封 High vacuum 高真空高真空 High energy X-rays 高能X 射线射线 Holography (optical) 光全息照相光全息照相 Holography , acoustic 声全息声全息声全息 Hydrophilic emulsifier 亲水性乳化剂亲水性乳化剂 Hydrophilic remover 亲水性洗净剂亲水性洗净剂 Lipophilic emulsifier 亲油性乳化剂亲油性乳化剂 Hydrostatic text 流体静力检测流体静力检测 Hysteresis 磁滞磁滞 Hysteresis 磁滞磁滞 IACS IACS ID coil ID 线圈线圈 Image definition 图像清晰度图像清晰度 Image contrast 图像对比度图像对比度 Image enhancement 图像增强图像增强 Image magnification 图像放大图像放大 Image quality 图像质量图像质量 Image quality indicator sensitivity 像质指示器灵敏度像质指示器灵敏度 Image quality indicator(IQI)/image quality indication 像质指示器像质指示器 Imaging line scanner 图像线扫描器图像线扫描器 Immersion probe 液浸探头液浸探头 Immersion rinse 浸没清洗浸没清洗 Immersion testing 液浸法液浸法 Immersion time 浸没时间浸没时间 Impedance 阻抗阻抗 Impedance plane diagram 阻抗平面图阻抗平面图 Imperfection 不完整性(缺欠)不完整性(缺欠) Impulse eddy current testing 脉冲涡流检测脉冲涡流检测 Incremental permeability 增量磁导率增量磁导率 Indicated defect area 缺陷指示面积缺陷指示面积 Indicated defect length 缺陷指示长度缺陷指示长度 Indication 指示(显示)指示(显示) Indirect exposure 间接曝光间接曝光 Indirect magnetization 间接磁化间接磁化 Indirect magnetization method 间接磁化法间接磁化法 Indirect scan 间接扫查间接扫查 Induced field 感应磁场感应磁场 Induced current method 感应电流法感应电流法 Infrared imaging system 红外成象系统红外成象系统 Infrared sensing device 红外扫描器红外扫描器 Inherent fluorescence 固有荧光固有荧光 Inherent filtration 固有滤波固有滤波 Initial permeability 起始磁导率起始磁导率 Initial pulse 始脉冲始脉冲 Initial pulse width 始波宽度始波宽度 Inserted coil 插入式线圈插入式线圈 Inside coil 内部线圈内部线圈 Inside- out testing 外泄检测外泄检测 Inspection 检查检查 Inspection medium 检查介质检查介质 Inspection frequency/ test frequency 检测频率检测频率 Intensifying factor 增感系数增感系数 Intensifying screen 增感屏增感屏 Interal,arrival time (Δtij)/arrival Δtij)/arrival time interval time interval (Δtij ) 到达时间差(Δtij) Interface boundary 界面界面 Interface echo 界面回波界面回波 Interface trigger 界面触发界面触发 Interference 干涉干涉 Interpretation 解释解释 Ion pump 离子泵离子泵 Ion source 离子源离子源 Ionization chamber 电离室电离室 Ionization potential 电离电位电离电位 Ionization vacuum gage 电离真空计电离真空计 Ionography 电离射线透照术电离射线透照术 Irradiance , E 辐射通量密度,辐射通量密度, E Isolation 隔离检测隔离检测 Isotope 同位素同位素 Kaiser effect 凯塞(Kaiser)效应效应 Kilo volt kv 千伏特千伏特 Kiloelectron volt keV 千电子伏特千电子伏特 Krypton 85 氪85 L /D ratio L/D 比 Lamb wave 兰姆波兰姆波 Latent image 潜象潜象 Lateral scan 左右扫查左右扫查 Lateral scan with oblique angle 斜平行扫查斜平行扫查 Latitude (of an emulsion) 胶片宽容度胶片宽容度 Lead screen 铅屏铅屏 Leak 泄漏孔泄漏孔 Leak artifact 泄漏器泄漏器 Leak detector 检漏仪检漏仪 Leak testtion 泄漏检测泄漏检测 Leakage field 泄漏磁场泄漏磁场 Leakage rate 泄漏率泄漏率 Leechs 磁吸盘磁吸盘 Lift-off effect 提离效应提离效应 Light intensity 光强度光强度 Limiting resolution 极限分辨率极限分辨率 Line scanner 线扫描器线扫描器 Line focus 线焦点线焦点 Line pair pattern 线对检测图线对检测图 Line pairs per millimetre 每毫米线对数每毫米线对数 Linear (electron) accelerator(LINAC) 电子直线加速器电子直线加速器 Linear attenuation coefficient 线衰减系数线衰减系数 Linear scan 线扫查线扫查 Linearity (time or distance ) 线性(时间或距离)线性(时间或距离) Linearity , anplitude 幅度线性幅度线性幅度线性 Lines of force 磁力线磁力线 Lipophilic emulsifier 亲油性乳化剂亲油性乳化剂 Lipophilic remover 亲油性洗净剂亲油性洗净剂 Liquid penetrant examination 液体渗透检验液体渗透检验 Liquid film developer 液膜显像剂液膜显像剂 Local magnetization 局部磁化局部磁化 Local magnetization method 局部磁化法局部磁化法 Local scan 局部扫查局部扫查 Localizing cone 定域喇叭筒定域喇叭筒 Location 定位定位 Location accuracy 定位精度定位精度 Location computed 定位,计算定位,计算 Location marker 定位标记定位标记 Location upon delta-T 时差定位时差定位 Location , clusfer 定位,群集定位,群集定位,群集 Location ,continuous AE signal 定位,连续AE 信号信号 Longitudinal field 纵向磁场纵向磁场 Longitudinal magnetization method 纵向磁化法纵向磁化法 Longitudinal resolution 纵向分辨率纵向分辨率 Longitudinal wave 纵波纵波 Longitudinal wave probe 纵波探头纵波探头 Longitudinal wave technique 纵波法纵波法 Loss of back reflection 背面反射损失背面反射损失 Loss of back reflection 底面反射损失底面反射损失 Love wave 乐甫波乐甫波 Low energy gamma radiation 低能γ辐射辐射 Low -enerugy photon radiation 低能光子辐射低能光子辐射 Luminance 亮度亮度 Luminosity 流明流明 Lusec 流西克流西克 Maga or million electron volts MeV 兆电子伏特兆电子伏特 Magnetic history 磁化史磁化史 Magnetic hysteresis 磁性滞后磁性滞后 Magnetic particle field indication 磁粉磁场指示器磁粉磁场指示器 Magnetic particle inspection flaw indications 磁粉检验的伤显示磁粉检验的伤显示 Magnetic circuit 磁路磁路 Magnetic domain 磁畴磁畴 Magnetic field distribution 磁场分布磁场分布 Magnetic field indicator 磁场指示器磁场指示器 Magnetic field meter 磁场计磁场计 Magnetic field strength 磁场强度(H) Magnetic field/field ,magnetic 磁场磁场 Magnetic flux 磁通磁通 Magnetic flux density 磁通密度磁通密度 Magnetic force 磁化力磁化力 Magnetic leakage field 漏磁场漏磁场 Magnetic leakage flux 漏磁通漏磁通 Magnetic moment 磁矩磁矩 Magnetic particle 磁粉磁粉 Magnetic particle indication 磁痕磁痕 Magnetic particle testing/magnetic particle examination 磁粉检测磁粉检测 Magnetic permeability 磁导率磁导率 Magnetic permeability 磁导率磁导率 Magnetic pole 磁极磁极 Magnetic saturataion 磁饱和磁饱和 Magnetic saturation 磁饱和磁饱和 Magnetic writing 磁写磁写 Magnetizing 磁化磁化 Magnetizing current 磁化电流磁化电流 Magnetizing coil 磁化线圈磁化线圈 Magnetostrictive effect 磁致伸缩效应磁致伸缩效应 Magnetostrictive transducer 磁致伸缩换能器磁致伸缩换能器 Main beam 主声束主声束 Manual testing 手动检测手动检测 Markers 时标时标 MA-scope; MA-scan MA 型显示型显示 Masking 遮蔽遮蔽 Mass attcnuation coefficient 质量吸收系数质量吸收系数 Mass number 质量数质量数 Mass spectrometer (M.S.) 质谱仪质谱仪 Mass spectrometer leak detector 质谱检漏仪质谱检漏仪 Mass spectrum 质谱质谱 Master/slave discrimination 主从鉴别主从鉴别 MDTD 最小可测温度差最小可测温度差 Mean free path 平均自由程平均自由程 Medium vacuum 中真空中真空 Mega or million volt MV 兆伏特兆伏特 Micro focus X - ray tube 微焦点X 光管光管 Microfocus radiography 微焦点射线透照术微焦点射线透照术 Micrometre 微米微米 Micron of mercury 微米汞柱微米汞柱 Microtron 电子回旋加速器电子回旋加速器 Milliampere 毫安(mA ) Millimetre of mercury 毫米汞柱毫米汞柱 Minifocus x- ray tube 小焦点调射线管小焦点调射线管 Minimum detectable leakage rate 最小可探泄漏率最小可探泄漏率 Minimum resolvable temperature difference (MRTD ) 最小可分辨温度差(MRDT ) Mode 波型波型 Mode conversion 波型转换波型转换 Mode transformation 波型转换波型转换 Moderator 慢化器慢化器 Modulation transfer function (MTF ) 调制转换功能(MTF ) Modulation analysis 调制分析调制分析 Molecular flow 分子流分子流 Molecular leak 分子泄漏分子泄漏 Monitor 监控器监控器 Monochromatic 单色波单色波 Movement unsharpness 移动不清晰度移动不清晰度 Moving beam radiography 可动射束射线透照术可动射束射线透照术 Multiaspect magnetization method 多向磁化法多向磁化法 Multidirectional magnetization 多向磁化多向磁化 Multifrequency eddy current testiog 多频涡流检测多频涡流检测 Multiple back reflections 多次背面反射多次背面反射 Multiple reflections 多次反射多次反射 Multiple back reflections 多次底面反射多次底面反射 Multiple echo method 多次反射法多次反射法 Multiple probe technique 多探头法多探头法 Multiple triangular array 多三角形阵列多三角形阵列 Narrow beam condition 窄射束窄射束 NC NC Near field 近场近场 Near field length 近场长度近场长度 Near surface defect 近表面缺陷近表面缺陷 Net density 净黑度净黑度 Net density 净(光学)密度密度 Neutron 中子中子 Neutron radiograhy 中子射线透照中子射线透照 Neutron radiography 中子射线透照术中子射线透照术 Newton (N ) 牛顿牛顿 Nier mass spectrometer 尼尔质谱仪尼尔质谱仪 Noise 噪声噪声 Noise equivalent temperature difference (NETD ) 噪声当量温度差(NETD ) Nominal angle 标称角度标称角度 Nominal frequency 标称频率标称频率 Non-aqueous liquid developer 非水性液体显像剂非水性液体显像剂 Non-condensable gas 非冷凝气体非冷凝气体 Non destructive Examination (NDE ) 无损试验无损试验 Non-destructive Examination 损检查损检查 Nondestructive Evaluation (NDE ) 无损评价无损评价 Nondestructive Inspection (NDI ) 无损检验无损检验 Nondestructive Testing (NDT ) 无损检测无损检测 Nonerasble optical data 可固定光学数据可固定光学数据 Nonferromugnetic material 非铁磁性材料非铁磁性材料 Non-relevant indication 非相关指示(显示)非相关指示(显示) Non-screen-type film 非增感型胶片非增感型胶片 Normal incidence 垂直入射(亦见直射声束)垂直入射(亦见直射声束) Normal permeability 标准磁导率标准磁导率 Normal beam method; straight beam method 垂直法垂直法 Normal probe 直探头直探头 Normalized reactance 归一化电抗归一化电抗 Normalized resistance 归一化电阻归一化电阻 Nuclear activity 核活性核活性 Nuclide 核素核素 Object plane resolution 物体平面分辨率物体平面分辨率 Object scattered neutrons 物体散射中子物体散射中子 Object beam 物体光束物体光束 Object beam angle 物体光束角物体光束角 Object-film distance 被检体-胶片距离胶片距离 Object 一film distance 物体物体- 胶片距离胶片距离 Over development 显影过度显影过度 Over emulsfication 过乳化过乳化 Overall magnetization 整体磁化整体磁化 Overload recovery time 过载恢复时间过载恢复时间 Overwashing 过洗过洗 Oxidation fog 氧化灰雾氧化灰雾 P P Pair production 偶生成偶生成 Pair production 电子对产生电子对产生 Pair production 电子偶的产生电子偶的产生 Palladium barrier leak detector 钯屏检漏仪钯屏检漏仪 Panoramic exposure 全景曝光全景曝光 Parallel scan 平行扫查平行扫查 Paramagnetic material 顺磁性材料顺磁性材料 Parasitic echo 干扰回波干扰回波 Partial pressure 分压分压 Particle content 磁悬液浓度磁悬液浓度 Particle velocity 质点(振动)速度速度 Pascal (Pa ) 帕斯卡(帕)帕斯卡(帕) Pascal cubic metres per second 帕立方米每秒(Pa?m3/s ) Path length 光程长光程长 Path length difference 光程长度差光程长度差 Pattern 探伤图形探伤图形 Peak current 峰值电流峰值电流Peelable developer 可剥离显像剂可剥离显像剂 Penetrameter 透度计透度计 Penetrant 渗透剂渗透剂渗透剂 Penetrameter sensitivity 透度计灵敏度透度计灵敏度 Penetrant 渗透剂渗透剂 Penetrant comparator 渗透对比试块渗透对比试块 Penetrant flaw detection 渗透探伤渗透探伤 Penetrant removal 渗透剂去除渗透剂去除 Penetrant station 渗透工位渗透工位 Penetrant , water- washable 水洗型渗透剂水洗型渗透剂 Penetration 穿透深度穿透深度Penetrant testing 渗透检测渗透检测 Penetration time 渗透时间渗透时间Penetrant materials 渗透材料渗透材料 Permanent magnet 永久磁铁永久磁铁 Permeability coefficient 透气系数透气系数 Permeability ,a-c 交流磁导率交流磁导率 Permeability ,d -c 直流磁导率直流磁导率 Phantom echo 幻象回波幻象回波 Phase analysis 相位分析相位分析 Phase angle 相位角相位角 Phase controlled circuit breaker 断电相位控制器断电相位控制器 Phase detection 相位检测相位检测 Phase hologram 相位全息相位全息 Phase sensitive detector 相敏检波器相敏检波器 Phase shift 相位移相位移 Phase velocity 相速度相速度 Phase-sensitive system 相敏系统相敏系统 Phillips ionization gage 菲利浦电离计菲利浦电离计 Phosphor 荧光物质荧光物质 Photo fluorography 荧光照相术荧光照相术 Photoelectric absorption 光电吸收光电吸收 Photographic emulsion 照相乳剂照相乳剂 Photographic fog 照相灰雾照相灰雾 Photostimulable luminescence 光敏发光光敏发光 Piezoelectric effect 压电效应压电效应 Piezoelectric material 压电材料压电材料 Piezoelectric stiffness constant 压电劲度常数压电劲度常数 Piezoelectric stress constant 压电应力常数压电应力常数 Piezoelectric transducer 压电换能器压电换能器 Piezoelectric voltage constant 压电电压常数压电电压常数 Pirani gage 皮拉尼计皮拉尼计 Pirani gage 皮拉尼计皮拉尼计 Pitch and catch technique 一发一收法一发一收法 Pixel 象素象素 Pixel size 象素尺寸象素尺寸 Pixel , disply size 象素显示尺寸象素显示尺寸 Planar array 平面阵(列) Plane wave 平面波平面波 Plate wave 板波板波 Plate wave technique 板波法板波法 Point source 点源点源 Post emulsification 后乳化后乳化 Post emulsifiable penetrant 后乳化渗透剂后乳化渗透剂 Post-cleaning 后清洗后清洗 Powder 粉未粉未 Powder blower 喷粉器喷粉器 Powder blower 磁粉喷枪磁粉喷枪 Pre-cleaning 预清理预清理 Pressure difference 压力差压力差 Pressure dye test 压力着色检测压力着色检测 Pressure probe 压力探头压力探头 Pressure testing 压力检测压力检测 Pressure- evacuation test 压力抽空检测压力抽空检测 Pressure mark 压痕压痕 Pressure,design 设计压力设计压力 Pre-test 初探初探 Primary coil 一次线圈一次线圈 Primary radiation 初级辐射初级辐射 Probe gas 探头气体探头气体 Probe test 探头检测探头检测 Probe backing 探头背衬探头背衬。
CFD modelling and validation of wall condensation in the presence of non-condensable gases
article info
Article history: Received 5 March 2014 Accepted 17 March 2014
abstract
The aim of this paper is to present and validate a mathematical model implemented in ANSYS CFD for the simulation of wall condensation in the presence of non-condensable substances. The model employs a mass sink at isothermal walls or conjugate heat transfer (CHT) domain interfaces where condensation takes place. The model was validated using the data reported by Ambrosini et al. (2008) and Kuhn et al. (1997).
• The condensation rate is controlled by the concentration boundary layer
• The partial pressure of the condensable component at the wall is equal to its saturation pressure evaluated at the interface temperature
MBw = −k(y+, Sc) ·
· YBp − YBw 1 − YBw
(3)
诊断性胃镜检查的质量指标
Chin J Gastroenterol,2023,Vol.28,No.4诊断性胃镜检查的质量指标董洋许松欣邓彬*扬州大学附属苏北人民医院消化内科(225001)摘要目前,胃镜检查是大多数国家和地区诊断和治疗上消化道疾病的主要方法。
高质量的胃镜检查在诊断、治疗和预防消化道疾病方面至关重要。
胃镜检查是一个高度依赖于胃镜医师技术的操作,操作上的差异可能会对胃镜检查质量产生重要影响,故提高胃镜检查的质量是目前胃镜医师急需解决的问题。
胃镜检查质量的提高不仅可以降低上消化道疾病的发病率和死亡率,而且可以提高整体医疗质量。
本文就诊断性胃镜检查的质量指标及其研究进展作一综述。
关键词胃镜检查;质量指标;消化系统疾病;诊断;治疗Quality Indicators of Diagnostic GastroscopyDONG Yang,XU Songxin,DENG Bin.Department of Gastroenterology,Northern Jiangsu People ′s Hospital Affiliated to Yangzhou University,Yangzhou,Jiangsu Province (225001)Correspondence to:DENG Bin,Email:*****************AbstractGastroscopy is a widely used examination for the diagnosis and treatment of upper gastrointestinal diseasesin most countries and regions.High quality gastroscopy is much important for the diagnosis,treatment and prevention of gastrointestinal diseases.Gastroscopy is an operation highly dependent on the skills of gastroscopy physician,and the difference in the quality of operation may have an important impact on the quality of gastroscopy.It is an urgent problem for gastroscopy clinicians to improve the quality of gastroscopy.The improvement of gastroscopy quality not only can reduce the morbidity and mortality of upper gastrointestinal diseases,but also can improve the overall medical quality.This articlereviewed the progress of research on the quality indicators of diagnostic gastroscopy.Key wordsGastroscopy;Quality Indicators;Digestive System Diseases;Diagnosis;TherapyDOI :10.3969/j.issn.1008‑7125.2023.04.008*本文通信作者,Email:*****************本世纪初,美国胃肠内镜学会(ASGE )实践标准委员会已提出胃镜检查质量这一定义,当时更多地强调检查时间以及胃镜检查报告信息的完整性。
Touchpoint TM Plus 气体检测器控制系统说明书
Gas DetectionTouchpoint TMPlusTouchpoint Plus brings a whole new control experience to your small system of gas detectors. Touchpoint Plus is an easily configurable, wall-mounted control system that supports up to 16 gas detection channels. Its modular approach enables you to take control and configure what you need for a wide range of applications.The signature feature of the Touchpoint line is a user-friendly touchscreen interface, which the Touchpoint Plus takes to a new level. With this unique interface, it’s easier than ever to see the status of your system at a glance - maximizing the time you have to make the right decisions. The intuitive, multilingual interface simplifies operation and reduces training requirements. The full-color stoplight-style status indication provides clarity from a distance too.Touchpoint Plus features a comprehensive set of outputs as standard, including common alarms and dedicated drives for remote audiovisual indicators. Its modularity enables you to customize your system to meet your specific application requirements. Selecting the right detector for use with your controller can deliver significant savings in startup costs and ongoing operations. Our global partner network and dedicated application specialists are able to help you make the right choices for your industry.With everything at your fingertips, you can take ownership of your system and operate it with confidence, helping to ensure the safety of your people and the productivity of your site.Delivering Reliable Control • Honeywell reliability from the most trusted experts in gas detection• Built-in battery backup for constant uptime• Robust, shockproof housing for a wide range of industrial environments Flexible Capabilities• Compatible with the full range of Honeywell gas detectors • Powered audiovisual alarms simplify field installation • Configuration includes easy grouping and voting alarm logic without specialist knowledge • Next-generation compatibility • Optional Modbus output for integration with a higher level systemProviding Ease and Efficiency • Quick and easy installation, configuration, setup, and maintenance• Easy diagnostics, data, and reporting• Minimum training time• Large color touchscreen LCD • Multilingual functionality • Green-yellow-red status at a glanceWant toknow what’sgoing on?View real-time andhistorical data, analyzereadings, andmuch more System status at a glanceBuilt-in sounderIndividual channel status indicators (green, yellow, red)Mute/Resetdetection systems across a wide range of applications and industries. If you need to integrate your gas detection with a higher-level management system, the Modbus output option makes this straightforward.As the heart of your gas detection system, Touchpoint Plus is designed to work with Honeywell’s industry-leading gas detectors and drive actuators, and audible and visual alarms to provide a complete end-to-end solution that you can configure as your own.Relays, actuators, and XNX universal transmitterGasDetector Audible & Visual AlarmTYPICAL EXAMPLE OF A SMALL GAS DETECTION SYSTEM USING TOUCHPOINT PLUSDesigned for Speed and ReliabilityMade of high-impact polymer plastic, Touchpoint TM Plus is versatile and durable. It is dustproof and waterproof, and has been tested to withstand the toughest operating environments, both indoors and out. So you can count on the Touchpoint Plus to stand up to the challenges of industrial environments, from mechanical rooms to chemical plants.Touchpoint Plus is supplied with pre-drilled and sealed cable entries and a unique tiered internal arrangement providing ease of access to save installers time and money.1. Main module2. Input module3. Relay output module4. mA output module5. Power supply6. Display module7. Touchscreen8. Backup battery9. Modbus TCP/Web 10. Modbus RTU12345869107System Configuration Options2, 4, or 8 Inputs 2-Wire 4-20 mA 3-Wire 4-20 mA 3-Wire mV BridgeProvided As Standard• Dedicated powered audiovisual alarm drives• Common alarm outputs, one for fault and two configurable • Datalogging to SD card•Remote reset and inhibit inputsOptions• Choice of AC or DC supply voltage • Optional backup battery• Choice of inputs: 2, 4 , or 8 mA; 2, 4 , or 8 mV; 2 mA and 2 mV; 4 mA and 4 mV • Optional expansion unit for up to 16 inputs• Choice of 12 or 24 relay outputs • Choice of 4 or 8 mA outputs • Optional RS485 Modbus RTU • Optional TCP/IP Modbus/HTTPQuick and easy installation - designed to save you time and moneyTouchpoint TM Plus can be directly wall-mounted, or, for an easier 1-man installation, simply use the optional mounting plate. Open the hinged front cover to find plenty of space for wiring and a unique tiered terminal arrangement for easy access. Cable entries are pre-drilled and sealed ready to use reducing installation time and cost further.Direct Surface MountingOptional Mounting PlateTouchpoint Plus is supplied with 13 pre-drilled and sealed cable entries for PG16/M20 glands.Note: Other field devices available on request. Some devices are not available in all regions.InstallationB: Base Unit E: Expansion UnitPlease Note:While every effort has been made to ensure accuracy in this publication, no responsibility can be accepted for errors or omissions. Data may change, as well as legislation, and you are strongly advised to obtain copies of the most recently issued regulations, standards, and guidelines. This publication is not intended to form the basis of a contract.Touchpoint Plus Datasheet | Rev 4 | 02/19© 2019 Honeywell International Inc.For more information Europe, Middle East, AfricaLife Safety Distribution GmbHTel: 00800 333 222 44 (Freephone number)Tel: +41 44 943 4380 (Alternative number)Middle East Tel: +971 4 450 5800 (Fixed Gas Detection)Middle East Tel: +971 4 450 5852 (Portable Gas Detection)AmericasHoneywell Analytics Distribution Inc.Tel: +1 847 955 8200Toll free: +1 800 538 0363RAE Systems by Honeywell Phone: 408 952 8200Tollfree:188****4800Asia PacificHoneywell Industrial Safety Tel: +82 (0) 2 6909 0300India Tel: +91 124 4752700China Tel: +86 10 5885 8788 3000**************************Technical SupportEMEA:**********************US:***************************AP:***************************。
应用地球化学元素丰度数据手册-原版
应用地球化学元素丰度数据手册迟清华鄢明才编著地质出版社·北京·1内容提要本书汇编了国内外不同研究者提出的火成岩、沉积岩、变质岩、土壤、水系沉积物、泛滥平原沉积物、浅海沉积物和大陆地壳的化学组成与元素丰度,同时列出了勘查地球化学和环境地球化学研究中常用的中国主要地球化学标准物质的标准值,所提供内容均为地球化学工作者所必须了解的各种重要地质介质的地球化学基础数据。
本书供从事地球化学、岩石学、勘查地球化学、生态环境与农业地球化学、地质样品分析测试、矿产勘查、基础地质等领域的研究者阅读,也可供地球科学其它领域的研究者使用。
图书在版编目(CIP)数据应用地球化学元素丰度数据手册/迟清华,鄢明才编著. -北京:地质出版社,2007.12ISBN 978-7-116-05536-0Ⅰ. 应… Ⅱ. ①迟…②鄢…Ⅲ. 地球化学丰度-化学元素-数据-手册Ⅳ. P595-62中国版本图书馆CIP数据核字(2007)第185917号责任编辑:王永奉陈军中责任校对:李玫出版发行:地质出版社社址邮编:北京市海淀区学院路31号,100083电话:(010)82324508(邮购部)网址:电子邮箱:zbs@传真:(010)82310759印刷:北京地大彩印厂开本:889mm×1194mm 1/16印张:10.25字数:260千字印数:1-3000册版次:2007年12月北京第1版•第1次印刷定价:28.00元书号:ISBN 978-7-116-05536-0(如对本书有建议或意见,敬请致电本社;如本社有印装问题,本社负责调换)2关于应用地球化学元素丰度数据手册(代序)地球化学元素丰度数据,即地壳五个圈内多种元素在各种介质、各种尺度内含量的统计数据。
它是应用地球化学研究解决资源与环境问题上重要的资料。
将这些数据资料汇编在一起将使研究人员节省不少查找文献的劳动与时间。
这本小册子就是按照这样的想法编汇的。
燃气安全检查翻译
燃气安全检查翻译Gas Safety InspectionIntroductionGas safety should be a priority for every household. A gas leak could lead to a fire or explosion, potentially endangering lives and property. It is essential to conduct a gas safety inspection regularly to ensure that the gas appliances, pipework, and flues are all functioning correctly. This article will provide guidelines on how to conduct a gas safety inspection.Pre-Inspection PreparationsBefore carrying out a gas safety inspection, it is necessary to gather all the information related to the gas appliances, including their age, manufacturer, and model. As a gas safety inspector, you must have the relevant qualifications and experience to undertake the inspection. It is also imperative to have a checklist to guide you during the inspection process.Gas Meter and Pipework InspectionThe gas meter and pipework are the first areas to inspect during a gas safety inspection. The gas meter's condition should be checked to see if there are any signsof wear, corrosion, or leaks. Similarly, the pipework should be inspected to check if it is appropriately secured, free of leaks, and maintained in good condition.Appliance InspectionThe next step is to inspect all gas appliances, including boilers, cookers, and fires. The appliance's condition should be carefully assessed to ensure it is functioning correctly and efficiently. The appliance's flue should also be inspected to ensure that it is safe and not blocked.VentilationProper ventilation is essential to ensure the safe operation of gas appliances. Inspection should be carried out to ensure that the ventilation airbricks are free from obstruction and that they have not been covered by plants, debris, or furniture. If the room is overly humid, there could be a risk of carbon monoxide poisoning, and the ventilation should be improved.Carbon Monoxide (CO) AlarmsCO alarms should be installed in rooms containing gas appliances as an additional safety measure. They should be tested regularly to ensure that they are working correctly. CO alarms can detect the presence ofcarbon monoxide in the air and signal danger through a loud alarm.Documenting Inspection ResultsIt is essential to document the results of the gas safety inspection, including any findings, recommendations, and actions taken. The documentation should include the inspection date and the inspector's details. It is also necessary to keep the records for future reference.ConclusionGas safety inspections are critical for ensuring the safe use of gas appliances and pipework. Inspections should be carried out regularly to identify any potential issues and prevent accidents. Gas safety inspectors should be qualified and experienced, and inspections should be guided by a checklist. It is essential to document the inspection results and keep the records for future reference. By following these guidelines, gas safety can be ensured, and accidents can be prevented.。
ASTM D5504
AuthorsWenmin LiuAgilent Technologies Co. Ltd.412 Ying Lun RoadWaigaoqiao Free Trade Zone Shanghai, 200131ChinaMario MoralesAgilent Technologies, Inc. 2850 Centerville Road Wilmington, DE 19808USAAbstractAn Agilent dual plasma sulfur chemiluminescence detec-tor (DP SCD) combined with an online dilutor was used for the analysis of sulfur compounds. By using this method, the detection limits of the sulfur compounds achieved the ppb level. The stability of the DP SCD was also investigated. The long-term and short-term stability show that the performance of DP SCD is stable, and no hydrocarbon interference was found during the analysis of natural gas samples.IntroductionMany sources of natural gas and petroleum gases contain varying amounts and types of sulfur com-pounds. The analysis of gaseous sulfur compounds is difficult because they are polar, reactive, and present at trace levels. Sulfur compounds pose problems both in sampling and analysis. Analysis of sulfur compounds many times requires special treatment to sample pathways to ensure inertnessDetection of Sulfur Compounds in Natural Gas According to ASTM D5504 with Agilent's Dual Plasma SulfurChemiluminescence Detector (G6603A) on the 7890A Gas Chromatograph ApplicationHydrocarbon Processingto the reactive sulfur species. Sampling must be done using containers proven to be boratory equipment must also be inert and well conditioned to ensure reliable results. Frequent calibration using stable standards is required in sulfur analysis [1].GC SCD configuration with inert plumbing is one of the best methods to detect sulfur compounds in different hydrocarbon matrices. Sulfur compounds elute from the gas chromatographic column and are combusted within the SCD burner. These com-bustion products are transferred to the SCD detec-tor box via vacuum to a reaction cell for ozone mixing. This detection technique provides a highly sensitive, selective, and linear response to volatile sulfur compounds.Agilent Technologies DP technology is the detector of choice for sulfur analysis when dealing with a hydrocarbon matrix. The burner easily mounts on the 6890 and 7890A GCs and incorporates features for easier and less frequent maintenance. In this application, the Agilent 355 DP SCD was used to analyze the gaseous sulfur compounds in natural gas. Detection limits, stability and linearity were investigated.ExperimentalAn Agilent 7890A GC configured with a split/splitless inlet (Sulfinert-treated), and an Agilent 355 DP SCD were used. Sample introduction was through a six-port Hastelloy C gas sample valve (GSV) interfaced directly to the sulfur-treated inlet with Sulfinert tubing. An online dilutor was used for preparation of ppb-level sulfur compounds inHeater150 °C Array Pressure14.5 psiSeptum purge flow 3 mL/minMode SplitlessGas saver20 mL/min after 2 minSample loop 1 mLOven30 °C (1.5 min), 15 °C/min 200 °C(3 min)Column HP-1 60 m ×0.53 mm ×5 µmInjection mode Static flow and dynamic flow modesSCD ConditionsBurner temperature800 °CVacuum of burner372 torrVacuum of reaction cell 5 torrH240 mL/minAir53 mL/minResults and DiscussionFrom the comparative results of the sulfur detec-tors’ sensitivity, it could be seen that SCD is thebest detector for sulfur components, especially atlow levels [3]. The Agilent DP technology is themost sensitive and selective detector for sulfur-containing gaseous hydrocarbon samples.Figure 2 is the chromatogram of low-level sulfurcompounds at 1.35 ppb (H2S), which is preparedby the point-of-use gas blending system. Table 2 isthe calculated signal to noise (S/N) of each com-pound, from the achieved data. It can be seen thatDP SCD can detect low-level sulfur compounds.Figure 1.Diagram of online dilutor GC-DP SCD.23Figure 2.Chromatogram of sulfur compounds in helium at 1.35 ppb. (Refer to Table 1 for peak identification.)Because the low-level sulfur components were pre-pared by the online dilutor system, which was pre-pared by adjusting the aux EPC to get appropriate diluent flow, high diluent flow could have the potential to cause high pressure in the sample loop, which results in the amount of the sample in the loop being different when the diluent flow changes from low to high. In this application, two sample injection modes, static and dynamic, were investigated. The mode is actuated by the on/off valve installed prior to GSV. When using staticinjection mode, the valve is switched to the off position, the pressure in the sample loop balances to ambient pressure, and then the sample is injected into the GC.Table 3 shows the linear ranges of the two injec-tion modes. The two injection modes have no dif-ference from a linearity perspective, which means that the two injection modes are both suitable when using the 1-mL sample loop. The 1-mL sample loop’s resistance is not high enough to cause variation in the sample injection amount.Table 4 shows the long-term (72 hours) and short-term (8 hours) stability of the SCD at different concentration levels.In an effort to investigate the coelution of hydro-carbon and sulfur, the same sulfur standards in natural gas were analyzed on the SCD. Figure 3shows the chromatogram; no quenching was found.For More InformationFor more information on our products and services, visit our Web site at /chem.Agilent shall not be liable for errors contained herein or for incidental or consequential damages in connection with the furnishing, performance, or use of this material.Information, descriptions, and specifications in this publication are subject to change without notice.© Agilent Technologies, Inc. 2008Printed in the USAAugust 12, 20085989-9234EN。
探伤专业英语
NDT英汉无损检测词汇abortion ---n.故障`失灵`失事abortive----v.失败abruption n 裂断`中断。
断路absolute adj 绝对的`纯粹的absolute sensitivity 绝对灵敏度absolute value 绝对值absorb 吸收`减震absorbance 吸收absorb dose 吸收计量absorbent 吸声材料,吸收体。
吸收性的。
Abutment joint 平接缝`对接缝。
对接。
AC yoke demagnetization 交流磁轭去磁,交流磁轭退磁AC yoke magnetization 交流磁轭磁化。
accept n 接受acceptable defect level 缺陷合格等级。
Acceptable emergency dose 容许的事故计量。
acceptable quality level(AQC)指验收等级,象指验收表准。
acceptance 接收,验收。
认可,肯定Acceptance certificate 验收证明书Acceptance criterion 验收准则` 验收Accessory device 辅助装置Accessory equipment 附属设备Accident 偶然事故,偶然损伤。
Accident condition 事故情况Accident error 偶然错误。
Accident prevention 安全措施Accidental exposure 偶然曝光Accidental radiation injury偶然辐射伤害。
Accumulate dose 总剂量,累计剂量。
Accumulator battery 蓄电池Accumulator cell 蓄电池Acetic acid 醋酸,乙酸。
ACDS (acoustic crack detection system)声裂纹检测系统,声裂纹检测装置,声裂纹检测仪。
小学上册第九次英语第6单元测验卷
小学上册英语第6单元测验卷英语试题一、综合题(本题有100小题,每小题1分,共100分.每小题不选、错误,均不给分)1.What is the largest planet in our solar system?A. EarthB. MarsC. JupiterD. Saturn答案:C2.What do you call the person who studies history?A. HistorianB. ScientistC. BiologistD. Chemist3.Which animal is considered a reptile?A. FrogB. LizardC. SalmonD. Sparrow4.My _____ (外婆) is a wonderful cook.5.The invention of ________ has reshaped modern communication.6.The __________ is a geographic area known for its mountains.7.The ________ is very cheerful.8.What do we call a person who plays sports?A. AthleteB. CoachC. RefereeD. Fan9.The rabbit hops around the ________.10.What do you call the science of classifying living things?A. TaxonomyB. AnatomyC. EcologyD. PhysiologyA11.What is the term for a large group of stars in the universe?A. GalaxyB. ClusterC. Solar SystemD. ConstellationA12.The boiling point of water is __________ degrees Fahrenheit.13. A ________ (生态恢复) can bring back plants.14.We are going to ___ a concert. (attend)15.The chemical symbol for chromium is __________.16.What is the main ingredient in pesto?A. TomatoB. BasilC. GarlicD. CheeseB17.What is 5 x 2?A. 7B. 8C. 10D. 12C18.The _____ (小羊) bleats when it is hungry.19.The ______ (小鸟) chirps sweetly in the trees.20. A lion is a type of ______.21.My sister loves to ________.22.The ________ was a significant period in the evolution of human rights.23.continent) of Australia is both a country and a landmass. The ____ets have a bright tail that points away from the _______.25.What is the process of water turning into vapor called?A. CondensationB. EvaporationC. PrecipitationD. SublimationB26. A chemical reaction can change the physical ______.27.What do we call a baby cow?A. CalfB. KidC. LambD. FoalA28.The _______ (The Ottoman Empire) was a powerful empire that lasted for centuries.29.Which instrument has strings and is played with a bow?A. FluteB. GuitarC. ViolinD. PianoC Violin30.What is the name of the famous dessert made of cream and fruit?A. CakeB. Ice creamC. TartD. MousseD31.The _______ (鲸鱼) sprays water from its blowhole.32.The ancient Egyptians worshiped _______. (太阳神)33.The chemical symbol for roentgenium is ______.34.What is the name of the famous scientist who developed the theory of evolution?A. Charles DarwinB. Albert EinsteinC. Isaac NewtonD. Galileo Galilei35.The __________ was a significant period of change in Europe. (文艺复兴)36.What is the capital of the Bahamas?A. NassauB. FreeportC. EleutheraD. Long IslandA Nassau37.What do you call a piece of furniture for sitting?A. TableB. ChairC. BedD. ShelfB38. A _______ can grow in different climates.39.What do you call a collection of books?A. LibraryB. MuseumC. GalleryD. Shop40.I have _____ (three/four) apples in my bag.41.The kitten loves to chase its _______ (尾巴).42. A ______ (温带) climate supports many types of flora.43.We write with a ___. (pen)44. A curious ___ (小鸽子) pecks at crumbs.45. A ________ (植物观察) can inspire stories.46.When it rains, I wear my ________ (雨衣) and jump in the ________ (水坑).47.What is the name of the famous statue found in New York Harbor?A. DavidB. Christ the RedeemerC. Statue of LibertyD. Venus de MiloC48.The __________ (花香) fills the air in spring.49.Which animal is known for building dams?A. BeaverB. FoxC. RabbitD. Owl50. A dog wags its _______ (尾巴) when happy.51.An electrolyte is a substance that conducts electricity when _____.52.What is the primary color made by mixing blue and yellow?A. GreenB. OrangeC. PurpleD. Brown53.The ______ (植物的生存) depends on various factors.54.The __________ (历史的反思) helps societies grow.55.The flowers are ___. (colorful)56.My brother is interested in ____ (mathematics).57.I enjoy ______ (与家人一起) playing sports.58.The ______ (海豚) is known for its intelligence.59.I have a __________ who lives next door. (邻居)60.The __________ is a major mountain range in North America. (落基山脉)61.I enjoy building things with my __________ (玩具名).62.I have fun playing sports with my ____.63.I like to play ___ (cards).64.What do you call a book of maps?A. AtlasB. DictionaryC. EncyclopediaD. NovelA65.The law of definite proportions states that a given chemical compound always contains its component elements in fixed _______.66.My dad teaches me to be __________ (负责任的) in my actions.67.We visit the ______ (博物馆) for field trips.68.The ancient Egyptians constructed ______ (神庙) for their gods.69.I want to learn more about ______ (植物) and how they grow. They are very ______ (重要).70.environmental monitoring) tracks ecosystem health. The ____71.The __________ (历史成就) can be celebrated.72.What do we call a young lion?A. CubB. PuppyC. KittenD. Calf73.My favorite ________ (玩具车) is red and can go very fast.74.My hamster has a _______ (舒适的) home.75.Mars is often called the ______ planet.76. A chemical property describes how a substance reacts with ______.77.What is the main language spoken in Spain?A. FrenchB. ItalianC. SpanishD. PortugueseC78.I like to ride my _____ (horse/bike) in the park.79.The process of breaking down food in our bodies is called ______.80.Which animal is known for its intelligence and ability to use tools?A. DolphinB. HorseC. CatD. FishA81.I have a toy _______ that can build things.82. A _____ (植物活动) can raise awareness about conservation.83.What is the smallest unit of life?A. CellB. TissueC. OrganD. Organism84.My sister has a __________ (好心) nature.85.The chemical formula for potassium phosphate is ______.86.The ______ helps regulate the body's temperature.87.My favorite _________ (玩具) can spin and dance.88.What do we call a person who studies the history of science?A. Science HistorianB. SociologistC. AnthropologistD. PhilosopherA89.My ___ (小猫) purrs when I pet it.90.My brother is really into _______ (运动). 他希望能 _______ (动词).91.What is the capital of the Philippines?A. ManilaB. CebuC. DavaoD. Iloilo92.The __________ (历史的启发) ignites passion.93.The stars are ________ (闪闪发光).94.I _____ (love/hate) homework.95.In _____ (挪威), you can find beautiful fjords.96.What do you call a young deer?A. CalfB. KidC. FawnD. LambC97. A solid has a __________ (固定的) shape and volume.98.The country famous for its classical music is ________ (奥地利).99.What is the name of Saturn's largest moon?A. TitanB. EnceladusC. RheaD. Iapetus100.The main component of natural gas is _______.。
INSA de Lyon
Keywords: Text Extraction, image enhancement, binarization, OCR, video Indexing 1
1
Introduage Retrieval and its extension to videos is a research area which gained a lot of attention in the recent years. Various methods and techniques have been presented, which allow to query big databases with multimedia contents (images, videos etc.) using features extracted by low level image processing methods and distance functions which have been designed to resemble human visual perception as closely as possible. Nevertheless, query results returned by these systems do not always match the results desired by a human user. This is largely due to the lack of semantic information in these systems. Systems trying to extract semantic information from low level features have already been presented [10], but they are error prone and very much depend on large databases of pre-defined semantic concepts and their low level representation. Another method to add more semantics to the query process is relevance feedback, which uses interactive user feedback to steer the query process. See [20] and [8] for surveying papers on this subject. Systems mixing features from different domains (image and text) are an interesting alternative to mono-domain based features [4]. However, the keywords are not available for all images and are very dependent on the indexer’s point of view on a given image (the so-called polysemy of images), even if they are closely related to the semantic information of certain video sequences (see figure 1). In this paper we focus on text extraction and recognition in videos. The text is automatically extracted from the videos in the database and stored together with a link to the video sequence and the frame number. This is a complementary approach to basic keywords. The user submits a request by providing a keyword, which is robustly matched against the previously extracted text in the database. Videos containing the keyword are presented to the user. This can also be merged with image features like color or texture. <Figure 1 about here> Extraction of text from images and videos is a very young research subject, which nevertheless attracts a large number of researchers. The first algorithms, introduced by the document processing community for the extraction of text from 2
无损检测常用英文词汇
无损检测常用英文词汇(a) angstrom unit埃a.c magnetic saturation交流磁饱和a.c magnetic saturation交流磁饱和ablution清洗absorbed dose 吸收剂量absorbed dose rate吸收剂量率absorbed dose rate吸收剂量率acceptanc limits验收范围acceptanc limits 验收范围acceptance level验收水平acceptance level 验收水平验收标准acceptance specification 验收规范acceptance standard 验收标准accessories 附件配件辅助设备辅助器材accumulation test累积检测accumulation test 累积检测accuracy 精确度准确度acetone 丙酮acoustic emission (ae) 声发射acoustic emission count声发射计数acoustic emission count(emission count)声发射计数(发射计数)acoustic emission transducer声发射换能器acoustic holography声全息术acoustic impedance声阻抗acoustic impedance matching声阻抗匹配acoustic impedance matching声阻抗匹配acoustic impedance method声阻法acoustic wave声波acoustical lens 声透镜acoustic-ultrasonic声-超声(au)across交叉横过activation活化activity活度additional stress附加应力address地址adequate shielding安全屏蔽adequate shielding适当防护、适当屏蔽ae ae声发射air header集气管air set空气中凝固air supply 气源aisle 过道走廊alarm condition 报警状态alarm level 报警电平alignment 对准定位调整校直alkaline battery碱性电池allowable variation允许偏差容许变化alternating current 交流电aluminum powder 铝粉amount 数量ampere turns安匝数amplifier panel放大器面板amplitude振幅、幅度analyzer分析器anchor bolt锚定螺栓地脚螺栓angle beam method斜射法、角波束法angle beam probe斜探头、角探头angle fitting弯头angle iron角钢角铁angle of incidence入射角angle of reflection反射角angle of spread扩散角angle of squint偏向角、偏斜角angle probe斜探头、角探头angle square角尺angle steel角钢appearance外观application drawing操作图应用图arc cutting 电弧切割arc gouging电弧刨削arc starting 起弧arc welding电弧焊area amplitude response curve面积幅度曲线area amplitude response curve面积振幅响应曲线area of interest 评定区area of interest 评定区、关注区域argon arc welding氩弧焊arliflcial disconlinuity人工不连续性、人工缺陷arrangement diagram布置图arrival time interval(δtij)到达时间差artifact 人为缺陷artificial defect 人工缺陷a-scan 型扫描a-scope 型显示assembly装配at present 目前attenuation coefficient衰减系数attenuator 衰减器audible leak indicator音响泄漏指示器automatic temperature recorder 温度自动记录器automatic testing 自动检测autoradiography自动射线照相术axiality同轴度轴对称性axonometric drawing 轴测图back-feed反馈background背景background target目标本底backwall echo 底波底面回波baiting valve 放料阀band plate 带板barium concrete 钡混凝土barn 靶base fog片基灰雾base material 基底材料basic sensitivity 基准灵敏度bath槽液、浴池、槽bayard-alpert ionization gage 型电离计beam声束、光束beam angle波束角、束张角beam axis声束轴线beam path声程、声束路径beam path location声程定位、声束路径位置beam ratio光束比beam spread声束扩散bellow type波纹管式bend弯管弯头弯曲bending挠曲弯曲bending deformation挠曲变形弯曲变形betatron电子感应加速器beveled edges坡口beveling 磨斜棱磨斜边成斜角bid 投标出价bimetallic strip gage 双金属片计bipolar field双极磁场bisectrix 等分线black and white transmission densitometer 黑白透射密度计black light 黑光,紫外光black light filter 黑光滤波器、黑光过滤片blackbody 黑体blackbody equivalent temperature 黑体等效温度bleakney mass spectrometer 波利克尼质谱仪bleedout 渗出、漏出blind 挡板窗帘blind plate 隔离盲板盲板blinding plate 盲板block up 封堵垫高blowhole 喷水孔通风孔通气孔(气)孔铸孔砂[气]眼气泡bolt 螺栓螺钉bolton 螺栓紧固bonding wire 接合线焊线boost pressure升压both sides welding双面焊接bottom echo底波底面回波bottom plate 底板bottom surface 底面boundary echo 边界回波、界面回波branch connection 分支接续分支连接brand name 商标名称品牌breaking of contact 断接卡bremsstrahlung 轫致辐射bridge 桥broad-beam 宽射束宽(声、光)束brush application 刷涂b-scan b型扫描b扫描b-scan presentation b型扫描显示b-scope b型显示buckle 满扣扣住buckling deformation翘曲变形buried depth 埋深burn through 烧蚀烧穿bus duct 母线槽butt joint 对接butt jointing对接接头butt weld 对接焊缝butt welding 对接焊cable armor 电缆铠装cable channel 电缆槽电缆管道cable fitting电缆配件cable gland 电缆衬垫cable laying电缆敷设cable routing电缆路由选择cable sheath 电缆包皮层cable testing bridge 电缆测试电桥cable tray电缆盘cable trunk 电缆管道电缆主干线calculation sheet计算书calibrated density reference scale 标准密度校验片calibration instrument 校准仪器calorimeter 热量计capillary action 毛细管作用capping ends 顶盖末端carbon steel 碳钢carbon steel tube 碳钢管carrier fluid载液carry over of penetrate渗透剂转入cascade connection 串联连接cassette 暗盒cathode 阴极cathodic protection system 阴极保护系统caulking metal填隙合金[金属](材料)ccd camera 电荷耦合摄像机cement lined piping 水泥衬里管线center bearing bracket 中心支架center line 中心线center plate 中心板拨盘central conductor 中心导体中线(三相四线制)central conductor method 中心导体法centralized 集中的centripetal canting pull rope向心斜拉索certification of fitness 质量合格证书channel bases沟渠基底channel steel expansion ring 槽钢胀圈characteristic curve特性曲线characteristic curve of film 胶片特性曲线characteristic radiation特征辐射标识辐射charge coupled device 电荷耦合器件(简称ccd)check against检查,核对check valve 止回阀chemical fog 化学灰雾chipping 修琢chronometer精密计时表ci 居里cine-radiography 射线(活动)电影摄影术连续射线照相circuit breaker断路开关circular array 圆形阵列circumferential coils 圆环线圈circumferential field 周向磁场环形磁场circumferential joint 周圈接缝circumferential magnetization method 周向磁化法circumferential weld 环焊缝civil engineer 土木工程师civil works 土建工程建筑工程clamp 夹钳clamping fixture 胎具夹具clean 清理clean-up 清除clearing time 定透时间cluster of flaws 密集区缺陷coaxial cable 同轴电缆cockle stairs 螺旋梯coercive force 矫顽力coherence 相干性coherence length相干长度(谐波列长度)coil method 线圈法coil reference 线圈参考(参照线圈)coil size 线圈尺寸coil spacing 线圈间距coil technique 线圈技术线圈法coil test 线圈试验coincidence discrimination 符合性鉴别一致性鉴别cold lap 冷隔cold-cathode ionization gage 冷阴极电离计collar extension 环口collimation 准直collimator 准直器collision碰撞冲突color identification 彩色识别combined colour contrast and fluorescent pene着色荧光渗透剂commencement 开始company 公司comply with 遵守component part构件(组合)零件部件comprehensive analysis and judgement综合分析判断compressed air drying压缩空气干燥compression joint 压接压力接合compression pump 压缩机压气机[泵] compressional wave 压缩波compton scatter 康普顿散射computed radiography(cr)计算机辅助射线成像技术condensation冷凝conducting wire 导线conductive paste 导电膏conduit box[电]导管分线匣conduit entry 导管引入装置conduit outlet 电线引出口connector 接线器连接器console 控制台construction work施工工程consumable insert (焊接)自耗嵌块consumer 用户contact pads 接触垫contactor 触头接触器触点开关content gauge 液位计continuous emission 连续发射continuous linear array 连续线性阵列continuous method 连续法continuous spectrum 连续谱continuous wave 连续波continuously welded (cw) 连续焊contrast 对比度衬度contrast agent对比剂造影剂contrast aid 反差增强剂contrast sensitivity 对比灵敏度contrast stretch 对比度扩展control 控制控制器control cable控制电缆操纵索control console 控制台control echo 控制回波control unit 控制单元control valve控制阀control valve actuator 阀控传动机构control wiring 控制线路convenience receptacle 电源插座convexity 凸面copper intensifying screens 铜增感屏core rod 芯棒corresponding 相应的cotton fibre 棉质纤维couplant 耦合剂coupling 耦合coupling losses 耦合损失coupling medium 耦合介质cr(computed radiography)计算机辅助射线成像技术cracking 破裂裂纹裂化裂解crate 板条箱柳条箱crater crack (焊接)弧坑裂纹creeping wave 爬波蠕变波critical angle 临界角cross section 横截面cross talk 串音cross-drilled hole 横孔crossed yoke 交叉磁轭crystal 晶片晶体c-scan c型扫描c扫描c-scope c型显示c-shape detector c型探测器(x射线实时成像)cubicle室,箱curie point 居里点curie temperature 居里温度curie(ci) 居里current attenuation 电流衰减current flow method 通电法电流法current induction method电流感应法current magnetization method电流磁化法cushion 垫层衬垫cut-off level 截止电平cutting切割cutting opening 切孔切开cw (continuously welded)连续焊dark room packing 暗室包装(在暗室条件下将x射线胶片装入暗盒)data logger 数据记录器datum mark基准点dead zone 盲区死区decay curve 衰变曲线decibel(db) 分贝defect 缺陷defect detection sensitivity 缺陷探测灵敏度defect evaluation zone 缺陷评定区defect resolution 缺陷分辨力definition 清晰度定义delivery 发货demagnetization 退磁demagnetization factor退磁因子退磁系数demagnetizer 退磁装置退磁器densitometer 黑度计密度计density 黑度(底片)密度density comparison strip 黑度比较片密度比较条density strip 黑度比较片密度比较条depth scan 深度扫描description 说明描述design pressure 设计压力detecting medium检验介质detergent remover洗净液去垢剂developer 显像剂显影剂developer aqueous水性显像剂developer dry 干式显象剂developer liquid film 液膜显象剂developer nonaqueous(suspend)非水(悬浮)显象剂developer station 显像工位显影台developing time 显像时间显影时间development 显影differential discriminator (电子)差动式鉴频器diffraction mottle衍射斑点衍射斑纹diffuse indications 扩散指示diffusion 扩散漫射digital detector数字探测器(x射线实时成像)digital display数字显示数显digital image acquisition system 数字图像采集系统digital radiography(dr)数字射线成像技术digital thermometer 数字温度计(用于测定胶片处理液的温度)digital timer for darkroom暗室用计时器(在暗室中可调及报警)dilatational wave膨胀波疏密波dimensional inspection 尺寸检验dip and drain station 浸渍和流滴工位浸渍与滴落台direct contact magnetization直接接触磁化direct contact method 直接接触法direct exposure imaging 直接曝光成像directional beam定向辐射(指定向辐射的工业x射线机)directivity 指向性disassembly and assembly 拆装discontinuity 不连续性distance marker 距离标志distance-gain-size dgs曲线(距离-增益-尺寸曲线)(dgs德文为avg)distribution board配电盘,配电屏dose 剂量dose equivalent 剂量当量dose meter 剂量计dose rate meter 剂量率计double crystal probe双晶探头double probe technique双探头法double skin 重皮double transceiver technique 双发双收法double traverse technique 双光路技术down lead引下线dr(digital radiography)数字射线成像技术dragout 废酸洗液drain 排水管排水沟排水道排水drain time 滴落时间排液时间draught 气流drift 漂移dry developer干式显像剂dry developing cabinet 干式显像柜dry method 干法dry powder干粉dry technique 干法drying 烘干drying oven 干燥箱干燥炉drying station 干燥工位干燥台drying time 干燥时间d-scan d型扫描d-scope d型显示dual element transducers 双晶探头双晶片换能器dual search unit 双探头双探测装置双探测器dual-focus tube 双焦点(x射线)管due date 到期日预定日期duplex wire type image quality indicator 双线型像质指示器双线像质计duplex-wire image quality indicator 双线像质指示器双线像质计duplicate part 备件duration 持续时间dwell time 停留时间dye penetrant 着色渗透剂dye penetrant examination 着色渗透检验dynamic leak test 动态泄漏检测dynamic leakage measurement 动态泄漏测量dynamic radiography 动态射线照相法dynamic range动态范围earth resistance 接地电阻earth wire接地线地线earthing device 接地装置earthing pole接地极echo回波echo frequency 回波频率echo height回波高度echo indication回波指示echo transmittance of sound pressure声压往复透过率echo width回波宽度echodynamic patterns回波动态波型eddy current 涡流涡电流eddy current coil 涡流检测线圈eddy current flaw detector涡流探伤仪eddy current probe 涡流检测探头eddy current testing 涡流检测edge 边缘棱边edge echo棱边回波edge effect 边缘效应effective depth penetration (edp)有效穿透深度有效透入深度effective focus size 有效焦点尺寸effective magnetic permeability 有效磁导率effective permeability 有效磁导率有效渗透率相对渗透率effective reflection surface of flaw 缺陷有效反射面effective resistance有效电阻elastic medium弹性介质elbow弯管接头管肘electric displacement 电位移electric force compounded grease 电力复合脂electric heat tracing 电伴随加热electric machine 电机electric pressure 电压electrical appliance 电器electrical center 电中心electrical material电气材料electrical panel配电板,配电盘electrified带电electrode电极电焊条electrolytic sliver recovery unit 电解银回收装置(从定影液中回收银)electromagnet电磁铁electro-magnetic acoustic transducer电磁声换能器electromagnetic induction电磁感应electromagnetic radiation 电磁辐射electromagnetic testing 电磁检测electro-mechanical coupling factor 机电耦合系数electron linear accelerator 电子直线加速器electron radiography 电子辐射照相术electron volt 电子伏恃electronic linear scans (e-scans) 电子线性扫描electronic noise 电子噪声electronic scanning (e-scans) 电子扫描(e-扫描)electrostatic spraying 静电喷涂e-mail电子邮件:?电子邮箱:embedded part 预埋件嵌入[埋置]部分emission count (声)发射计数emulsification 乳化emulsification time乳化时间emulsifier 乳化剂encircling coils 环形线圈end effect 端部效应端点效应end socket端头,(钢索的)封头energizing cycle 激励周期enfoldment 折迭envelope 包络包迹environment visible light 环境可见光equalizing filter 均衡滤波器平衡滤波器equipment 器材设备equivalent 当量equivalent i.q.i. sensitivity 当量象质指示器灵敏度equivalent method 当量法equivalent nitrogen pressure 等效氮压当量氮气压力equivalent penetrameter sensifivty 当量透度计灵敏度erasabl optical medium 可消光介质erection 架设etching 浸蚀腐蚀侵蚀蚀刻evaluation评定evaluation threshold 评价阈值评定阈event count事件计数event count rate 事件计数率examination 试验检验考试examination area 检验范围examination region 检验区域examine and approve审批exfoliation 剥落脱落exhaust pressure/discharge pressure 排气压力/排放压力出口压力输送压力exhaust tubulation 排气管道expanded time-base sweep 时基线展宽时基扫描扩展expansion bolt伸缩栓,扩开螺栓expansion joint 膨胀节exposure 曝光exposure and darkroom accessories曝光与暗室附件exposure chart 曝光曲线exposure fog 曝光灰雾exposure table 曝光表extended source 扩展源延长源external diameter 外径external diameter of the pipe 管子直径extra fee 额外费用?eye survey 目测fabrication 加工制造fabrication drawing制造图纸制作图fabrication tolerance制造容差facility scattered neutrons易散射中子fall off 脱落false indication 假指示虚假指示伪显示虚假显示family 族系列far field远场fast neutron detectors 快中子探测器fast/slow timing oscilloscope 带快慢调速的示波器fax传真:?fbh 平底孔(缩写)feeder 馈电线feed-through coil 穿过式线圈ferritic 铁素体的field 场(磁场、声场)field fabricated 工地制造的现场装配的field installation 现场安装field instrument 携带式仪表filament 灯丝fill factor 填充系数filler metal 焊料焊丝filler rod 焊条fillet weld 角焊填角焊filling water test 充水试验film badge 胶片剂量计film base 片基film cassette 胶片暗盒film contrast 胶片对比度film density 胶片密度,底片黑度film evaluation scope 底片评定范围film gamma 胶片γ值(胶片灰度系数)film hangers (channel type)槽式洗片架(手工洗片的一种洗片架类型)film hangers (clip type)夹式洗片架(手工洗片的一种洗片架类型)film hangers for manual processing 洗片架(手工洗片的胶片挂架)film marking equipment 胶片标记器材film processing胶片冲洗加工底片处理film processing chemicals 胶片处理药品洗片药品film speed胶片速度(胶片感光速度胶片感光度)film unsharpness 胶片不清晰度film viewer 底片评片灯观片灯底片观察用光源film viewing equipment 评片装置(观片灯)film viewing screen 胶片观察屏filter 滤波器滤光板过滤器final test 最终检验fire barriers防火间隔防火屏障fixing 固定flange 边缘轮缘凸缘法兰flange connection 凸缘联接flange gasket法兰垫片flange joint 凸缘接头flange sealing surface法兰密封面flash plate闪熔镀层flash point 闪点flat-bottomed hole 平底孔flat-bottomed hole equivalent 平底孔当量flaw 伤缺陷瑕疵裂纹flaw characterization 伤特性缺陷特征flaw echo 缺陷回波flaw height(thru-wall dimension) 缺陷自身高度(缺陷在壁厚方向的尺寸)flexible conduit 软管flexural wave 弯曲波flicker-free images 无闪烁图像floating threshold 浮动阀值floor slab 楼板flow instrument 流量计flow sheet 流程图fluorescence 荧光fluorescent dry deposit penetrant干沉积荧光渗透剂fluorescent examination method 荧光检验法fluorescent light 荧光荧光灯fluorescent magnetic particle inspection 荧光磁粉检验fluorescent magnetic powder 荧光磁粉fluorescent penetrant 荧光渗透剂fluorescent screen 荧光屏fluorography 荧光照相术fluorometallic intensifying screen 荧光金属增感屏fluoroscopy 荧光检查法flushing冲洗填缝flux 焊剂,熔化flux cored arc welding 带焊剂焊丝电弧焊flux leakage field 磁通泄漏场漏磁场flux lines 磁通线focal distance 焦距focal spot 焦点focus electron 电子焦点聚焦电子束focus length 焦点长度聚焦长度focus size 焦点尺寸聚焦尺寸focus width 焦点宽度聚焦宽度focused beam 聚焦束(声束、光束、电子束)focusing probe 聚焦探头focus-to-film distance(f.f.d) 焦点-胶片距离(焦距)fog 灰雾fog density 灰雾密度footcandle英尺烛光formula 公式foundation ring 底圈foundation settlement基础沉降freguency 频率frequency constant 频率常数fringe 干涉带干扰带条纹边缘front distance 前沿距离front distance of flaw 缺陷前沿距离full-scale value 满刻度值full-wave direct current(fwdc)全波直流fundamental frequency 基频furring 毛状迹痕毛皮fusion 熔融熔合fusion arc welded 熔弧焊gage glass 液位玻璃管gage pressure 表压表压力gain增益gamma c amera γ射线照相机(γ射线探伤机)gamma equipment γ射线设备gamma radiographyγ射线照相术gamma ray source γ射线源gamma ray source containerγ射线源容器gamma raysγ射线gamma source γ射线源γ源gamma-ray radiographic equipmentγ射线照相装置gamme ray unit γ射线机γ射线装置gap scanning 间隙扫查间隙扫描gas 气体gas cutting 气割gas shielded arc welding 气体保护焊gate 闸门gating technique 选通技术脉冲选通技术gauge board 仪表板样板模板规准尺gauss 高斯geiger-muller counter 盖革.弥勒计数器generating of arc 引弧geometric unsharpness 几何不清晰度girth weld 环形焊缝gland bolt 压盖螺栓goggles 护目镜gouging 刨削槽gray(gy) 戈瑞grazing angle 掠射角切线角入射余角grazing incidence 掠入射切线入射grind off 磨掉grinder 磨床磨工grinding wheel 砂轮片砂轮groove face (焊缝)坡口面grounding conductor 接地导体group velocity 群速度grouting 灌(水泥)浆guide wire尺度[定距]索,准绳gusset plate角撑板,加固板half life 半衰期half-value layer(hvl) 半值层半价层half-value method 半波高度法半值法half-wave current (hw)半波电流halogen 卤素halogen leak detector 卤素检漏仪hanger 吊架挂架洗片架hard hat 安全帽hard x-rays 硬x射线hard-faced probe硬膜探头硬面探头harmonic analysis谐波分析harmonic distortion 谐波畸变harmonics 谐频谐波head face 端面head wave头波heat absorbing glass 吸热玻璃heat affected area 热影响区heat exchangers 热交换器heat transfer 热传输heating boxes 加热箱helium bombing 氦轰击法helium drift 氦漂移helium leak detector氦检漏仪hermetically tight seal 气密密封密封密封装置high energy x-rays 高能x射线high frequency 高频high frequency generator高频发电机high vacuum 高真空highly sophisticated image processing 高度完善的图像处理hoisting upright column 吊装立柱holography 全息照相术(光全息、声全息)horizontal line 水平线hydrophilic emulsifier 亲水乳化剂hydrophilic remover 亲水性洗净剂亲水性去除剂hydrostatic pressure test水压试验hysteresis磁滞滞后i.f. (intermediate frequency)中频(30~3000千周/秒)iacs =international annealed copper standard国际退火(软)铜标准ice 冰ice chest 冰箱ice machine 制冰机,冷冻机iconoscope 光电摄像管id (①inside ②inside dimensions) ①内径②内部尺寸id coil, id =inside diameter 内径线圈idea概念,意见,思想ideal 理想的,想象的identical 同一的,恒定的,相同的identification 鉴定,辨别,验明identification mark识别标志identifier 鉴别器identify pulse识别脉冲idiopathetic 自发的,特发的iem (ion exchange membrane) 离子交换膜illuminance照(明)度illuminant 照明的,发光的illuminating lamp 照明灯泡illuminating loupe 放大照明镜illuminating mirror 照明镜illumination 照明的,照射illumination apparatus 照明器illumination plate 照明板illuminator①照明器,照明装置②反光镜illuminometer 照度计illustration(abbr. illus.)图解,例证,具体说明image amplifier 图像放大器,影像增强器image analysis system 图像分析系统image contrast 图像对比度影像对比image converter 影像转换器image definition 图像清晰度image enhancement 图像增强image freeze 影像冻结image intensifier 像亮化器,图像增强器image intensifier tube 影像增强管图像增强管image magnification图像放大image monitor 图像监视器image multiplier 影像倍增器image pick-up tube 摄像管image quality 图像质量image quality indication 像质指示image quality indicator (iqi)像质计像质指示器image quality indicator sensitivity 像质指示器灵敏度image reproducer 显像管,显像器image store 图像存储器image tube 显像管imager 图像仪,显像仪imagination 想象imagine 想象,推测,设想imaging line scanner 图像线扫描器图像行扫描器imaging plates(ip)成像板immediate payment 立即付款immersion 浸没,浸渍immersion probe 液浸探头immersion rinse 浸没清洗浸液清洗immersion system 浸渍装置液浸系统immersion testing 液浸试验immersion time 浸没时间浸入时间impact strength 冲击强度impacter 冲击器impedance 阻抗impedance matching 阻抗匹配impedance plane diagram 阻抗平面图impedance transducer 阻抗传感器,阻抗换能器impeller ①叶轮,转子②压缩机imperfection 不完整性缺陷imperial gallon(abbr. ip gal) 英国标准加仑(英制容量单位合4.546升)imperial quart英制夸脱import ①进口②输入import and export firm 进出口商行import border station 进口国境站名import licence position 进口许可证importation ①输入,传入②进口货impression 压迹,印模,版impression technic 印模术impression tray 印模盘impulse 冲动,搏动,脉冲impulse eddy current testing脉冲涡流检测impulse generator 脉冲发生器impulse oscilloscope 脉冲示波器impulse recorder 脉冲自动记录器impulse scaler 脉冲计数器impulse timer 脉冲计数器impulse transmitting tube 脉冲发射管impulser脉冲发生器,脉冲传感器impurity不纯,杂质in (①indium ②inch) ①铟②英寸(等于25.4毫米)in parallel 并联in phase 同相的in series 串联in toto 全,整体in vacuo 在真空中inaction 无作用inadequacy 机能不全,闭锁不全inc. (incorporated) 股份有限公司incandescent lamp 白炽灯inch(abbr.in;in) 英寸incidence ①入射,入射角②发生率incident angle 入射角incident illumination入射光incident light 入射光incident ray 入射光incidental 偶发的,非主要的inclination 倾斜,斜度inclined tube type manometer 斜管式压力计include 包括,计入inclusion 包含包埋杂质incoming line 进线口incompatible 不相容的,禁忌的incompetence 机能不全,闭锁不全inconvertible 不可逆的incorporation ①并入②公司increase 增加,增大,增长incremental permeability 增量磁导率indent 订单index ①指数,索引②指针index card 索引卡片index hand指针index signal指示信号indexer 指数测定仪,分度器indicate 指示,表明indicated defect area 缺陷指示面积indicated defect length 缺陷指示长度indicated light 指示灯indicating bell 指示铃indicating lamp 指示灯indication 指示indicator ①指示器,显示器②指针③指示剂indicator paper 试纸indicatrix指示量,指示线,特征曲线indifferent electrode 无关电极indiffusible不扩散的indirect export 间接出口indirect exposure间接曝光indirect import 间接进口indirect magnetization 间接磁化indirect magnetization method 间接磁化法indirect scan 间接扫查indium(abbr.in) 铟individual 个体的,个别的indoor 室内的induce 引起,感应,诱导induced current method 感应电流法induced electricity感生电,感应电induced field 感应磁场感生场induct 感应,引导,引入inductance 电感,感应系数inductance bridge flowmeter 感应电桥流量计inductance meter 电感测定计induction ①引导,前言②感应,电感③吸气induction apparatus 感应器induction coil 感应线圈inductive transducer 感应传感器inductogram x射线照片inductometer 电感计inductor 感应器,感应机inductorium 感应器inductosyn 感应式传感器industrial exhibition 工业展览会industrial radiographic film drye工业射线胶片干燥器industrial robot 工业机器人industrial x-ray films 工业x射线胶片industrial(abbr.indust.) 业的,产品的industry 工业,产业indutrial x-ray machin工业x射线机inert 惰性的,无效的inference推论,推断infinite无限的,无穷的infinitesimal 无限小的,无穷小的infinity 无穷大,无限,无限距inflame 燃,着火inflammable燃的,易燃的inflation 膨胀,充气,打气inflator 充气机inflow 流入,吸入,进气influence影响,感应influx 流入,注入inform 报告,通告,告诉information 情报,资料,消息,数据information generator 信息发送器information storage unit信息存储器infra-下,低于,内,间infranics 红外线电子学infrared ①红外线的②红外线infrared detector红外线探测器infrared drier 红外线干燥器infrared equipment 红外线设备infrared furnace 红外线炉infrared gas analyzer 红外线气体分析仪infrared heater红外线加热器infrared imaging system 红外成象系统infrared lamp红外线灯infrared laser 红外激光器infrared light 红外线infrared liner polarizer 红外线直线偏振镜infrared photography 红外摄影术infrared radiation 红外线照射infrared radiator 红外线辐射器infrared rays 红外线infrared sensing device 红外传感装置infrared spectrophotometer 红外分光光度计infrared thermography红外热成象红外热谱infrasonic frequency 次声频infrequent稀有的,不常见的inherent 生来的,固有的,先天的inherent filtration 固有滤波inherent fluorescence 固有荧光inheritance 遗传,继承inhibition抑制,延迟,阻滞inhibitor 抑制剂抑制器inhomogeneous 不纯的,不均匀的in-house自身的,内部的initial 开始的,最初的initial charge 起始电荷initial data原始数据initial permeability 起始磁导率初始磁导率initial pulse 始脉冲initial pulse width 始波宽度始脉冲宽度initiator①创造人②引发剂injection 注射,喷射injection syringe注射器injector 注射器,喷射器injector pump 注射泵injury 伤,损伤,损害ink 墨水,油墨ink jet printer 墨水喷射印刷机,喷水式打印机ink jet recorder 墨水喷射记录器ink writer印字机ink writing oscillograph 记录示波仪inlay嵌体,嵌入inlead 引入线inlet 入口,入线,输入inlet port入口inner 内部的innocuous 无害的,良性的innovation 革新,改革innumerable 无数的,数不清的ino- 纤维inoperative 无效的,不工作的inorganic 无机的inorganic chemistry 无机化学inosculation 吻合,联合in-out box 输入-输出盒input 输入,输入电路input buffer 输入缓冲器input coupler 输入耦合器input device输入装置input filter 输入滤波器input impedance输入阻抗input output adapter 输入-输出衔接器input tranformer 输入变压器inscription 标题,注册insert ①插入物,垫圈②插入,植入insert tube嵌入式x射线管inserted coil 插入式线圈inserter 插入器,插入物insertion 插入inset 插页,插图,插入inside内部,内侧,在……里面inside coil 内部线圈inside-out testing 外泄检测泄出检测insignificant 无意义的,轻微的insolation 曝晒,日照insoluble 不溶解的inspection 检查检验inspection 验收,检查,商检inspection certificate 检验证明书inspection fee 检验费inspection frequency 检测频率inspection machine 检验设备inspection medium 检查介质检验介质inspection standard 检验标准inspector①测定器②检验员inspectoscope检查镜inspissator 浓缩器,蒸浓器instability 不稳定性install 安装,装置installation①安装②装置,设备installation fundamental circle 安装基准圆installing 安装,插入instance 例证,实例,情况instantaneous value瞬时值,即时值instead代替,更换instillation 滴注法,灌注institute 学会,协会,研究所institution 机关,机构,学校,制度instruction ①指示,命令②说明,说明书instruction counter 指令计数器instrumenent repairing table器械修理台instrument 仪器,器械,仪表instrument air仪表气源instrument board 仪表板instrument cabinet 器械柜instrument carriage 器械车instrument case 器械箱instrument cover 仪器外表instrument cupboard 器械柜instrument light 仪表信号灯instrument lubricant 器械润滑剂instrument rack器械架仪器架instrument stand 仪器架instrument table 器械台,器械桌instrumental error 仪器误差instrumentation ①器械,设备②器械操作法insulant 绝缘材料insulated cable 绝缘电缆insulated sleeve 绝缘套管insulating oil 绝缘油insulation绝缘,绝热,隔离insulation resistance 绝缘电阻insulator 绝缘体,绝热体insullac 绝缘漆insusceptible 不受……影响的,不接受……的intact 完整的,未受损伤的integral ①积分(的)②完整的integraph 积分仪integrated circuit microelectrode集成电路微电极integrated circuit storage集成电路存储器integrated circuit(abbr.ic) 集成电路integrating dosimeter 累计剂量仪integrating instrument 积分仪,积算仪表integrator 积分仪integrogram 积分图integronics 综合电子设备intellect智力,才智intensifier①增强器②照明装置intensifying factor增感系数intensifying screen增感屏intensimeter x射线强度计intensionometer x射线强度量intensity强度intensity level①强度级(声音)②亮度intensity output声强输出intensive 加强的,集中的,重点的inter- 在……中间,内,相互interaction 相互影响,相互作用,干扰interception 相交,折射(光)interchange 交替,交换interchanger 交换器intercondenser中间电容器intercooler 中间冷却器interdiction 禁止,制止interest 兴趣,关心,注意,利益interesting 有趣的interface (计算机)接口界面interface boundary界面interface echo 界面回波interface trigger 界面触发interfacial tensiometer 界面张力计interfacial tension 界面张力interference 干涉interference absorber 干扰吸收器interference filter①干涉滤波器②干涉滤光镜interference preventer 防干扰装置interference refractometer 干涉折射计interference spectroscope 干涉分光镜interferogram 干涉图interferometer 干涉仪,干扰计interferoscope 干涉镜interior 内部,内部的interior angle welding line joint 内侧角焊缝接头interlayer 夹层隔层intermediate frequency(abbr.i.f.) 中频(300~3000千周/秒)intermission 间断间歇internal energy 内能internal exposure 体内照射internal gauge 内径规international candle 国际烛光international fair 国际博览会international market 国际市场international standard 国际标准international treaty 国际条约international unit(abbr. i.u) 国际单位international(abbr.int.) 国际的,世界的interphase 界面界面interpolation插入,内插法interpretation翻译,解释,说明interpretation解释interpreter 翻译程序,翻译机interrupt 断续,中断interrupter 断流器,断续器interspace空间,间隙,中间interstage amplifier 级间放大器inter-sync 内同步interval 间隔,时间间隔,中断期interval arrival time (δtij) 到达时间差interval timer 限时器intervalometer 定时器,时间间隔计intra- 在内,内,内部intrasonic 超低频intro- 入口,在内introduce①引进,引导②前言,绪论introduction说明书,前言,intromission 插入,输入introscope内腔检视仪,内孔窥视仪invagination 凹入,折入,套叠invasive 侵害的,侵入的invention 发明,创造inventor 发明者,创造者inventory①清单,存货单②设备,机器inversion 转换,逆转inverted cone 倒锥形inverted image倒像inverter 倒相器,交换器,换流器inverting amplifier 倒相放大器inverting eyepiece倒像目镜invest 包埋,围模,附于investigation ①调查,研究②调查报告invisible light filter 不可见光滤光镜invisible spectrum 不可见光谱involuntary 不随意的,偶然的。
无损检测单词表
基于表面增强拉曼光谱的巴旦木氧化程度快速检测
钱玉,刘帅,金龙,等. 基于表面增强拉曼光谱的巴旦木氧化程度快速检测[J]. 食品工业科技,2023,44(24):286−293. doi:10.13386/j.issn1002-0306.2023020173QIAN Yu, LIU Shuai, JIN Long, et al. Rapid Detection of the Oxidation of Almonds Based on Surface Enhanced Raman Spectroscopy[J]. Science and Technology of Food Industry, 2023, 44(24): 286−293. (in Chinese with English abstract). doi:10.13386/j.issn1002-0306.2023020173· 分析检测 ·基于表面增强拉曼光谱的巴旦木氧化程度快速检测钱 玉1,刘 帅1,金 龙2,孙 美2,颜 玲1,刘长虹1,董保磊1, *,郑 磊1,*(1.合肥工业大学食品与生物工程学院,安徽合肥 230031;2.洽洽食品股份有限公司,安徽合肥 230031)摘 要:氧化程度对巴旦木营养和品质具有重要的影响,本研究的目的是建立一种灵敏、可靠的巴旦木氧化程度快速检测方法。
本研究首先通过表面配体交换的转相策略实现了水溶液中分散的金纳米粒子(AuNPs )快速、简便地向非极性的甲苯溶液中的转相。
UV-Vis 和透射电镜等表征结果表明转相后的AuNPs 的纳米形貌未发生明显的变化,可成功作为表面增强拉曼光谱(SERS )基底用于巴旦木油脂氧化程度的检测。
结果表明,巴旦木油脂位于1655 cm −1处的顺式双键的特征拉曼信号在氧化过程中逐渐减弱;选择酯键的1747 cm −1作为参比信号,其特征峰的相对强度I 1655/I 1747值与巴旦木的加速氧化时间呈良好线性关系(R 2=0.98),SERS 光谱结果结合主成分分析法可以用于实际巴旦木样品氧化程度的快速判定和分类。
人脸识别技术研究本科毕业论文
除了以上应用外,人脸识别技术还可以用于视频会议、机器人的智能化研究等方面。尤其从美国9.11事件后,人的身份识别问题更是提升到了国家安全的角度,如何利用人脸信息迅速确定一个人的身份成了各个国家重点研究的技术。
Abstract
Face recognition has very lagre academic and praetieal values. In daily lief,people kowing each other uses at most of person’s face.Face is the most familiar model in human vision.The visual inofmration refleeted by face has important meaning and impact between people’s intercommunion and intercourse. Because of its extensive and applied realm,face recognition technique has got the extensive concern with study in near three decades and become the most potential method of identity recognition. At the same time,it is difficult to implement face recognition using computers. First,human face is a deformable object composed of complex 3D curve surfaces,Which is hard to be represented in form of mathematics. Secondly faces of different persons have the similar strueture,and the face images are greatly dependent on ages and photography conditions.This paper mainly study face extraction and class method,which concept can be summarized as ofllows.
PreSens Precision Sensing GmbH氧浸入式探头说明书(PSt3 PSt
Oxygen Dipping ProbePSt3 / PSt6 / PSt9Specification:Oxygen dipping probe with high grade stainless steel fitting for normal / trace / ultra-low oxygen range Document filename: IM_DP-PSt3_PSt6_PSt9_dv2All rights reserved. No parts of this work may be reproduced in any form or by any means - graphic, electronic, or mechanical, including photocopying, recording, taping, or information storage and retrieval systems - without the written permission of the publisher.Products that are referred to in this document may be either trademarks and/or registered trademarks of the respective owners. The publisher and the author make no claim to these trademarks.While every precaution has been taken in the preparation of this document, the publisher and the author assume no responsibility for errors or omissions, or for damages resulting from the use of information contained in this document or from the use of programs and source code that may accompany it. In no event shall the publisher and the author be liable for any loss of profit or any other commercial damage caused or alleged to have been caused directly or indirectly by this document.Specifications may change without prior notice.ManufacturerPreSensPrecision Sensing GmbH Am BioPark 1193053 Regensburg, GermanyPhone +49 941 94272100Fax +49 941 94272111***************www.PreSens.deTable of Contents1Preface (7)2Safety Notes (8)3Description of the Oxygen Dipping Probe (9)3.1Scope of Delivery (10)3.2Measurement Set-up (11)3.2.1Underwater Applications (11)3.2.2Gas Phase Applications (12)4Operation (13)4.1Calibration (13)4.1.1Calibration of a DP-PSt3 – Preparation of Calibration Standards (13)4.1.2Calibration of a DP-PSt6 – Preparation of Calibration Standards (15)4.1.3Calibration of a DP-PSt9 – Preparation of Calibration Standards (16)4.2Performance Proof (17)5Technical Data (18)6Concluding Remarks (19)7DP-PSt3/PSt6/PSt9 Preface1 PrefaceYou have chosen a new, innovative technology for measuring oxygen.Chemical optical sensors (also called optodes) have several important features:They are small.Their signal does not depend on the flow rate of the sample.They can be physically divided from the measuring system which allows a non-invasive measurement.They can be used in disposables.Therefore, they are ideally suited for the examination of small sample volumes, for highlyparallelized measurements in disposables, and for biotechnological applications.A set of different minisensors, flow-through cells and integrated sensor systems is available tomake sure you have the sensor which matches your application.Please feel free to contact our service team to find the best solution for your application.Your PreSens TeamPLEASE READ THE FOLLOWING INSTRUCTIONS CAREFULLY BEFORE WORKINGWITH THIS ITEM.DP-PSt3/PSt6/PSt9 Safety Notes82 Safety Notes!It is the customer’s responsibility to validate the sensor under end-user conditionsaccording to safety precautions of the application to ensure that the use of the sensor issafe and suitable for the intended purpose.PreSens is explicitly not liable for direct or indirect losses caused by the application of thesesensors. In particular it has to be considered that malfunctions can occur due to the naturallylimited lifetime of the sensor depending on the respective application. The set-up of backupmeasurement stations is recommended when using the sensors in critical applications toavoid consequential losses. It is the customer’s responsibility to install a suitable s afetysystem in the event of sensor failure.3 Description of the Oxygen DippingProbeOxygen dipping probes measure the partial pressure of both gaseous and dissolved oxygen. They consist of a polymer optical fiber (POF) with a polished distal tip which is coated with a planar oxygen sensitive foil. Oxygen dipping probes are available with sensor coatings type PSt3 (detection limit 15 ppb, 0 - 100 % oxygen), type PSt6 (detection limit 1 ppb, 0 - 4.2 % oxygen), and PSt9 (detection limit 0.5 ppm, 0 - 200 ppm). The end of the polymer optical fiber is covered with a high-grade steel tube to protect both the sensor material and the POF. Thecable has an outer diameter of 2.8 mm. The inner diameter of the POF is 2.0 mm. The steel tube has an outer diameter of 4 mm. Usually the fiber is coated with an optical isolated sensor material in order to exclude ambient light from the fiber tip and to increase chemicalresistance especially against oily samples as well as to reduce biofouling on the sensor membrane. This type of oxygen sensor has excellent long-term stability.Fig. 1 Oxygen dipping probe; insert: enlarged view ofsensor coating Fig. 2 Schematic illustration of an oxygen dipping probeDipping probe features:No polarization necessaryNo membrane cleaning and replacement necessaryNo electrolyte solutions to poison or replenishLong shelf-lifePressure resistant up to 3 bar3.1 Scope of DeliveryThe oxygen dipping probe is delivered with a protective rubber cap on the distal end of the steel fitting to protect the sensor coating.!Please remove the protective rubber cap before inserting the dipping probe in your sample.Additionally required equipment (not supplied):Fiber optic oxygen transmitter Fibox 4 / Fibox 4 trace (more oxygen transmitters canbe found on www.presens.de/products/o2/meters.html)PC / Notebook3.2 Measurement Set-upConnect the dipping probe’s polymer optical fiber to the sensor connector of the fiber optic oxygen meter (e. g. Fibox 4 trace). Then remove the protective rubber cap from the steel fitting and insert the dipping probe in your sample.3.2.1Underwater ApplicationsFor underwater applications specially designed weights for dipping probes are available, which keep the probe in a stable, fixed position while it is submerged. For more information please see the Sensor Probe Accessories instruction manual (IM_SP_Acc).Fig. 3 Set-up for measurement with an oxygen dipping probeFig. 4 Dipping Probe with attached DP-Weight for under water use.3.2.2 Gas Phase ApplicationsFor applications in the gas phase, especially when working with gas pipelines the oxygen dipping probe can be integrated in a Swagelok T-cell. The metal T-connector with oxygen probe (FTCM) can easily be integrate in pipes with o. d. 6 mm (or other diameter, when using the respective adapter). Gases (or liquids) can be pumped through the cell and precise oxygen measurements conducted.Fig. 5 Dipping probe (top) integrated in Swagelok T-cell (FTCM)4 Operation!Please note that oxygen dipping probes (DP) are NOT autoclavable – unlike the oxygen probes for inline measurements (OIM) – as the polymer optical fiber does not stand high temperatures.Maximum temperature for a standard dipping probe is 80 °C. However, a hightemperature version is available which stands temperatures up to 110 °C. In case the dipping probe must be exposed to temperatures > 80 °C please contact our serviceteam.4.1 CalibrationThe oxygen dipping probe has to be calibrated before use. A conventional two-point calibration in oxygen-free environment (nitrogen / CO2, or sodium sulfite), and air saturated (sensor type PSt3), 1 – 2 % oxygen (sensor type PSt6), or 100 – 200 ppmv oxygen (sensor type PSt9) environment has to be performed.A recalibration is recommended after 100,000 measurement points or a period of 3 months, whichever is reached earlier.Please see the respective transmitter instruction manual for more detailed information about software settings and calibration procedure.4.1.1 Calibration of a DP-PSt3 – Preparation ofCalibration Standards1st Calibration Point:In Liquid: Oxygen-free waterTo prepare oxygen-free water dissolve 1 g of sodium sulfite (Na2SO3) and 50 µLcobalt nitrate (Co(NO3)2) standard solution (ρ(Co) = 1000 mg/L; in nitric acid 0.5mol/L) in 100 mL water. Use a suitable vessel with a tightly fitting screw top and label it cal 0. Make sure there is only little headspace in your vessel. Due to a chemicalreaction of oxygen with the Na2SO3 the water becomes oxygen-free. Additionaloxygen, diffusing from air into the water, is removed by surplus Na2SO3. Close thevessel with the screw top and shake it for approximately one minute to dissolveNa2SO3 and to ensure that the water is oxygen-free. To prepare oxygen-free wateryou also can use sodium dithionite (Na2S2O4).Place the oxygen dipping probe in the vessel with cal 0.To minimize the responsetime, slightly stir the solution. Then follow the instructions in the respective transmitter manual for calibration. After recording the first calibration point remove the dippingprobe from the calibration solution cal 0, and rinse it with distilled water. Repeat thisprocedure at least 5 times to clean the probe from sodium sulfite.For storing the calibration solution cal 0 keep the vessel closed after calibration with a screw top to minimize oxygen contamination. The shelf life of cal 0 is about 24 hours provided that the vessel has been closed with the screw top.In Humid Gases: Nitrogen-saturated atmosphereUse nitrogen-saturated atmosphere as calibration standard cal 0. Use a commercially available test gas N2(5.0) (suppliers are e. g. Air Liquide, Linde Westfalen AG). Leadthe gas into a vessel filled with distilled water before feeding it into the calibrationvessel with the dipping probe (see Fig. 6). Then follow the instructions in therespective transmitter manual.In Dry Gases: Nitrogen-saturated atmosphereUse nitrogen-saturated atmosphere as calibration standard cal 0. Use a certified test gas N2(5.0) (suppliers are e. g. Air Liquide, Linde Westfalen AG). Lead the gasdirectly into the calibration vessel with the dipping probe in it (see Fig. 7). Then follow the instructions in the respective transmitter manual.2nd Calibration Point:In Liquid: Air-saturated waterAdd 100 mL water to a suitable vessel and label it cal 100. To obtain air-saturatedwater, blow air into the water using an air-pump with a glass-frit (air stone), creating a multitude of small air bubbles, while stirring the solution. After 20 minutes, switch ofthe air-pump and stir the solution for another 10 minutes to ensure that the water isnot supersaturated.Place the oxygen dipping probe in the vessel with cal 100.To minimize the response time, slightly stir the solution. Then follow the instructions in the respective transmitter manual for calibration.In Humid Gases: Water vapor-saturated air or 20.9 % O2Use water-vapor saturated air as calibration standard cal 100. Place wet cotton woolin a vessel with a fitting screw top or lid.For inserting dipping probe (and the temperature sensor) into the vessel you mighthave to drill holes in the lid. Introduce the dipping probe and wait about 2 minutes toensure that the air is water vapor-saturated.Alternatively, you can use a certified test gas O2(20.9) (suppliers are e. g. Air Liquide, Linde Westfalen AG). Lead the gas into a vessel filled with distilled water beforefeeding it into the calibration vessel with the dipping probe (see Fig. 6). Then followthe instructions in the respective transmitter manual for calibration.In Dry Gases: 20.9 % O2Leave the dipping probe in ambient air (or certified test gas O2(20.9); suppliers are e.g. Air Liquide, Linde Westfalen AG) . Then follow the instructions in the respectivetransmitter manual.4.1.2 Calibration of a DP-PSt6 – Preparation ofCalibration StandardsCalibration of a DP-PSt6 is performed with certified gases (suppliers are e. g. Air Liquide, Linde, Westfalen AG).1st Calibration Point:In Humid Gases: Nitrogen- or CO-saturated atmosphereUse nitrogen or CO2 (N2 / CO2 5.0) as a first calibration standard cal 0.Lead the gas into a vessel filled with distilled water before feeding it into thecalibration vessel with the dipping probe (see Fig. 6). Then follow the instructions inthe respective transmitter manual.In Dry Gases: Nitrogen- or CO-saturated atmosphereUse nitrogen or CO2 (N2 / CO2 5.0) as a first calibration standard cal 0.Lead the gas directly into the calibration vessel with the dipping probe in it (see Fig.7). Then follow the instructions in the respective transmitter manual.2nd Calibration Point:(humidified gas)In Humid Gases: 1 – 2 % OThe second calibration value cal 2nd for a PSt6 sensor is ideally in the rangebetween 5 and 10 % air sat. (ca. 1 – 2 % O2→ % air sat. = % O2 x 100/20.95). Use a commercially available test gas of 1 – 2 % O2 as a second calibration standard cal2nd.Lead the gas into a vessel filled with distilled water before feeding it into thecalibration vessel with the dipping probe (see Fig. 6). Then follow the instructions inthe respective transmitter manual.In Dry Gases: 1 – 2 % O2Use a commercially available test gas of 1 – 2 % O2 as a second calibration standard cal 2nd.Lead the gas directly into the calibration vessel with the dipping probe in it (see Fig.7). Then follow the instructions in the respective transmitter manual.If it is not possible to use gases or to build a suitable calibration chamber, a manual calibration can be performed, using calibration values obtained from the final inspection protocol delivered with the dipping probe. You can find more information about manual calibration in the instruction manual of the respective transmitter.4.1.3 Calibration of a DP-PSt9 – Preparation ofCalibration StandardsA PSt9 sensor can only be calibrated with dry gases. Calibration is performed with certified gases (suppliers are e. g. Air Liquide, Linde, Westfalen AG).1st Calibration Point:Use nitrogen-saturated atmosphere as calibration standard cal 0. Use a certified test gas N 2(6.0), and lead the gas directly into the calibration vessel with the dipping probe in it (see Fig. 7). Then follow the instructions in the respective transmitter manual. 2nd Calibration Point:Use a certified test gas of 100 – 200 ppmv O 2 as calibration standard cal 2nd , and lead the gas directly into the calibration vessel with the dipping probe in. Then follow the instructions in the respective transmitter manual.If it is not possible to use gases or to build a suitable calibration chamber, a manual calibration can be performed, using calibration values obtained from the final inspectionFig. 6 Calibration set-up: Two-point calibration of a dipping probe with humid gasesprotocol delivered with the dipping probe. You can find more information about manual calibration in the instruction manual of the respective transmitter.4.2 Performance ProofIf you want to prove the sensor performance during the past measurement, please check the calibration values by inserting the sensor in the cal0 and cal2nd calibration standards (see chapter 3.1) when you have finished your measurement. If the device shows 0% air saturation immersing the sensor tip into cal0 and the respective oxygen concentration for the cal2nd standard, the sensor worked perfectly throughout the whole measurement.Fig. 7 Calibration set-up: Two-point calibration of a dipping probe with dry gases18DP-PSt3/PSt6/PSt9 Technical Data5 Technical DataSpecifications Gaseous &Dissolved O2Dissolved O2Gaseous &Dissolved O2Dissolved O2Gaseous O2Measurement range 0 – 100 % O20 – 1000 hPa0 – 45 mg/L0 – 1400 µmol/L0 – 4.2 % O20 – 41.4 µmol/L0 – 1.8 mg/L0 – 56.9 µmol/L0 – 200 ppmLimit of detection 0.03 % O215 ppb 0.002 % O2 1 ppb 0.5 ppmResolution ± 0.01 % O2 at0.21 % O2± 0.1 % O2 at20.9 % O2± 0.1 hPa at2 hPa± 1 hPa at207 hPa ± 0.14 µmol/L at2.83 µmol/L± 1.4 µmol/L at238.1 µmol/L± 0.0007 % O2 at0.002 % O2± 0.0015 % O2 at0.2 % O2± 0.007 hPa at0.023 hPa± 0.015 hPa at2.0 hPa± 0.010 µmol/L at0.03 µmol/L± 0.020 µmol/L at2.8 µmol/L10 ± 0.5 ppm100 ± 0.8 ppm200 ± 1.5 ppmAccuracy ± 0.4 % O2 at 20.9 % O2± 0.05 % O2 at 0.2 % O2± 1 ppb or ± 3 %; whichever is higher ± 2 ppm or ± 5 %;whichever ishigherMeasurementtemperature range0 to +50 °C 0 to +50 °C 0 to +40 °CResponse time(t90)< 6 sec. < 40 sec. < 6 sec. < 40 sec. < 3 sec. PropertiesCompatibility Aqueous solutions, ethanol, methanol Gas phase onlyNo cross-sensitivity with pH 1 – 14CO2, H2S, SO2Ionic speciesCO2, SO2Cross-sensitivity Organic solvents, such as acetone, toluene, chloroform or methylene chloride Chlorine gas Organic vapor, Chlorine gasSterilization procedure Ethylene oxide (EtO)Gamma irradiation-Cleaning procedure 3 % H2O2Acidic agents (HCl, H2SO4), max. 4 – 5 % at room temperature-Calibration Two-point calibration with oxygen-freeenvironment (nitrogen, sodium sulfite)and air-saturated environment Two-point calibration in oxygen-freeenvironment (nitrogen) and a secondcalibration value optimally between 1and 2 % oxygenTwo-pointcalibration inoxygen-freeenvironment(nitrogen 6.0) anda secondcalibration valueoptimally between100 and 200 ppmgaseous oxygenStorage Stability 2 years provided the sensor material is stored in the dark (-10 to +60 °C)19DP-PSt3/PSt6/PSt9 Concluding Remarks6 Concluding RemarksDear Customer,With this manual, we hope to provide you with an introduction to work with the oxygen dippingprobes type PSt3, PSt6 and PSt9.This manual does not claim to be complete. We are endeavored to improve and supplementthis version.We are looking forward to your critical review and to any suggestions you may have.You can find the latest version at www.PreSens.de.With best regards,Your PreSens TeamManufacturerPreSensPrecision Sensing GmbHAm BioPark 1193053 RegensburgGermanyPhone +49 941 94272100Fax +49 941 94272111***************www.PreSens.de© 2016 PreSens Precision Sensing GmbHwww.PreSens。
DETECTOR OF GAS COMPONENT IN SPACE INSIDE PACKAGE
专利名称:DETECTOR OF GAS COMPONENT IN SPACE INSIDE PACKAGE发明人:ION BARUSU,BUIRII HOFUAA,ANTOWAANU GANIEBIN申请号:JP31259590申请日:19901116公开号:JPH03176636A公开日:19910731专利内容由知识产权出版社提供摘要:PURPOSE: To detect a gas component with high reliability by providing the diaphragm covering the detection surface of the membrane of a sensor or the surface of the sensor to protect the same from spraying or sputtering. CONSTITUTION: Each package P is temporarily fixed to a holder 10 and a hollow needle 11 bores a hole in the part PF of the package P. The needle 11 has two channels 111, 112 and compartment 15 is connected to the channel 111 and a sensor (current sensor) 17 is arranged within the compartment 15. Inert gas (N2 ) is sent from a source 19 through a guide line 151 and introduced into the part of the apparatus to remove internal gas. A substitution liquid (water) is supplied to the internal space S of the package P from a source 16 through the channel 12 to substitute the gas in the space S with the substitution liquid of which the vol. is equal to that of the gas. A diaphragm 14 is arranged in the compartment 15 so as to leave an interval from the membrane 170 of a sensor 17 to protect the sensor 17 or the detection surface thereof from the separation or adhesion of the liquid without substantially obsturcting the passage of gas.申请人:OOBISUFUEA LAB NUUSHIYATERU SA更多信息请下载全文后查看。
EN)21电热测定矿物和陶瓷材料中的硼-04
Analytica Chimica Acta 501(2004)103–111Electrochemical determination of boron in mineralsand ceramic materialsA.Doménech-Carbóa ,∗,S.Sánchez-Ramos a ,b ,D.J.Yusá-Marco a ,M.Moya-Moreno a ,J.V .Gimeno-Adelantado a ,F.Bosch-Reig aa Departament de Qu´ımica Anal´ıtica,Universitat de València,Dr.Moliner 50,46100València,Spain bEscuela Superior de Cerámica de Manises,Ceramista Alfons Blat s/n,46940Manises,Valencia,Spain Received 10June 2003;received in revised form 16September 2003;accepted 18September 2003AbstractA method for quantitatively determining boron in minerals and ceramic materials is described.It is based on the abrasive attachment of mixtures of ZnO plus sample to PIGEs.After a reductive deposition step,square wave voltammograms recorded for those modified electrodes immersed into 0.10M NaCl +0.25M mannitol provide well-defined stripping peaks at −0.85and −0.15V vs.AgCl/Ag for the oxidation of Zn and B,respectively.The quotients between the peak areas and the peak currents for the stripping oxidation of B and Zn vary linearly with the molar ratio of B and Zn in the mixture,thus providing an electrochemical method for determining the boron content in solid samples.Results for boron-containing minerals and ceramic frits are in excellent agreement with those obtained by a potentiometric reference method.©2003Elsevier B.V .All rights reserved.Keywords:Ceramic materials;Boron;Electrochemical1.IntroductionBoron compounds are used in the manufacture of a va-riety of industrial products including ceramic materials.Boracic raw materials are employed in the manufacture of ceramic frits as well as additives in glazes.Although there are over 150boron minerals identified,the most im-portant boron minerals of commercial interest in ceramic industry are borax (Na 4B 4O 5(OH)4·8H 2O),colemanite (CaB 3O 4(OH)3·H 2O),ulexite (NaCaB 5O 6(OH)6·5H 2O),kernite and hydroboracite [1].Apart from these minerals,a significant amount of boron compounds is also produced from boron-rich lakes [2].The determination of boron in raw materials and ceramic products can be achieved by means of different analytical techniques.Thus,methods for determining boron in ceramic materials by flame atomic absorption spectrometry (AAS)[3]and in minerals by inductive coupled plasma-atomic emission spectrometry ICP-AES [4]have been reported.∗Corresponding author.Tel.:+34-963864533;fax:+34-963864436.E-mail address:antonio.domenech@uv.es (A.Dom´e nech-Carb´o ).UV-Vis spectrophotometry has been applied in minerals [5]as well as ceramics [6].X-ray fluorescence is the most reliable and precise technique employed in ceramic laboratories for the quan-titative analysis of raw materials and manufactured prod-ucts [7–10].The determination of the content of boron,however,presents some drawbacks,requiring an accurate control of the instrumental conditions and sample prepa-ration [11].Electrochemical techniques have been also used in the determination of boron;recent reports include the use of ion-selective electrodes [12]and voltammetry in the presence of Beryllon(III)as a ligand [13].These methodologies require the dissolution of the samples that in the most of the cases is very difficult and can be con-ditioned by the presence of interfering species and matrix effects.Analysis of solid samples is particularly uneasy for con-ventional electron microscopy techniques.Thus,neutron in-duced radiography [14]and ion beam microprobe analysis [15]have been applied to determine the boron concentration and its spatial distribution in minerals.To extent the scope of available methods for determining boron in solid samples,electrochemical methods can also0003-2670/$–see front matter ©2003Elsevier B.V .All rights reserved.doi:10.1016/j.aca.2003.09.021104 A.Dom´e nech-Carb´o et al./Analytica Chimica Acta501(2004)103–111be applied.These can be entailed in the voltammetry of mi-croparticles approach developed by Scholz et al.[16,17], based on the record of the voltammetric response of a set of solid microparticles of the analyte immobilized in an inert electrode immersed into a suitable electrolyte.This method-ology was prompted by the studies of Lamache and Bauer [18]and Brainina and Vidrevich[19]on carbon paste elec-trodes.The voltammetry of microparticles configurates a rapidly growing researchfield for which extensive reviews are available[20–23].In particular,this scheme has been previously applied for studying glass and glazed materials [24–27].The purpose of the current work is to describe an elec-trochemical procedure for the quantitation of boron from solid microsamples of boron-containing minerals and ce-ramic materials attached to PIGEs.These electrodes,de-veloped by Scholz et al.[16,17],enables for the study of small amounts(less than10−6g,if necessary)of spar-ingly soluble solids transferred by abrasion to the electrode surface.Since the exact amount of sample transferred to the electrode surface cannot be exactly measured,an addition method is proposed,using mixtures of the material and a reference compound containing an electroactive metal. The method is based on the classical scheme of stripping voltammetry[28]:a cathodic potential isfirst applied to the sample-modified electrode,and a further anodic scan yields stripping oxidation peaks of boron and the reference metal. Neglecting interelemental and matrix effects,the ratio be-tween the peak currents and/or peak areas of the stripping oxidations of boron and the auxiliary metal can provide a di-rect estimate of the boron content of the material providing that the ratio between the weights of the auxiliary compound and the boron material is known.Linear potential scan(LSV)and square wave voltamme-try(SQWV)have been used as detection modes.SQWV is of particular interest,apart from its inherently high sensi-tivity,by its immunity to charging currents.The theory of linear stripping voltammetry of immobilized reactants refers to the de Vries and Van Dalen model[29].The theory of SQWV for stripping processes has been recently treated by Lovric et al.[30–32].An application for the abrasive depo-sition of lead and mercury onto a PIGE has also been re-ported by Bond and coworkers[33].Quantitation of ceramic pigments using this methodology has also been presented [34].In this study,ZnO was selected as an auxiliary compound by the large potential separation between the stripping oxida-tion processes of boron and zinc.Calibration was performed with Li2B4O7+ZnO,Na2B4O7+ZnO,H3BO3+ZnO and LiBO2·2H2O+ZnO mixtures in HCl+mannitol andNaCl+mannitol aqueous electrolytes.The method described here has been applied to the determination of the content of boron of a series of commercial boron minerals and ce-ramic frits and its results compared with those obtained with a potentiometric reference procedure[11].Table1Composition of samples used in this work(%,w/w)Oxide Ulexite38ColemaniteKestelekColemanite38F.1 F.2 F.3B2O334.1846.4840.3 3.09.08.0 SiO2 4.61 2.93 6.259.057.058.0 Al2O30.090.010.9410.09.012.0 CaO16.6626.5124.6215.09.010.0 MgO 1.930.98 2.15 4.0– 2.0 K2O0.010.110.53 5.0 5.0 6.0 Na2O 5.82–– 4.0– 2.0 SrO0.660.720.98–––As2O30.020.010.51–––SO3–0.220.99–––Fe2O30.030.250.35–––TiO20.02–––––BaO–––– 1.0–PbO–––– 1.0–ZrO2––––9.0 2.02.Experimental2.1.Reagents and samplesLi2B4O7(Merck),Na2B4O7(Acros),LiBO2·2H2O(Pan-reac),H3BO3(Panreac),BaCl2(analaR),ZnO(Panreac), Na2CO3(Acros),KNO3(Guinama),NaOH(Probus),HCl (Sharlau),and mannitol(Merck)have been used.Solutions of NaOH used for titrations were standardized with solu-tions of potassium biphthalate(Merck).Samples were three commercial minerals,labelled as Ulexite38,Colemanite38,and colemanite Kestelek fur-nished by Manuel Pilato Blat(Cheste,Spain)and three home-made ceramic frits(F.1–F.3)prepared from typical commercial compositions.The composition of such samples is presented in Table1.2.2.InstrumentationpH-meter CRISON model Micro pH2000,muffle furnace GALLUR T max=1300◦C with regulator for the speed of temperature,disk micro-mill of tungsten carbide FRITSH pulverisette9,planetary micro-mill FRITSCH pulverisette 7,crucible of5%Au/Pt ZGS,Pt/Rh mould of30mm of diameter.Electrochemical experiments were performed at298K in a three-electrode cell under argon atmosphere.Linear scan and cyclic voltammograms(LSVs and CVs,respec-tively)and Osteryoung’s square wave voltammograms (SQWs)were obtained with a BAS CV50W equipment. Sample-modified graphite polyester composite working electrodes were dipped into the electrochemical cell so that only the lower end of the electrode was in contact with the electrolyte solution.This procedure provides an almost constant electrode area and reproducible background cur-rents.A saturated calomel reference electrode(SCE)and a platinum-wire auxiliary electrode completed the conven-tional three-electrode arrangement.A.Dom´e nech-Carb´o et al./Analytica Chimica Acta501(2004)103–1111052.3.Modified electrode preparationParaffin-impregnated graphite electrodes(PIGEs)were prepared as described in literature[22–25],and consisted on cylindrical rods of diameter5mm.The5mg of the sample were powdered in an agate mortar and then ultrasonicated for5min in a PVC vial and extended again on the agate mortar forming a spot offinely distributed material.Then,the lower end of the graphite electrode was gently rubbed over that spot of sample andfinally rinsed with water to remove ill-adhered particles.2.4.Reference method for the determination of boronIn the case of boron minerals,2.5g of porfirized and dried(at40◦C for12h)sample were accurately weighed on analytical scales with a standard error of±0.1mg,and introduced in a250ml vessel with70–80ml of10%(v/v) hydrochloric acid.The mixture was boiled for1min and left for1h in a bath at70–80◦C.The solution of the sample wasfiltered and diluted with deionized water in a250ml calibratedflask.Samples obtained from ceramic frits were dried at110◦C for2h.The0.2–0.5g of sample were weighted out,depend-ing on the foreseeable quantity of B2O3in the sample and mixed in a Pt crucible with a quantity seven times the weight of the sample of Na2CO3/KNO3(30:1)and carefully mixed with a glass rod.The mixture was heated in a muffle furnace at900◦C for10min.The sinterized sample was collected in a porcelain capsule with100ml of hot de-ionized water and filtered.The precipitate was washed in hot water.The re-sulting solution was diluted with deionized water to250ml. In the case of raw materials an aliquot of10ml of the sample in solution was used.It was boiled for a few minutes to eliminate carbonate from the solution and left to cool at ambient ing a pH-meter and the appropri-ate concentration of NaOH solution,it was taken to a pH of between2and2.5in order to speed up evaluation of residual acidity due to digestion.This was then evaluated with a0.1M NaOH standardized solution taking continual pH measurements.The titration curves and thefirst and sec-ond derivatives were drawn in order to determine the pH of residual acidity neutralization which is denoted here as pH1. The pH of the solution was adjusted to the previously determined pH1using a suitably diluted HCl solution. The3.5g of mannitol were added and the acidity due to mannitol–boric acid was evaluated with a NaOH standard-ized solution.The evaluation curve was traced,thefirst and second derivatives and the value of the equivalence volume is determined.To determine the boron in ceramic frits,an aliquot of50ml of the sample in solution was used.Some drops of methyl red and concentrated HCl until turn around were added, plus an extra drop.The solution was boiled gently for5min to eliminate carbonate and the carbonate/bicarbonate buffer. The solution was cooled and titrated potentiometrically as previously described,this time using a standardized solution of0.02M NaOH and adding6g of mannitol after taking the solution to the value of pH1.3.Description of the proposed methodLet us consider a mixture of a material with an unknown amount of boron,BX,and an addition material,MY,with a known amount of an electroactive metal,M.It is assumed that weighted amounts of both materials are accurately pow-dered and mixed so that the mass ratio between BX and MY, m BX/m MY,is known.In an electrodeposition step helding the potentials at a constant value sufficiently negative to reduce boron and M compounds,a layer of B and M will be deposited on the elec-trode surface.Assuming that no interelemental compounds are formed during the deposition of B and M,a subsequent detection step performed by scanning the potential in the positive direction must result in the appearance of stripping peaks for the oxidation of B and M.In a suitable electrolyte, both peaks can be sufficiently separated in the voltammo-grams to determine separately peak area and/or peak cur-rents.Onfirst examination,integration of the area under the stripping peaks must provide the charges passed during the stripping process of boron,q B,and M,q M.These charges must verify:q B=r B n B m BXM B(1) q M=r M n M m MYM M(2) where r B,r M represent the mass fraction of each element in the boron and reference material,respectively,m BX,m MY the masses of such materials deposited on the electrode sur-face,M B,M M the atomic masses of boron and M,respec-tively,and n B,n M denote the number of electrons involved in the stripping of each one of the metals.Although the ex-act amounts of each one of the materials deposited on the electrode surface are uncertain,it is reasonable to expect that their quotient m MY/m BX must equal the mass ratio MY and BX in the original mixture.Accordingly,the mass frac-tion of boron in the material BX can be calculated from the charges ratio asr B=r Mq Bq An Mn BM BM Mm MYm BX(3)If well-defined stripping peaks are obtained,the determina-tion of peak areas can be replaced by the measure of peak currents.In SQWV,the peak current for an irreversible strip-ping oxidation process verifies[32],i p=Hn2FSfα( E)Γ(4) where f is the square wave frequency, E the amplitude of the potential step,Γthe surface concentration(mol/cm2)of106 A.Dom´e nech-Carb´o et al./Analytica Chimica Acta 501(2004)103–111the surface-confined electroactive species,H is a constantdepending on the electrochemical conditions,and the other symbols have their customary meaning.For a stripping experiment of a mixture of BX and MY ,the ratio between the peak currents recorded for the stripping of boron and M must verify i p (B ) i p (M )=g B ΓBg M ΓM(5)where ΓB and ΓM represent the surface concentrations of boron and M,respectively.g B and g M are the two electro-chemical constants depending on the characteristics of each one of the electron transfer processes (n i ,αi ;i =B,M),the electrode area,and electrochemical parameters such as square wave frequency and,in particular,the potential and time at which the electrodeposition step preceding the de-termination one is performed.Accordingly,introducing g =g M /g B ,one can obtainr B =r M i p (B ) i p (M ) m MYm BX M M M B g (6)where g represents an electrochemical “coefficient ofresponse”,characteristic of the electrochemical conditions of deposition and determination.A similar relationship must apply substituting the peak current ratio by the quotient between the peak areas,A (B)/A (M).The application of this method requires that the stripping processes of B and M take place at separated potentials and that no intermetallic effects occur.Zinc appears to accom-plish such requirements because:(i)the stripping of zinc occurs at potentials separated above 500mV from those at which the stripping of boron occurs (see below)and (ii)as far as we know,no interelemental effects between boron and zinc have been reported.The auxiliary material was ZnO characterized by:(a)good adherence to graphite electrodes;(b)a well-defined electrochemical response in contact with aqueous electrolytes;(c)ease of manipulation and powder-ing.Obviously,the samples must be free from other de-positable metals;in particular,the presence of copper,that interacts strongly with Zn,can influence notably the voltam-metric record.4.Results and discussion 4.1.General voltammetric patternFig.1illustrates the cyclic voltammetric response in 0.10M NaCl +0.25M mannitol of PIGEs modified by:(a)ZnO and (b)Li 2B 4O 7.Upon application of a potential scan in the cathodic direction,a reduction peak (C 1)appears near to −0.70V for ZnO followed by a increasing current.In the subsequent anodic scan,a weak stripping oxidation peak at −0.9V (A 1)appears.This peak is enhanced on pro-longing the potential to values more negative than −1.0V .The overall reduction of solid(s)ZnO can be representedasFig. 1.Cyclic voltammograms of PIGEs modified by:(a)ZnO;(b)Li 2B 4O 7,immersed into 0.10M NaCl +0.25M mannitol.Potential scan rate 100mV/s.ZnO (s )+2H ++2e −→Zn (s )+H 2O(7)resulting in the deposition of Zn metal on the electrode sur-face,further oxidized to Zn 2+in solution phase (process A 1):Zn (s )→Zn 2++2e −(8)For Li 2B 4O 7,the CVs show a main reduction peak near to −0.60V (C 2),followed by anodic peaks at −0.30(A 2)and +0.15V (A 3).Similar responses were obtained for H 3BO 3,LiBO 2·2H 2O,Na 2B 4O 7and commercial samples of cole-manite and ulexite.This response results probably from the superposition of different electrode processes that,in agreement with literature concerning the electrochemistry of solids [20–23],can be associated to:(a)differences in the size distribution of particles;(b)coexistence of different structural arrangements of boron centres,namely,trigonal and tetrahedral units;(c)the superposition of different elec-trode mechanisms;roughly,via solid state processes or via solution intermediates.As a result,different steps of nucle-ation and growth of boron can take place,thus resulting in the formation of different deposits,which subsequently ex-perience different stripping processes in anodic scan voltam-mograms.The overall electrode reduction process can be represented for Li 2B 4O 7asLi 2B 4O 7(s )+14H ++12e −→4B (s )+2Li ++7H 2O(9)whereas the stripping oxidation of boron can be described byB (s )+3H 2O →H 3BO 3+3H ++3e −(10)A.Dom´e nech-Carb´o et al./Analytica Chimica Acta501(2004)103–111107Fig.2.SQWVs of:(a)ulexite38;(b)colemanite38;(c)sample F.2, attached to PIGEs and immersed into0.10M NaCl+0.25M mannitol. Potential scan initiated at−0.85V after an electrodeposition step at that potential during60s.Potential step increment4mV,square wave amplitude25mV,frequency15Hz.For our purposes,the main objective is the obtention of a ‘clean’stripping peak for the oxidation of such deposits of boron.This can be obtained by adding mannitol.It is well known that polyalcohols form relatively strong complexes with boric acid in solution phase.The formation of such complex can favour the stripping oxidation of boron.In fact, upon addition of mannitol the anodic portion of voltammo-grams becomes well defined resulting in the appearance of two tall peaks A2and A3as illustrated in SQWVs depicted in Fig.2for ulexite38,colemanite38andF.2.Fig.3.Square wave voltammograms performed on PIGEs modified by different ZnO+Li2B4O7mixtures in0.10M NaCl+0.25M mannitol. m BX/m ZnO equal to:(a)2.110;(b)0.650;(c)0.312;(d)0.078.Potential scan initiated at−1.05V after an electrodeposition step of60s at that potential.Potential step increment4mV,square wave amplitude25mV, frequency15Hz.As shown in Fig.3,square wave voltammograms of ZnO+Li2B4O7mixtures presented a two-peak profile with well-separated peaks A1(stripping of Zn),A2and A3(strip-ping of B).The peaks obtained in such mixtures are identical to those obtained in blank experiments performed at PIGEs108 A.Dom´e nech-Carb´o et al./Analytica Chimica Acta 501(2004)103–111-1000-800-600-400-2000log f(Hz)E p (m V )Fig.4.Representation of the peak potential vs.log f in SQWVs for thestripping oxidation peaks A 1and A 2in 0.10M NaCl +0.25M mannitol.PIGEs modified by ZnO and Li 2B 4O 7.Potential scan initiated at −1.25V after an electrogeneration step of 30s at that potential.Potential step increment 4mV ,square wave amplitude 25mV .modified by ZnO and Li 2B 4O 7separately,suggesting that no interelemental effects appear.The peak potentials for the stripping of B and Zn differ significantly from the standard potentials of the ZnO/Zn and B 2O 3/B couples.As described in literature concerning the voltammetry of microparticles [20–24],this can be due to separations from reversibility,variations on the thermodynamic activity of the deposited solids,complexing ability of the electrolyte,etc.4.2.Analysis of stripping processesThe electrochemical parameters recorded in the anodic processes A 1,corresponding to the stripping of zinc,and A 2,the main stripping process of boron,fit with the theo-retical model for irreversible stripping oxidation [30–33].In LSVs,linear dependencies of the peak potential,E p ,on the logarithm of the potential scan rate (log v )were obtained;in SQWVs,linear representations of E p vs.log f apply in both cases,as illustrated in Fig.4.Interestingly,almost identical anodic voltammograms were obtained for all tested boron materials,thus suggest-ing that the electrochemical oxidation of the boron deposit is unaffected by the starting material.This can be seen in Fig.2,in which the anodic SQWVs of ulexite 38,coleman-ite 38,and F.2are shown.It should be noted,however,that the response in mixed BX +ZnO systems can be conditioned not only by the possi-ble formation of intermetallic compounds during deposition.Since the deposition of zinc metal takes place at potentials more negative than those at which the deposition of boron occurs,the nucleation and growth processes of the deposi-tion of zinc takes place at a boron-modified electrode sur-face.Accordingly,the deposit of Zn,and,consequently,its subsequent stripping dissolution,may differ from that ob-tained in ZnO-modified electrodes.Additionally,the presence of other metals in samples,and the possible effects of counteranions as complexing agents or influencing deposition processes,may result inmatrixFig.5.SQWVs of PIGEs modified by ZnO +H 3BO 3(m BX /m ZnO )=1.047immersed into 0.10M NaCl +0.25M mannitol after an electrode-position time of 30s:(a)E d =−1.15V ;(b)E d =−1.55V .Potential step increment 4mV ,square wave amplitude 25mV ,frequency 15Hz.effects affecting the electrochemical determination of boron.Electrochemical measurements in the different BX +ZnO systems (BX =Li 2B 4O 7,Na 2B 4O 7,H 3BO 3,and LiBO 2·2H 2O),however,indicated that the stripping pro-cesses of boron and zinc are essentially unchanged under our experimental conditions,with almost identical depen-dencies of the peak potential on log v and/or log f in all cases.To disfavour intermetallic and matrix effects,it is convenient to transfer relatively low amounts of modifier to the electrode surface [34].The most significant feature is that relative height and/or area of peaks A 1and A 2+A 3depends on the potential of electrodeposition,E d ,and the duration of the electrodepo-sition step performed at such potential.Thus,as shown in Fig.5,for a fixed electrodeposition time,t d ,stripping peak of Zn is enhanced at the expense of that of B by apply-ing more negative electrodeposition potentials.At a given E d value,both stripping peaks increase,but the A (B)/A (Zn)and i p (B)/ i p (Zn)ratios decrease as the electrodeposition time increases until constant values for such quotients ap-pear for times larger than 50–60s,as can be seen in Fig.6.This fact can be explained by the existing differences in the nucleation and growth of the deposits of B and Zn,the sec-ond being presumably more sensitive to changes on the elec-A.Dom´e nech-Carb´o et al./Analytica Chimica Acta 501(2004)103–11110902468050100150200250300350t(s)Fig. 6.Experimental values of the i p (B)/ i p (Zn)(triangles)and A (B)/A (Zn)(squares)ratios as a function of the electrodeposition time in SQWVs recorded at PIGEs modified by a ZnO +Li 2B 4O 7mixture (m BX /m ZnO =1.039)in 0.10M NaCl +0.25M mannitol.E d =−1.25V ,potential step increment 4mV ,square wave amplitude 25mV ,frequency 15Hz.trodeposition time than the first.It should be noted,however,that formation of gaseous B 2H 6may eventually distort the observed voltammetry.It appears that under our experimen-tal conditions,with graphite electrodes having in general a large overpotential for gaseous evolution,‘clean’boron de-posits are formed,as suggested by the record of well-defined stripping peaks.Repeatability tests were performed as series of inde-pendent measurements:(a)successively performed on the same modified electrode,or (b)performed on different freshly prepared modified electrodes.The second method produced better results with deviations lower than a 10%for i p (B)/ i p (Zn)and A (B)/A (Zn)ing fixed electrodeposition potentials and times and freshly prepared electrodes,the relative standard deviation (RSD)of the i p (B)/ i p (Zn)and A (B)/A (Zn)ratios increased on increasing the electrodeposition time from 0.6%at t =30s,to 1.6%at t =300s.Table 2Statistical parameters of calibration curves obtained from SQWVs of PIGEs modified by ZnO +BX mixtures in 0.10M NaCl +0.25M mannitol a BXE d (V)t d (s)m s m ±ts m b S b ±ts b r 2LD From i p (B)/ i p (Zn)measurements Li 2B 4O 7−1.2530 2.180.030.07−0.090.070.180.99910.096Li 2B 4O 7−1.2560 1.2880.0110.030.000.030.070.99960.063Li 2B 4O 7−1.251200.9730.0030.008−0.0540.0080.020.999930.025Li 2B 4O 7−1.3530 1.560.040.100.180.100.20.9960.18Li 2B 4O 7−1.45300.7690.0100.020.010.020.060.999920.094Na 2B 4O 7−1.3530 2.300.140.4−0.220.32 1.00.9900.42LiBO 2·2H 2O −1.3530 2.260.030.10−0.280.070.20.99940.092H 3BO 3−1.3530 2.190.100.3−0.080.190.60.9940.26From A (B)/A (Zn)measurements Li 2B 4O 7−1.2530 2.780.040.11−0.100.100.260.99900.11Li 2B 4O 7−1.2560 1.7320.0160.0420.030.040.100.99960.068Li 2B 4O 7−1.25120 1.3240.0040.011−0.0700.0100.0260.99940.023Li 2B 4O 7−1.3530 2.120.050.14−0.100.130.330.9960.18Li 2B 4O 7−1.4530 1.1860.0160.040−0.010.040.100.999910.096Na 2B 4O 7−1.3530 2.930.060.20−0.340.150.460.99900.15LiBO 2·2H 2O−1.3530 2.860.050.16−0.370.110.340.99910.11H 3BO 3−1.35302.800.120.39−0.10.20.70.9930.24aPotential step increment 4mV ,square wave amplitude 25mV ,frequency 15Hz.4.3.CalibrationCalibration curves were obtained for ZnO +Li 2B 4O 7mixtures with m BX /m MY ratios ranging from 0.15to 2.10in 0.10M NaCl +0.25M mannitol.Linear dependencies of the A (B)/A (Zn)and i p (B)/ i p (Zn)ratios on the ΓB /ΓZn ratio were obtained upon application of an electrodeposi-tion step at −1.35V during 30s (A),60s (B),and 120s (C).A straight line that passed through the origin was obtained in all cases with correlation coefficients larger than 0.99.A similar situation was obtained for calibration plots ob-tained from SQWVs recorded at different electrodeposition potentials.For different ZnO +Li 2B 4O 7mixtures in 0.10M NaCl +0.25M mannitol,straight lines passing through the origin were obtained at an electrogeneration time of 30s.The statistical parameters for these calibration experiments are summarized in Table 2.The confidence intervals for slope and y -intercept were calculated as ts a and ts b ,where s a and s b are the standard deviations of slope and y -intercept,respectively,and t the Student’s t (P =0.05,n −2).The limit of detection was calculated as 3s b /m ,where s b represents again the standard deviation of the y -intercept and m is the slope of the straight line [35].To corroborate the absence of matrix effects,calibra-tion experiments were performed using mixtures of ZnO with Li 2B 4O 7,Na 2B 4O 7,H 3BO 3,and LiBO 2·2H 2O.Plots of A (B)/A (Zn)and i p (B)/ i p (Zn)vs.ΓB /ΓZn provided almost identical straight lines.These results support the idea that,in the absence of other depositable metals and other possible interfering agents,the proposed methodol-ogy can be applied to determine the amount of boron in samples.。
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a rXiv:0711.4988v1[astro-ph]3Nov27Detection of an inner gaseous component in a Herbig Be star accretion disk:Near-and mid-infrared spectro-interferometry and radiative transfer modeling of MWC 1471Stefan Kraus,Thomas Preibisch and Keiichi Ohnaka Max Planck Institut f¨u r Radioastronomie,Auf dem H¨u gel 69,53121Bonn,Germany skraus@mpifr-bonn.mpg.de ABSTRACT We study the geometry and the physical conditions in the inner (AU-scale)cir-cumstellar region around the young Herbig Be star MWC 147using long-baseline spectro-interferometry in the near-infrared (NIR K -band,VLTI/AMBER ob-servations and PTI archive data)as well as the mid-infrared (MIR N -band,VLTI/MIDI observations).The emission from MWC 147is clearly resolved and has a characteristic physical size of ∼1.3AU and ∼9AU at 2.2µm and 11µm respectively (Gaussian diameter).The MIR emission reveals asymmetry consis-tent with a disk structure seen under intermediate inclination.The spectrally dispersed AMBER and MIDI interferograms both show a strong increase in the characteristic size towards longer wavelengths,much steeper than predicted by analytic disk models assuming power-law radial temperature distributions.We model the interferometric data and the spectral energy distribution of MWC 147with 2-D,frequency-dependent radiation transfer simulations.This analysis shows that models of spherical envelopes or passive irradiated Keplerian disks (with vertical or curved puffed-up inner rim)can easily fit the SED,butpredict much lower visibilities than observed;the angular size predicted by suchmodels is 2to 4times larger than the size derived from the interferometric data,so these models can clearly be ruled out.Models of a Keplerian disk with opticallythick gas emission from an active gaseous disk (inside the dust sublimation zone),however,yield a good fit of the SED and simultaneously reproduce the absolutelevel and the spectral dependence of the NIR and MIR visibilities.We concludethat the NIR continuum emission from MWC147is dominated by accretionluminosity emerging from an optically thick inner gaseous disk,while the MIRemission also contains contributions from the outer,irradiated dust disk.Subject headings:accretion,accretion disks–stars:formation–stars:pre-main-sequence–stars:individual:MWC147–techniques:interferometric1.IntroductionThe spatial structure of the circumstellar material around Herbig Ae/Be(HAeBe)stars, i.e.intermediate-mass,pre-main sequence stars,is still a matter of debate.Until recently,the spatial scales of the inner circumstellar environment(a few AU,corresponding to 0.′′1)were not accessible to optical and infrared imaging observations,and conclusions drawn on the spa-tial distribution of the circumstellar material were,in most cases,entirely based on the model-ing of the spectral energy distribution(SED).However,fits to the observed SEDs are highly ambiguous,and very different models such as spherical envelopes(Miroshnichenko et al. 1997),geometrically thin disks(Hillenbrand et al.1992),disks surrounded by a spherical en-velope(Natta&Kruegel1995;Natta et al.2001;Miroshnichenko et al.1999),flared outer disks,puffed-up inner disk rims(Dullemond et al.2001),and disk plus inner halo models (Vinkovi´c et al.2006)have been used to successfullyfit the observed SEDs of HAeBes.It was also unclear how the accretion of circumstellar material onto the star affects the structure and emission of the inner circumstellar environment.In the last couple of years,long-baseline interferometry in the near-(NIR)and mid-infared(MIR)spectral range provided,for thefirst time,direct spatial information on the inner circumstellar regions of young stars at scales of 10milli-arcseconds(mas;e.g.,Malbet et al.1998;Millan-Gabet et al.1999;Akeson et al.2000;Millan-Gabet et al. 2001;Wilkin&Akeson2003;Eisner et al.2004;Leinert et al.2004;Monnier et al.2005; Malbet et al.2007).The interferometric data were usually interpreted byfitting simple an-alytic models for the brightness distribution to the measured visibilities.The characteristic sizes of the emitting regions derived in this way were found to be correlated to the stellar luminosity,consistent with the idea that the NIR continuum emission mainly traces hot dust close to the dust sublimation radius,i.e.where the grains are heated above their sublimation temperature(T sub∼1500K)and destroyed by the(stellar)radiationfield(Tuthill et al. 2002;Monnier&Millan-Gabet2002).While the expected simple R⋆∝L1/2⋆scaling law be-tween stellar luminosity L⋆and NIR size R⋆appears to hold throughout the low-to medium-luminosity part of the observed stellar sample,some very luminous early B-type stars exhib-ited considerably smaller NIR sizes than predicted by this relation(Monnier&Millan-Gabet 2002;Eisner et al.2004;Monnier et al.2005).Monnier&Millan-Gabet(2002)suggested that this might be due to the presence of an inner gaseous disk,which shields the dust disk from the strong stellar ultraviolet(UV)radiation.Since this shielding would be most efficient for hot stars,it would allow the inner rim of the dust disk around B-type stars to exist closer to the star.Several subsequent studies favour“classical”accretion disk mod-els(Eisner et al.2004;Monnier et al.2005;Vinkovi´c&Jurki´c2007)or“two-ring”models (Eisner et al.2007),in which the infrared emission contains contributions from the thermal emission of optically thick gas in the innermost disk regions.Following initial attempts by Hinz et al.(2001),who used single-dish nulling interfer-ometry to put upper limits of 20AU on the MIR size of some Herbig Ae stars,a large sample of HAeBes disks could be resolved with the VLTI/MIDI long-baseline interferometer at MIR wavelengths.In contrast to the NIRflux,which originates from hot dust in the innermost disk regions close to the dust sublimation radius,the MIR emission also traces cooler(∼200−300K)dust further out in the disk.Leinert et al.(2004)determined char-acteristic dimensions of the10µm emitting regions for a sample of HAeBes,which ranged from1AU to10AU.Due to the quite limited uv-plane coverage of most existing infrared interferometric data sets,most published studies were only able to derive estimates of characteristic sizes and,in some cases,to look for possible elongation of the emitting region,but could not investigate the geometry of individual sources in detail.A more comprehensive interferometric study of one Herbig Ae star,HR5999,was recently performed by our group(Preibisch et al.2006). Based on a set of ten MIDI measurements at different projected baseline lengths and po-sition angles(PAs),modeling with2-D frequency-dependent radiation transfer simulations provided relatively detailed information on the disk size and inclination.In this study,we combine,for thefirst time,NIR and MIR interferometric observations to constrain the spatial structure of the dust and gas environment around a Herbig Be star. Besides the wide spectral coverage(from∼2to13µm),our interferometric data is also dispersed into several spectral channels(resolution R=λ/∆λ≈30),allowing us to measure the wavelength-dependence of the visibility over the K-and N-band and within spectral features such as the silicate emission feature around10µm.In combination with detailed2-D radiative transfer modeling,this spectro-interferometric data set provides unique information about the inner circumstellar structures of this star.MWC147(alias HD259431,BD+101172,HBC529,V700Mon)is a well-studied Her-big Be star in Monoceros.There is some uncertainty concerning the distance and thephysical parameters of this star.From the analysis of the Hipparcos parallax data by van den Ancker et al.(1998),a lower limit on the distance of>130pc was derived,while apc(Bertout et al.1999).This distance estimate, reanalysis suggested a distance of290+200−84however,is in conflict with the apparent location of MWC147in the NGC2247dark cloud, which is a part of the cloud complex in the Monoceros OB1association at a distance of ∼800−900pc(Oliver et al.1996).We assume a distance of800pc for MWC147(consis-tent with most other recent studies)and use the main stellar parameters as listed in Tab.1, which were taken from Hern´a ndez et al.(2004).Numerous observational results strongly suggest the presence of a circumstellar disk around MWC147.The object shows a strong infrared excess of about6mag at MIR wave-lengths,clearly demonstrating the presence of circumstellar material.Hillenbrand et al. (1992)fitted the SED of MWC147with a model assuming an accretion disk and estimated an accretion rate of˙M acc=1.01×10−5M⊙yr−1.MIR(10µm and18µm)imaging ob-servations revealed an elongated diffuse emission component around MWC147along PA ∼50◦,extending out to∼6′′and contributing∼34%to the totalflux(Polomski et al.2002). Mannings(1994)determined the1.1mmflux of MWC147and estimated the mass in the circumstellar disk/envelope to be<0.09M⊙.The study of the far-UV spectrum of MWC147by Bouret et al.(2003)also suggested the presence of aflared circumstellar disk. Polomski et al.(2002)imaged MWC147in the MIR and concluded that the star is sur-rounded by a moderatelyflared disk and probably an extended envelope.Measurements by Jain et al.(1990)showed a significant amount of linear polarization(∼1%along PA∼106◦) but no wavelength-dependence of the polarization.The high observed rotational velocity of v sin i=90km s−1(Boehm&Catala1995)suggests a high inclination of the rotation axis of MWC147with respect to the line-of-sight.This implies that the orientation of the circumstellar disk should be closer to edge-on than to face-on.Table1.Stellar parameters for MWC147from Hern´a ndez et al.(2004),assumingR V=3.1.Parameter ValueRecently,Brittain et al.(2007)presented a high-resolution NIR spectrum of MWC147, showing a strong Brγemission ing an empirical relation between the Brγluminosity and the accretion rate(as derived from UV veiling;van den Ancker2005),they derive a mass accretion rate of˙M acc=4.1×10−7M⊙yr−1.As discussed in their Section5.2,it is well possible that this method underestimates the true mass accretion rate.Adopting the stellar parameters used in our study(Tab.1)will also result in a larger value for the derived accretion rate.Evidence for a strong stellar wind from MWC147comes from the observed P Cygni profiles in several emission lines(Bouret et al.2003).A quantitative modeling of FUSE spectra revealed multiple absorption components with different temperatures,consistent with aflared disk interpretation(Bouret et al.2003).Based on the intensity ratio of infrared hydrogen lines,Nisini et al.(1995)estimated a mass loss rate of2.0±0.4×10−7M⊙yr−1, which is slightly higher than the mass loss rates determined from radio observations(0.68×10−7M⊙yr−1,Skinner et al.1993).The star has a faint visual companion at a projected separation of3.′′1(∼2500AU,∆R=6.82,Baines et al.2006).While Vieira&Cunha(1994)classified MWC147as a spectroscopic binary with a period of about one year,this claim could not be confirmed in more recent observations(Corporon&Lagrange1999).First interferometric measurements on MWC147were presented by Millan-Gabet et al. (2001),providing an upper limit on the H-band size.Akeson et al.(2000)observed MWC147 with the Palomar Testbed Interferometer(PTI)and resolved its emission in the K-band at baselines around100m.They derived a best-fit Gaussian FWHM diameter of1.38mas (=1.1AU)in the K-band.2.Observations and data reductionDetails of all interferometric observations of MWC147used in this paper are summa-rized in Tab.2.All visibility measurements were corrected for atmospheric and instrumental effects using calibrator stars observed during the same night.The calibrator stars as well as their assumed angular diameters are listed in Tab.3.Fig.1shows the uv-plane coverage obtained with these observations.Table3.Calibrator star information for the interferometric observations presented inTab.2.Star K N Spectral d UD,K d UD,N[Jy]Type[mas][mas]Note.—The V-band magnitudes were taken from SIMBAD,theK-band magnitudes from the2MASS point source catalog,and theN-band(12µm)flux density from Helou&Walker(1988).a UD diameter from Malbet et al.(1998).b UD diameter from the CHARM catalog(Richichi&Percheron2002).c UD diameter adopted from Pasinetti Fracassini et al.(2001),us-ing the Hipparcos parallax of51.76mas measured for HD43587.d UD diameter from M´e rand et al.(2005).e UD diameter from the CHARM2catalog(Richichi et al.2005).-100-5050100-100-50 050 100v [m ]u [m]Fig.1.—uv -plane coverage of the VLTI/MIDI,VLTI/AMBER,and archival PTI data.Fig.2.—2.1.VLTI/MIDI observationsThe MIDI interferometer(Przygodda et al.2003;Leinert et al.2004)at the ESO Very Large Telescope Interferometer(VLTI)records spectrally dispersed interferograms in the N-band(8-13µm).The MIDI observations of MWC147were carried out for ESO open time(OT)programmes074.C-0181and078.C-0129(P.I.Th.Preibisch),using the NaCl prism as dispersive element(providing a spectral resolution of R=30)and the HIGH-SENS instrument mode.In total,nine observations were carried out onfive different baseline configurations,as listed in Tab.2.We used the data reduction software package MIA+EWS1(Release1.5.1)to extract visibilities from the MIDI data.This package contains two independent data reduction programs,based on a coherent(EWS,Jaffe2004)and an incoherent approach(MIA, Leinert et al.2004).The reduction results obtained with both algorithms agree very well (within3%for the calibrated visibility)for all data sets;with exception of the data sets from January/February2005.Inspection of the acquisition image for these specific data sets0 0.2 0.40.60.81V i s i b i l i t y λ [µm]Fig. 3.—Wavelength-dependence of the visibility measured with VLTI/AMBER and the visibilities measured with PTI using broad-band filters.revealed a poor beam overlap;thus,we rejected them from our further analysis.The inspec-tion of the acquisition images for the other data sets showed that the visual companion at a separation of 3.′′1was not in the MIDI field-of-view (FOV)and,therefore,does not affect the measured visibilities.The wavelength-dependent calibrated visibilities of the remain-ing seven data sets are shown in Fig.2.For the minimum relative error on the calibrated visibilities,we assume a conservative value of 10%(see Leinert et al.2004).2.2.VLTI/AMBER observationsAMBER (Petrov et al.2003,2007),the NIR beam-combiner of the VLTI,can combine the light from up to three telescopes,providing not only the visibility amplitudes but also the closure phase relation.The observations of MWC 147were conducted within OT programme 076.C-0138(P.I.Th.Preibisch)using the 8.2m unit telescopes UT1-UT3-UT4.Spectrally dispersed interferograms were obtained in the low resolution (LR)mode (R =35),which resolves the K -band into 11spectral channels.Due to problems with the fiber injection during that night,the flux reaching the AMBER beam combiner from UT4was about afactor of3lower than from the other telescopes.Therefore,clear fringes were detectable on only one of the three baselines(UT1-UT3),and no closure phase signal could be measured. Following the ESO service mode observation procedure,one data set of5000interferograms was recorded both on a calibrator star(HD45415)and on MWC147.The length and orientation of the projected baseline for this AMBER measurement(101m,PA40◦)is similar to the measurement at the PTI-NS baseline,but adds information about the spectral dependence of the visibility within the K-band.The AMBER data were reduced with version2.4of the amdlib2software employing the P2VM algorithm(Tatulli et al.2006).Due to the absence of a fringe tracker,a large fraction of the interferograms is of rather low contrast Petrov et al.(see discussion in2007). Therefore,we removed those frames from our data set for which(a)the light injection from the contributing telescopes was unsatisfying;i.e.,the intensity ratio between the photometric channels was larger than4,(b)the atmospheric piston was larger than1/4of the coherence lengthλ·R,or(c)the fringe contrast was decreased due to instrumental jitter(the20%best interferograms were selected based on the Fringe SNR criteria,as defined in Tatulli et al. 2006).In Fig.3the calibrated K-band visibilities derived from the AMBER and PTI measurements are shown as a function of wavelength.As mentioned in Petrov et al.(2007), the accuracy of the absolute calibration of the visibilities measured with VLTI/AMBER is currently limited by vibrations induced by the UTs,which lead us to assume a minimum relative error of3%for the calibrated visibilities.In contrast to the absolute calibration,the wavelength-differential dependence of the visibility is insensitive to this effect(Petrov et al. 2007).2.3.PTI archive dataMWC147was observed with the Palomar Testbed Interferometer(PTI,Colavita et al. 1999)on the NS(Akeson et al.2000)and NS&NW baselines(Wilkin&Akeson2003). Yet unpublished data for the SW baseline was retrieved from the PTI archive.To obtain a uniformly calibrated data set,we processed the new data set together with the previously published data using the V2Calib V1.4software3.In the course of the calibration procedure, we applied to the raw visibilities(which were estimated from the spatiallyfiltered PTI spectrometer output)the standard correction for coherence loss using the measured phase jitter(see Colavita et al.1999).The individual PTI measurements were binned so that eachbin contains data sets covering less than15◦variation along the PA.Since the measurements on the PTI-NS baseline also cover a relatively wide range of PAs(∼23◦),we divided those measurements into two halves(depending on the PA)before averaging.As for the AMBER data,we assume3%minimum relative error on the calibrated visibilities.2.4.Spitzer-IRS archive dataIn order to constrain the SED for our radiative transfer modeling as tightly as pos-sible,we obtained MIR spectra from the Spitzer Space Telescope Archive.These spectra were recorded on2004-10-26within GTO programme ID3470(P.I.J.Bouwman)using the Infrared Spectrograph(IRS,Houck et al.2004).The data set consists of four exposures; two taken in the Short-High mode(SH,wavelength range from9.9to19.6µm)and two in the Long-High mode(LH,18.7to37.2µm).Both modes provide a spectral resolution of R∼600.With slit sizes of4.′′7×11.′′3(SH mode)and11.′′1×22.′′3(LH mode),IRS integrates flux from areas much larger than those collected in the spatiallyfiltered MIDI spectrum. The spectra were pre-processed by the S13.2.0pipeline version at the Spitzer Science Center (SSC)and then extracted with the SMART software,Version5.5.7(Higdon et al.2004).3.Results3.1.The MIR spectrum0.5 1 1.5 2 2.5 33.5 4λF λ [10-12W /m 2]λ [µm]Fig. 4.—Comparison of the measured MIDI spectrum and the spectrum extracted from archival Spitzer -IRS data.In the overlapping wavelength regime between10and13µm,the MIDI and Spitzer-IRS spectra show good quantitative agreement,both in the absolute level of the continuumfluxand in the spectral slope(see Fig.4).However,the IRS spectrum exhibits some line featureswhich do not appear in the MIDI spectrum4.As these emission lines are most pronounced at wavelengths of11.0,11.2,12.8,14.5,and16.4µm,we attribute these features to the presenceof Polycyclic Aromatic Hydrocarbons(PAHs,Allamandola et al.1985;van Dishoeck2004),which were found towards a large variety of objects,including T-Tauri stars and HAeBestars(Acke&van den Ancker2004).For the strong and rather broad emission feature at11.2µm,contributions from the11.3µm crystalline silicate feature are also possible.The prominence of the PAH lines in the Spitzer-IRS spectra with their4.′′7×11.′′3FOVand their absence in the MIDI spectrum with its much(∼17×)smaller FOV suggeststhat the PAH emission comes predominantly from the outermost circumstellar environmentand/or the surrounding nebulosity of MWC147,similar to what was found for other young stellar objects(e.g.van Boekel et al.2004b,Rho et al.2006)or the outer regions of HAeBedisks(Habart et al.2004,2006).The comparison of the Spitzer-IRS spectrum with thefluxes measured by IRAS(Helou&Walker 1988)showed that the IRASfluxes are systematically higher.This is likely related to thelarger beam size of IRAS,which includes significant amounts of emission from the ambientNGC2247nebula.For our modeling in Sect.4,we will therefore treat the IRASfluxes asupper limits only.3.2.The correlated MIR spectrum–indications of grain growthThe visibilities measured with MIDI show significant variations along the recorded wave-length range.In particular,we detect a drop of visibility within the10µm silicate feature.A similar behavior has already been observed for several HAeBe stars;e.g.,in the samplesof Leinert et al.(2004)and van Boekel et al.(2004a).As the silicate emission feature is generally attributed to the presence of rather small silicate grains(r 0.1µm,see e.g.van Boekel et al.2004a),it is possible to probe the radialdust mineralogy by comparing the correlated spectrum at various baseline lengths with thetotal spectrum F tot.The correlated spectrum F corr corresponds to theflux integrated over the0.5 11.522.538 9 1011 12 13λF λ [10-12W /m 2]λ [µm]total fluxflux < 35 AU (correlated at B=56m)flux < 20 AU (correlated at B=89m)Fig. 5.—Total MIDI spectrum and the correlated flux at the 55.9m (corresponding to a spatial scale of 35AU)and 89.4m ( 20AU)baselines.spatial area unresolved by the interferometer for a particular baseline length B .Therefore,for each baseline length B ,the correlated flux F corr (B )can be computed by multiplying the total spectrum measured by MIDI in the photometry files with the visibility measured for a certain baseline.In order to probe the radial dependence of the dust mineralogy,measurements taken at similar PAs should be used in order to avoid contaminations by changes in the source geometry.We therefore choose the measurements from 2004-11-01(B =55.9m,PA=82◦)and 2004-10-30(B =89.4m,PA=90◦),as they have very similar PAs.The comparison of the correlated spectra for these baselines with the total spectrum (Fig.5)shows that the 10µm silicate feature flattens out with increasing resolution.This change in the correlated spectrum might indicate spatial variations in the dust composition,with the more evolved dust grains (rger grains with a weaker silicate feature;Min et al.2006)in the innermost disk regions.3.3.Geometric model fitsSince the imaging capabilities of the current generation of infrared interferometers are rather limited,the measured interferometric observables are often used to constrain theparameters of a model for the object morphology.In most studies presented until now, either purely geometric profiles(in particular uniform disk(UD)and Gaussian profiles)or physically motivated geometries such as ring profiles or analytic accretion disk models witha power law temperature distribution were employed.Ring models are justified by the theoretical expectation that most of the NIR emission originates from a rather small region around the dust sublimation radius(e.g.,Millan-Gabet et al.2001;Monnier&Millan-Gabet 2002).A common problem in applying simple geometric models is that the observed emission does not originate exclusively from the circumstellar material:a certain fraction comes directly from the central star and contributes a spatially(nearly)unresolved component, and the existence of extended background emission,which is fully resolved,is also possible. For the modelfits,one therefore has to specify which fraction of the totalflux F tot at any wavelength has to be attributed to the different spatial components.The stellarflux contribution f star/tot(λ)=F star/F tot is often estimated from the SED,while the extended component f ext/tot(λ)=F ext/F tot is usually assumed to be zero.These assumptions are, however,associated with a considerable uncertainty.To allow comparison with earlier NIR interferometric studies on MWC147,we keep theflux ratios from Millan-Gabet et al.(2001),namely f star/tot(2.1µm)=0.16,and f ext/tot(2.1µm)= 0.0for the analyticfits.The sameflux ratio was assumed by Wilkin&Akeson(2003),while Akeson et al.(2000)used f star/tot(2.1µm)=0.10.At MIR wavelengths,the stellar contri-bution is likely to be negligible;i.e.,f star/tot(10µm)≈0.This can be concluded from the SED shown in Fig.6,where the infrared excess exceeds the stellarflux by a factor of∼280at10µm.3.3.1.Characteristic source size and elongationTo obtain afirst estimate of the object size,wefit the most common analytic profilesto our interferometric data:Gaussian,UD,and ring profiles.For mathematical descriptionsof these profiles,we refer to Kraus et al.(2005,UD profile)and Millan-Gabet et al.(2001, Gaussian&ring profile).We assume uniform bright rings with an average diameterΘand afixed width of20%to be consistent with Monnier et al.(2005).As the apparent object size is expected to change with wavelength,wefitted these profiles to subsets of our data,covering wavelength ranges around2.2µm,8.6µm,11.0µm,and12.5µm.The visibilities measuredin these sub-bands werefitted to the visibility profiles using a Levenberg-Marquardt least-squarefitting algorithm,taking the chromatic change in resolution within the bandwidth into account.1.5 10.5 0 0.5 1 1.51 0.5 00.5110.5 0 0.51d D E C [m a s ]d D E C [A U ]dRA [mas]dRA [AU] 12.5 10 7.5 5 2.5 0 2.5 57.5 10 12.5 10 5 051010 5 05 10d D E C [m a s ]d D E C [A U ]dRA [AU]12.510 7.55 2.5 0 2.5 57.5 10 12.5 10 5 0510d D E C [m a s ]d D E C [A U ]12.510 7.55 2.5 0 2.5 5 7.510 12.5 12.5 10 7.5 5 2.5 0 2.5 5 7.5 10 12.5105510d D E C [m a s ]d D E C [A U ]dRA [mas]Fig.7.—Polar diagram showing the best-fit circular and elliptical geometries.To derive the characteristic object size along different PAs (dots with errorbars),we fitted ring profiles to the PTI K -band visibilities (left panel)and to MIDI visibilities (right panel)which were averaged over five spectral channels around the silicate feature (10.3−11.7µm)and in the surrounding continuum ranges 8.1−9.1µm and 11.9−13.1µm.2 4 6 8 10 12 14 16 18d i a me t e r [m a s ]Wavelength [µm]Fig.8.—Wavelength-dependence of the measured characteristic size over the H -,K -and N -band,including IOTA,PTI,AMBER and MIDI measurements.From our seven MIDI measurements,we choose the data set from 2007-02-08,since this measurement was taken at very similar baseline length and PA (102.0m/35◦)as the AMBER data set (101.0m/40◦),which makes these data sets particularly well suited to study the radial disk structure without contamination by the detailed source geometry.The IOTA H -band measurement provides only an upper size limit.To compute the characteristic size,Gaussian intensity profiles were assumed.For comparison,we show the wavelength-dependent size corresponding to the commonly applied analytic disk model from Hillenbrand et al.(1992).We scaled these disk models to match the measured NIR (dashed curves)or MIR size (dotted curves).In all cases,it is evident that these analytic models cannot describe the measured wavelength-dependent size well.。